JP2004140066A - Chemical supply apparatus - Google Patents

Chemical supply apparatus Download PDF

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JP2004140066A
JP2004140066A JP2002301537A JP2002301537A JP2004140066A JP 2004140066 A JP2004140066 A JP 2004140066A JP 2002301537 A JP2002301537 A JP 2002301537A JP 2002301537 A JP2002301537 A JP 2002301537A JP 2004140066 A JP2004140066 A JP 2004140066A
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gas
pressure
chemical
pipe
pressurized
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JP4138440B2 (en
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Kazuji Nakajima
中嶋　和司
Akira Nagata
永田　明
Daisuke Adachi
足立　大介
Takasato Katagiri
片桐　隆聡
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Fujitsu Ltd
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Fujitsu Ltd
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Priority to TW092127815A priority patent/TWI228434B/en
Priority to KR1020030071309A priority patent/KR100904052B1/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/008—Feed or outlet control devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/02—Feed or outlet devices; Feed or outlet control devices for feeding measured, i.e. prescribed quantities of reagents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a chemical supply apparatus which is capable of supplying chemicals stably and reducing its initial cost and operation/maintenance cost at the same time. <P>SOLUTION: Prior to the supply of pressure-feeding gas from pressure-feeding gas piping 6a, 6b, and 6c to pressurized vessels 2a and 2b, the pressure-feeding gas is supplied from pre-pressurizing gas piping 8a, 8b, and 8c to the pressurized vessels 2a and 2b. The pressure-feeding gas is supplied from the pressure-feeding gas piping 6a, 6b and 6c to the pressurized vessels 2a and 2b to pressure-feed chemicals after a pre-pressurizing process is carried out, and the pressurized vessel used for pressure-feeding chemicals is switched from the pressurized vessel 2a to the pressurized vessel 2b and vice versa on the measured value of a gas flowmeter 3. <P>COPYRIGHT: (C)2004,JPO

Description

【０００１】
【発明の属する技術分野】
この発明は、半導体装置あるいは液晶表示装置の製造工程で使用する薬液供給装置に関するものである。
【０００２】
ウェハや液晶基板の洗浄工程では、高純度薬液を収容した加圧容器に高純度窒素ガスを加圧流入させることにより、高純度薬液をウェハや液晶基板の洗浄装置に圧送している。このような薬液供給装置では、薬液を洗浄装置に安定して移送することが必要となっている。
【０００３】
【従来の技術】
従来、洗浄装置に薬液を移送する薬液供給装置では、洗浄装置への薬液移送配管及び薬液圧送用ガス配管が接続された容器内に薬液が収容される。薬液移送配管は、容器内において薬液の液面より下方まで挿入され、圧送用ガス配管は容器内の上部にガスが噴出するように接続されている。
【０００４】
そして、容器内に圧送用ガスを供給することにより、薬液が容器内から薬液移送配管に押し出され、洗浄装置へ移送される。圧送用ガスは、高純度窒素が用いられる。
【０００５】
一般的な薬液供給装置では、薬液を収容する容器は複数設けられ、薬液移送配管は各容器に対し自動開閉弁を介して分岐接続されている。また、圧送用ガス配管はガス供給元と各容器との間で分岐され、各容器に自動開閉弁を介してそれぞれ供給される。
【０００６】
そして、まず一方の容器へ繋がる圧送用ガス配管の自動開閉弁が開かれ、かつその容器に繋がる薬液移送配管の自動開閉弁が開かれる。すると、一方の容器から薬液が洗浄装置に移送される。
【０００７】
このとき、他方の容器に繋がる圧送用ガス配管及び薬液移送配管の自動開閉弁は閉じられている。
一方の容器内の薬液がなくなると、その容器に繋がる圧送用ガス配管及び薬液移送配管の自動開閉弁は閉じられるとともに、他方の容器に繋がる圧送用ガス配管及び薬液移送配管の自動開閉弁が開かれる。この結果、容器が切り替えられて、洗浄装置への薬液の供給が継続される。
【０００８】
上記のような容器の切替え動作において、容器内の薬液がなくなったことを検知するために、薬液移送配管の一部が透明あるいは半透明のフッ素樹脂で形成され、その配管内を薬液が流れているか否かを光学式の薬液検知センサーで検出している。
【０００９】
そして、薬液検知センサーの出力信号に基づいて、制御装置により自動開閉弁の動作が制御される。
このように、光学式の薬液検出センサーにより容器内の薬液の有無を検出する構成は、例えば特許文献１に開示されている。
【００１０】
また、特許文献２では、薬液の供給開始時に、容器内の気圧が大気圧から所定の薬液移送気圧に至るまでのガス流量を積分して、容器内の初期空間容積を算出して容器内の薬液量を算出する。次いで、薬液の供給時には、圧送用ガスの圧力と流量を積算して薬液の移送量を算出し、容器が空になる前に容器を切り替える構成が開示されている。
【００１１】
【特許文献１】
特開昭６２−２３７３２４
【特許文献２】
特開２０００−１５０８２
【００１２】
【発明が解決しようとする課題】
光学式の薬液検出センサーで薬液移送配管内に薬液がなくなったことを検出してから容器を切り替える構成では、薬液移送配管内に圧送用ガスが混入するため、薬液の移送圧力が変動し、洗浄ムラが発生し易い。
【００１３】
また、圧送用ガスの混入により洗浄装置の薬液供給口において薬液が飛散する。このため、強酸あるいは強アルカリ溶液である薬液の飛散液滴による被害を蒙るおそれがあり、その被害を防止するために、飛散防止用のカバーを備える必要があった。
【００１４】
また、薬液を光学的に検出するセンサーを使用していることから、移送する薬液の物性や特性に合わせて制御装置での検出レベルのしきい値を調整する必要がある。さらに、センサー設置位置のフッ素樹脂の配管に薬液により経年劣化して透明度が低下するため、安定した薬液検知を行うことができない。
【００１５】
このようなことから、薬液検出センサーの検出信号に基づいて容器を切り替える構成では、薬液の安定した供給を期待することができず、この結果洗浄装置において安定した洗浄性能を得ることができないという問題点がある。
【００１６】
特許文献２に開示された構成では、薬液移送配管内に圧送用ガスが混入することはないので、上記のような不具合は発生しない。
ところが、容器毎にガス流量検出手段及びガス圧力検出手段が必要となるとともに、各検出手段から出力される検出信号に基づいて移送薬液量の算出を行う必要があるため、制御装置での演算プログラムが煩雑となる。
【００１７】
また、ガス流量検出手段及びガス圧力検出手段にはそれぞれ個体差が存在するため、それらを補正する作業も必要となり、その補正作業が煩雑である。
また、薬液の供給を停止した容器内のガス圧を大気圧に戻す際に、容器内に残存する気化した薬液が圧送用ガス配管に逆流して、ガス流量検出手段及びガス圧力検出手段まで到達し、これらを腐食させて破損に至らしめることがある。
【００１８】
このようなことから、特許文献２に記載された構成では、ガス流量検出手段及びガス圧力検出手段をそれぞれ設けることによるコストの上昇と、その調整及び維持管理コストが上昇する。従って、このような薬液供給装置で製造される半導体装置あるいは液晶表示装置のコストを上昇させるという問題点がある。
【００１９】
この発明の目的は、薬液の安定供給を可能としながら、その初期コスト及び維持管理コストを低減し得る薬液供給装置を提供することにある。
【００２０】
【課題を解決するための手段】
圧送用ガス配管から加圧容器への圧送用ガスの供給に先立って、予備加圧用ガス配管から圧送用ガスを前記加圧容器に供給し、予備加圧後に前記圧送用ガス配管から圧送用ガスを加圧容器に供給し、前記ガス流量計の検出値に基づいて前記圧送用ガスを供給する加圧容器を切り替える。
【００２１】
【発明の実施の形態】
以下、この発明を具体化した薬液供給装置の一実施の形態を図１に従って説明する。
【００２２】
ガス供給元１から二つの加圧容器２ａ，２ｂに薬液圧送用ガスを供給する圧送用ガス配管は、ガス流量計３と、ガス精製フィルタ４ａと、逆止弁５ａが介在される第一の圧送用ガス配管６ａと、第一の圧送用ガス配管６ａから分岐する第二及び第三の圧送用ガス配管６ｂ，６ｃとから構成される。
【００２３】
そして、加圧容器２ａには第一の圧送用ガス配管６ａ及び第二の圧送用ガス配管６ｂを介して圧送用ガスが供給され、加圧容器２ｂには第一の圧送用ガス配管６ａ及び第三の圧送用ガス配管６ｃを介して圧送用ガスが供給される。
【００２４】
前記第二及び第三の圧送用ガス配管６ｂ，６ｃにはそれぞれ自動開閉弁７ａ，７ｂが介在される。
前記ガス供給元１と加圧容器２ａ，２ｂとの間には、前記第一及び第二の圧送用ガス配管６ａ，６ｂと、第一及び第三の圧送用ガス配管６ａ，６ｃに対しそれぞれ並列に予備加圧用ガス配管が配設される。
【００２５】
その予備加圧用ガス配管は、ガス精製フィルタ４ｂと、逆止弁５ｂが介在される第一の予備加圧用ガス配管８ａと、第一の予備加圧用ガス配管８ａから分岐する第二及び第三の予備加圧用ガス配管８ｂ，８ｃとから構成される。
【００２６】
そして、第一及び第二の予備加圧用ガス配管８ａ，８ｂが前記第一及び第二の圧送用ガス配管６ａ，６ｂに並列に接続され、第一及び第三の予備加圧用ガス配管８ａ，８ｃが前記第一及び第三の圧送用ガス配管６ａ，６ｃに並列に接続される。
【００２７】
前記第二及び第三の予備加圧用ガス配管８ｂ，８ｃにはそれぞれ自動開閉弁９ａ，９ｂが介在される。
前記加圧容器２ａは、前記第二の圧送用ガス配管６ｂから分岐する大気開放用配管１０ａを介して大気圧に開放され、前記加圧容器２ｂは、前記第三の圧送用ガス配管６ｃから分岐する大気開放用配管１０ｂを介して大気圧に開放される。
【００２８】
また、前記大気開放用配管１０ａ，１０ｂには自動開閉弁１１ａ，１１ｂがそれぞれ介在されている。
前記加圧容器２ａ，２ｂには、薬液移送配管１２ａ，１２ｂの一端部が同容器２ａ，２ｂの底部近傍まで挿通されている。前記薬液移送配管１２ａ，１２ｂの他端部は、自動開閉弁１３ａ，１３ｂを介して共通の薬液供給配管１４に接続され、その薬液供給配管１４から薬液供給先である洗浄装置に薬液が供給される。
【００２９】
前記自動開閉弁７ａ，７ｂ，９ａ，９ｂ，１１ａ，１１ｂ，１３ａ，１３ｂの動作は、制御部１５により制御され、前記ガス流量計３の検出値は制御部１５に出力される。
【００３０】
次に、上記のように構成された薬液供給装置の動作を説明する。加圧容器２ａ，２ｂに薬液を満たした状態で、まず自動開閉弁９ａを開き、予備加圧用ガス配管８ａ，８ｂを介して加圧容器２ａに加圧ガスを供給し、加圧容器２ａに対し予備加圧を行う。このとき、その他の自動開閉弁はすべて閉じる。
【００３１】
自動開閉弁９ａを所定時間開いて加圧容器２ａに予備加圧を行った後、自動開閉弁９ａを閉じ、第二の圧送用ガス配管６ｂの自動開閉弁７ａを開き、さらに薬液移送配管１２ａの自動開閉弁１３ａを開く。
【００３２】
すると、加圧容器２ａ内の薬液が薬液移送配管１２ａを経て、洗浄装置に移送される。
このとき、ガス流量計３で加圧容器２ａに供給される圧送用ガスの流量がガス流量計３で検出され、その検出値が制御部１５に出力される。制御部１５では、ガス流量計３の検出値を積算することにより、加圧容器２ａ内に圧送したガスの体積値を算出する。この体積値は、加圧容器２ａから洗浄装置に圧送される薬液の量とほぼ一致する。
【００３３】
また、上記動作と並行して、第三の予備加圧用ガス配管８ｃの自動開閉弁９ｂが開かれ、加圧容器２ｂが予備加圧される。
加圧容器２ａ内に圧送したガスの体積値があらかじめ設定されている設定値を超えたとき、すなわち加圧容器２ａ内の薬液が一定量以下となったとき、薬液移送配管１２ａの自動開閉弁１３ａ及び第二の圧送用ガス配管６ｂの自動開閉弁７ａが閉じられる。
【００３４】
また、第三の圧送用ガス配管６ｃの自動開閉弁７ｂが開かれ、薬液移送配管１２ｂの自動開閉弁１３ｂが開かれる。
すると、加圧容器２ａからの薬液の移送が停止され、引き続いて加圧容器２ｂから洗浄装置への薬液の移送が開始される。
【００３５】
このとき、大気開放用配管１０ａの自動開閉弁１１ａが開かれ、加圧容器２ａ内の圧力は大気圧まで減圧される。
そして、ガス流量計３の検出値の積算値が一定値を超えると、第三の圧送用ガス配管６ｃの自動開閉弁７ｂが閉じられ、薬液移送配管１２ｂの自動開閉弁１３ｂが閉じられて、加圧容器２ｂから洗浄装置への薬液の移送が停止される。
【００３６】
このとき、大気開放用配管１０ｂの自動開閉弁１１ｂが開かれ、加圧容器２ｂ内の圧力は大気圧まで減圧される。
また、逆止弁５ａにより気化薬液がガス精製フィルタ４ａ，４ｂ及びガス流量計３に逆流することはない。
【００３７】
上記のように構成されたでは、次に示す作用効果を得ることができる。
（１）加圧容器２ａ，２ｂを切り替えるとき、薬液移送配管１２ａに加圧ガスが混入する前に、加圧容器２ａから同２ｂに切り替える。従って、薬液供給配管１４内に加圧ガスの混入を防止することができるので、洗浄装置での薬液の飛散及び洗浄ムラの発生を防止することができる。
（２）薬液を光学的に検出するセンサーを使用していないので、移送する薬液の物性や特性に合わせて制御部１５での検出レベルのしきい値を調整する必要がない。
（３）洗浄装置への薬液の供給量は、加圧容器２ａ，２ｂに予備加圧を行うことにより、ガス流量計３のみで検出可能である。従って、制御部１５で移送薬液量を算出するためのプログラムを簡略化することができる。
（４）１個のガス流量計３を使用するのみであるので、そのガス流量計３の検出値の補正作業はほとんど必要ない。
（５）逆止弁５ａ，５ｂにより加圧容器２ａ，２ｂ内の気化薬液のガス精製フィルタ４ａ，４ｂあるいはガス流量計３への逆流を防止することができる。従って、ガス精製フィルタ４ａ，４ｂあるいはガス流量計３の腐食を未然に防止することができる。
（６）上記（３）（４）（５）の作用効果により、薬液供給装置の初期コスト及びメンテナンスコストを低減することができる。
【００３８】
上記実施の形態は、次に示すように変更することもできる。
・加圧容器は３つ以上でも同様に実施することができる。
【００３９】
【発明の効果】
以上詳述したように、この発明は薬液の安定供給を可能としながら、その初期コスト及び維持管理コストを低減し得る薬液供給装置を提供することができる。
【図面の簡単な説明】
【図１】薬液供給装置を示す構成図である。
【符号の説明】
２ａ，２ｂ　　　　　加圧容器
３　　　　　　　　　ガス流量計
６ａ〜６ｃ　　　　　圧送用ガス配管
７ａ，７ｂ　　　　　自動開閉弁
８ａ〜８ｃ　　　　　予備加圧用ガス配管
１３ａ，１３ｂ　　　自動開閉弁
１２ａ，１２ｂ　　　薬液移送配管
１５　　　　　　　　制御部[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a chemical liquid supply device used in a manufacturing process of a semiconductor device or a liquid crystal display device.
[0002]
In a wafer or liquid crystal substrate cleaning process, a high-purity chemical is pumped into a pressurized container containing a high-purity chemical to pump the high-purity chemical to a wafer or liquid crystal substrate cleaning apparatus. In such a chemical solution supply device, it is necessary to stably transfer the chemical solution to the cleaning device.
[0003]
[Prior art]
2. Description of the Related Art Conventionally, in a chemical solution supply device for transferring a chemical solution to a cleaning device, a chemical solution is stored in a container to which a chemical solution transfer pipe to the cleaning device and a gas pipe for chemical solution pressure feed are connected. The chemical liquid transfer pipe is inserted below the liquid level of the chemical liquid in the container, and the gas pipe for pressure feeding is connected so that gas is ejected to the upper part in the container.
[0004]
Then, by supplying the gas for pressure feeding into the container, the chemical solution is pushed out of the container to the chemical solution transfer pipe and transferred to the cleaning device. High-purity nitrogen is used as the gas for pumping.
[0005]
In a general chemical solution supply device, a plurality of containers for storing a chemical solution are provided, and a chemical solution transfer pipe is branched and connected to each container via an automatic opening / closing valve. Further, the gas pipe for pressure feed is branched between a gas supply source and each container, and is supplied to each container via an automatic opening / closing valve.
[0006]
Then, first, the automatic open / close valve of the gas pipe for pressure feeding connected to one container is opened, and the automatic open / close valve of the chemical liquid transfer pipe connected to the container is opened. Then, the chemical solution is transferred from one container to the cleaning device.
[0007]
At this time, the automatic on-off valves of the gas pipe for pressure feed and the chemical liquid transfer pipe connected to the other container are closed.
When the chemical liquid in one container is exhausted, the automatic opening / closing valve of the pressure gas pipe and the chemical liquid transfer pipe connected to that container is closed, and the automatic gas valve of the pressure gas gas pipe and the chemical liquid transfer pipe connected to the other container are opened. It is. As a result, the container is switched, and the supply of the chemical solution to the cleaning device is continued.
[0008]
In the above-described container switching operation, a part of the chemical liquid transfer pipe is formed of a transparent or translucent fluororesin to detect that the chemical liquid in the container has run out, and the chemical liquid flows through the pipe. The presence or absence is detected by an optical chemical detection sensor.
[0009]
Then, the operation of the automatic on-off valve is controlled by the control device based on the output signal of the chemical liquid detection sensor.
A configuration for detecting the presence or absence of a chemical solution in a container by an optical chemical solution detection sensor is disclosed in, for example, Patent Document 1.
[0010]
Further, in Patent Document 2, at the start of the supply of the chemical, the gas flow rate from the atmospheric pressure in the container to the predetermined chemical liquid transfer pressure is integrated, the initial space volume in the container is calculated, and the internal space in the container is calculated. Calculate the chemical volume. Then, at the time of supplying the chemical solution, a configuration is disclosed in which the transfer amount of the chemical solution is calculated by integrating the pressure and the flow rate of the pressure-feeding gas, and the container is switched before the container becomes empty.
[0011]
[Patent Document 1]
JP-A-62-237324
[Patent Document 2]
JP 2000-15082A
[0012]
[Problems to be solved by the invention]
In the configuration in which the container is switched after detecting that the chemical liquid has run out in the chemical liquid transfer pipe with the optical chemical liquid detection sensor, the gas transfer pressure is mixed into the chemical liquid transfer pipe, so the transfer pressure of the chemical liquid fluctuates and cleaning is performed. Unevenness is likely to occur.
[0013]
Further, the chemical solution is scattered at the chemical solution supply port of the cleaning device due to the mixing of the gas for pressure feeding. For this reason, there is a possibility that the chemical liquid, which is a strong acid or strong alkaline solution, may be damaged by scattered droplets, and in order to prevent the damage, it is necessary to provide a cover for preventing scattering.
[0014]
Further, since a sensor for optically detecting a chemical solution is used, it is necessary to adjust the threshold value of the detection level in the control device according to the physical properties and characteristics of the chemical solution to be transferred. Further, the fluororesin piping at the sensor installation position is deteriorated with the aging due to the chemical solution and the transparency is reduced, so that stable detection of the chemical solution cannot be performed.
[0015]
For this reason, in the configuration in which the containers are switched based on the detection signal of the chemical liquid detection sensor, stable supply of the chemical liquid cannot be expected, and as a result, stable cleaning performance cannot be obtained in the cleaning device. There are points.
[0016]
In the configuration disclosed in Patent Literature 2, since the gas for pressure feeding does not mix into the chemical liquid transfer pipe, the above-described problem does not occur.
However, a gas flow rate detecting means and a gas pressure detecting means are required for each container, and it is necessary to calculate the amount of the transferred chemical solution based on the detection signal output from each detecting means. Is complicated.
[0017]
In addition, since there are individual differences in the gas flow rate detecting means and the gas pressure detecting means, it is necessary to perform a work of correcting them, and the work of correcting them is complicated.
Also, when returning the gas pressure in the container in which the supply of the chemical solution is stopped to the atmospheric pressure, the vaporized chemical solution remaining in the container flows back to the gas pipe for pressure feed and reaches the gas flow rate detecting means and the gas pressure detecting means. However, they may corrode and cause damage.
[0018]
For this reason, in the configuration described in Patent Literature 2, the cost is increased due to the provision of the gas flow rate detecting means and the gas pressure detecting means, and the adjustment and maintenance costs are increased. Therefore, there is a problem that the cost of the semiconductor device or the liquid crystal display device manufactured by such a chemical liquid supply device is increased.
[0019]
An object of the present invention is to provide a chemical solution supply device capable of reducing the initial cost and the maintenance and management cost while enabling stable supply of the chemical solution.
[0020]
[Means for Solving the Problems]
Prior to the supply of the gas for pressure feed from the gas pipe for pressure feed to the pressurized container, the gas for pressure feed is supplied from the gas pipe for preliminary pressurization to the pressurized container, and the gas for pressure transfer from the gas pipe for pressure feed after the pre-pressurization. Is supplied to the pressurized container, and the pressurized container for supplying the pressure-feeding gas is switched based on the detection value of the gas flow meter.
[0021]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, an embodiment of a chemical liquid supply device embodying the present invention will be described with reference to FIG.
[0022]
A gas supply gas pipe for supplying a chemical liquid pressure supply gas from the gas supply source 1 to the two pressurized containers 2a and 2b includes a first gas flow meter 3, a gas purification filter 4a, and a check valve 5a. It is composed of a pressure-feeding gas pipe 6a, and second and third pressure-feeding gas pipes 6b and 6c that branch off from the first pressure-feeding gas pipe 6a.
[0023]
Then, the pressurized container 2a is supplied with a pumping gas via the first pumping gas pipe 6a and the second pumping gas pipe 6b, and the first pumping gas pipe 6a and the The gas for pressure feeding is supplied through the third gas pipe for pressure feeding 6c.
[0024]
Automatic opening / closing valves 7a and 7b are interposed in the second and third pressure-feeding gas pipes 6b and 6c, respectively.
Between the gas supply source 1 and the pressurized containers 2a and 2b, the first and second pumping gas pipes 6a and 6b and the first and third pumping gas pipes 6a and 6c are respectively provided. A pre-pressurizing gas pipe is provided in parallel.
[0025]
The pre-pressurizing gas pipe includes a gas purification filter 4b, a first pre-pressurizing gas pipe 8a in which a check valve 5b is interposed, and second and third branches branched from the first pre-pressurizing gas pipe 8a. And pre-pressurizing gas pipes 8b and 8c.
[0026]
Then, the first and second pre-pressurizing gas pipes 8a, 8b are connected in parallel to the first and second pre-pressurizing gas pipes 6a, 6b, and the first and third pre-pressurizing gas pipes 8a, 8b are connected. 8c is connected in parallel to the first and third pressure-feeding gas pipes 6a, 6c.
[0027]
Automatic opening / closing valves 9a and 9b are interposed in the second and third pre-pressurizing gas pipes 8b and 8c, respectively.
The pressurized container 2a is opened to the atmospheric pressure via an atmosphere opening pipe 10a branching from the second pressure-feeding gas pipe 6b, and the pressure vessel 2b is opened from the third pressure-feeding gas pipe 6c. The air is released to the atmospheric pressure via the branch line 10b.
[0028]
Automatic opening / closing valves 11a and 11b are interposed in the atmosphere opening pipes 10a and 10b, respectively.
One ends of chemical solution transfer pipes 12a and 12b are inserted into the pressurized containers 2a and 2b up to near the bottoms of the containers 2a and 2b. The other ends of the chemical transfer pipes 12a and 12b are connected to a common chemical supply pipe 14 via automatic opening and closing valves 13a and 13b, and the chemical is supplied from the chemical supply pipe 14 to a cleaning device to which the chemical is supplied. You.
[0029]
The operation of the automatic on-off valves 7a, 7b, 9a, 9b, 11a, 11b, 13a, 13b is controlled by a control unit 15, and the detection value of the gas flow meter 3 is output to the control unit 15.
[0030]
Next, the operation of the chemical liquid supply device configured as described above will be described. When the pressurized containers 2a and 2b are filled with the chemical, the automatic opening and closing valve 9a is first opened, and pressurized gas is supplied to the pressurized container 2a via the pre-pressurized gas pipes 8a and 8b. Pre-pressurization is performed. At this time, all other automatic on-off valves are closed.
[0031]
After the automatic opening / closing valve 9a is opened for a predetermined time to pre-pressurize the pressurized container 2a, the automatic opening / closing valve 9a is closed, the automatic opening / closing valve 7a of the second gas feed gas pipe 6b is opened, and the chemical liquid transfer pipe 12a is further opened. Is opened.
[0032]
Then, the chemical in the pressurized container 2a is transferred to the cleaning device via the chemical transfer pipe 12a.
At this time, the gas flow meter 3 detects the flow rate of the pressure-feeding gas supplied to the pressurized container 2a, and the detected value is output to the control unit 15. The control unit 15 calculates the volume value of the gas pumped into the pressurized container 2a by integrating the detection values of the gas flow meter 3. This volume value substantially coincides with the amount of the chemical solution pumped from the pressurized container 2a to the cleaning device.
[0033]
In parallel with the above operation, the automatic opening / closing valve 9b of the third pre-pressurizing gas pipe 8c is opened, and the pressurizing container 2b is pre-pressurized.
When the volume value of the gas pumped into the pressurized container 2a exceeds a preset value, that is, when the amount of the medicinal solution in the pressurized container 2a becomes equal to or less than a predetermined amount, the automatic opening / closing valve of the medicinal solution transfer pipe 12a 13a and the automatic opening / closing valve 7a of the second pressure-feed gas pipe 6b are closed.
[0034]
In addition, the automatic opening / closing valve 7b of the third pressure-feeding gas pipe 6c is opened, and the automatic opening / closing valve 13b of the chemical liquid transfer pipe 12b is opened.
Then, the transfer of the chemical from the pressurized container 2a is stopped, and the transfer of the chemical from the pressurized container 2b to the cleaning device is subsequently started.
[0035]
At this time, the automatic opening / closing valve 11a of the atmosphere opening pipe 10a is opened, and the pressure in the pressurized container 2a is reduced to the atmospheric pressure.
Then, when the integrated value of the detection value of the gas flow meter 3 exceeds a certain value, the automatic opening / closing valve 7b of the third gas feed piping 6c is closed, and the automatic opening / closing valve 13b of the chemical transfer pipe 12b is closed, The transfer of the chemical from the pressurized container 2b to the cleaning device is stopped.
[0036]
At this time, the automatic opening / closing valve 11b of the atmosphere opening pipe 10b is opened, and the pressure in the pressurized container 2b is reduced to the atmospheric pressure.
In addition, the vaporized chemical liquid does not flow back to the gas purification filters 4a and 4b and the gas flow meter 3 by the check valve 5a.
[0037]
With the above configuration, the following operation and effect can be obtained.
(1) When switching between the pressurized containers 2a and 2b, the pressurized container 2a is switched to the pressurized container 2a before the pressurized gas is mixed into the chemical liquid transfer pipe 12a. Accordingly, mixing of the pressurized gas into the chemical supply pipe 14 can be prevented, so that scattering of the chemical and the occurrence of uneven cleaning in the cleaning device can be prevented.
(2) Since no sensor for optically detecting the chemical is used, there is no need to adjust the threshold of the detection level in the control unit 15 in accordance with the physical properties and characteristics of the chemical to be transferred.
(3) The supply amount of the chemical solution to the cleaning device can be detected only by the gas flow meter 3 by pre-pressurizing the pressurized containers 2a and 2b. Therefore, the program for calculating the amount of the transferred chemical solution by the control unit 15 can be simplified.
(4) Since only one gas flow meter 3 is used, there is almost no need to correct the detection value of the gas flow meter 3.
(5) The check valves 5a, 5b can prevent the vaporized chemical solution in the pressurized containers 2a, 2b from flowing back to the gas purification filters 4a, 4b or the gas flow meter 3. Therefore, corrosion of the gas purification filters 4a and 4b or the gas flow meter 3 can be prevented beforehand.
(6) The initial cost and maintenance cost of the chemical liquid supply device can be reduced by the effects of (3), (4), and (5).
[0038]
The above embodiment can be modified as follows.
-The same can be performed with three or more pressurized containers.
[0039]
【The invention's effect】
As described above in detail, the present invention can provide a chemical solution supply device capable of stably supplying a chemical solution and reducing the initial cost and the maintenance and management cost.
[Brief description of the drawings]
FIG. 1 is a configuration diagram showing a chemical solution supply device.
[Explanation of symbols]
2a, 2b Pressurized container 3 Gas flow meter 6a-6c Gas pipe for pressure feed 7a, 7b Automatic open / close valve 8a-8c Pre-pressurized gas pipe 13a, 13b Automatic open / close valve 12a, 12b Chemical transfer pipe 15 Control unit

Claims (6)

薬液を貯留可能とした複数の加圧容器と、
前記各加圧容器に圧送用ガスをそれぞれ供給する圧送用ガス配管と、
前記加圧容器から前記圧送用ガスに基づいて押し出される薬液を供給先に移送する薬液移送配管と、
前記圧送用ガス配管に介在される自動開閉弁と、
前記薬液移送配管に介在される自動開閉弁と、
前記加圧容器を予備加圧するための圧送用ガスを該加圧容器に供給する予備加圧用ガス配管と、
前記圧送用ガス配管に流れる圧送用ガスの流量を計測するガス流量計と、
前記自動開閉弁の動作を制御して、前記供給先に薬液を供給する加圧容器を切り替える制御部とを有し、
前記制御部は、前記圧送用ガス配管から加圧容器への圧送用ガスの供給に先立って、前記予備加圧用ガス配管から圧送用ガスを前記加圧容器に供給し、予備加圧後に前記圧送用ガス配管から圧送用ガスを加圧容器に供給し、前記ガス流量計の検出値に基づいて前記圧送用ガスを供給する加圧容器を切り替えることを特徴とする薬液供給装置。A plurality of pressurized containers capable of storing a chemical solution,
A pressure-feed gas pipe for supplying a pressure-feed gas to each of the pressurized containers,
A chemical transfer pipe that transfers a chemical extruded from the pressurized container based on the gas for pressure transfer to a supply destination,
An automatic on-off valve interposed in the gas pipe for pressure feeding,
An automatic on-off valve interposed in the chemical transfer pipe,
A pre-pressurizing gas pipe for supplying a pressurized gas for pre-pressurizing the pressurized container to the pressurized container,
A gas flow meter that measures the flow rate of the gas for pumping flowing through the gas pipe for pumping,
A control unit that controls the operation of the automatic opening and closing valve and switches a pressurized container that supplies a chemical solution to the supply destination,
The control unit supplies a gas for pumping from the gas pipe for preliminary pressurization to the pressurized container prior to the supply of the gas for pumping from the gas pipe for pressurizing to the pressurized container, and performs the pumping after the prepressurization. A chemical solution supply device for supplying a gas for pressurization from a gas pipe to a pressurized container and switching the pressurized container for supplying the gas for pressurization based on a detection value of the gas flow meter. 前記圧送用ガス配管と前記予備加圧用ガス配管とを並列に接続したことを特徴とする請求項１記載の薬液供給装置。The chemical solution supply device according to claim 1, wherein the gas pipe for pressure feeding and the gas pipe for preliminary pressurization are connected in parallel. 前記圧送用ガス配管と前記予備加圧用ガス配管には、前記加圧容器からの薬液の逆流を防止する逆止弁を設けたことを特徴とする請求項１または２記載の薬液供給装置。The chemical solution supply device according to claim 1, wherein a check valve for preventing a backflow of the chemical solution from the pressurized container is provided in the gas pipe for pressure feeding and the gas pipe for preliminary pressurization. 前記逆止弁と前記圧送用ガスの供給元との間において、前記圧送用ガス配管には前記ガス流量計とガス精製フィルタを介在させ、前記予備加圧用ガス配管にはガス精製フィルタを介在させたことを特徴とする請求項３記載の薬液供給装置。Between the check valve and the supply source of the gas for pumping, the gas pipe for pumping is provided with the gas flow meter and a gas purification filter, and the gas pipe for preliminary pressurization is provided with a gas purification filter. The chemical liquid supply device according to claim 3, wherein 前記制御部は、前記ガス流量計の検出値を積算し、その積算値があらかじめ設定された所定値に達したとき、圧送用ガスを供給する加圧容器を切り替えることを特徴とする請求項１乃至４のいずれかに記載の薬液供給装置。2. The control unit according to claim 1, wherein the control unit integrates the detection value of the gas flow meter, and switches the pressurized container that supplies the gas for pressure feeding when the integrated value reaches a predetermined value set in advance. 5. The chemical solution supply device according to any one of claims 4 to 4. 前記制御部は、一方の加圧容器からの薬液の圧送と、他方の加圧容器に対する予備加圧とを並行して行うことを特徴とする請求項１乃至５のいずれかに記載の薬液供給装置。The chemical liquid supply according to any one of claims 1 to 5, wherein the control unit performs the pressure feeding of the chemical liquid from one pressure container and the preliminary pressurization of the other pressure container in parallel. apparatus.
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JP2008539078A (en) * 2005-04-25 2008-11-13 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド Liner type liquid storage and distribution system with empty detection function
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JP2015157286A (en) * 2005-04-25 2015-09-03 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド Liner-based liquid storage and dispensing systems with empty detection capability
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US9802749B2 (en) 2005-04-25 2017-10-31 Entegris, Inc. Liner-based liquid storage and dispensing systems with empty detection capability
US9079758B2 (en) 2005-06-06 2015-07-14 Advanced Technology Materials, Inc. Fluid storage and dispensing systems and processes
US9802808B2 (en) 2005-06-06 2017-10-31 Entegris, Inc. Fluid storage and dispensing systems and processes
JP2007273568A (en) * 2006-03-30 2007-10-18 Hitachi High-Technologies Corp Substrate-treating device, substrate treatment method, and manufacturing method of the substrate

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