TW200410757A - Chemical liquid feeding apparatus - Google Patents

Chemical liquid feeding apparatus Download PDF

Info

Publication number
TW200410757A
TW200410757A TW092127815A TW92127815A TW200410757A TW 200410757 A TW200410757 A TW 200410757A TW 092127815 A TW092127815 A TW 092127815A TW 92127815 A TW92127815 A TW 92127815A TW 200410757 A TW200410757 A TW 200410757A
Authority
TW
Taiwan
Prior art keywords
gas
pressure
pressurization
aforementioned
chemical liquid
Prior art date
Application number
TW092127815A
Other languages
Chinese (zh)
Other versions
TWI228434B (en
Inventor
Kazushi Nakashima
Akira Nagata
Daisuke Adachi
Takaaki Katagiri
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of TW200410757A publication Critical patent/TW200410757A/en
Application granted granted Critical
Publication of TWI228434B publication Critical patent/TWI228434B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/008—Feed or outlet control devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/02—Feed or outlet devices; Feed or outlet control devices for feeding measured, i.e. prescribed quantities of reagents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The present invention relates to a chemical liquid feeding apparatus, which can stably supply a chemical liquid at a reduced initial cost and maintenance cost. The chemical liquid feeding apparatus supplies a pressurization gas through a pressurization gas pipeline to a pressurization container, and through an auxiliary pressurization gas to the pressurization container. After pressurization of the auxiliary pressurization pipeline, the pressurization gas is fed through the pressurization gas pipeline to the pressurization container, and pressurizes a chemical liquid. The pressurized transportation of the chemical liquid to the pressurization container is controlled by a switching operation according to the measurement from a gas flow meter 3.

Description

200410757 玖、發明說明： C發明所屬技術領威3 發明所屬之技術領域 本發明係有關於一種使用於半導體裝置或液晶顯示裝 5 置製造程序之藥液供給裝置。 於晶圓與液晶基板清洗程序中，係藉由加壓高純度氮 氣並使之流入一收容有高純度藥液之加壓容器内，將高純 度藥液壓送至晶圓與液晶基板清洗裝置等。在這種藥液供 給裝置中，必須穩定地輸送藥液至清洗裝置。 10 【先糊"】 先前技術 远今，在用以將樂液輸送至洗淨裝置之藥液供給裝置 中，藥液係收容於連接於藥液朝洗淨裝置輸送之藥液輸送 配笞及壓送用氣體配管之容器内。藥液輸送配管係於容器 15内插人至藥液之液面以下，而壓送用氣體配管係、連接成可 將氣體喷出至容器内之上部。 另外，藉由將壓送用氣體供給至容器，則藥液可從容 器内押出至藥液輸送配管，且輸送至洗淨裝置。壓送用氣 體可使用高純度氮氣。 20 在―般的藥液供給裝置#，設有多數用以收容藥液之 容器，且藥液輸送配管係透過自動開關閥分歧地連接各容 器。又，壓送用氣體配管在供給目的地與各容器間分^， 並透過自動開關閥將氣體分別供給於各容器。 又，首先開啟連接於-容器之壓送用氣體配管的自動 5 200410757 開關閥，並開啟連接於該容器之藥液輸送配管之自動開關 閥。於是，藥液會從一容器輸送至洗淨裝置。 此時，連接於另一容器之壓送用氣體配管及藥液輸送 配管為關閉狀態。 5 一旦容器内藥液消耗完，連接於該容器之壓送用氣體 配管及藥液輸送配管的自動開關閥就會關閉，並同時開啟 連接於另一容器之壓送用氣體配管及藥液輸送配管的自動 開關閥。因此，可切換容器且持續供給藥液至洗淨裝置。 於上述此類容器的切換動作中，為了檢知容器内藥液 10 消耗完畢情形，藥液輸送配管的一部分係以透明或半透明 之含氟樹脂形成，並以光學式藥液檢知感測器檢出藥液是 否於該配管内流動。 另外，可根據藥液檢知感測器的輸出信號，並藉由控 制裝置來控制自動開關閥的動作。 15 上述以光學式藥液感測器可檢驗容器内有無藥液之構 造係揭示於專利文獻1(特開昭62-237324)中。 又，在專利文獻2(特開2000-15082)中，揭示有一種構 造，該構造於藥液開始供給時，會累計容器内的氣壓從大 氣壓開始至預定藥液輸送氣壓之氣體流量，並算出容器内 20 的初期容積及容器内的藥液量，接著，在藥液供給時，累 計壓送用氣體的壓力與流量，並算出藥液輸送量，且於容 器空了之前，切換容器。 以光學式藥液檢知感測器檢出藥液於藥液輸送配管内 消耗完畢後再切換容器之構造中，由於將壓送用氣體混入 6 200410757 藥液輸送配管，使藥液輸送壓力變動，故容易發生洗淨不 均之情形。 又，由於混入壓送用氣體，藥液會在洗淨裝置的藥液 供給口飛散。因此，有因強酸或強鹼溶液之藥液飛散液滴 5 而損壞之虞，為防止此一損壞，必須設置防止飛散用之蓋 子。 且，因為使用光學性地檢出藥液之感測器，所以必須 合併輸送藥液的物性與特性等來調整在控制裝置中檢驗標 準之起始值。再者，由於位於感測器設置位置之含氟樹脂 10 的配管，因藥液而經年劣化，使透明度降低，故無法進行 穩定地檢知藥液。 由上述可知，在根據藥液檢知感測器的檢出信號切換 容器之構造中，藥液無法穩定地供給，因此會有於洗淨裝 置中，無法獲得穩定的洗淨性能之問題。 15 於專利文獻2所公告之構造中，並無將壓送用氣體混入 藥液輸送配管内之情形，因此不會發生上述之不良狀況。 然而，因為每一容器必須有氣體流量檢出裝置及氣體 壓力檢出裝置，並且必須根據從各檢出裝置輸出之檢出信 號算出輸送藥液量，故會使控制裝置中的運算程式變得複 20 雜。 又，氣體流量檢出裝置及氣體壓力檢出裝置，分別存 在個別差異，因此亦必須有修正此差異之作業，而該修正 作業頗為繁雜。 此外，在已停止供給藥液之容器内的氣體壓力回到大 7 200410757 氣壓時，容器内殘留之已氣化藥液將逆流至壓送用氣體配 管，直到達到氣體流量檢出裝置及氣體壓力檢出裝置為 止，使腐#甚至於破損。 由上述可知，於專利文件2所記載之構造中，由於分別 5 設置氣體流量檢出裝置及氣體壓力檢出裝置而使成本提 高，所以其調整及維持管理的成本也會提高。因此，以此 種藥液供給裝置所製造之半導體或液晶顯示裝置會有成本 提高之問題。 【發明内容】 10 發明概要 本發明之目的係提供一種可穩定地供給藥液，並且可 降低其初期成本及維持管理成本之藥液供給裝置。 本發明之一態樣的藥液供給裝置，係由壓送用氣體配 管供給壓送用氣體至加壓容器，並由預備加壓用氣體配管 15 供給前述壓送用氣體至前述加壓容器，且在預備加壓後由 前述壓送用氣體配管供給前述壓送用氣體至前述加壓容 器，並且根據前述氣體流量計之檢測值切換供給前述壓送 氣體之加壓容器。 圖式簡單說明 20 第1圖為表示藥液供給裝置之構造圖。 L實施方式】 發明之實施型態 以下，以第1圖說明一將本發明具體化之藥液供給裝置 之實施型態。 8 200410757 用以由氣體供給源1將藥液壓送氣體供給至兩個加壓 容器2a、2b之壓送氣體配管，包含氣體流量計3，氣體精製 過濾器4a，插置有止逆閥5a之第一壓送用氣體配管6a，與 從第一壓送氣體配管6a分歧之第二及第三壓送用氣體配管 5 6b 、 6c 〇200410757 (1) Description of the invention: C. Technical power of the invention 3 Technical field of the invention The present invention relates to a chemical liquid supply device used in a manufacturing process of a semiconductor device or a liquid crystal display device. In the wafer and liquid crystal substrate cleaning process, high-purity nitrogen is pressurized and flowed into a pressurized container containing a high-purity chemical solution, and the high-purity drug is hydraulically sent to the wafer and liquid crystal substrate cleaning device. . In such a chemical liquid supply device, it is necessary to stably transport the chemical liquid to the cleaning device. 10 [First paste "] The prior art is far and far. In the medicinal solution supply device for transporting the joy liquid to the washing device, the medicinal solution is contained in the medicinal solution delivery system connected to the medicinal solution and transported toward the washing device. And in the container of gas pipe for pressure feeding. The chemical liquid conveying piping is inserted into the container 15 below the liquid level of the chemical liquid, and the pressure feeding gas piping is connected so that gas can be ejected to the upper part of the container. In addition, by supplying the pressure-feeding gas to the container, the medicinal solution can be extruded from the container to the medicinal-solution delivery pipe, and can be transported to the cleaning device. High-purity nitrogen can be used as the pressure-feed gas. 20 In the general medicinal liquid supply device #, there are many containers for medicinal liquids, and the medicinal liquid delivery piping is connected to each of the containers in a divergent manner through an automatic on-off valve. The pressure feed gas pipe is divided between the supply destination and each container, and the gas is supplied to each container through an automatic opening and closing valve. In addition, first open the automatic on / off valve of the pressure feeding gas pipe connected to the container, and then open the automatic on / off valve of the medicinal solution delivery pipe connected to the container. Then, the chemical solution is transferred from a container to the washing device. At this time, the pressure feeding gas piping and the chemical liquid transporting piping connected to another container are closed. 5 Once the medicinal solution in the container is consumed, the automatic opening and closing valves of the pressure feeding gas piping and the medicinal liquid delivery piping connected to the container will be closed, and the pressure feeding gas piping and medicinal liquid delivery connected to another container will be opened at the same time. Automatic piping valve. Therefore, the container can be switched and the chemical liquid can be continuously supplied to the cleaning device. In the above-mentioned switching operation of the container, in order to detect the consumption of the medicinal solution 10 in the container, a part of the medicinal solution delivery pipe is formed of a transparent or translucent fluororesin, and is optically detected and sensed. The device detects whether the medicinal solution flows in the pipe. In addition, the output signal of the sensor can be detected based on the medicinal solution, and the operation of the automatic opening and closing valve can be controlled by the control device. 15 The above-mentioned structure for detecting the presence or absence of a medicinal solution in a container with an optical medicinal liquid sensor is disclosed in Patent Document 1 (Japanese Patent Application Laid-Open No. 62-237324). In addition, Patent Document 2 (Japanese Patent Application Laid-Open No. 2000-15082) discloses a structure that calculates a gas flow rate from the atmospheric pressure to a predetermined chemical liquid transport pressure when the chemical liquid starts to be supplied, and calculates The initial volume of the container 20 and the amount of the medicinal solution in the container, and then, when the medicinal solution is supplied, the pressure and flow rate of the pressure-feed gas are accumulated to calculate the medicinal solution delivery amount, and the container is switched before the container is empty. The optical liquid detection sensor detects that the chemical liquid is consumed in the chemical liquid conveying pipe and then switches the container. Because the pressure feeding gas is mixed into the 6 200410757 chemical liquid conveying pipe, the chemical liquid conveying pressure changes. Therefore, it is prone to uneven washing. In addition, since the pressure-feed gas is mixed, the chemical solution is scattered at the chemical solution supply port of the cleaning device. Therefore, there is a risk of damage due to the droplet 5 of the chemical solution of the strong acid or alkali solution. In order to prevent this damage, a cover for preventing scattering must be provided. In addition, since a sensor for optically detecting a chemical solution is used, the physical properties and characteristics of the chemical solution to be transported must be combined to adjust the initial value of the inspection standard in the control device. In addition, the piping of the fluororesin 10 located at the sensor installation position deteriorates over time due to the medicinal solution and decreases the transparency, so that the medicinal solution cannot be detected stably. From the above, it can be seen that in the structure of the container that is switched based on the detection signal of the chemical liquid detection sensor, the chemical liquid cannot be stably supplied, and therefore there is a problem that a stable cleaning performance cannot be obtained in the cleaning device. 15 In the structure disclosed in Patent Document 2, there is no case where the pressure-feed gas is mixed into the medicinal-liquid delivery pipe, so the above-mentioned disadvantages do not occur. However, since each container must have a gas flow detection device and a gas pressure detection device, and the amount of liquid medicine to be transported must be calculated based on the detection signals output from each detection device, the calculation program in the control device becomes Complex 20 miscellaneous. In addition, there are individual differences between the gas flow detection device and the gas pressure detection device, so there must be an operation to correct the difference, and the correction operation is quite complicated. In addition, when the pressure of the gas in the container where the supply of the chemical liquid has been stopped returns to 7 200410757, the gasified chemical liquid remaining in the container will flow back to the gas pipe for pressure feeding until it reaches the gas flow detection device and the gas pressure. Until the device is detected, the rot # is even broken. From the above, it can be seen that in the structure described in Patent Document 2, since the gas flow detection device and the gas pressure detection device are separately provided to increase the cost, the cost of adjustment and maintenance management also increases. Therefore, a semiconductor or liquid crystal display device manufactured with such a medicinal solution supply device has a problem of increasing cost. [Summary of the invention] 10 Summary of the invention The object of the present invention is to provide a medicinal solution supply device that can stably supply a medicinal solution and reduce its initial cost and maintenance management cost. According to one aspect of the present invention, a medicinal solution supply device is configured to supply a pressure-feed gas to a pressure vessel from a pressure-feed gas pipe, and supply the pressure-feed gas to the pressure vessel from a preliminary pressure gas pipe 15, After the pre-pressurization, the pressure-feed gas is supplied to the pressure container from the pressure-feed gas pipe, and the pressure container to which the pressure-feed gas is supplied is switched according to a detection value of the gas flow meter. Brief Description of Drawings 20 Fig. 1 is a structural diagram showing a chemical liquid supply device. [Embodiment L] Implementation mode of the invention An implementation mode of the medicinal solution supply device embodying the present invention will be described below with reference to Fig. 1. 8 200410757 Pressure feed gas piping for supplying medicinal fluid to the two pressurized containers 2a, 2b from the gas supply source 1, including gas flow meter 3, gas refining filter 4a, and check valve 5a inserted The first pressure-feed gas piping 6a is different from the second and third pressure-feed gas piping 5 6b and 6c, which diverge from the first pressure-feed gas piping 6a.

且，透過第一壓送用氣體配管6a及第二壓送用氣體配 管6b，可將壓送用氣體供給至一加壓容器2a，並透過第一 壓送用氣體配管6a及第三壓送用氣體配管6c，可將壓送氣 體供給至另一加壓容器2b。 10 其中，前述第二及第三壓送用氣體配管6b、6c，分別 插置有自動開關閥7a及7b。 又，於前述氣體供給源1與加壓容器2a、2b之間，係對 於前述第一及第二壓送用氣體配管6a、6b，與第一及第三 壓送用氣體配管6a、6c，分別並聯地設置預備加壓用氣體 15 配管。In addition, through the first pressure-feed gas pipe 6a and the second pressure-feed gas pipe 6b, the pressure-feed gas can be supplied to a pressurized container 2a, and through the first pressure-feed gas pipe 6a and the third pressure feed The gas piping 6c can supply a pressure-feed gas to another pressurized container 2b. 10 Among them, the above-mentioned second and third pressure feeding gas pipes 6b and 6c are respectively inserted with automatic opening and closing valves 7a and 7b. Further, between the gas supply source 1 and the pressurized containers 2a and 2b, the first and second pressure-feed gas pipes 6a and 6b and the first and third pressure-feed gas pipes 6a and 6c, The preliminary pressurizing gas 15 pipes are provided in parallel.

該預備加壓用氣體配管包括氣體精製過濾器4b，插置 有止逆閥5b之第一預備加壓用氣體配管8a，與從第一預備 加壓用氣體配管8a分歧之第二及第三預備加壓用氣體配管 8b、8c 〇 20 又，第一及第二預備加壓用氣體配管8a、8b係並聯地 連接於前述第一及第二預備加壓用氣體配管6a、6b，而第 一及第三之壓送用氣體配管8a、8c則並聯地連接於前述第 一及第三壓送用氣體配管6a、6c。 前述第二及第三預備加壓用氣體配管8b、8c，係分別 9 插置有自動開關閥9a、9b。 又，前述一加壓容器2a係透過從前述第二壓送用氣體 配g 6b分歧之大氣開放用配管1〇a開放於大氣，而前述另一 加壓各器2b則透過從前述第三壓送用氣體配管6(：分歧之大 5 氣開放用配管開放於大氣。 此外，前述大氣開放用配管l〇a、1〇b分別插置有自動 開關閱lla、lib。 於前述加壓容器2a、2b中，藥液輸送配管12a、12b之 一端部係插人至同-容n之底部。前述藥液輸送配管12a、 1〇 1孔之另一端部則透過自動開關閥13a、13b接於共通之藥液 供給配管14，且由該藥液供給配管14將藥液供給至作為藥 液供給目的地之洗淨裝置。 所述自動開關閥7a、7b、9a、9b、11a、lib、lh、13b 勺動作，係由控制部15控制，且前述氣體流量計3的檢出值 15 係由控制部15輸出。 接著，說明依上述所構成之藥液供給裝置的動作。在 加壓各器2a、2b充滿藥液的狀態下，首先開啟自動開關閥 ”並透過預備加壓用氣體配管8a、，供給加壓氣體至 加壓谷為2a，且對加壓容器2a進行預備加壓，此時，其他 20自動開關閥全部關閉。 在開啟自動開關間9a-預定時間，且對加壓容器2遣 >預備力σ壓後’將自動開關閥9a關閉，並開啟第二壓送用 氣月且配官6b的自動開關閥7a，再開啟藥液輸送配管心的自 動開_ 13a。如此一來，加壓容器2a的藥液可經過藥液輸 10 200410757 送配管12a，輸送至洗淨裝置。此時，以氣體流量計3檢出 供給至加壓容器2a之壓送用氣體流量，並由控制部15輸出 其檢出值。在控制部15中’错由累計氣體流量計3之檢出 值，算出已壓送至加壓容器2a之氣體的體積值。此體積值 5 與從加壓容器2a壓送至洗淨裝置之藥液量大致相同。 又，與上述動作同時進行，開啟第三預備加壓用氣體 配管8c的自動開關閥9b，並預備加壓加壓容器2b。 當已壓送至加壓容器2a内之體積值超過事先設定之設 定值時，即，當加壓容器2a内的藥液量已低於預定量時， 10 藥液輸送配管12a的自動開關閥13a及第二壓送用氣體配管 6b的自動開關閥7a會關閉。 另外，開啟第三壓送用氣體配管6c的自動開關閥7b， 且開啟藥液輸送配管12b的自動開關閥13b。如此一來，則 可停止從加壓容器2b輸送藥液，並接著開始從加壓容器2b 15 輸送藥液至洗淨裝置。此時，開啟大氣開放用配管l〇a的自 動開關閥11a，使加壓容器2a内的壓力降至大氣壓。 且，當氣體流量計3檢出值的累計值超過預定值時，則 會關閉第三壓送用氣體配管6c的自動開關閥7b，且藥液輸 送配管12b的自動開關閥13b也會關閉，以停止從加壓容器 20 2b輸送藥液至洗淨裝置。此時，開啟大氣開放用配管10b的 自動開關閥lib，並使加壓容器2b内的壓力降至大氣壓。此 外，利用止逆閥5a，氣化之藥液就不會發生逆流至氣體精 製過濾器4a、4b及氣體流量計3的情形。 在如上述所形成之構造中，可得到以下所示之作用效 11 200410757 果。 (1) 於切換加壓容器2a、2b，並在加壓氣體混入藥液輸 送配管12a之前，可從加壓容器2a切換至加壓容器2b。因 此，可防止加壓氣體混入藥液供給配管14内，故可防止在 5 洗淨裝置中的藥液飛散及發生洗淨不均的情形。The pre-pressurization gas piping includes a gas purification filter 4b, a first pre-pressurization gas piping 8a in which a check valve 5b is inserted, and second and third branches diverging from the first pre-pressurization gas piping 8a. Pre-pressurization gas piping 8b, 8c 020 The first and second pre-pressurization gas piping 8a, 8b are connected in parallel to the first and second pre-pressurization gas piping 6a, 6b, and the first The first and third pressure feed gas pipes 8a and 8c are connected in parallel to the first and third pressure feed gas pipes 6a and 6c. The second and third pre-pressurization gas pipes 8b and 8c are respectively inserted with automatic opening and closing valves 9a and 9b. In addition, the one pressurized container 2a is opened to the atmosphere through an atmospheric opening pipe 10a diverging from the second pressure-feed gas distribution g 6b, and the other pressurized container 2b is transmitted through the third pressure. Delivery gas piping 6 (: Big 5 diverging gas opening piping is opened to the atmosphere. In addition, the above-mentioned atmospheric opening pipes 10a and 10b are respectively inserted with automatic switches 11a and 11b. In the aforementioned pressurized container 2a In 2 and 2b, one end of the medicinal liquid delivery piping 12a, 12b is inserted to the bottom of the same volume. The other ends of the aforementioned medicinal liquid delivery piping 12a, 101 are connected to the valve through automatic opening and closing valves 13a, 13b. The common medicinal solution supply pipe 14 supplies the medicinal solution to the cleaning device as a medicinal solution supply destination through the medicinal solution supply pipe 14. The automatic opening and closing valves 7a, 7b, 9a, 9b, 11a, lib, lh The 13b scoop operation is controlled by the control unit 15 and the detection value 15 of the gas flow meter 3 is output by the control unit 15. Next, the operation of the medicinal solution supply device configured as described above will be described. 2a, 2b are full of liquid medicine, first open the automatic opening and closing valve "and Through the pre-pressurization gas piping 8a, the pressurized gas is supplied to the pressurized valley to 2a, and the pressurized container 2a is pre-pressurized. At this time, all other 20 automatic opening and closing valves are closed. 9a- After a predetermined time, and after the pressure of the pressurized container 2 > the preparatory force σ is pressed, the automatic on-off valve 9a is closed, the automatic on-off valve 7a of the second pressure feeding gas month and the official 6b is opened, and then the liquid medicine delivery pipe is opened Automatic opening of the heart _ 13a. In this way, the medicinal solution of the pressurized container 2a can be sent to the washing device through the medicinal solution delivery pipe 10 200410757. At this time, the gas flow meter 3 detects and supplies it to the pressurized container. The flow rate of the gas for pressure feeding in 2a is outputted by the control unit 15. The control unit 15 calculates the volume of the gas that has been pressurized to the pressurized container 2a by mistakenly detecting the value of the cumulative gas flow meter 3. The volume value 5 is approximately the same as the amount of the chemical solution pressure-fed from the pressurized container 2a to the cleaning device. Simultaneously with the above operation, the automatic on-off valve 9b of the third pre-pressurization gas pipe 8c is opened, and Prepare the pressurized container 2b. When it has been pressurized to the pressurized container When the volume value in 2a exceeds a preset value, that is, when the amount of the medicinal solution in the pressurized container 2a has fallen below a predetermined amount, 10 the automatic opening and closing valve 13a of the medicinal solution delivery pipe 12a and the second pressure-feeding gas The automatic on-off valve 7a of the piping 6b is closed. In addition, the automatic on-off valve 7b of the third pressure feed gas piping 6c is opened, and the automatic on-off valve 13b of the chemical liquid delivery piping 12b is opened. In this way, the pressure can be stopped. The container 2b transfers the chemical solution, and then starts to transfer the chemical solution from the pressurized container 2b 15 to the washing device. At this time, the automatic opening and closing valve 11a of the atmospheric opening pipe 10a is opened to reduce the pressure in the pressurized container 2a. Atmospheric pressure. Moreover, when the cumulative value detected by the gas flow meter 3 exceeds a predetermined value, the automatic on-off valve 7b of the third pressure-feed gas pipe 6c will be closed, and the automatic on-off valve 13b of the medicinal-liquid delivery pipe 12b will also be closed. This stops the delivery of the chemical solution from the pressurized container 20 2b to the cleaning device. At this time, the automatic opening / closing valve lib of the atmospheric release pipe 10b is opened, and the pressure in the pressurized container 2b is reduced to atmospheric pressure. In addition, with the check valve 5a, the gasified chemical liquid does not flow back to the gas purification filters 4a, 4b and the gas flow meter 3. In the structure formed as described above, the effects shown below can be obtained. (1) Before the pressurized containers 2a and 2b are switched and the pressurized gas is mixed into the medicinal-liquid delivery pipe 12a, the pressurized container 2a can be switched to the pressurized container 2b. Therefore, it is possible to prevent the pressurized gas from being mixed into the medicinal solution supply pipe 14, so that it is possible to prevent the medicinal solution from being scattered in the cleaning device and uneven washing.

(2) 因未使用光學性地檢出藥液之感測器，所以無須配 合輸送之藥液的物性與特性等，來調整在控制部15檢出標 準之起始值。 (3) 輸送至洗淨裝置的藥液供給量，藉由對加壓容器 10 2a、2b進行預備加壓，就可僅以氣體流量計3檢出。因此， 可簡化在控制部15中用以算出輸送藥液量之程式。 (4) 因為僅使用1個氣體流量計3，所以幾乎不需要修正 該氣體流量計3的檢出值。 (5) 藉由止逆閥5a、5b，可防止加壓容器2a、2b内的氣 15 化藥液逆流至氣體精製過濾器4a、4b或氣體流量計3的情(2) Since no sensor for optically detecting the medicinal solution is used, it is not necessary to match the physical properties and characteristics of the medicinal solution being conveyed to adjust the initial value of the detection standard of the control unit 15. (3) The amount of chemical liquid supplied to the cleaning device can be detected only by the gas flow meter 3 by pre-pressurizing the pressure vessels 10 2a and 2b. Therefore, the program for calculating the amount of the medicinal solution to be transported in the control unit 15 can be simplified. (4) Since only one gas flow meter 3 is used, there is almost no need to correct the detection value of the gas flow meter 3. (5) The non-return valves 5a and 5b prevent the gas in the pressurized containers 2a and 2b from flowing back to the gas purification filters 4a and 4b or the gas flow meter 3.

形。因此，可防範氣體精製過濾器4a、4b或氣體流量計3之 腐餘於未然。 (6) 藉由上述(3)、（4)、（5)之作用效果，可降低藥液供 給裝置的初期成本及維修成本。 20 上述之實施型態可以下列方式變更。 即使加壓容器在3個以上，也同樣可實施。 發明之效果 如以上詳述内容，本發明可提供一種可穩定地供給藥 液，且可降低其初期成本及維持管理成本之藥液供給裝置。 12 200410757 I：圖式簡單說明1 第1圖為表示藥液供給裝置之構造圖。 【圖式之主要元件代表符號表】 1...供給源 6a〜6c...壓送用氣體配管 3...氣體流量計 7a、7b、9a、9b、11a、lib、13a、 14...藥液供給配管 13b…自動開關閥 15...控制部 8a〜8c...預備加壓用氣體配管 2a、2b...加壓容器 10a、10b...大氣開放用配管 4a、4b…氣體精製過濾器 5a、5b··.止逆閥 12a、12b.·.·藥液輸送配管 13shape. Therefore, it is possible to prevent the corrosion of the gas refining filters 4a, 4b or the gas flow meter 3 from occurring. (6) The above-mentioned effects (3), (4), and (5) can reduce the initial cost and maintenance cost of the chemical liquid supply device. 20 The above implementation modes can be changed in the following ways. The same can be applied even if there are three or more pressurized containers. Effects of the Invention As described in detail above, the present invention can provide a medicinal solution supply device that can stably supply a medicinal solution and reduce its initial cost and maintenance management cost. 12 200410757 I: Brief description of the drawings 1 Figure 1 shows the structure of a chemical liquid supply device. [Representative symbols for main components of the figure] 1 ... Supply source 6a ~ 6c ... Gas piping for pressure feeding 3 ... Gas flow meters 7a, 7b, 9a, 9b, 11a, lib, 13a, 14. .. medicinal solution supply piping 13b ... automatic on-off valve 15 ... control units 8a to 8c ... preparation pressurization gas piping 2a, 2b ... pressurization container 10a, 10b ... air release piping 4a, 4b ... gas refining filters 5a, 5b ... check valves 12a, 12b ... medicinal liquid delivery piping 13

Claims (1)

200410757 拾、申請專利範圍： 1. 一種藥液供給裝置，包含有： 複數加壓容器，係可儲存藥液者； 壓送用氣體配管，係用以將壓送用氣體分別供給至 5 前述各加壓容器； 藥液移送配管，係用以將依前述壓送用氣體壓出之 藥液由前述加壓容器移送至供給目的地； 壓送用氣體配管之自動開關閥，插置於前述壓送用 氣體配管； 10 藥液移送配管自動開關閥，插置於前述藥液移送配 管； 預備加壓用氣體配管，係可將用以預備加壓該加壓 容器之壓送用氣體供給於該加壓容器； 氣體流量計，係用以測量在前述壓送用氣體配管中 15 流動之前述壓送用氣體流量；及 控制部，係用以控制前述壓送用氣體配管與藥液移 送配管之自動開關閥之動作，以切換供給前述藥液至前 述供給目的地之加壓容器， 又，前述控制部係由前述壓送用氣體配管供給前述 20 壓送用氣體至前述加壓容器，並由前述預備加壓用氣體 配管供給前述壓送用氣體至前述加壓容器中，且在預備 加壓後，由前述壓送用氣體配管供給前述壓送氣體至前 述加壓容器，並且根據前述氣體流量計之檢測值切換供 給前述壓送氣體之加壓容器。 14 200410757 2. 如申請專利範圍第1項之藥液供給裝置，其中前述壓送 用氣體配管與前述預備加壓用氣體配管係並聯地連接。 3. 如申請專利範圍第1或2項之藥液供給裝置，其中於前 述壓送用氣體配管與前述預備加壓用氣體配管中，設有 5 防止藥液由前述加壓容器逆流之止逆閥。 4. 如申請專利範圍第3項之藥液供給裝置，其中於前述逆 止閥與前述預備加壓用氣體配管之間，於前述壓送氣體 配管中插置有前述氣體流量計與氣體精製過濾器，且前 述氣體精製過濾器係插置於前述預備加壓用氣體配管 10 中。 5. 如申請專利範圍第1或2項之藥液供給裝置，其中前述 控制部，累計前述氣體流量計之檢測值，當該累計值達 到事先設定之預定值時，則切換供給前述壓送用氣體之 加壓容器。 15 6.如申請專利範圍第1或2項之藥液供給裝置，其中前述 控制部，係同時進行由前述加壓容器之其中一加壓容器 壓送前述藥液與對前述加壓容器之另一加壓容器之預 備加壓。 15200410757 Scope of patent application: 1. A medicinal solution supply device, including: a plurality of pressurized containers, which can store medicinal solutions; pressure feeding gas piping, which is used to supply pressure feeding gas to each of the foregoing 5 Pressurized container; Chemical liquid transfer piping is used to transfer the chemical liquid squeezed out according to the aforementioned pressure feed gas from the aforementioned pressure container to the supply destination; the automatic opening and closing valve of the pressure feed gas piping is inserted into the aforementioned pressure Supply gas piping; 10 chemical liquid transfer piping automatically opens and closes the valve and is inserted into the aforementioned chemical liquid transfer piping; pre-pressurization gas piping, which can supply the pressure-feed gas used to pre-pressurize the pressurized container to the Pressurized container; a gas flow meter for measuring the flow rate of the aforementioned pressure-feeding gas flowing in the aforementioned pressure-feeding gas pipe 15; and a control section for controlling the aforementioned pressure-feeding gas pipe and the chemical liquid transfer pipe The operation of the automatic opening / closing valve switches the pressurized container for supplying the chemical solution to the supply destination, and the control unit supplies the 20 pressure feed from the pressure feed gas pipe. Gas is supplied to the pressurized container, and the pressure-feed gas is supplied to the pressurized container from the pre-pressurization gas pipe, and after the pre-pressurization, the pressure-feed gas is supplied from the pressure-feed gas pipe to The pressurized container is switched according to a detection value of the gas flow meter. 14 200410757 2. The chemical liquid supply device according to item 1 of the scope of patent application, wherein the gas pipe for pressure feeding and the gas pipe for preliminary pressurization are connected in parallel. 3. For the medicinal solution supply device according to item 1 or 2 of the scope of the patent application, 5 is provided in the aforementioned pressure feeding gas piping and the preliminary pressurizing gas piping to prevent backflow of the medicinal solution from the aforementioned pressurized container. valve. 4. The chemical liquid supply device according to item 3 of the application, wherein the aforementioned gas flow meter and gas purification filter are inserted between the aforementioned check valve and the aforementioned pre-pressurization gas piping. The gas purification filter is inserted into the gas pipe 10 for preliminary pressurization. 5. For the medicinal solution supply device of the first or second patent application range, wherein the control section accumulates the detection value of the gas flow meter, and when the accumulated value reaches a predetermined value set in advance, the supply for the aforementioned pressure feed is switched Gas pressurized container. 15 6. The medicinal solution supply device according to item 1 or 2 of the patent application scope, wherein the aforementioned control unit simultaneously performs pressure feeding of the medicinal solution from one of the pressurized containers and another of the pressurized container. Pre-pressurization of a pressurized container. 15
TW092127815A 2002-10-16 2003-10-07 Chemical liquid feeding apparatus TWI228434B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002301537A JP4138440B2 (en) 2002-10-16 2002-10-16 Chemical supply device

Publications (2)

Publication Number Publication Date
TW200410757A true TW200410757A (en) 2004-07-01
TWI228434B TWI228434B (en) 2005-03-01

Family

ID=32449847

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092127815A TWI228434B (en) 2002-10-16 2003-10-07 Chemical liquid feeding apparatus

Country Status (3)

Country Link
JP (1) JP4138440B2 (en)
KR (1) KR100904052B1 (en)
TW (1) TWI228434B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8322571B2 (en) * 2005-04-25 2012-12-04 Advanced Technology Materials, Inc. Liner-based liquid storage and dispensing systems with empty detection capability
KR20080039373A (en) 2005-06-06 2008-05-07 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 Fluid storage and dispensing systems and processes
JP4113546B2 (en) 2005-12-12 2008-07-09 鶴見曹達株式会社 How to clean container valves
JP4703467B2 (en) * 2006-03-30 2011-06-15 株式会社日立ハイテクノロジーズ Substrate processing apparatus, substrate processing method, and substrate manufacturing method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0781900B2 (en) 1986-04-08 1995-09-06 九州日本電気株式会社 Chemical supply device
JP4314537B2 (en) 1998-07-03 2009-08-19 関東化学株式会社 Safety detection type chemical supply device

Also Published As

Publication number Publication date
KR20040034436A (en) 2004-04-28
JP4138440B2 (en) 2008-08-27
JP2004140066A (en) 2004-05-13
KR100904052B1 (en) 2009-06-23
TWI228434B (en) 2005-03-01

Similar Documents

Publication Publication Date Title
TW396257B (en) Methods and systems for distributing liquid chemicals
EP1007855B1 (en) Liquid transfer system
US6340098B2 (en) Chemical delivery systems and methods of delivery
US6098843A (en) Chemical delivery systems and methods of delivery
CN101010241A (en) Liquid dispensing method and system with headspace gas removal
US6267132B1 (en) Liquid delivery system and its use for the delivery of an ultrapure liquid
JP4314537B2 (en) Safety detection type chemical supply device
TW201200459A (en) Liquid dispensing systems with gas removal and sensing capabilities
JP2001179075A (en) Chemical delivery system and method for detecting empty condition of storage tank containing liquid
JP2008282907A (en) Liquid-material feeder and method for supplying liquid material by using it
US20100132451A1 (en) Method and device for determining volume during transfer of a liquid
TW200410757A (en) Chemical liquid feeding apparatus
CN110156179B (en) Water softening plant and method for operating a water softening plant
JP2003117364A (en) Apparatus and method of dissolving gas in liquid and method of manufacturing gas-dissolved liquid
JP2007155447A (en) Liquid volume measuring instrument, liquid volume measuring method, and volumetric supply method for liquid material
KR101183363B1 (en) Apparatus and process for refilling a bubbler
CN101888967B (en) Multiple inlet tube dispensing system
CN217230217U (en) Automatic unloading and filling device of outdoor tank car
TWM465965U (en) Treatment equipment having quantitative loading device
CN102397771B (en) Boot media is through being used for the method and apparatus of the treatment system of fluid product
CN113058496B (en) Solution preparation method and solution preparation device
US20230077918A1 (en) Bioprocessing installation
CN210045243U (en) Spent acid separation and treatment system
US6364545B1 (en) Photographic processor having an improved replenishment delivery system
CN211488968U (en) Glass substrate's belt cleaning device

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees