TH76171B - The recycling of the substrate of large photomasks - Google Patents

Abstract

DC60 (12/03/51) a substrate of a large photomask that has been used. Light-shielded pattern films can be recycled by (i) removing the protective film from the used substrate. To get the photodetector Mask that becomes stock of glass substrate (ii) resurfacing of glass substrate stock by sandblasting (iii) smoothing it. New stock of glass substrates that have been resurfaced to allow the stock of the reconstructed glass substrate (iv). The stock of the substrate that the glass was reconstructed. In order to obtain a newly formed photomask that becomes a blank, and (V) conducts the process of a light-blocking film. Within the inserted form Corresponding to the desired exposure of the original glass That produces a substrate of a newly formed photomask, a substrate of a larger photomask that has been used Light-shielded pattern films can be recycled by (i) removing the protective film from the used substrate. To get the photodetector Mask that becomes stock of glass substrate (ii) resurfacing of glass substrate stock by sandblasting (iii) smoothing it. New glass drive stock has been resurfaced to allow for the reconstructed glass drive stock (iv). The stock of the substrate that the glass was reconstructed. In order to obtain the newly created photomask that becomes a blank and (V), the operation of the blanc light-blocking film process. Within the inserted form Corresponding to the desired exposure of the original glass That contributes to the substrates of the photomask that has been reconstructed

Claims (8)

Disclaimer (all) which will not appear on the advertisement page: Amendment 20/05/2020 Claims None -------------------------------------------------- -------------------------------------------------- 1. Method of recycling the substrate of large photomasks. It consists of a procedure of: (i) Removing a light-blocking film from a substrate of a used large photomask to obtain a large photomask. (Ii) Renovation of the glass substrate stock, which has become a glass substrate stock for reuse. By using the tools used in the process Sandblasting (iii) smoothing of glass substrate stock That has been resurfaced to get stock Of a glass substrate (Iv) A light-blocking film is applied to the stock of the glass substrate. It was reconstituted to obtain a large, reconstructed photomask that turned into a blank, and (v) performed the process of a film that shielded the light of the blank within a consistent pattern. The desired exposure of the prototype glass Causing the substrate of photomasks Rebuilt 2. Claim Method 1 where the stock of the glass substrate resulting from step (i) is diagonal length. The minimum is 500 mm and the minimum thickness is 3 mm. 3. Claim method 2, where the substrate of the newly formed photomask. It is used in the process of lightening the prototype glass that includes substrates of newly created photomasks with opposite sides. The device of exposure Through the lining of the opposite edge Alignment of the prototype glass of the substrate of the reconstructed photomask. That is arranged as a side substrate that is arranged in a row, or Color filter side In the TET liquid crystal plate and the light from the photometric apparatus to the prototype glass through the substrate of the reconstituted photomask, the procedure (ii) of the resurfacing is as follows. say By sandblasting consists of the process of Processed large photomasks that become stock of glass substrates with front and back surfaces and the length of their diagonals. The minimum is 500 mm and the thickness is at least 3 mm by removing it from it (1) the volume removal that causes the flat surface of the Material depending on the height data of the flattening and parallelism of the front and back surfaces of Stock of a large glass substrate in a vertical orientation. Combined with the volume removal of the bending material Correct distortion, through sandblasting Removal of modified quantities, correcting distortion The calculation is made from (2) the stock deviation of the glass substrate by its own weight in the horizontal orientation, calculated from the stock thickness and size. The bosom of a glass substrate And the position of the support when the sub The stret of the newly formed photomask Supported horizontally (3) the distortion of the photomask substrate Rebuilt This is achieved by the shunt port of the photomask substrate when the substrate of the photomask is reconstructed. It is coupled to the apparatus of the use of light, and (4) the precise deformation of the rubber ball for the prototype glass support. To be exposed to light A large glass substrate that has been reconstituted. As a result of the stock of the glass substrate it has the bow-like shape in the cross section where the surface is opposite to the prototype glass, ie, concave when held vertically. And reduce the change in the closeness of the gap Between the prototype glass And a substrate of the newly created photomask Which is mounted horizontally When the opposite edge of Substrate of the newly created photomask It can be supported in the equipment of the exposure. 4. Method of claim 1,2 or 3 where the amount of material removed in the (ii) and (iii) steps is at least 20 (formula) from the front and side surfaces. Behind the photo Large mask That becomes a stock of glass substrates So that it can be rebuilt 5. Any one of the 1 to 4 claim methods where the smoothing process (iii) will include the first smoothing. And smoothing it 2nd time 6. Method of claim 5 where the process of smoothing it first Will use the slurry used in Smoothing it Containing cerium oxide 7. Method of Claim 5 or 6 Where the 2nd smoothing process is used to smooth the surface with serium oxy or slurry. Colloidal chilica 8. Any method of claim 1 to 7 where the photomask substrate is The newly created substrate has a consistent surface profile with a surface flatness / diagonal length of 4.8x10-5 in a horizontal orientation.