TW200420657A - Thermosetting composition, antihalation membrane of solid image element, forming method for the membrane, and solid image element - Google Patents

Thermosetting composition, antihalation membrane of solid image element, forming method for the membrane, and solid image element

Info

Publication number
TW200420657A
TW200420657A TW092128894A TW92128894A TW200420657A TW 200420657 A TW200420657 A TW 200420657A TW 092128894 A TW092128894 A TW 092128894A TW 92128894 A TW92128894 A TW 92128894A TW 200420657 A TW200420657 A TW 200420657A
Authority
TW
Taiwan
Prior art keywords
membrane
antihalation
image element
solid image
thermosetting composition
Prior art date
Application number
TW092128894A
Other languages
Chinese (zh)
Other versions
TWI293321B (en
Inventor
Yoshifumi Kato
Atsushi Baba
Masashige Takatori
Kazuaki Niwa
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200420657A publication Critical patent/TW200420657A/en
Application granted granted Critical
Publication of TWI293321B publication Critical patent/TWI293321B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/14618—Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • H01L27/14685—Process for coatings or optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Optical Filters (AREA)

Abstract

This invention is to provide a thermosetting composition which, in an exposure process when a color filter or a micro lens in a solid image element is formed, can effectively control scattered reflection light from an underlying substrate and is suitable for forming an antihalation membrane having high heat resistance, to provide a forming method for the antihalation membrane using the composition, to prepare the membrane formed by the method, and to provide the solid image element having the antihalation membrane. The thermosetting composition comprises [A] a copolymer of monomers comprising (a1) an epoxy group-containing unsaturated compound and (a2) a radical polymerizable compound having a radiation absorbent group, and [B] at least one compound selected from the group consisting of polyvalent carboxylic anhydrides and polyvalent carboxylic acids. The antihalation membrane is formed from the composition, and the solid image element has the antihalation membrane.
TW092128894A 2002-11-29 2003-10-17 Thermosetting composition, antihalation membrane of solid image element, forming method for the membrane, and solid image element TW200420657A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002346680 2002-11-29
JP2003337499A JP3951302B2 (en) 2002-11-29 2003-09-29 Thermosetting composition, antihalation film for solid-state imaging device and method for forming the same, and solid-state imaging device

Publications (2)

Publication Number Publication Date
TW200420657A true TW200420657A (en) 2004-10-16
TWI293321B TWI293321B (en) 2008-02-11

Family

ID=32774878

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092128894A TW200420657A (en) 2002-11-29 2003-10-17 Thermosetting composition, antihalation membrane of solid image element, forming method for the membrane, and solid image element

Country Status (3)

Country Link
JP (1) JP3951302B2 (en)
KR (1) KR100947693B1 (en)
TW (1) TW200420657A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4671016B2 (en) * 2004-03-29 2011-04-13 Ｊｓｒ株式会社 Thermosetting composition, antihalation film for solid-state imaging device and method for forming the same, and solid-state imaging device
JP2007099943A (en) * 2005-10-05 2007-04-19 Jsr Corp Thermosetting composition, antihalation film for solid-state imaging device, method for forming the same and solid-state imaging device
JP2007332200A (en) * 2006-06-13 2007-12-27 Jsr Corp Thermosetting resin composition, forming method of antihalation film of solid imaging element, antihalation film of solid imaging element, and solid imaging element

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1025434A (en) * 1996-04-18 1998-01-27 Otsuka Chem Co Ltd Weatherable powder coating resin composition
JP3369414B2 (en) * 1996-10-25 2003-01-20 大日本インキ化学工業株式会社 Thermosetting resin composition

Also Published As

Publication number Publication date
JP3951302B2 (en) 2007-08-01
KR100947693B1 (en) 2010-03-16
JP2004190006A (en) 2004-07-08
TWI293321B (en) 2008-02-11
KR20040047714A (en) 2004-06-05

Similar Documents

Publication Publication Date Title
TW200627064A (en) Photosensitive resin composition, method for preparating the same, and dry film resist comprising the same
WO2008050768A1 (en) Photocurable/thermocurable solder resist composition, and printed circuit board using the same
EP2230040A3 (en) Laser material processing system
WO2006053751A3 (en) Projection lens system of a microlithographic projection exposure installation
EP1017086A4 (en) Projection aligner, method of manufacturing the aligner, method of exposure using the aligner, and method of manufacturing circuit devices by using the aligner
DE60319591D1 (en) RADIATION CALCULATED AQUEOUS COMPOSITIONS
CA2403080A1 (en) Method and apparatus for producing a marking on an ophthalmic lens having a low surface energy
ATE313571T1 (en) FLUORINATED PHOTOPOLYMER COMPOSITION AND WAVEGUIDE DEVICE
CN1182486A (en) Illumination unit for an optical apparatus
JP2000119472A5 (en)
DE60235883D1 (en) Device for generating liquid droplets
JP2007036249A (en) Well photoresist pattern of semiconductor device, and method for forming same
TWI263867B (en) Positively photosensitive resin composition and method of pattern formation
TW200627061A (en) Photosensitive composition, image-forming base material, image-forming material, and image-forming method
ATE441157T1 (en) OPTICAL SENSOR DEVICE AND METHOD FOR CONTROLLING ITS EXPOSURE TIME
JPS5227634A (en) Focus plate
TW200420657A (en) Thermosetting composition, antihalation membrane of solid image element, forming method for the membrane, and solid image element
TW200720311A (en) Thermosetting composition, antihalation film for solid-state imaging device and process for producing the same, and solid-state imaging device
TW200719086A (en) Photosensitive resin composition, spacer for display panel and display panel
EP2019128A4 (en) Photosensitive resin composition and produced therefrom, photosensitive film and stencil for screen printing
ES2019088B3 (en) AQUEOUS DISPERSION OF AN ADDITIONAL POLYMER, A COATING COMPOSITION BASED ON IT AND A PROCEDURE FOR COATING A SUBSTRATE WITH SUCH A COATING COMPOSITION.
TW200628539A (en) Halogen free dry film photosensitive resin composition
JPS56101112A (en) Exposure method
US10884165B2 (en) Display device with protective anti-glare layers and method for manufacturing the same
TW200609251A (en) Thermosetting composition, halation preventing film of solid state imaging device and its forming method, and solid state imaging device

Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent