TW200416990A - Stacked flip-chip package processing - Google Patents
Stacked flip-chip package processing Download PDFInfo
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- TW200416990A TW200416990A TW92103360A TW92103360A TW200416990A TW 200416990 A TW200416990 A TW 200416990A TW 92103360 A TW92103360 A TW 92103360A TW 92103360 A TW92103360 A TW 92103360A TW 200416990 A TW200416990 A TW 200416990A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
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Abstract
Description
200416990 五、發明說明(1) 【發明所屬之技術領域】 本發明是有關於一種覆晶封裝製程,且特別是有關於 一種堆疊式(Stacked)覆晶封裝製程。 【先前技術】 在半體產業中’積體電路(Integrated Circuits, I C )的生產,主要分為三個階段:晶圓(wa f e r )的製造、積 體電路(ic)的製作以及積體電路(IC)的封裝(Package) 等。其中’裸晶片(d 1 e)係經由晶圓製作、電路設計、光 罩多道製程以及切割晶圓等步驟而完成,而每一顆由晶圓 切割所形成的裸晶片,經由裸晶片上之焊墊(B〇nding Pad)與承載器(Carrier)電性連接。承載器例如為一封裝 基板(Substrate)或一印刷電路板(Printed Circuit Board,PCB),為了連接上述之晶片和承載器,通常會使 用導線(Wire)及/或凸塊(Bump)作為接合之媒介,以構成 一晶片封裝(Chip Package)結構。其中,覆晶接合技術 (FI ip Chip Interconnect Technology)即是在晶片之辉 塾上以面陣列(Area array)排列的方式形成凸塊,接著干再 將晶片翻覆之後,利用晶片上之凸塊分別對應連接至 器上的接點,使得晶片可經由凸塊而電性以及機械性 至承載器,再經由承載器之内部線路及表面之接點 = 部電路連接,如主機板等。 /、外 隨著晶片的積集度的增加,晶片的封士 來越多樣化,利用上述的覆晶接合技術 疋越 ^ ^ 入丨』心日日月封裝έ士棋, ,、,、有縮小晶片封裝面積及縮短訊號傳輪路徑等優:,目200416990 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a flip chip packaging process, and more particularly to a stacked flip chip packaging process. [Previous technology] The production of 'Integrated Circuits (IC)' in the half-body industry is mainly divided into three stages: wafer (wa fer) manufacturing, integrated circuit (ic) manufacturing, and integrated circuit (IC) Packages, etc. Among them, the “bare wafer (d 1 e)” is completed through the steps of wafer fabrication, circuit design, photomask multiple processes, and wafer dicing, and each bare wafer formed by wafer dicing is passed through the bare wafer. The Bonding Pad is electrically connected to the carrier. The carrier is, for example, a packaging substrate (Substrate) or a printed circuit board (PCB). In order to connect the above chip and the carrier, wires (Wire) and / or bumps (Bump) are usually used as the bonding. Media to form a chip package structure. Among them, the flip chip bonding technology (FI ip Chip Interconnect Technology) is to form bumps on the wafer in an area array arrangement, and then dry the wafer, and then use the bumps on the wafer to separate Corresponding to the contacts connected to the device, the chip can be electrically and mechanically connected to the carrier through the bumps, and then connected through the internal circuit and surface of the carrier = circuit connections, such as motherboards. / 、 With the increase of the degree of accumulation of the wafer, the more diverse the seals of the wafer, the more the use of the above-mentioned flip-chip bonding technology ^ ^ Into the heart and the sun and the moon and the package. Reduced chip package area and shortened signal transmission path
200416990 五、發明說明(2) 别已經廣泛應用於晶片封裝領域’例如晶片尺寸封裝 (Chip Scale Package,CSP)、覆晶 / 球袼陣列封裝(Flip Chip/Ball Grid Array, FC/BGA)以及多晶片模組封裝 (Multi-Chip Module,MCM)等型態的封裝模組,均是覆晶 接合技術所應用的範疇。其中,多晶片模組封裝係指將數 個曰曰片以覆晶接合技術構裝在同一承載器上,且這此晶片 之間藉由承載器而彼此電性連接,以構成一具有多二=之 覆晶封裝結構。 以 memory 多晶片 路晶片 減少空 以達到 及攜帶 結構’ 積集度 訊號傳 【發明 因 製程, 晶片與 目的。 動態隨機存取記憶體(dynamic randQm aeeess ’dram)以及邏輯電路(loglc circuU)為例,利用 杈組封裝(MCM)型態可將多個DRAM晶片以及邏輯電 =衣在同一個承載器上’如此不僅提高構裝密度、 ?需求’也降低了封裝模組之間訊號延遲的現象, S的,因此廣泛被應用在通訊 1Γ! 0 ^ 7 。,付注意的是,針對各種覆晶封裝 二j疋夕晶片封裝之覆晶封裝結構,如何製作出t #二:性的晶片封裝產品,並縮短晶片與晶片之門 遞的路徑,乃為本發明之重點。 間 内容】 … :在本m的就是在提供一種堆疊式 2-晶囫之表面上進行覆晶封裝的製程^ 曰曰囫之間訊號傳遞的路徑,並可達到多晶片封事: 為達本發明之上述目的 本發明提出一種堆疊式覆晶200416990 V. Description of the invention (2) Don't already be widely used in the field of chip packaging, such as Chip Scale Package (CSP), Flip Chip / Ball Grid Array (FC / BGA), and more Multi-Chip Module (MCM) and other types of package modules are all applications of flip-chip bonding technology. Among them, the multi-chip module package refers to the construction of several wafers on the same carrier using flip-chip bonding technology, and the chips are electrically connected to each other through the carrier to form a multi-chip = The flip chip package structure. The memory multichip chip reduces the space to achieve and carry the structure 'accumulation degree. Signal transmission [Invention due to manufacturing process, chip and purpose. For example, dynamic random access memory (dynamic randQm aeeess 'dram) and logic circuit (loglc circuU), multiple DRAM chips and logic circuits can be placed on the same carrier using the MCM package type.' In this way, not only the structure density is increased, the demand is reduced, but also the phenomenon of signal delay between the package modules is reduced. Therefore, it is widely used in communication 1Γ! 0 ^ 7. It should be noted that, for various flip-chip packaging structures, how to make t # 二 : sexual chip packaging products and shorten the path between the wafer and the wafer is based on The focus of the invention. Content]…: The process of providing flip-chip packaging on the surface of a stacked 2-crystal wafer is described in this article. ^ The signal transmission path between the wafers can be achieved, and multi-chip sealing can be achieved. The above object of the invention The present invention proposes a stacked flip chip
200416990 五、發明說明(3) 封裝製程,首先提供一晶圓,晶圓具有多個第一晶片,而 每一第一晶片具有多個第一接點及多個第二接點,且第一 接點係電性連接於第二接點。接著配置多個凸塊於這些第 一接點上。提供多個第二晶片,每一第二晶片具有多個銲 墊,分別對應於第二接點,且這些銲墊之表面分別配置一 第一凸塊,接著進行一覆晶步驟,藉由第一凸塊連接每一 第二接點及對應之銲墊之一。最後進行迴銲,並切割晶 圓,以獨立分開這些第一晶片。 依照本發明的較佳實施例所述,上述於切割晶圓之 後,又將切割後之晶粒配置於一承載器上,承載器具有多 個接合墊,分別對應於這些第一接點,且藉由第二凸塊分 別連接這些第一接點及對應之這些接合墊。此外,再進行 一底填製程,將一底膠填入於基板、晶片及第一晶片之 間,且底膠更包覆凸塊及凸塊。 本發明係在未切割之晶圓的表面上進行凸塊製程,並 配置一已切割之晶片於晶圓之表面上,以形成一堆疊式覆 晶封裝結構。其中晶片係直接堆疊於晶圓之表面,且藉由 凸塊而彼此電性連接,因此可縮短晶片與晶圓之間的訊號 傳遞路徑,並可達到多晶片封裝的目的。 為讓本發明之上述和其他目的、特徵、和優點能更明 顯易懂,下文特舉一較佳實施例,並配合所附圖式,作詳 細說明如下: 【實施方式】 第1 A〜1 Η圖依序繪示本發明第一實施例之一種堆疊式200416990 V. Description of the invention (3) For the packaging process, a wafer is first provided, and the wafer has multiple first wafers, and each first wafer has multiple first contacts and multiple second contacts, and the first The contact is electrically connected to the second contact. A plurality of bumps are then disposed on these first contacts. A plurality of second wafers are provided, each of which has a plurality of solder pads corresponding to the second contacts, and a surface of the solder pads is respectively provided with a first bump, and then a flip-chip step is performed. A bump is connected to each second contact and one of the corresponding solder pads. Finally, re-soldering is performed and the wafer is cut to separate the first wafers independently. According to a preferred embodiment of the present invention, after the wafer is diced, the diced dies are arranged on a carrier, and the carrier has a plurality of bonding pads respectively corresponding to the first contacts, and These first contacts and corresponding bonding pads are respectively connected by a second bump. In addition, an underfill process is performed to fill a primer between the substrate, the wafer and the first wafer, and the primer further covers the bumps and bumps. In the present invention, a bump process is performed on the surface of an uncut wafer, and a cut wafer is arranged on the surface of the wafer to form a stacked flip-chip packaging structure. The wafers are directly stacked on the surface of the wafer and are electrically connected to each other by bumps, so the signal transmission path between the wafer and the wafer can be shortened, and the purpose of multi-chip packaging can be achieved. In order to make the above and other objects, features, and advantages of the present invention more comprehensible, a preferred embodiment is given below in conjunction with the accompanying drawings for detailed description as follows: [Embodiment] The first 1 ~ 1 The figure illustrates a stacked type of the first embodiment of the present invention in sequence.
10551 t.wf. ptd 第7頁 200416990 五、發明說明(4) 覆晶封裝製程的流程示意圖。請先參考第1 A圖,首先提供 一晶圓100 ’晶圓100之表面大致上可區分為多個方格狀之 第一晶片1 1 0 (請參考第2圖),而晶圓1 〇 〇内部之積體電路 經由多道半導體製程之後,最後在第一晶片丨丨〇上形成多 個第一接點1 1 2及多個第二接點1 1 4,其中接點1 1 2、1 1 4係 作為訊號輸出入之媒介。值得注意的是,這些接點丨丨2、 Π 4例如以面陣列的方式排列於第一晶片丨丨〇上,以作為覆 晶封裝之晶片接點1 1 2 (即第一接點)或凸塊接點1 1 4 (即第 二接點),且晶片接點1 1 2係與凸塊接點1 1 4彼此電性連 接。 接著請參考第1B圖,在晶圓1〇〇之表面上進行凸塊製 程,將多個凸塊1 2 0 (即第一凸塊)以網版印刷(s c r e e n printing)的方式分別形成於每一凸塊接點丨14上,而凸塊 1 2 0之材質可為錫鉛合金。其中,凸塊接點1 1 4上已分別形 成 凸塊底金屬層116 ’藉由凸塊底金屬層116以使凸塊 120定位於凸塊接點丨14上。在較佳情況下,凸塊接點114 係分佈於第一晶片Π 0周圍的區域上,且利用一網版(未繪 示)先將晶圓1 0 0上之晶片接點1 1 2覆蓋住,並僅暴露出凸曰 塊接點1 1 4,之後再將錫膏(s ο 1 d e r p a s t e )以印刷的方式 塗佈於網版中,且在每一凸塊接點丨丨4上分別形成凸塊 120。當然,除了網版印刷之外,凸塊12〇亦可以電鍍的方 式分別形成於凸塊接點1 1 4上,其利用曝光、顯影等1影 製程’先形成一光阻(未繪示)於晶圓丨〇 〇表面上,接著將 一圖案轉印至光阻上,以使光阻形成多個光阻開口,10551 t.wf. ptd Page 7 200416990 V. Description of the invention (4) Schematic diagram of the flip-chip packaging process. Please refer to FIG. 1A first. First, a wafer 100 is provided. The surface of the wafer 100 can be roughly divided into a plurality of square-shaped first wafers 1 1 0 (refer to FIG. 2), and the wafer 1 〇 〇 After the internal integrated circuit passes multiple semiconductor processes, a plurality of first contacts 1 1 2 and a plurality of second contacts 1 1 4 are finally formed on the first wafer 丨 丨 0, among which the contacts 1 1 2 1 1 4 is the medium for signal input and output. It is worth noting that these contacts 丨 2 and Π 4 are arranged on the first chip 丨 丨 in the form of a surface array, for example, as chip contacts 1 1 2 (ie, the first contacts) of a flip-chip package or The bump contacts 1 1 4 (ie, the second contacts), and the chip contacts 1 1 2 and the bump contacts 1 1 4 are electrically connected to each other. Next, referring to FIG. 1B, a bump process is performed on the surface of the wafer 100, and a plurality of bumps 120 (that is, the first bumps) are separately formed on each surface by screen printing. A bump contact 丨 14, and the material of the bump 120 may be a tin-lead alloy. Among them, the bump bottom metal layer 116 'has been formed on the bump contacts 1 14 respectively, and the bump bottom metal layer 116 is used to position the bumps 120 on the bump contacts 14. In a better case, the bump contacts 114 are distributed on the area around the first wafer Π 0, and a screen plate (not shown) is used to cover the wafer contacts 1 1 2 on the wafer 100 first. Hold and expose only the bump contact 1 1 4, and then apply solder paste (s ο 1 derpaste) to the screen by printing, and on each bump contact 丨 丨 4 respectively Forming a bump 120. Of course, in addition to screen printing, the bumps 120 can also be formed on the bump contacts 1 1 4 in an electroplating manner, which uses a photolithography process such as exposure and development to form a photoresist (not shown). On the surface of the wafer, a pattern is transferred to the photoresist, so that the photoresist forms a plurality of photoresist openings.
200416990 五、發明說明(5) 阻開口僅暴露出凸塊接點1 1 4,之後再利用電鑛錫鉛合金 以形成凸塊1 2 0於每一凸塊接點π 4上,最後再將光阻去 除。另外,亦可以植球方式形成凸塊1 2 〇。 接著請參考第1C及1D圖,提供多個第二晶片13〇,而 第二晶片1 3 〇係由切割另一晶圓所形成的,且第二晶片1 3 〇 之表面具有多個銲墊(bonding pad) 132,分別對應於晶圓 1 0 0之晶片接點1 1 2,且銲墊1 3 2之表面例如先形成一凸塊 底金屬層136,之後再分別配置一凸塊134(即第二凸塊)於 凸塊,金屬層136上。接著進行一覆晶步驟,藉由凸塊134 連接每一晶片接點1 1 2及對應之銲墊丨3 2之一。其中,凸塊 1 = 4例如為一錫膏(s〇lder paste)或一錫鉛合金。在較佳 情況下,第一晶片!丨〇例如為邏輯電路晶片,其具有高密 度且面陣列排列之銲墊丨丨2。當第二晶片1 3 〇以覆晶堆疊 (StaCked)的方式形成於晶圓100上時,第二晶片130係直 =電Λ與:咖生連接於晶圓100,目此第二晶片130與晶圓 1⑽之間的訊號傳遞路徑相對地縮短。此外,由於第二晶 ^ \3〇係可作為動態隨機存取記憶體(DRAM)晶片之用,且 口 &之第 晶片具有邏輯運算功能,兩者之間提供不 二^功,且利用堆疊的方式可提高構裝密度、減少空間 2 ',降低了第二晶片1 3 0與晶圓1 〇 〇之間訊號延遲的現 象,故:達到高速處理的目的。 古著"月參考第1 E圖,進行迴銲(r e f 1 〇 w),以使凸塊 idfi t ^ ^狀態下熔融為一球體狀,而第二晶片130與晶圓 曰、凸塊1 34,在經過迴銲之後,亦使得第二晶片200416990 V. Description of the invention (5) The resistance opening only exposes the bump contacts 1 1 4 and then the electric ore tin-lead alloy is used to form the bumps 1 2 0 on each bump contact π 4 and finally Photoresist removal. In addition, the bumps 1 2 0 may be formed by a ball-planting method. Next, please refer to FIGS. 1C and 1D to provide a plurality of second wafers 13o, and the second wafer 130 is formed by cutting another wafer, and the surface of the second wafer 130 has a plurality of pads. (Bonding pad) 132, respectively corresponding to the wafer contacts 1 12 of the wafer 100, and the surface of the solder pad 132 is formed with a bump bottom metal layer 136, for example, and then a bump 134 ( That is, the second bump is on the bump and the metal layer 136. Then, a flip-chip step is performed, and each of the wafer contacts 1 1 2 and one of the corresponding solder pads 32 are connected to each other through the bump 134. Wherein, the bump 1 = 4 is, for example, a solder paste or a tin-lead alloy. In the best case, the first chip! For example, it is a logic circuit chip, which has high-density pads arranged in an area array. When the second wafer 130 is formed on the wafer 100 in a StaCked manner, the second wafer 130 is directly connected to the wafer 100 and the second wafer 130 is connected to the wafer 100. The signal transmission path between the wafers 1 is relatively shortened. In addition, since the second chip ^ \ 30 can be used as a dynamic random access memory (DRAM) chip, and the first chip of the port has a logic operation function, it provides the best work between the two, and uses The stacking method can increase the structure density, reduce the space 2 ′, and reduce the signal delay between the second wafer 130 and the wafer 1000, so that the purpose of high-speed processing is achieved. The vintage " month refers to Figure 1E, reflow (ref 1 〇w), so that the bump idfi t ^ ^ fused into a sphere in the state, and the second wafer 130 and the wafer, the bump 1 34. After reflow, the second wafer is also made.
200416990 五、發明說明(6) 3 0與晶圓1 0 0之間形成良好的接合效果。值得注意的是, 第 咨-晶片1 3 0與晶圓1 0 0的主要成分均為矽,故兩者之熱膨 脹係數相同’故凸塊134不會受到第二晶片13〇與晶圓1〇〇 之間熱膨脹係數不同而產生熱應變的疲勞(f a t i gue )破 壞。如此’第二晶片1 3 0與晶圓i 〇 〇之間的距離(s t and〇 f f ) 可縮小’進而縮短第二晶片1 3 〇之銲墊丨3 2的間距或晶圓 1 0 0之晶片接點11 2的間距,以提高覆晶封裝的接點數目。 另一方面,由於凸塊1 2 〇熔融為球體狀之後,為維持凸塊 1 20之高度,以提供後續第一晶片丨丨〇封裝於承載器上所需 之距離(standoff )。在較佳情況下,利用大面積之凸塊接 點1 1 4可使球形之凸塊1 2 〇具有較大的外徑,以保持凸塊 120的高度。其中,晶片接點112之面積係小於凸塊接點 1 1 4的面積。 ^ 參考第1?及16圖,將晶圓100切割,以獨立分開晶 二1 . 第、晶片110 ’而晶圓10 0在切割之後,再以覆晶 (1P ChlP)的方式配置於一承載器20 0上,而承載哭2〇〇 ^ =封裝基板(substrate)或一印刷電路板上2二 接點;14 0°具有多個接合墊202,分別對應於每一凸塊 接‘二,1晶圓⑽於覆晶之後’藉由凸塊12〇分別連接 母一凸塊接點114及對應之接合墊2〇2, 晶封奘纟士接 4 , 傅取堆i式覆 ;哭2 η Λ精由迴鮮這些凸塊120,以使晶圓1〇〇與承 ΐ二曰片=良好的接合效果。如1",第二晶片13。與 弟Ba片110的訊號可藉由凸塊120而傳導至承裁哭9ηη 之後再經由承載器2 0 0之接點及内部線路…會示Γ而傳導200416990 V. Description of the invention (6) A good bonding effect is formed between the 30 and the wafer 100. It is worth noting that the main components of the first and second wafers 130 and 100 are silicon, so the thermal expansion coefficients of the two are the same, so the bump 134 will not be affected by the second wafer 13 and the wafer 1. The thermal expansion coefficient is different from 0 to cause fatigue strain of thermal strain. In this way, the distance between the second wafer 130 and the wafer 〇〇 (st and 〇ff) can be reduced, thereby shortening the pad of the second wafer 1300 and the distance between the wafers 2 or the wafer 100 The pitch of the chip contacts 112 is increased to increase the number of contacts of the flip-chip package. On the other hand, after the bumps 120 are melted into a sphere, in order to maintain the height of the bumps 120, a distance (standoff) required for subsequent subsequent wafers to be packaged on the carrier is provided. In a better case, by using the large-area bump contact 1 1 4, the spherical bump 1 2 0 can have a larger outer diameter to maintain the height of the bump 120. The area of the wafer contact 112 is smaller than the area of the bump contact 1 1 4. ^ Referring to Figures 1? And 16, the wafer 100 is cut to separate the crystal wafer 1. The wafer 110 'and the wafer 100 are cut in a wafer and then placed on a carrier in the form of a flip chip (1P ChlP). On the device 200, and the load is 200 ^ = the package substrate (substrate) or 22 contacts on a printed circuit board; 14 ° has a plurality of bonding pads 202, corresponding to each bump connection, respectively, 1 wafer after chip-on-chip 'is connected to the mother-bump contact 114 and the corresponding bonding pad 202 by bump 120, respectively, and the chip sealer is connected to 4, and the fetching i-type cover; cry 2 η Λ refinishes these bumps 120 so that the wafer 100 and the wafer 2 = good bonding effect. If 1 ", the second chip 13. The signal of the and Ba film 110 can be transmitted to the contractor 9ηη through the bump 120, and then transmitted through the contacts and internal circuits of the carrier 2 0 0 ...
200416990 五、發明說明(7) 至外部電子裝置。 此外’如第1 Η圖所示,為了保護凸塊1 2 0不會受到第 一晶片1 1 0與承載器2 〇 〇之間因熱膨脹係數不同而產生熱應 L的破壞’最後還可進行一底填(underfill)製程,將一 底膠2丨〇如環氧樹脂(Epoxy resin)填入於承載器2〇〇、第 二晶片1 3 0及第一晶片1 1 〇之間所構成的空間中,且底膠 21〇係可完全包覆凸塊120以及凸塊134,以緩衝第一晶片 Π 0與承載器2 〇 〇之間的熱應變。 上述第1 F、1 G及1 Η圖之實施例中,係先將晶圓1 〇 〇切 口J之後’再將獨立分開之第一晶片1 1 〇進行一覆晶封裝於 一承載器20 0上,最後再進行底填製程,以形成一堆疊式 覆晶封裝結構。然而,本發明之另一實施例,亦可先將承 載器2 0 0封裝於晶圓100上,並進行迴銲,藉由凸塊12〇連 接承載器20 0之接合墊2 0 2及晶圓1〇〇之凸塊接點114,之後 再切割晶圓100以及承載器20 0,以獨立分開承載器2〇〇以 及晶圓1 00之第一晶片1丨〇,最後再進行一底埴以 成-堆疊式覆晶封裝結#。再者’如第2圖所示' / 施例,係配置多個第二晶片13〇於晶圓ι〇〇之單一 :。曰曰片110上’其流程如第-實施例所述,纟此不再贅 由以上之說明可知,本發 製程係在未切割之晶圓的表面 係以電鍍錫鉛合金或網版印刷 上。接著以覆晶的方式將已切 明所揭露之堆疊式覆晶封裝 上進行凸塊製程,其中凸塊 ,方式形成於每一凸塊接點 之第二晶片直接封裝於晶200416990 V. Description of Invention (7) To external electronic device. In addition, as shown in the first figure, in order to protect the bump 120 from being damaged by the thermal stress L due to the difference in thermal expansion coefficient between the first wafer 110 and the carrier 2000, it can be finally performed. An underfill process, in which a primer 2 such as epoxy resin is filled between the carrier 200, the second wafer 130 and the first wafer 110. In the space, the primer 20 can completely cover the bump 120 and the bump 134 to buffer the thermal strain between the first wafer Π 0 and the carrier 2000. In the above-mentioned embodiments of the first F, 1 G, and 1 drawings, the wafer 100 is notched J first, and then the independently separated first wafer 1 1 10 is encapsulated in a flip chip package 20 0 Finally, an underfill process is performed to form a stacked flip-chip package structure. However, in another embodiment of the present invention, the carrier 200 may be first packaged on the wafer 100 and re-soldered. The bump 120 is connected to the bonding pad 202 and the wafer of the carrier 200. The bump contact 114 of the circle 100 is cut, and then the wafer 100 and the carrier 200 are cut to separate the carrier 200 and the first wafer 1 of the wafer 100 separately. Finally, a bottom is performed. In a stacked-chip flip chip package. Furthermore, as shown in FIG. 2 / embodiment, a plurality of second wafers 13 are arranged in a single wafer:. The process on the wafer 110 is as described in the first embodiment, so it is no longer necessary to understand from the above description. The process of this process is to electroplate tin-lead alloy or screen printing on the surface of the uncut wafer. . Next, a bump process is performed on the stacked flip-chip package that has been revealed and disclosed in a flip-chip manner, wherein a second wafer formed in each bump contact manner is directly packaged on the wafer.
10551 t.wf ,ptd 第11頁 200416990 五、發明說明(8) 圓之表面上,且第二晶片之銲墊藉由凸塊而連接於晶片接 點上。其中,第二晶片例如作為動態隨機記憶體(DRAM)之 晶片,而晶圓之第一晶片可作為邏輯電路晶片,兩者之間 的訊號傳遞路徑縮短,故可提高晶片運算之速度。此外, 晶圓於切割之後,再以覆晶的方式配置於一承載器上,以 形成一堆疊式覆晶封裝結構。由於第一晶片與第二晶片係 封裝於同一承載器上,且兩者以堆疊的方式彼此連接,因 此可提高覆晶構裝密度、減少空間需求,也降低了晶片與 晶圓之間訊號延遲的現象,故可達到晶片高速處理以及產 品多工性的目的。 雖然本發明已以一較佳實施例揭露如上,然其並非用 以限定本發明,任何熟習此技藝者,在不脫離本發明之精 神和範圍内,當可作些許之更動與潤飾,因此本發明之保 護範圍當視後附之申請專利範圍所界定者為準。10551 t.wf, ptd page 11 200416990 V. Description of the invention (8) On the surface of a circle, and the pads of the second chip are connected to the chip contacts by bumps. Among them, the second chip is, for example, a dynamic random access memory (DRAM) chip, and the first chip of the wafer can be used as a logic circuit chip. The signal transmission path between the two is shortened, so the speed of chip operation can be increased. In addition, after the wafer is diced, it is arranged on a carrier in a flip-chip manner to form a stacked flip-chip package structure. Since the first chip and the second chip are packaged on the same carrier, and the two are connected to each other in a stacked manner, the flip chip structure density can be increased, space requirements can be reduced, and the signal delay between the chip and the wafer can be reduced. Phenomenon, it can achieve the purpose of high-speed wafer processing and product multiplexing. Although the present invention has been disclosed as above with a preferred embodiment, it is not intended to limit the present invention. Any person skilled in the art can make some changes and retouch without departing from the spirit and scope of the present invention. The scope of protection of the invention shall be determined by the scope of the attached patent application.
10551 t.wf. ptd 第12頁 200416990 圖式簡單說明 第1 A〜1 Η圖依序繪示本發明第一實施例之一種堆疊式 覆晶封裝製程的流程示意圖。 第2圖繪示本發明第二實施例之一種堆疊式覆晶封裝 的俯視示意圖。 【圖式標不說明】 100 晶圓 110 弟一晶片 1 12 晶片接點(第一接點) 114 凸塊接點(第二接點) 116 凸塊底金屬層 120 第一 塊 130 弟二晶片 132 銲墊 134 第二凸塊 136 凸塊底金屬層 200 承載器 202 接合墊 210 底膠10551 t.wf. ptd Page 12 200416990 Brief description of the drawings 1 A ~ 1 Figure 1 shows a schematic flow chart of a stacked flip-chip packaging process according to the first embodiment of the present invention in sequence. FIG. 2 is a schematic top view of a stacked flip-chip package according to a second embodiment of the present invention. [Schematic symbols do not explain] 100 wafers 110 di wafers 1 12 wafer contacts (first contacts) 114 bump contacts (second contacts) 116 bump bottom metal layer 120 first block 130 two wafers 132 Welding pad 134 Second bump 136 Metal layer of bump bottom 200 Carrier 202 Bonding pad 210 Primer
10551 twf. pt.d 第13頁10551 twf. Pt.d Page 13
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