TW197534B - - Google Patents
Info
- Publication number
- TW197534B TW197534B TW081101322A TW81101322A TW197534B TW 197534 B TW197534 B TW 197534B TW 081101322 A TW081101322 A TW 081101322A TW 81101322 A TW81101322 A TW 81101322A TW 197534 B TW197534 B TW 197534B
- Authority
- TW
- Taiwan
- Prior art keywords
- anode
- cathode
- cell
- configuration
- strip
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Electrolytic Production Of Metals (AREA)
- Bipolar Transistors (AREA)
- Inert Electrodes (AREA)
- Primary Cells (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US67298191A | 1991-03-21 | 1991-03-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW197534B true TW197534B (fr) | 1993-01-01 |
Family
ID=24700825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW081101322A TW197534B (fr) | 1991-03-21 | 1992-02-22 |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0504939B1 (fr) |
JP (1) | JPH0647758B2 (fr) |
KR (1) | KR100249115B1 (fr) |
AT (1) | ATE141962T1 (fr) |
CA (1) | CA2062089A1 (fr) |
DE (1) | DE69213060T2 (fr) |
TW (1) | TW197534B (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102239281A (zh) * | 2008-12-08 | 2011-11-09 | 株式会社昭和 | 电解用电极 |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2714395B1 (fr) * | 1993-12-28 | 1996-04-05 | Lorraine Laminage | Anode soluble pour dispositif d'électrodéposition. |
JPH07316861A (ja) * | 1994-05-24 | 1995-12-05 | Permelec Electrode Ltd | 電極構造体 |
JP3606932B2 (ja) * | 1994-12-30 | 2005-01-05 | 石福金属興業株式会社 | 電解用複合電極 |
TW318320B (fr) * | 1995-08-07 | 1997-10-21 | Eltech Systems Corp | |
WO1998017845A1 (fr) * | 1996-10-24 | 1998-04-30 | Ishifuku Metal Industry Co., Ltd. | Electrolyseur |
JPH11302900A (ja) * | 1998-04-17 | 1999-11-02 | Ishifuku Metal Ind Co Ltd | 電解装置及びその組立て方法 |
JP3261582B2 (ja) * | 2000-02-04 | 2002-03-04 | 株式会社三船鉄工所 | 電解銅箔の製造装置 |
US6585846B1 (en) * | 2000-11-22 | 2003-07-01 | 3M Innovative Properties Company | Rotary converting apparatus and method for laminated products and packaging |
JP4858666B2 (ja) * | 2001-09-27 | 2012-01-18 | Tdk株式会社 | 電極装置 |
DE10235117B3 (de) * | 2002-08-01 | 2004-02-12 | EISENMANN Maschinenbau KG (Komplementär: Eisenmann-Stiftung) | Anlage zur kataphoretischen Tauchlackierung von Gegenständen |
AU2004272647A1 (en) * | 2003-09-16 | 2005-03-24 | Global Ionix Inc. | An electrolytic cell for removal of material from a solution |
JP4038194B2 (ja) * | 2004-03-03 | 2008-01-23 | 野▲崎▼工業株式会社 | 不溶性電極及びそれに使用される電極板並びにその使用方法 |
DE102004025669A1 (de) * | 2004-05-21 | 2005-12-15 | Diaccon Gmbh | Funktionelle CVD-Diamantschichten auf großflächigen Substraten |
US7494576B2 (en) * | 2004-08-26 | 2009-02-24 | General Electric Company | Electroplating apparatus and method for making an electroplating anode assembly |
WO2012043514A1 (fr) * | 2010-09-30 | 2012-04-05 | 株式会社シンク・ラボラトリー | Procédé et dispositif de placage de cylindre |
CN102321895B (zh) * | 2011-09-01 | 2013-10-23 | 西安航天动力机械厂 | 一种整体式阳极槽 |
JP7045840B2 (ja) * | 2017-12-08 | 2022-04-01 | 日鉄工材株式会社 | 金属箔製造装置及び電極板取付体 |
JP7005323B2 (ja) * | 2017-12-08 | 2022-01-21 | 日鉄工材株式会社 | 金属箔製造装置 |
CN110565138B (zh) * | 2019-09-06 | 2024-07-02 | 陕西汉和新材料科技有限公司 | 一种新型铜箔防氧化槽液下辊机制 |
WO2022164695A1 (fr) * | 2021-02-01 | 2022-08-04 | Lam Research Corporation | Plaque canalisée non uniforme sur le plan spatial et dimensionnel pour hydrodynamique personnalisée pendant une électrodéposition |
CN113529117B (zh) * | 2021-05-31 | 2022-12-06 | 宝鸡钛普锐斯钛阳极科技有限公司 | 一种电化学反应池 |
KR20230082190A (ko) * | 2021-12-01 | 2023-06-08 | 에이티엑스 주식회사 | 동박 제조장치 |
CN117926352B (zh) * | 2024-03-19 | 2024-06-14 | 江苏兴虹科技有限公司 | 一种铜箔加工用生箔分切一体设备 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA682872A (en) * | 1964-03-24 | A. Mcneill John | Apparatus for electroplating cylinders | |
US1881713A (en) * | 1928-12-03 | 1932-10-11 | Arthur K Laukel | Flexible and adjustable anode |
US3170699A (en) * | 1963-03-25 | 1965-02-23 | Sperry Rand Corp | Manure spreader |
US4340449A (en) * | 1977-10-11 | 1982-07-20 | Texas Instruments Incorporated | Method for selectively electroplating portions of articles |
US4318794A (en) * | 1980-11-17 | 1982-03-09 | Edward Adler | Anode for production of electrodeposited foil |
US5017275A (en) * | 1989-10-23 | 1991-05-21 | Eltech Systems Corporation | Electroplating cell anode |
-
1992
- 1992-02-22 TW TW081101322A patent/TW197534B/zh active
- 1992-02-28 CA CA002062089A patent/CA2062089A1/fr not_active Abandoned
- 1992-03-09 JP JP4050796A patent/JPH0647758B2/ja not_active Expired - Lifetime
- 1992-03-20 AT AT92104923T patent/ATE141962T1/de not_active IP Right Cessation
- 1992-03-20 EP EP92104923A patent/EP0504939B1/fr not_active Expired - Lifetime
- 1992-03-20 DE DE69213060T patent/DE69213060T2/de not_active Expired - Fee Related
- 1992-03-20 KR KR1019920004643A patent/KR100249115B1/ko not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102239281A (zh) * | 2008-12-08 | 2011-11-09 | 株式会社昭和 | 电解用电极 |
CN102239281B (zh) * | 2008-12-08 | 2014-08-20 | 株式会社昭和 | 电解用电极 |
Also Published As
Publication number | Publication date |
---|---|
EP0504939A2 (fr) | 1992-09-23 |
EP0504939A3 (en) | 1993-03-17 |
EP0504939B1 (fr) | 1996-08-28 |
JPH0647758B2 (ja) | 1994-06-22 |
DE69213060D1 (de) | 1996-10-02 |
DE69213060T2 (de) | 1997-01-23 |
KR100249115B1 (ko) | 2000-04-01 |
CA2062089A1 (fr) | 1992-09-22 |
ATE141962T1 (de) | 1996-09-15 |
KR920018247A (ko) | 1992-10-21 |
JPH04346697A (ja) | 1992-12-02 |
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