TW200409324A - High-density multi-chip modulestructure and the forming method thereof - Google Patents

High-density multi-chip modulestructure and the forming method thereof Download PDF

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TW200409324A
TW200409324A TW091134864A TW91134864A TW200409324A TW 200409324 A TW200409324 A TW 200409324A TW 091134864 A TW091134864 A TW 091134864A TW 91134864 A TW91134864 A TW 91134864A TW 200409324 A TW200409324 A TW 200409324A
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layer
chip
chip module
forming
density multi
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TW091134864A
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Chinese (zh)
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TWI233193B (en
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Kwun-Yao Ho
Moriss Kung
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Via Tech Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/16227Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/162Disposition
    • H01L2924/16251Connecting to an item not being a semiconductor or solid-state body, e.g. cap-to-substrate

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  • Wire Bonding (AREA)

Abstract

The invention discloses a high-density multi-chip module (MCM) structure and the forming method thereof. First of all, an insulating layer and a multilevel interconnect layer are sequentially formed on an integrated circuit substrate. The multilevel interconnect layer has a first surface having a plurality of first bonding pads thereon and a second surface having a plurality of first bonding pads thereon. Then an adhesive layer and a transparent substrate comprising a glass substrate are sequentially formed on the first surface of the multilevel interconnect layer. Next the integrated circuit substrate is removed, and a portion of the insulating layer is etched to expose the second bonding pads on the second surface of the multilevel interconnect layer. The a plurality of chips are electrically connected to the second bonding pads by flip chip or wire bonding processes and are mounted by using underfill/resin. Then a heat sink is disposed to provide heat dissipation and structural support. Finally, the transparent substrate and the adhesive layer are removed and the high-density multi-chip module (MCM) is completed.

Description

200409324 五、發明說明(1) 5 - 1發明領域: 本發明係有關於一種高密度多晶片模組的結構及形成 方法’以提南多晶片模組的晶片密度並縮短電路與電路之 間的距離,以提高晶片之間的溝通效率。 5 - 2發明背景: 在過去,積體電路廠商所發展出來的積體電路構裝技 術,已企圖滿足微小化的要求。對於微小化的積體電路改 良方法,是使其能夠在矽底材上結合包含電路、晶片等數 以百萬計的電晶體電路元件。這些改良的方法導致在有限 的空間中構裝電路元件的方法更受到重視。200409324 V. Description of the invention (1) 5-1 Field of the invention: The present invention relates to the structure and forming method of a high-density multi-chip module, in order to improve the chip density of the multi-chip module and shorten the time between circuits. Distance to improve communication efficiency between chips. 5-2 Background of the Invention: In the past, integrated circuit construction technology developed by integrated circuit manufacturers has attempted to meet miniaturization requirements. An improved method for miniaturized integrated circuits is to enable them to incorporate millions of transistor circuit elements including circuits, wafers, etc. on a silicon substrate. These improved methods have led to a greater emphasis on the method of constructing circuit components in a limited space.

積體電路藉由一矽晶圓經過複雜的蝕刻、摻雜、沈積 及切割等技術,在積體電路設備中製造出來。一矽晶圓至 少包含一積體電路晶片,每一晶片代表一單獨的積體電路 。最後,此晶片可藉由包圍在晶片四周的塑膠灌膠混合物 (Molding Compound)構裝起來,且有多樣化的針腳露出和 互相連接的設計。例如:提供一相當平坦構裝的Μ型雙列 直插式構裝體(M Dual-In-Line-Package; M-Dip),其 有兩列平行的引腳從底部穿通孔中延伸出來,接觸並固定 於在下面的積體電路板上。容許較高密度積體電路的印刷 電路板為單列式構裝體(Single-In-Line-Package; SIPThe integrated circuit is manufactured in a integrated circuit device by a silicon wafer through complex etching, doping, deposition, and cutting techniques. A silicon wafer contains at least one integrated circuit chip, and each chip represents a separate integrated circuit. Finally, the chip can be constructed by a plastic compound (Molding Compound) that surrounds the chip, and has a variety of pins exposed and interconnected designs. For example: to provide a M-D-In-Line-Package (M-Dip) with a fairly flat structure, which has two rows of parallel pins extending from the bottom through hole, Contact and fix on the integrated circuit board below. The printed circuit board that allows higher density integrated circuits is a single-line package (Single-In-Line-Package; SIP

200409324 五、發明說明(2) 豆袁 /里接腳構裝(Sma11 0utline J-leaded; SOJ) ,其為採用模型的構裝。 的種Ϊ : Ϊ ΐ的積體電路晶片#丈目,構裝積體電路 scp)盥夕Β σ刀為早晶片構裝(Single Chip Package; 曰片爐二Γ片構i (Multlchip Package; MCP)兩大類,多 )。若忙、昭产括夕晶片模組構裝(Multi chip Module; MCM 分為引腳杆7^與電路板的接合方式,構裝積體電路可區 (S 盯 fac M入型(Pin —Through —H〇le; PTH)與表面黏著型 元件的引腳為:針='01;:兩大類。引腳插入型 Socket)或電路板的導成孔疋工=屬:以㈣入腳座( 著型的元件則先符貼 1 a進订1干接固定。而表面黏 目前所换用j i f 板上後再以銲接的方式固定。 fh - 較先進的構裝技術為晶片直接黏结(Direct 大小,並樺^ i H 以降低構裝積體電路之體積的 «結;=部…的積集度。晶片直 連結。 土板(SUbStrate)上,再進行電路的 之结ί照ΐ;圖:::;;:=裝基板上佈植… 塊20覆晶連接於基板3〇上:;”多數個銲接凸 結於基板30上,再將曰片彳j :先將^刀多數個晶片1〇黏 再將曰“ 10與基板30藉由引線 200409324 五、發明說明(3) ,以使訊號能夠在晶片與基板之間傳遞。最後在晶片上覆 蓋封膠4 0,以保護基板上之多數個晶片1 0。。 在上述傳統技術中,多數個晶片均直接或間接連結至 基板上,並藉由基板之電路繞線(r 〇 u t i n g )來彼此電性溝 通,會增加傳統技術中基板本身電路繞線的困難度,並因 晶片與晶片之間的距離較大而造成構裝積體電路的體積無 法順利縮小而增加封裝體尺寸,故而提高基板的成本,更 因為晶片之間電路溝通之路徑較長,而使電性效能受限。 雖然目前業界已提出整合主動元件及被動元件之多功能之 單一晶片(Silicon on a Chip; S0C)的解決方案,但其設 計及製程的困難度仍高,且價格較貴。 5 - 3發明目的及概述: 鑒於上述之發明背景中,傳統將多數個晶片直接連接 基板的結構及方法將無法縮小構裝積體電路的體積,更會 降低封裝體内之電路間的溝通效率,因此本發明提供了一 種面密度多晶片模組的結構及形成方法’利用在積體電路 底材上所形成之多層内連線層來連接多數個晶片,而形成 高密度多晶片模組,以縮短多晶片封裝體内電路之間的距 離,而增進電路間的溝通效率。 本發明之第二個目的為利用在積體電路底材上所形成200409324 V. Description of the invention (2) Douyuan / Li pin structure (Sma11 0utline J-leaded; SOJ), which is a structure using a model. Kind of Ϊ: Ϊ ΐ 的 体 体 电路 片 # 目 目, constructing integrated circuit scp) 夕 B σ knife is an early chip package (Single Chip Package; 片片 炉 二 Γ 片 结构 i (Multlchip Package; MCP ) Two major categories, and more). If you are busy, Zhaochao ’s chip module assembly (Multi chip Module; MCM is divided into the pin 7 and the circuit board connection method, the integrated circuit can be constructed (S-fac M-type (Pin —Through —Hole (PTH) and the pins of the surface-adhesive components are: pin = '01;: two categories. Pin-insertion type socket) or the lead-through hole of the circuit board The typed components are fixed with 1 a, 1 fixed, and 1 dry-bonded. The surface is currently glued to a jif board, and then fixed by soldering. Fh-More advanced mounting technology is direct chip bonding (Direct size) ^ I H in order to reduce the volume of the integrated circuit structure «junction; = the degree of accumulation of the department. The wafer is directly connected. On the soil board (SUbStrate), the circuit is then photographed. Figure: :: ;;: = Mounting on the substrate ... Block 20 flip chip is connected to the substrate 30: "" Most of the solder bumps are bonded to the substrate 30, and then the chip 彳 j: Firstly, ^ knife a plurality of wafers 1 〇Adhesive will be "10 and the substrate 30 through the lead 200409324 V. Description of the invention (3), so that the signal can be transmitted between the wafer and the substrate. Finally in the crystal Cover 40 is used to protect the majority of the wafers 10 on the substrate. In the above-mentioned conventional technology, most of the wafers are directly or indirectly connected to the substrate and are routed by the circuit of the substrate (routing). The electrical communication with each other will increase the difficulty of winding the circuit of the substrate itself in the conventional technology, and the larger the distance between the chip and the volume of the integrated circuit cannot be reduced, which increases the package size. The cost of the substrate is increased, and the electrical performance is limited due to the long circuit communication path between the chips. Although the industry has proposed a multifunctional single chip (Silicon on a Chip; S0C) that integrates active and passive components Solution, but its design and manufacturing process is still difficult and expensive. 5-3 Purpose and Summary of the Invention: In view of the above background of the invention, the traditional structure and method of directly connecting most wafers to the substrate cannot be reduced. The volume of the integrated circuit will reduce the communication efficiency between the circuits in the package. Therefore, the present invention provides an area density multi-chip module. Structure and formation method 'uses a plurality of interconnecting layers formed on a integrated circuit substrate to connect a plurality of chips, thereby forming a high-density multi-chip module to shorten the distance between circuits in a multi-chip package, and Improve the communication efficiency between circuits. The second object of the present invention is to use the integrated circuit substrate

200409324 五、發明說明(4) 之多層内連線層來連接多數個晶片,而形成高密度多晶片 模組,以順利降低多晶片封裝體的尺寸,可降低多晶片模 組製作成本。 本發明之第三個目的為利用在積體電路底材上所形成 之多層内連線層來連接多數個晶片,而形成高密度多晶片 模組,以簡化傳統基板繞線製程,可提升多晶片封裝良率 本發明之第四個目的為利用在積體電路底材上所形成 之多層内連線層來連接多數個晶片,而形成高密度多晶片 模組,可以簡單的設計和製程整合主動元件及被動元件於 本發明之多晶片模組中。 根據以上所述之目的,本發明提供了一種高密度多晶 片模組的結構及形成方法,利用在積體電路底材上所形成 之多層内連線層來連接多數個晶片,而形成高密度多晶片 模組。發明首先在一積體電路底材上依序形成一絕緣層及 多層内連線層,其中多層内連線層之第一表面設有多數個 第一銲墊、第二表面設有多數個第二銲墊。接下來在多層 内連線層之第一表面上依序形成一黏結層及一透明底材, 如:玻璃基材。接下來移除積體電路底材,並蝕刻部分之 絕緣層以露出多層内連線層之第二表面上的第二銲墊。接 下來將多數個晶片藉由覆晶或導線連結方式電性連接至第200409324 V. Description of the Invention (4) The multi-layer interconnection layer connects multiple chips to form a high-density multi-chip module, which can smoothly reduce the size of the multi-chip package and reduce the manufacturing cost of the multi-chip module. A third object of the present invention is to use a plurality of interconnecting layers formed on a integrated circuit substrate to connect a plurality of chips, thereby forming a high-density multi-chip module, in order to simplify the traditional substrate winding process and improve multi-chip. Wafer Package Yield The fourth object of the present invention is to use a plurality of interconnecting layers formed on an integrated circuit substrate to connect a plurality of wafers, thereby forming a high-density multi-chip module, which can be easily designed and integrated with processes. Active components and passive components are included in the multi-chip module of the present invention. According to the above-mentioned object, the present invention provides a structure and a forming method of a high-density multi-chip module, which uses a plurality of interconnecting layers formed on an integrated circuit substrate to connect a plurality of chips to form a high density. Multi-chip module. In the invention, an insulating layer and a plurality of interconnecting layers are sequentially formed on a integrated circuit substrate, wherein the first surface of the multilayer interconnecting layer is provided with a plurality of first pads, and the second surface is provided with a plurality of first pads. Two solder pads. Next, a bonding layer and a transparent substrate, such as a glass substrate, are sequentially formed on the first surface of the multilayer interconnecting layer. Next, the integrated circuit substrate is removed, and a part of the insulating layer is etched to expose the second pad on the second surface of the multilayer interconnection layer. Next, most of the chips are electrically connected to the chip by flip-chip or wire connection.

200409324 五、發明說明(5) 二銲墊,並利用封膠固定晶片。再接著裝設一散熱片以提 供散熱及結構支撐的功能。最後移除透明底材及黏結層即 可完成本發明之高密度多晶片模組。利用本發明之高密度 多晶片模組可以縮短封裝體内電路之間的距離並順利降低 封裝體的尺寸。利用本發明之高密度多晶片模組更可提高 封裝體的效能。 5 - 4發明的詳細說明: 本發明的一些實施例會詳細描述如下。然而,除了詳 細描述外,本發明還可以廣泛地在其他的實施例施行,且 本發明的範圍不受實施例的限定,其以之後的專利範圍為 準。 本發明提供了一種高密度多晶片模組的結構及形成方 法,利用在積體電路底材上所形成之多層内連線層來連接 多數個晶片,而形成高密度多晶片模組。參照第二圖所示 ,此為本發明所提供之積體電路底材並在積體電路底材上 形成一絕緣層、一多層内連線層、一黏結層、與、一透明底 材之示意圖。本發明首先提供一積體電路底材100,並在 積體電路底材1 0 0上形成一絕緣層11 0。接下來在此絕緣層 1 1 0之表面上形成一多層内連線層120,其中多層内連線層200409324 V. Description of the invention (5) Two solder pads, and the wafer is fixed by the sealing compound. A heat sink is then installed to provide heat dissipation and structural support. Finally, the transparent substrate and the adhesive layer are removed to complete the high-density multi-chip module of the present invention. The high-density multi-chip module of the present invention can shorten the distance between the circuits in the package and smoothly reduce the size of the package. The high-density multi-chip module of the present invention can further improve the performance of the package. 5-4 Detailed Description of the Invention: Some embodiments of the present invention will be described in detail as follows. However, in addition to the detailed description, the present invention can also be widely implemented in other embodiments, and the scope of the present invention is not limited by the embodiments, which is subject to the scope of subsequent patents. The invention provides a structure and a forming method of a high-density multi-chip module, which uses a plurality of interconnecting layers formed on an integrated circuit substrate to connect a plurality of chips to form a high-density multi-chip module. Referring to the second figure, this is an integrated circuit substrate provided by the present invention, and an insulating layer, a multilayer interconnecting layer, an adhesive layer, and a transparent substrate are formed on the integrated circuit substrate. The schematic. The present invention first provides an integrated circuit substrate 100, and forms an insulating layer 110 on the integrated circuit substrate 100. Next, a plurality of interconnecting layers 120 is formed on the surface of the insulating layer 110, wherein the plurality of interconnecting layers 120

200409324 五、發明說明(6) - 12 0之第一表面122包含多數個第一銲墊13卜第二表面124 u a夕數個第一I干墊132。接下來在多層内連線層12〇之第 一表面122上形成一有機黏結層14〇並在此有機黏結層14〇 上形成一透明底材丨50,諸如:玻璃基材、石英基材等。 有機黏結層140可為高分子聚合物膠(p〇lymer以⑽),其 功用為增加透明底材1 5 〇與多層内連線層i 2 〇之間的結合力 ,以避^透明底材150發生脫落,i且該透明底材係用以 提供後續製程之結構支撑。 >,、?、第一圖所示’此為移除積體電路底材及部分之絕 緣層以露出第二銲墊之示意圖。當在有機黏結層上形成透 月底材後可配合製耘的需求來決定是否將積體電路翻轉 以使透明底材接觸製程運作之機具上而進行後續之製程步 ί Ί 疋並不限制本發明之範圍。接下來移除積體電路底 材舁部分之絕緣層1 1 0以露出多層内連線層i 20之第二 表面j24上的第二銲墊132,其中積體電路底材1〇〇可用研 3方式? •,而部分之絕緣層係用一般蝕刻方式移除。所 ί。出之第一銲墊1 3 2的位置即為在後續製程中接觸晶片上 之銲接凸塊的位置。 ΐ处將多數個晶片藉由覆晶凸塊(FHp-ChlP BUmp) 或V線連、.、D (Wlre-B〇nding)或其他方式電性連接至第二銲 ,成而與多層内連線層連結’以使訊號能在多數個晶片盥 夕層内連線層之間傳《。以下僅提供三個f施例將多數個200409324 V. Description of the invention (6)-12 The first surface 122 includes a plurality of first pads 13 and a second surface 124 u a and a plurality of first I dry pads 132. Next, an organic bonding layer 1440 is formed on the first surface 122 of the multilayer interconnecting layer 120, and a transparent substrate 50 is formed on the organic bonding layer 14o, such as: glass substrate, quartz substrate, etc. . The organic bonding layer 140 may be a polymer polymer glue, and its function is to increase the bonding force between the transparent substrate 150 and the multilayer interconnecting layer i 2 〇 to avoid the transparent substrate 150 fell off, and the transparent substrate was used to provide structural support for subsequent processes. >,?, shown in the first figure 'This is a schematic diagram of removing the integrated circuit substrate and part of the insulating layer to expose the second pad. After forming the lunar substrate on the organic bonding layer, it can be used to meet the needs of the manufacturing process to determine whether to turn the integrated circuit to make the transparent substrate contact the process operation equipment and carry out subsequent process steps. Range. Next, the insulating layer 1 10 of the integrated circuit substrate 舁 part is removed to expose the second bonding pad 132 on the second surface j24 of the multilayer interconnecting layer i 20, where the integrated circuit substrate 100 can be researched. 3 ways? • And part of the insulating layer is removed by ordinary etching. All ί. The position of the first solder pad 1 3 2 is the position where the solder bumps on the wafer are contacted in subsequent processes. Most of the chips are electrically connected to the second solder through FHp-ChlP BUmp or V-line connection,., D (Wlre-Bonding) or other means, so as to interconnect with multiple layers. Line layer connection 'to enable the signal to be transmitted between the interconnect layers of most chip layers. Only three examples are provided below.

200409324 五、發明說明(7) 晶片與多層内連線層相I έ士 Η媪細伯a 連、0以製作本發明之高密度多晶 片核組,但是並不限制多數 線層相互連結。 夕數们曰曰片以何種模式與多層内連 參Α?、弟四圖所示,此為曰 審# ^。^ 此為日日片連結多層内連線層之第一 t之夕日—貫施例巾’多數個晶片2 _由各晶片2 〇 〇 上之多數個銲接凸媿2 ] έ士认夕 & 19/lu > # 尾ZiU黏結於多層内連線層120之第二表 弟—銲墊1 3 2,而與多層内連線層1 2 0相互連結 :並使讯號能在多數個晶片2 0 0與多層内連12〇之 遞。 曰曰 ^妝第五圖所不,此為在第四圖的晶片周圍安裝一散 「片(Heat Sink)之示意圖。當多數個晶片2〇〇與多層内 連線層—120相互連接後,隨即利用封膠i丨/以以打) 3 0 0固疋晶片並保護晶片2 〇 〇與多層内連線層i 2 〇之連接處 ’一且避免夕數個晶片2 0 0彼此之間發生接觸的現象而導致 短路的缺陷。再接著,可在多數個晶片2〇〇周圍並在絕緣 ==上安裝一凹槽結構的散熱片MO,利用此散熱片MO 夕數個晶片2 0 0,以一方面增加多數個晶片2〇〇的散埶 效率,一方面可提供EMm蔽功能,再一方面可提供… 曰曰 〇/ ^ ^ 片2 0 0之非主動表面與散熱片32〇之間可利用一 0來黏結二者,以增加導熱效率。多數 曰 多數個晶片2 0 0與散熱片3 2 0更以一樹脂3〇〇包^。〇〇之間及200409324 V. Description of the invention (7) The phase between the wafer and the multilayer interconnecting wire I Η 媪 伯 伯 a, 0 to make the high-density polycrystalline chip core group of the present invention, but most of the wire layers are not connected to each other. On the evening, the number of modes in which the film is connected to multiple layers is shown in Figure A and the fourth figure. This is Yue # ^. ^ This is the first t-day of connecting Japanese and Japanese films with multiple layers of interconnecting wires-the example of the towel "most wafers 2 _ embarrassed by the majority of solders on each wafer 2000" 2 19 / lu ># The tail ZiU is bonded to the second cousin of the multi-layer interconnect layer 120—the pad 1 3 2 and interconnects with the multi-layer interconnect layer 1 2 0: and enables the signal to be transmitted on most chips. 2 0 0 and multi-layer interconnected 12 0 delivery. As shown in the fifth picture, this is a schematic diagram of installing a "seat sink" around the wafer in the fourth picture. When most of the wafers 200 are interconnected with the multilayer interconnect layer -120, Immediately use the sealant i 丨 / to fight) to fix the wafer and protect the connection between the wafer 2000 and the multilayer interconnect layer i 2 ′ and avoid the occurrence of several wafers 2000 between each other. The contact phenomenon causes a short circuit defect. Then, a heat sink MO with a groove structure can be installed around a plurality of wafers 2000 and on the insulation ==, and the heat sink MO can be used for several wafers 200, On the one hand, the dispersion efficiency of the majority of wafers is increased by 200, on the one hand, it can provide the EMm shielding function, and on the other hand, it can provide ... between the inactive surface of the 200 / ^ and the heat sink 32. A 0 can be used to bond the two to increase the heat transfer efficiency. Most of the chips 200 and the heat sink 3 2 0 are packaged with a resin 300. ^

第12頁 200409324Page 12 200409324

參照第六圖所示,此盔 示意圖。當在多數個晶片ttf田明\高密度多晶片模組之 即可利用光、雷射或是加熱’周圍女裝散熱4片3 2 0後’隨 之聚合物分子結構,使苴本工,刀解有機黏結層14 〇 ’並接著利用雷射、電衆^黏t,以移除透明底材15〇 ( stripping) Etchlng) ' ^ 層内連線層120之第一夺ΐ私除该有機黏結層140以露出多 晶片模組。 又1 2 2,並完成本發明之高密度多Refer to Figure 6 for a schematic view of this helmet. When in many chips TTF Tianming \ high-density multi-chip modules can use light, laser, or heat to heat the surrounding women's heat to dissipate 4 pieces after 3 2 0, followed by the polymer molecular structure, so that this work, The organic bonding layer 14 is decomposed by a knife, and then a laser and a light source are used to adhere t to remove the transparent substrate 15 (stripping) Etchlng) ^ The first interconnection layer 120 deprives the organic The bonding layer 140 is exposed to expose the multi-chip module. Another 1 2 2 and completed the high density of the invention

參照第七圖所示,此主士饮 第二實施例。在帛二實施^ ^ 之高密度多晶片模組3 各晶片2 0 0主動表面上之多例/心部分多數個晶片2_由 層内連線層120之第1面^ ^接凸塊210電性連結於多 # 2 2 (1¾ έ士产夕爲咖、先以一非主動表面可利用一黏膠 I 田 在夕層内連線層1 20之第二表面1 24上,接下來 :=導 '線2!0電性連結此部☆之多數個晶片2〇〇與多層户 节lt二12〇之第二表面124上的部分第二銲墊132。以使訊 =此不同形式(覆晶或導線連結)之多數個晶片2 0 0及多 層内連線層1 2 0之間傳遞。Referring to the seventh figure, this master drinks a second embodiment. The high-density multi-chip module ^ ^ implemented in the second two 3 each chip 2 0 0 multiple cases on the active surface / the majority of the chip 2_ by the first surface of the layer interconnect layer 120 ^ ^ contact bump 210 It is electrically connected to the multi-layer # 2 2 (1¾), and first uses a non-active surface to use an adhesive I field on the second surface 1 24 of the interconnect layer 1 20, and then: = The guide wire 2! 0 electrically connects the majority of the wafers 200 of this part ☆ with a part of the second pads 132 on the second surface 124 of the multi-layered household joint 120. To make the news = this different form ( Flip-chip or wire bonding) are transferred between a plurality of wafers 200 and a plurality of interconnecting layers 120.

—仍茶照第七圖所示,封膠(Underfill/Resin)3〇〇係固 疋晶片並保護晶片2〇〇與多層内連線層12〇之連接處,且避 免多數個晶片2 0 0彼此之間發生接觸的現象而導致短路的—As shown in the seventh picture of the tea, the underfill / Resin 300 is used to fix the wafer and protect the connection between the wafer 200 and the multilayer interconnect layer 120, and to avoid the majority of wafers 2000 Short circuit caused by contact between each other

第13頁 200409324 五、發明說明(9) -- 缺 。並可在多數個晶片2 〇 〇周圍安 埶^ ^ ^ ^ ^ ^ 多數個晶片2 0 0,以一方面辦加客奴了 Γ λ 万面曰加夕數個晶片2 0 0的散熱效率 方面可提供EM I遮蔽功能,再一方面可提供多晶片模 、、且的、、Ό構強度。依照製程及產品的需求,多數個覆晶晶片 之非主動表面與散熱片3 2 0之間可利用一導熱膠層31〇來黏 妹 '者,以增加導熱效率。 # 一 ^知、第八圖所示’此為本發明之高密度多晶片模組之 第二貫施例。在第三實施例中,多數個晶片2 〇 〇係先以其 非主動表面黏結在多層内連線層12〇之第二表面124上,接 下來再利用導線2 3 0電性連結此多數個晶片2 0 0與多層内連 ,層1 2 0之第二表面1 2 4上的第二銲墊丨3 2,以使訊號能在 多數個晶片2 0 〇與多層内連線層1 2 〇之間傳遞。 仍參知、弟八圖所示’封膠(U n d e r f i 1 1 / R e s i η ) 3 0 0係固 疋晶片並保護晶片2 0 0與多層内連線層1 2 〇之連接處,且避 免多數個晶片2 0 〇彼此之間發生接觸的現象而導致短路的 j陷。並可在多數個晶片2〇〇周圍安裝一的散熱片32〇,以 方面增加多數個晶片2 〇 〇的散熱效率,一方面可提供e μ I 遮蔽功能’再一方面可提供多晶片模組的結構強度。 ^ 利用本發明之結構與方法,將多數個晶片連結於積體 兒路基材上之多層内連線層所製作而成的高密度多晶片模 組’可縮短多數個晶片彼此之間的距離並可縮短電路與電Page 13 200409324 V. Description of the Invention (9)-Missing. ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ Λ 10,000 面 面 面 面 面 面 面 夕 夕 晶片 晶片 晶片 晶片 晶片 晶片 2 0 2 0 0 0 It can provide EM I shielding function, and on the other hand, it can provide multi-die mode, and the structure strength. According to the process and product requirements, a thermally conductive adhesive layer 31 can be used between the non-active surface of most flip-chip wafers and the heat sink 3 2 0 to increase thermal conductivity. # 一 ^ 知 , shown in the eighth figure ’This is the second embodiment of the high-density multi-chip module of the present invention. In the third embodiment, the plurality of wafers 200 are first adhered to the second surface 124 of the multilayer interconnect layer 120 with their non-active surfaces, and then the plurality of wafers are electrically connected with the wires 230. The chip 200 is interconnected with multiple layers, and the second pads 32 on the second surface 12 of the layer 120, so that the signal can be connected to the multilayer interconnect layer 1 2 with the multiple chips 2 00. Between. Still seeing and seeing the figure of the eighth figure, 'sealing glue (Underfi 1 1 / Re esi η) 3 0 0 is to fix the chip and protect the connection between the chip 2 0 and the multilayer interconnect layer 1 2 0, and avoid A phenomenon in which a plurality of wafers 200 are in contact with each other results in a short-circuit depression. A heat sink 32 can be installed around the majority of wafers 200 to increase the heat dissipation efficiency of the majority of wafers 200. On the one hand, it can provide e μ I shielding function. On the other hand, it can provide multi-chip modules. Structural strength. ^ Using the structure and method of the present invention, a high-density multi-chip module made by connecting a plurality of wafers to a plurality of interconnecting layers on a substrate of an integrated circuit can reduce the distance between the plurality of wafers. And shorten the circuit and power

第14頁 200409324Page 14 200409324

五、發明說明(ίο) 洽度多晶片模組中,電 將可加快,且電路的運 體電路的尺寸。 路之間的距離。因此在本發明之高 路與電路彼此之間的訊號傳遞速& 作效能將可提高,並可降低構裝積 上述 種形式之 不以此為 多晶片模 故並不限 之高密度 圖’可提 使其分 第一表面 多晶片模 實施例所完成之南密度多g 私狀社嫵,、,T與φ 4 日片模組,可應用於多 封一構,以下牛出右干實例說明,但 限。且僅採用第一實施例以_ Μ & 、應用田 Ν从呪明本發明之高穷碎 組的應用方式,且任一實踹^ ^ ^ 夂门山度 焉^例均可單獨被應用,V. Description of the Invention (ίο) In the multi-chip module of Qiadu, electricity will be accelerated, and the size of the circuit's operational circuit. The distance between the roads. Therefore, the signal transmission speed & operation efficiency between the high road and the circuit of the present invention will be improved, and the structure of the above-mentioned forms will not be reduced. This is not a high-density map of multi-chip simulation. It can be divided into the first surface multi-wafer die embodiment, which is completed by the South-density multi-g-private-community module, T, and φ 4 day-chip modules, which can be applied to multiple seals and one structure. Description, but limited. And only the first embodiment is used to apply the application method of the high-poor fragmentation group of the present invention with _M &, and any practical example ^ ^ ^ 夂 门 山 度 焉 ^^ can be applied separately ,

制本發明之範圍。參照第九圖所示,此為:發明 多晶片板組直接形成球格陣列封裝體形式之示意 供多數個銲球4 1 0,以傳統封裝之上銲球的製程 別鮮接連結至多晶片模組之多層内連線層1 2 〇之 1 2 2的多數個第一銲墊1 3 1上,而直接完成一具有 組之球格陣列封裝體。 參照第十圖所示,此為本發明之高密度多晶片模組以 覆晶方式結合封裝基板,形成球格陣列覆晶封裝體形式之 示意圖。首先以一般凸塊製程,於多晶片模組之多層内連 線層1 2 0之第一表面1 2 2上的每一個第一銲塾1 3 1上,形成 一銲接凸塊4 2 0。接下來以一般覆晶封裝製程,將此銲接 凸塊4 2 0分別黏結至一基板5 0 0上的多數個凸塊墊5 1 0,以 將本發明之高密度多晶片模組4 0 0固定於基板上5 0 0,其中 多晶片模組與基板之間填充底膠4 0 0 ( U n d e r f i 1 1)以固定 該多晶片模組於基板5 0 0上並且避免凸塊4 1 0彼此之間發生Making the scope of the invention. Referring to the ninth figure, this is: a schematic diagram of the invention of a multi-chip board group directly forming a ball grid array package for a plurality of solder balls 4 10, which is freshly connected to the multi-chip die by the process of solder balls on the traditional package. A plurality of first interconnect pads 1 2 1 of a plurality of multilayer interconnecting layers 12 2 to 12 are directly completed to complete a ball grid array package having a group. Referring to the tenth figure, this is a schematic view of a high-density multi-chip module of the present invention combined with a package substrate in a flip-chip manner to form a ball grid array flip-chip package. First, a general bump process is used to form a solder bump 4 2 0 on each of the first solder pads 1 3 1 on the first surface 1 2 2 of the multilayer interconnect layer 12 2 of the multi-chip module. Next, in a general flip-chip packaging process, the solder bumps 4 2 0 are respectively bonded to a plurality of bump pads 5 1 0 on a substrate 5 0 0, so as to integrate the high-density multi-chip module 4 0 0 of the present invention. It is fixed on the substrate 5 0, wherein the multi-chip module and the substrate are filled with primer 4 0 0 (Underfi 1 1) to fix the multi-chip module on the substrate 5 0 0 and avoid bumps 4 1 0 each other Happen between

第15頁 200409324 五、發明說明(11) 接觸的現象,而導致半導體元件發生短路的缺陷。最後, 以上銲球的製程,使多數個銲球5 5 0分別銲接連結至基板 5 0 0底面上之多數個銲球墊5 4 0上。 參照第十一圖所示,此為本發明之高密度多晶片模組 結合封裝基板形成開口向下(Cav i t y-Down )形式的球格陣 列封裝體之示意圖。首先提供一包含一貫穿孔5 2 〇封裝基 板5 0 0。接下來將本發明之高密度多晶片模組4 〇 〇安裝入此 貝牙孔5 2 0内’其中高密度晶片模組4〇〇上的散熱片3 2 0接 觸於貝穿孔5 2 0的側壁,其中基板5 〇 〇與多晶片模組之第一 ^面1 2 2位於同一侧的表面上設有多數個接點5丨〇及多數個 一球塾5 4 0。接下來利用多數個導線5 3 〇連接高密度晶片模 組第一表面1 2 2上之多數個第一銲墊1 3 1與該封裝基板5 〇 〇 ^面之多數個接點5 1 〇,並進行一封膠填充之製程包覆此 導f 5 3 0、多層内連線層ι2〇的第一表面122、與之基板5〇〇 f多數個接點5 1 0,以避免高密度多晶片模組受到外在環 ,的〜喜而降低其品質與效能。最後以上銲球的製程,使 多數個銲球5 5 0分別銲接連結至該多數個銲球墊5 4 〇上。 綜上所述,本發明提供了 一種高密度多晶片模組的結 及幵y成方法,利用在積體電路之底材上所形成之多層内 ^線層來連接多數個晶片,而形成高密度多晶片模組。發 明首先在一積體電路底材上依序形成一絕緣層及多層内連 線層’其中多層内連線層之第一表面設有多數個第一銲墊Page 15 200409324 V. Description of the invention (11) The contact phenomenon that causes a short circuit in a semiconductor device. Finally, in the above solder ball manufacturing process, a plurality of solder balls 5 50 are respectively soldered to a plurality of solder ball pads 5 40 on the bottom surface of the substrate 500. Referring to FIG. 11, this is a schematic diagram of a high-density multi-chip module combined with a package substrate to form a Cavity T-Down ball grid package. First, a package substrate 500 including a through hole 5 2 0 is provided. Next, the high-density multi-chip module 400 of the present invention is installed in this shell hole 5 2 0, wherein the heat sink 3 2 0 on the high-density chip module 400 contacts the shell hole 5 2 0. The side wall, where the substrate 500 is on the same side as the first surface 12 of the multi-chip module is provided with a plurality of contacts 5 and 0 and a plurality of balls 5 4 0. Next, a plurality of wires 5 3 0 are used to connect the plurality of first pads 1 3 1 on the first surface 1 2 2 of the high-density chip module and the plurality of contacts 5 1 0 of the 5 0 ^ surface of the package substrate. A glue filling process is performed to cover the lead f 5 3 0, the first surface 122 of the multilayer interconnection layer ι 2 0, and the substrate 5 0 f with a plurality of contacts 5 1 0 to avoid high density The chip module is subject to external loops, and its quality and performance are reduced. Finally, in the above process of solder balls, the plurality of solder balls 5 50 are respectively welded and connected to the plurality of solder ball pads 5 4 0. In summary, the present invention provides a method for forming and forming a high-density multi-chip module, which uses a plurality of internal wiring layers formed on a substrate of an integrated circuit to connect a plurality of chips, thereby forming a high Multi-chip density module. According to the invention, an insulating layer and a plurality of interconnecting layers are sequentially formed on a integrated circuit substrate. The first surface of the multilayer interconnecting layer is provided with a plurality of first pads.

第16頁 200409324 五、發明說明(12) 、第二表面設有多數個第二銲墊。接下來在多層内連線層 之第一表面上依序形成一黏結層及一透明底材,如:玻璃 基材。接下來移除積體電路底材,並蝕刻部分之絕緣層以 露出多層内連線層之第二表面上的第二銲墊。接下來將多 數個晶片藉由覆晶或導線連結方式電性連接至第二銲墊, 並利用封膠固定晶片。再接著裝設一散熱片以提供散熱及 結構支撐的功能。最後移除透明底材及黏結層即可完成本 發明之高密度多晶片模組。利用本發明之高密度多晶片模 組可以縮短封裝體内電路之間的距離並順利降低封裝體的 尺寸。利用本發明之高密度多晶片模組更可提高封裝體的 效能,不僅具有實用功效外,並且為前所未見之設計,具 有功效性與進步性之增進,故已符合專利法之要件,爰依 法具文申請之。為此,謹貴 審查委員詳予審查,並祈早 曰賜准專利,至感德便。 以上所述僅為本發明之較佳實施例而已,並非用以限 定本發明之申請專利範圍;凡其它未脫離本發明所揭示之 精神下所完成之等效改變或修飾,均應包含在下述之申請 專利範圍内。Page 16 200409324 V. Description of the invention (12) The second surface is provided with a plurality of second pads. Next, a bonding layer and a transparent substrate, such as a glass substrate, are sequentially formed on the first surface of the multilayer interconnecting layer. Next, the integrated circuit substrate is removed, and a part of the insulating layer is etched to expose the second pad on the second surface of the multilayer interconnection layer. Next, a plurality of chips are electrically connected to the second bonding pad by flip-chip or wire bonding, and the chip is fixed by using a sealant. A heat sink is then installed to provide heat dissipation and structural support. Finally, the transparent substrate and the adhesive layer are removed to complete the high-density multi-chip module of the present invention. The high-density multi-chip module of the present invention can shorten the distance between the circuits in the package and smoothly reduce the size of the package. The use of the high-density multi-chip module of the present invention can further improve the efficiency of the package. It not only has practical effects, but also has a design that has never been seen before. It has improved efficacy and progress.申请 Apply in accordance with the law. For this reason, the examiner would like to examine it in detail, and pray that he would grant the patent as soon as possible. The above is only a preferred embodiment of the present invention, and is not intended to limit the scope of patent application of the present invention. Any other equivalent changes or modifications made without departing from the spirit disclosed by the present invention shall be included in the following Within the scope of patent application.

200409324 圖式簡單說明 以上及其餘有關於本發明的目的、特性及優點在發明 的詳細說明及附圖中可得到更完整的說明。 第一圖為傳統之多晶片封裝之結構示意圖; 第二圖為本發明所提供之積體電路底材並在其上形成 一絕緣層、一多層内連線層、第一鲜墊、第二鲜墊、一有 機黏結層、與一透明底材之示意圖;200409324 Brief description of the drawings The above and the rest about the purpose, characteristics and advantages of the present invention can be more completely explained in the detailed description of the invention and the accompanying drawings. The first diagram is a schematic diagram of the structure of a conventional multi-chip package. The second diagram is an integrated circuit substrate provided by the present invention, and an insulating layer, a multilayer interconnecting layer, a first fresh pad, a first Schematic diagram of two fresh pads, an organic bonding layer, and a transparent substrate;

第三圖為移除積體電路底材及部分絕緣層以露出第二 銲墊之示意圖; 第四圖為晶片連結多層内連線層之第一實施例示意圖 第五圖為在晶片周圍及絕緣層上安裝一散熱片之示意 圖;The third figure is a schematic diagram of removing the integrated circuit substrate and a part of the insulating layer to expose the second pad; the fourth figure is a schematic diagram of the first embodiment of a chip connecting multiple interconnecting layers. The fifth figure is around the chip and insulating Schematic diagram of installing a heat sink on the layer;

第六圖為本發明之高密度多晶片模組之第一實施例示 意圖; 第七圖為本發明之高密度多晶片模組之第二實施例示 意圖;The sixth figure is a schematic view of the first embodiment of the high-density multi-chip module of the present invention; the seventh figure is the second embodiment of the high-density multi-chip module of the present invention;

第18頁 200409324 圖式簡單說明 第八圖為本發明之高密度多晶片模組之第三實施例示 意圖 第九圖為本發明之高密度多晶片模組直接形成球格陣 列封裝體形式之示意圖; 第十圖為本發明之高密度多晶片模組以覆晶方式結合 封裝基板,形成球格陣列覆晶封裝體形式之示意圖; 第十一圖為本發明之高密度多晶片模組結合封裝基板 形成開口向下(C a v i t y - D 〇 w η )形式的球格陣列封裝體之示 意圖。 主要部份的代表符號: 1 0晶片 2 0銲接凸塊 3 0基板 3 5引線 4 0封膠 1 0 0積體電路底材 1 1 0絕緣層 1 2 0多層内連線層 122多層内連線層之第一表面 12 4多層内連線層之第二表面Page 18 200409324 Brief description of the drawings The eighth figure is a schematic diagram of the third embodiment of the high-density multi-chip module of the present invention The ninth figure is a schematic diagram of the high-density multi-chip module of the present invention directly forming a ball grid array package The tenth figure is a schematic view of a high-density multi-chip module combined with a package substrate in a flip-chip manner to form a ball grid array flip-chip package; the eleventh figure is a high-density multi-chip module combined package of the present invention; A schematic view of a substrate forming a ball grid array package with an opening downward (Cavity-D ow η). Representative symbols of the main parts: 1 0 wafer 2 0 solder bump 3 0 substrate 3 5 lead 4 0 sealant 1 0 0 integrated circuit substrate 1 1 0 insulation layer 1 2 0 multilayer interconnecting layer 122 multilayer interconnection The first surface of the wire layer 12 The second surface of the multilayer interconnecting layer

第19頁 200409324 圖式簡單說明 131第一銲墊 13 2第二銲墊 1 4 0黏結層 1 5 0透明底材 2 0 0晶片 2 10凸塊 2 2 0黏膠層 2 3 0導線 3 0 0封膠 31 0導熱膠層Page 19 200409324 Schematic description 131 First pad 13 2 Second pad 1 4 0 Adhesive layer 1 5 0 Transparent substrate 2 0 0 Wafer 2 10 Bump 2 2 0 Adhesive layer 2 3 0 Wire 3 0 0 封 胶 31 0 Thermally conductive adhesive layer

3 2 0散熱片 4 0 0底膠 41 0凸塊 5 0 0基板 5 1 0接點 5 3 0導線 5 4 0銲球墊 5 5 0銲球3 2 0 heat sink 4 0 0 primer 41 0 bump 5 0 0 substrate 5 1 0 contact 5 3 0 wire 5 4 0 solder ball pad 5 5 0 solder ball

第20頁Page 20

Claims (1)

200409324 六、申請專利範圍 1. 一種高密度多晶片模組結構,其中該結構包含: 一多層内連線層,具有第一表面及第二表面; 多數個第一銲·墊,位於該多層内連線層之該第一表面 多數個第二鲜塾,位於該多層内連線層之該第二表面 一圖案化絕緣層,位於該多層内連線層之該第二表面上, 並露出該些第二銲墊; 多數個晶片,位於該絕緣層上且與該些第二銲墊電性 連結;及 一散熱片,位於該絕緣層上,並包圍並覆蓋該多數個 晶片。 2. 如申請專利範圍第1項之高密度多晶片模組結構,其中 上述之多數個晶片之任一係以覆晶(F 1 i p - C h i p )方式與該 些第二銲墊電性連結。 3. 如申請專利範圍第2項之高密度多晶片模組結構,其中 上述之以覆晶方式與該些第二銲墊電性連結之晶片的非主 動表面可藉由一導熱膠層與該散熱片相連。 4. 如申請專利範圍第1項之高密度多晶片模組結構,其中 上述之多數個晶片之任一係以導線連接(W i r e - Β ο n d i n g )方 式與該些第二銲墊電性連結。200409324 6. Scope of patent application 1. A high-density multi-chip module structure, wherein the structure includes: a multilayer interconnect layer having a first surface and a second surface; a plurality of first soldering pads located in the multilayer Most of the first surface of the interconnecting layer are second and second, a patterned insulating layer is located on the second surface of the multilayer interconnecting layer, is located on the second surface of the multilayer interconnecting layer, and is exposed. The second solder pads; a plurality of wafers located on the insulation layer and electrically connected to the second solder pads; and a heat sink located on the insulation layer and surrounding and covering the plurality of wafers. 2. For example, the high-density multi-chip module structure of the first patent application scope, wherein any one of the above-mentioned multiple chips is electrically connected to the second pads in a flip-chip (F 1 ip-Chip) manner. . 3. For example, the high-density multi-chip module structure of the scope of the patent application, wherein the non-active surface of the chip electrically connected to the second pads in a flip-chip manner can be connected to the chip by a thermally conductive adhesive layer. The heat sink is connected. 4. For example, the high-density multi-chip module structure of the first patent application scope, in which any one of the plurality of chips mentioned above is electrically connected to the second pads by a wire connection (Wire-Β ο nding) method. . 200409324 六、申請專利範圍 5. 如申請專利範圍第1項之高密度多晶片模組結構,其中 上述之散熱片與該多數個晶片及該多層内連線層之間的空 間係充滿封膠。 6. —種形成高密度多晶片模組的方法,包含: 提供一積體電路底材; 形成一絕緣層於該積體電路底材上; 形成一多層内連線層於該絕緣層上,其中該多層内連 線層之第一表面設有多數個第一銲墊、第二表面設有多數 個第二銲墊;200409324 6. Scope of patent application 5. For example, the high-density multi-chip module structure of the first patent application scope, wherein the space between the above-mentioned heat sink and the plurality of chips and the multilayer interconnection layer is filled with sealant. 6. —A method for forming a high-density multi-chip module, comprising: providing an integrated circuit substrate; forming an insulating layer on the integrated circuit substrate; forming a multilayer interconnecting layer on the insulating layer , Wherein the first surface of the multilayer interconnection layer is provided with a plurality of first pads, and the second surface is provided with a plurality of second pads; 形成一黏結層於該多層内連線層之第一表面上; 形成一透明底材於該黏結層上; 移除該積體電路底材及部分該絕緣層以露出該該第二 群塾; 將多數個晶片設於該絕緣層上,並個別電性連接至第 二銲墊;及 安裝一散熱片於該絕緣層上並包圍覆蓋住該多數個晶Forming a bonding layer on the first surface of the multilayer interconnecting layer; forming a transparent substrate on the bonding layer; removing the integrated circuit substrate and part of the insulating layer to expose the second group of plutonium; Arranging a plurality of chips on the insulating layer and electrically connecting them to the second solder pads individually; and mounting a heat sink on the insulating layer to surround and cover the plurality of crystals 7. 如申請專利範圍第6項之形成高密度多晶片模組的方法 ,其中上述之多數個晶片之任一係以覆晶(F 1 i p - C h i ρ )方 式設於該絕緣層上,並藉由多數個銲接凸塊與該些第二銲 墊電性連結。7. For the method for forming a high-density multi-chip module according to item 6 of the patent application scope, wherein any one of the above-mentioned plurality of chips is provided on the insulating layer in a flip-chip (F 1 ip-C hi ρ) manner, The plurality of solder bumps are electrically connected to the second solder pads. 第22頁 200409324 六、申請專利範圍 8. 如申請專利範圍第7項之形成高密度多晶片模組的方法 ,其中在安裝該散熱片之前,上述之以覆晶方式與該些第 二銲墊電性連結之晶片的非主動表面可形成一導熱膠層。 9. 如申請專利範圍第6項之形成高密度多晶片模組的方法 ,其中上述之多數個晶片之任一係以導線連接 (W i r e - Β ο n d i n g )方式設於該絕緣層上,並藉由多數個導線 與該些第二銲墊電性連結。 1 0 .如申請專利範圍第6項之形成高密度多晶片模組的方法 ,其中在安裝該散熱片之前,係先以封膠固定該多數個晶 片以及該些晶片與該些第二銲墊之連接處。 1 1.如申請專利範圍第6項之形成高密度多晶片模組的方法 ,其中上述之黏結層係為有機聚合物材質。 1 2 .如申請專利範圍第6項之形成高密度多晶片模組的方法 ,其中當散熱片安裝完成之後,更包含依序移除該透明底 材及該黏結層的步驟。 1 3 .如申請專利範圍第1 2項之形成高密度多晶片模組的方 法,其中上述之移除該透明底材的步驟是可利用光、雷射 及加熱方式其中之一,分解該黏結層之分子結構使其失去 黏性,以移除該透明底材。Page 22 200409324 6. Scope of patent application 8. The method for forming a high-density multi-chip module as described in item 7 of the scope of patent application, wherein before the heat sink is installed, the above-mentioned flip-chip method is used with the second solder pads. A non-active surface of the electrically connected wafer may form a thermally conductive adhesive layer. 9. The method for forming a high-density multi-chip module according to item 6 of the scope of patent application, wherein any one of the above-mentioned plurality of chips is provided on the insulating layer by a wire connection (Wire-Β ο nding) method, and The plurality of wires are electrically connected to the second pads. 10. The method for forming a high-density multi-chip module according to item 6 of the scope of patent application, wherein before installing the heat sink, the plurality of wafers and the wafers and the second solder pads are fixed with a sealant. Connection. 1 1. The method for forming a high-density multi-chip module according to item 6 of the patent application scope, wherein the above-mentioned adhesive layer is made of an organic polymer material. 12. The method for forming a high-density multi-chip module according to item 6 of the patent application scope, wherein after the heat sink is installed, the method further includes a step of sequentially removing the transparent substrate and the adhesive layer. 1 3. The method for forming a high-density multi-chip module according to item 12 of the scope of patent application, wherein the above-mentioned step of removing the transparent substrate is to use one of light, laser, and heating methods to decompose the adhesion The molecular structure of the layer causes it to lose its viscosity to remove the transparent substrate. 200409324 六、申請專利範圍 1 4 .如申請專利範圍第1 2項之形成高密度多晶片模組的方 法,其中上述之移除該黏結層的步驟是利用雷射、電漿蝕 刻(Plasma Etching)、及剝膜(Stripping)其中之一 ,以移除該黏結層。 1 5. —種形成高密度多晶片模組的方法,包含: 提供一積體電路底材; 形成一絕緣層於該積體電路底材上; 形成一多層内連線層於該絕緣層上,其中該多層内連 線層之第一表面設有多數個第一銲墊、第二表面設有多數 個第二銲墊; 形成一黏結層於該多層内連線層之第一表面上; 形成一透明底材於該黏結層上; 移除該積體電路底材及部分該絕緣層以露出該該第二 鮮塾; 將多數個晶片設於該絕緣層上,並個別電性連接至第 二銲墊; 安裝一散熱片於該絕緣層上並包圍覆蓋住該多數個晶 片; 移除該透明底材;及 移除該黏結層。 1 6 .如申請專利範圍第1 5項之形成高密度多晶片模組的方200409324 6. Application for patent scope 1 4. The method for forming a high-density multi-chip module as described in item 12 of the patent scope, wherein the above-mentioned steps for removing the adhesive layer are using laser and plasma etching (Plasma Etching) And stripping to remove the adhesive layer. 1 5. A method for forming a high-density multi-chip module, comprising: providing an integrated circuit substrate; forming an insulating layer on the integrated circuit substrate; forming a multilayer interconnecting layer on the insulating layer A plurality of first pads are provided on a first surface of the multilayer interconnecting layer, and a plurality of second pads are provided on a second surface of the multilayer interconnecting layer; an adhesive layer is formed on the first surface of the multilayer interconnecting layer Forming a transparent substrate on the bonding layer; removing the integrated circuit substrate and a part of the insulating layer to expose the second core; placing a plurality of chips on the insulating layer and electrically connecting them individually To the second pad; installing a heat sink on the insulating layer and surroundingly covering the plurality of chips; removing the transparent substrate; and removing the bonding layer. 16. The method for forming a high-density multi-chip module as described in item 15 of the scope of patent application 200409324 六、申請專利範圍 法,其中上述之多數個晶片之任一係以覆晶(FI ip-Chip) 方式設於該絕緣層上,並藉由多數個銲接凸塊與該些第二 銲墊電性連結。 1 7 .如申請專利範圍第1 5項之形成高密度多晶片模組的方 法,其中在安裝該散熱片之前,上述之以覆晶方式與該些 第二銲墊電性連結之晶片的非主動表面可形成一導熱膠層200409324 6. Method of applying for a patent, in which any one of the above-mentioned plurality of wafers is provided on the insulating layer in a flip-chip (FI ip-Chip) manner, and a plurality of solder bumps and the second solder pads are provided. Electrical connection. 17. The method for forming a high-density multi-chip module according to item 15 of the scope of patent application, wherein before the heat sink is installed, the above-mentioned non-conductive chip is electrically connected to the second bonding pads in a flip-chip manner. A thermally conductive adhesive layer can be formed on the active surface 1 8 .如申請專利範圍第1 5項之形成高密度多晶片模組的方 法,其中上述之多數個晶片之任一係以導線連接(Wire-Bonding)方式設 於該絕 緣層上 ,並藉 由多數 個導線 與該些 第二銲墊電性連結。 1 9 .如申請專利範圍第1 5項之形成高密度多晶片模組的方 法,其中在安裝該散熱片之前,係先以封膠固定該多數個 晶片以及該些晶片與該些第二銲墊之連接處。 2 0 .如申請專利範圍第1 5項之形成高密度多晶片模組的方 法,其中上述之黏結層係為有機聚合物材質。 2 1.如申請專利範圍第1 5項之形成高密度多晶片模組的方 法,其中上述之移除該透明底材的步驟是可利用光、雷射 及加熱方式其中之一,分解該黏結層之分子結構使其失去18. The method for forming a high-density multi-chip module according to item 15 of the scope of patent application, wherein any one of the above-mentioned plurality of chips is provided on the insulating layer by a wire-bonding method, and borrows A plurality of wires are electrically connected to the second pads. 19. The method for forming a high-density multi-chip module according to item 15 of the scope of patent application, wherein before installing the heat sink, the plurality of wafers and the wafers and the second solders are fixed with a sealant. The connection of the pad. 20. The method for forming a high-density multi-chip module according to item 15 of the scope of patent application, wherein the above-mentioned adhesive layer is made of an organic polymer material. 2 1. The method for forming a high-density multi-chip module according to item 15 of the scope of patent application, wherein the above-mentioned step of removing the transparent substrate is to use one of light, laser, and heating methods to decompose the adhesion The molecular structure of the layer makes it lose 第25頁 200409324 六、申請專利範圍 黏性,以移除該透明底材。 2 2 .如申請專利範圍第1 5項之形成高密度多晶片模組的方 法,其中上述之移除該黏結層的步驟是利用雷射、電漿蝕 刻(Plasma Etching)、及剝膜(Stripping)其中之一 ,以移除該黏結層。Page 25 200409324 6. Scope of patent application Viscosity to remove the transparent substrate. 2 2. The method for forming a high-density multi-chip module according to item 15 of the scope of patent application, wherein the above steps for removing the adhesive layer are using laser, plasma etching, and stripping. ) To remove the adhesive layer. 第26頁Page 26
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