TW201527789A - Antiglare film - Google Patents

Abstract

This invention provides an antiglare film which exhibits excellent antiglare properties over a wide range of view angles even with a low haze. The antiglare film is capable of sufficiently suppressing the occurrence of the phenomena of whitening and glare, when used on an image display device. The antiglare film contains a transparent supporting member and an antiglare layer formed on the transparent supporting member, the antiglare layer having a surface with fine undulations, a total haze of 0.1% or more to 3% or less, a surface haze of 0.1% or more to 2% or less, have an average inclination angle of 0.2 degrees or more to 1.2 degrees or less and the inclination angle has a standard deviation of 0.1 degrees or more to 0.8 degrees or less. The abovesaid surface undulations have an intensity of the power spectrum of I(0.01), I(0.02) and I(0.1) or space frequency 0.01[mu]m<SP>-1</SP> at space frequency 0.02[mu]m<SP>-1</SP> and space frequency 0.1[mu]m<SP>-1</SP> at a set elevation of the abovesaid surface undulations within the respective predetermined range.

Description

Anti-glare film

The present invention relates to a film excellent in anti-glare.

Image display devices such as liquid crystal displays, plasma display panels, Braun tubes (CRT) displays, and organic electroluminescent (EL) displays are designed to avoid identification due to external light mapping on their display surfaces. The performance is deteriorated, so an anti-glare film is disposed on the display surface.

As for the anti-glare film, a transparent film having a surface uneven shape is mainly studied. Such an anti-glare film exhibits anti-glare property by scattering the external light by the surface unevenness and reducing the mapping by (outer light scattering light). However, when the external light scatters light, the display surface of the image display device may all become white, or the turbid color may be displayed, that is, so-called "discoloration" occurs. Further, the pixels of the image display device may interfere with the surface unevenness of the anti-glare film to cause a luminance distribution to be difficult to recognize, that is, so-called "glare" is also generated. For the above reasons, it is desired to ensure excellent anti-glare properties in the anti-glare film, and to prevent the occurrence of "whitening" and "glare".

As such an anti-glare film, for example, disclosed in Patent Document 1 An anti-glare film which is an anti-glare film which does not generate glare when fully disposed on a high-definition image display device and which sufficiently prevents whitening from occurring, forms a fine surface uneven shape on the transparent substrate, and the surface The average length PSm of an arbitrary profile curve of the uneven shape is 12 μm or less, and the ratio Pa/PSm of the arithmetic mean height Pa to the average length PSm of the cross-sectional curve is 0.005 or more and 0.012 or less, and the inclination angle of the surface uneven shape is 2 The ratio of the surface below ° is 50% or less, and the ratio of the surface having the inclination angle of 6 or less is 90% or more.

In the anti-foam film disclosed in Patent Document 1, since the average length PSm of an arbitrary cross-sectional curve is extremely small, the glare can be effectively suppressed by eliminating the surface unevenness shape having a period of about 50 μm which is likely to cause glare. However, in the anti-glare film disclosed in Patent Document 1, if the haze is to be reduced (if a low haze is to be formed), when the display surface of the image display device in which the anti-glare film is disposed is observed from an oblique direction, there is anti-glare Sexual reduction. Therefore, in the anti-glare film disclosed in Patent Document 1, there is still room for improvement in the point of preventing the glare of the wide viewing angle.

Prior technical literature Patent literature

Patent Document 1: Japanese Laid-Open Patent Publication No. 2007-187952

An object of the present invention is to provide an anti-glare film which has excellent anti-glare properties even at a low viewing angle even at a low haze. The occurrence of whitening and glare can be sufficiently suppressed in the image display device.

The inventors of the present invention have completed the present invention in order to solve the above problems and to concentrate on the results of the research. That is, the anti-foam film of the present invention is provided with a transparent support and an anti-glare film having an anti-glare layer having a fine surface uneven shape formed thereon; wherein the total haze of the anti-foam film is 0.1% or more 3% or less; surface haze is 0.1% or more and 2% or less; the average value of the inclination angle of the surface uneven shape is 0.2° or more and 1.2° or less, and the standard deviation of the inclination angle is 0.1° or more and 0.8° or less. The power spectrum of the elevation satisfies all of the following conditions (1) to (3): (1) the spatial frequency of 0.01 μm ^-1 of the intensity I (0.01) is 2 μm ⁴ or more and 10 μm ⁴ or less; (2) the spatial frequency of 0.02 μm ^-1 the intensity I (0.02) of 0.1μm ⁴ less than 1.5μm ^4; and (3) the spatial frequency of the intensity I 0.1μm ^-1 (0.1) is more than 0.01μm ⁴ 0.0001μm ⁴ or less.

Furthermore, in the anti-glare film of the present invention, it is preferable to use the following five kinds of optical combs having a dark portion and a bright portion having widths of 0.125 mm, 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm, respectively. Degree and Tc are more than 375%; using four kinds of optical combs with dark and bright portions of 0.25mm, 0.5mm, 1.0mm and 2.0mm, respectively, the reflection is measured at an incident angle of light of 45° The degree of refraction and Rc(45) are less than 180%; the four kinds of optical combs with the width of the dark portion and the bright portion are 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm, respectively, and the reflection is determined by the incident angle of light of 60°. The degree of Rc (60) is 240% or less.

According to the present invention, it is possible to provide an anti-glare film which has sufficient anti-glare property even at a low viewing angle even when it is low in haze, and can sufficiently suppress the occurrence of whitening and glare when disposed in an image display device.

1‧‧‧Anti-glare film

2‧‧‧Micro bumps

3‧‧‧film projection surface

5‧‧‧Main normal direction

6‧‧‧Average normal vector

6a, 6b, 6c, 6d‧‧‧ normal vector

40‧‧‧Mold base for mold

41‧‧‧ Surface of the substrate for the mold after the first plating step and the polishing step (plating)

46‧‧‧First surface relief shape formed by etching treatment

50‧‧‧Photosensitive resin film

60‧‧‧ mask

70‧‧‧ Surface-concave surface after chrome plating

71‧‧‧Chromium plating

80‧‧‧Send rolls

81‧‧‧ Transparent support

83‧‧‧ coated area

86‧‧‧Active energy line irradiation device

87‧‧‧roll-shaped mould

88, 89‧‧‧ pinch roller

90‧‧‧ film winding device

Fig. 1 is a schematic view for explaining the inclination angle of the surface uneven shape of the anti-foam film.

Fig. 2 is a schematic view for explaining a method of measuring the inclination angle of the surface uneven shape of the anti-foam film.

Fig. 3 is a view for simply explaining the elevation of the surface unevenness of the anti-foam film.

Fig. 4 is a view showing a state in which the elevation of the surface uneven shape of the anti-foam film is discretely obtained.

Fig. 5 is a view showing a state in which a one-dimensional power spectrum is calculated from a two-dimensional power spectrum of an elevation of a surface uneven shape obtained as a discrete function.

Fig. 6 is a graph showing the dimensional power spectrum I(f) of one of the elevations of the surface relief shape of the anti-foam film with respect to the spatial frequency f.

Fig. 7 (a) to (e) are views showing a preferred example of a method of manufacturing a mold (first half).

Fig. 8 (a) to (c) are schematic views showing a preferred example of a method of manufacturing a mold (second half).

Fig. 9 is a schematic view showing a preferred example of a manufacturing apparatus used in the method for producing an anti-glare film of the present invention.

Fig. 10 is a schematic view showing a suitable preliminary hardening step in the method for producing an anti-glare film of the present invention.

Fig. 11 is a schematic view showing a unit cell for glare evaluation.

Fig. 12 is a schematic view showing a glare evaluation device.

Fig. 13 is a view showing a part of the pattern A used in the first to third embodiments and the comparative example 1.

Fig. 14 is a view showing a part of the pattern B used in Comparative Example 2.

Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings as needed, but the dimensions and the like of the drawings are of any size for ease of viewing.

The anti-glare film of the present invention is characterized in that the average value of the inclination angle of the surface uneven shape is 0.2° or more and 1.2° or less, and the standard deviation of the inclination angle is 0.1° or more and 0.8° or less, and the power spectrum of the elevation of the surface uneven shape is The intensity I of the spatial frequencies of 0.01 μm ^-1 , 0.02 μm ^-1 , and 0.1 μm ^-1 is within the above range.

First, regarding the anti-glare film of the present invention, the average value and standard deviation of the tilt angle, and the power of the elevation of the surface uneven shape will be described. The method of obtaining the spectrum.

[Average and standard deviation of the tilt angle]

The method of obtaining the average value of the inclination angle and the standard deviation will be described.

The present inventors have found that the surface unevenness shape of the anti-foam film exhibits a specific oblique angle distribution, and it is extremely effective to obtain an image display apparatus having excellent anti-glare property and effectively preventing whitening. In other words, the average value of the inclination angle of the surface unevenness of the anti-glare film of the present invention is 0.2 or more and 1.2 or less, and the standard deviation of the inclination angle is 0.1 or more and 0.8 or less. When the average value of the inclination angle is less than 0.2°, the unevenness of the surface uneven shape becomes a slightly flat surface, and sufficient anti-glare performance cannot be exhibited. When the average value of the inclination angle of the surface uneven shape is higher than 1.2°, the image display device having such an anti-glare film is liable to be whitened because the inclination angle thereof becomes steep and the light from the surroundings is easily collected. Further, when the standard deviation of the inclination angle is less than 0.1, the surface unevenness shape becomes uniform, and sufficient anti-glare performance may not be exhibited. When the standard deviation of the inclination angle is higher than 0.8°, even if the average value is within a specific range, the surface uneven shape has a steep angle, and the image display device having such an anti-glare film is liable to be whitened.

The term "inclination angle of the surface uneven shape" as used in the present invention means an angle P formed at an arbitrary point P on the surface of the anti-glare film 1 shown in Fig. 1, and a local normal line 6 is formed in the main normal direction 5 of the film. . The angle formed by the local normal 6 is somewhat affected by the unevenness of the point P. The inclination angle of the surface uneven shape can be obtained from three-dimensional information of the surface shape measured by a confocal microscope, a dry microscope, an atomic force microscope (AFM) or the like.

Fig. 2 is a schematic view for explaining a method of measuring the inclination angle of the surface uneven shape. When the method of determining the specific tilt angle is described, as shown in FIG. 2, the eye point A on the virtual plane FGHI indicated by the dotted line is determined, and the vicinity of the eye point A on the x-axis passing there is relative to Point A, points B and D are obtained approximately symmetrically, and points C and E are obtained approximately symmetrically with respect to point A in the vicinity of eye point A on the y-axis of point A, and the points corresponding thereto are determined. Points Q, R, S, and T on the film faces of B, C, D, and E. Further, in Fig. 2, (x, y) indicates the orthogonal coordinates in the film plane, and z indicates the coordinates in the film thickness direction. The plane FGHI is a straight line parallel to the x-axis passing through the point C on the y-axis, and a straight line parallel to the x-axis passing through the point E on the y-axis, and parallel to the y-axis passing through the point B on the x-axis. The straight line and the surface formed by the intersections F, G, H, and I of the straight line parallel to the y axis parallel to the point D on the x-axis. Further, in Fig. 2, the position of the actual film surface is drawn upward with respect to the plane FGHI. However, depending on the position taken by the eye point A, of course, the position of the actual film surface may be in the plane FGHI. Above, and sometimes below.

Then, the inclination angle of the obtained surface shape data (surface shape data of the surface uneven shape) can be obtained by the point P corresponding to the actual film surface corresponding to the eye point A, and the 4 point B obtained corresponding to the vicinity thereof. , the total of Q, R, S, T on the actual film surface of C, D, E is 5 points, the open polygon 4 plane, that is, the normal vectors of the four triangles PQR, PRS, PST, PTQ 6a, 6b, 6c, and 6d are averaged, and the polar angle of the obtained average normal vector 6 is obtained. In this way, for each measurement point After taking the tilt angle, calculate the average and standard deviation of the tilt angle.

In order to set the average value of the inclination angle of the surface uneven shape to 0.2° or more and 1.2° or less, and to set the standard deviation of the inclination angle to 0.1° or more and 0.8° or less, the resin solution in which the fine particles are dispersed is applied to the transparent support. The method of exposing the fine particles to the surface of the coating film so that any irregularities are formed on the transparent support can be adjusted by adjusting the particle size and dispersion state of the fine particles and the film thickness of the coating film. Generally, when the particle size of the fine particles is constant, the average value of the tilt angle is lowered by increasing the film thickness of the coating film. Further, the dispersed state of the fine particles is good, that is, the fine particles are uniformly disposed on the transparent support, and the standard deviation of the inclination angle is small.

Further, in order to obtain a preferred method of the anti-foam film of the present invention to be described later, by adjusting the etching amount in the etching step and the plating thickness in the second plating step, an anti-foam film which satisfies the requirements of the present invention can be obtained. By reducing the amount of etching in the etching step or increasing the plating thickness of the second plating step, the average value and standard deviation of the tilt angle can be reduced.

[Power spectrum of the elevation of the surface irregular shape]

Hereinafter, the power spectrum of the elevation of the surface uneven shape of the anti-glare film will be described. Fig. 2 is a cross-sectional view schematically showing the surface of the anti-foam film of the present invention. As shown in FIG. 2, the anti-glare film 1 of the present invention has a transparent support 101 and an anti-glare layer 102 formed thereon, and the anti-dazzle layer 102 is provided with fine concavo-convex 2 on the opposite side to the transparent support 101. The surface has a concave and convex shape.

Here, the term "elevation of the surface uneven shape" as used in the present invention means any point P on the surface of the film 1, and a concave-convex shape on the surface. The linear distance of the main normal direction 5 (the normal direction of the virtual plane 103) of the film of the virtual plane 103 (the elevation is based on 0 μm) of the height among the average heights.

Actually, the anti-glare film is schematically shown in Fig. 1 and has an anti-glare layer in which fine irregularities are formed on a two-dimensional plane. Therefore, the elevation of the surface relief shape is as shown in Fig. 1. When the orthogonal coordinates in the plane of the film are represented by (x, y), it can be expressed as a two-dimensional function h(x, y) of coordinates (x, y). .

The elevation of the surface concavo-convex shape can be obtained from three-dimensional information of the surface shape measured by a confocal microscope, a dry microscope, an atomic force microscope (AFM) or the like. The horizontal resolution required for the measuring machine is at least 5 μm or less, preferably 2 μm or less, and the vertical resolution is at least 0.1 μm or less, preferably 0.01 μm or less. The non-contact three-dimensional surface shape and the thickness measuring machine suitable for the measurement are, for example, New View 5000 series (manufactured by Zygo Corporation), three-dimensional microscope PL μ 2300 (manufactured by Sensofar Co., Ltd.), and the like. The resolution of the power spectrum of the elevation must be 0.005 μm ^-1 or less, so the measurement area is preferably at least 200 μm × 200 μm, more preferably 500 μm × 500 μm or more.

Next, a method of obtaining the power spectrum of the elevation from the two-dimensional function h(x, y) will be described. First, the two-dimensional function H(f _x , f _y ) is obtained from the two-dimensional function h(x, y) according to the two-dimensional Fourier transform defined by the equation (1).

Here, f _x and f _y are frequencies in the x direction and the y direction, respectively, and have a dimension of the inverse of the length. Further, in the formula (1), the π is a pi, and i is an imaginary unit. By squaring the absolute value of the obtained two-dimensional function H(f _x , f _y ), the two-dimensional power spectrum I(f _x , f _y ) can be obtained according to the equation (2).

I ( f _x , f _y )=| H ( f _x , f _y )| ² (2)

This two-dimensional power spectrum I(f _x , f _y ) represents the spatial frequency distribution of the surface uneven shape of the anti-foam film. The anti-glare film is isotropic, so the two-dimensional function I(f _x , f _y ) representing the two-dimensional power spectrum of the elevation of the surface concavo-convex shape can depend only on the distance f from the origin (0, 0). The dimension function I(f) is represented. Next, a method of obtaining the one-dimensional function I(f) from the two-dimensional function I(f _x , f _y ) is shown. First, the two-dimensional function I(f _x , f _y ) of the two-dimensional power spectrum of the elevation is expressed by polar coordinates according to equation (3).

I ( f _x , f _y )= I ( f cos θ , f sin θ )...(3)

Here, θ is the declination in the Fourier space. The one-dimensional function I(f) can be obtained by calculating the rotation average of the two-dimensional function I (fcos θ , fsin θ ) represented by the polar coordinates according to the equation (4). The one-dimensional function I(f) is obtained from the rotational average of the two-dimensional function I(f _x , f _y ) as the two-dimensional power spectrum of the elevation, and is also referred to as a one-dimensional power spectrum I(f) hereinafter.

The anti-glare film of the present invention calculates the intensity I (0.01) of the spatial frequency of the one-dimensional power spectrum I(f) of 0.01 μm ^{-1 and} the intensity I of the spatial frequency of 0.02 μm ^-1 (0.02) from the elevation of the surface concavo-convex shape. And the intensity I (0.1) of the spatial frequency of 0.1 μm ^-1 is within a specific range.

Hereinafter, a method of obtaining a two-dimensional power spectrum of the elevation of the surface unevenness shape of the anti-foam film will be more specifically described. Actual measurement by the above-mentioned confocal microscope, dry microscope, atomic force microscope, etc. The three-dimensional information of the surface shape is generally a separate value, that is, obtained as an elevation corresponding to a plurality of measurement points. Fig. 4 is a view showing a state in which the function h(x, y) of the elevation is discretely obtained. As shown in Fig. 4, the orthogonal coordinates in the plane of the film are indicated by (x, y), and are indicated by broken lines on the film projection surface 3 every Δx line in the x-axis direction and Δy in the y-axis direction. In the actual measurement, the elevation of the surface uneven shape is obtained by the discrete elevation value of each area Δx × Δy divided by each broken line on the film projection surface 3.

The number of the obtained elevation values is determined according to the measurement range and Δx and Δy. As shown in Fig. 4, the measurement range in the x-axis direction is X=MΔx, and the measurement range in the y-axis direction is set. For Y = N Δy, the number of the obtained elevation values is M × N.

As shown in Fig. 4, the coordinates of the eye point A on the film projection surface 3 are (m Δx, n Δy) (where m is 0 or more and M-1 or less, and n is 0 or more and N-1). Hereinafter, the elevation of the point P corresponding to the film surface of the eye point A can be expressed as h (m Δx, n Δy).

Here, the measurement intervals Δx and Δy depend on the horizontal analysis ability of the measuring device, and in order to accurately evaluate the surface unevenness shape, Δx and Δy are preferably 5 μm or less, more preferably 2 μm or less. Further, the measurement ranges X and Y are preferably 200 μm or more, and more preferably 500 μm or more, as described above.

In such an actual measurement, the function indicating the elevation of the surface uneven shape is obtained as a discrete function h(x, y) having M × N values. Therefore, the two-dimensional function H(f _x , f _y ) obtained by the two-dimensional Fourier transform of the two-dimensional function h(x, y) of the elevation of the surface concavo-convex shape is calculated by the discrete Fourier transform of the discrete equation (1) It is obtained as a discrete function as in the equation (5).

Here, j in the formula (5) is an integer of -M/2 or more and M/2 or less, and k is an integer of -N/2 or more and N/2 or less. Further, Δf _x and Δf _y are frequency intervals in the x direction and the y direction, respectively, and are defined by the formulas (6) and (7).

The two-dimensional power spectrum I(f _x , f _y ) is obtained by the square of the absolute value of the discrete function H(f _x , f _y ) obtained by the equation (5) as shown in the equation (8).

In the formula (8), when H (j Δf _x , k Δf _y )| ^{2 is} divided by MN Δx Δy, the actual measurement is performed, in order to make the integration range different depending on the measurement area. Standardization.

The two-dimensional power spectrum I(f _x , f _y ) obtained as a discrete function also represents the spatial frequency distribution of the surface relief shape of the anti-foam film. Moreover, the anti-glare film is isotropic, so the two-dimensional discrete function I(f _x , f _y ) of the two-dimensional power spectrum indicating the elevation of the surface concavo-convex shape may also depend only on the distance from the origin (0, 0). f One-dimensional discrete function I(f) is represented. When the one-dimensional discrete function I(f) is obtained from the two-dimensional discrete function I(f _x , f _y ), the rotation average can be calculated as well as the equation (4). The discrete averaging of the two-dimensional discrete function I(f _x , f _y ) can be calculated by equation (9).

Here, when M≧N, 1 is an integer of 0 or more and N/2 or less, and when M<N, 1 is an integer of 0 or more and M/2 or less. Further, Δf is the interval between the distances from the origin, and is Δf = (Δf _x + Δf _y )/2. Further, θ(x) is a Heaviside function defined by the formula (10), and the distance from the origin of the f _jk system (j, k) can be calculated according to the formula (11).

The calculation shown in the equation (9) will be explained using Fig. 5. The function Θ(f _jk -(1-1/2) Δf) is 0 when f _jk is less than (1-1/2) Δf, and is greater than (1-1/2) Δf. 1. The function Θ(f _jk -(1+1/2) Δf) is 0 when f _jk is less than (1+1/2) Δf, and is above (1+1/2) Δf. When the time is 1, the θ(f _jk -(1-1/2)Δf)-θ(f _jk -(1+1/2)Δf) of the equation (9) is only (1 in f _jk ) 1/2) Δf or more, 1 when it is less than (1-1/2) Δf, and 0 when it is not. Here, f _{jk is} the distance from the origin O (f _x =0, f _y =0) in the frequency space, so the denominator of equation (9) calculates the distance f _jk from the origin O as (1) - 1/2) The number of all points (the point of the black circle in Fig. 5) of Δf or more and less than (1 + 1/2) Δf. Further, the molecular formula of the formula (9) calculates I (f _x ) at a point where the distance f _jk from the origin O is (1-1/2) Δf or more and does not reach (1 + 1/2) Δf. , the total value of f _y ) (the total value of I(f _x , f _y ) in the point of the black circle in Fig. 5).

Generally, one-dimensional power spectrum system is obtained according to the above method and contains the measurement information. Here, when the one-dimensional power spectrum is obtained, in order to remove the influence of the signal, it is preferable to measure the elevation of the surface unevenness at a plurality of points on the anti-foam film, and use the elevation from the individual surface uneven shape. The average of the one-dimensional power spectrum is taken as the one-dimensional power spectrum I(f). The number of the surface unevenness on the anti-glare film is preferably 3 or more, more preferably 5 or more.

Fig. 6 is a view showing I(f) of one-dimensional power spectrum of the surface uneven shape elevation obtained in this manner. The one-dimensional power spectrum I(f) of Fig. 6 is obtained by averaging one-dimensional power spectrum from the elevation of the surface concavo-convex shape at five different points on the anti-glare film.

The anti-glare film of the present invention is calculated from the elevation of the surface concavo-convex shape, and the spatial frequency of the one-dimensional power spectrum I(f) is 0.01 μm ^{-1 and} the intensity I (0.01) is 2 μm ⁴ or more and 10 μm ⁴ or less, and the spatial frequency is 0.02 μm ^- intensity I (0.02) of ¹ to 0.1μm ⁴ less than 1.5μm ^4, the spatial frequency of the intensity I 0.1μm ^-1 (0.1) is more than 0.01μm ⁴ 0.0001μm ⁴ or less. Here, the one-dimensional power spectrum I(f) is obtained as a discrete function, so that the intensity I(f ₁ ) in the specific spatial frequency f ₁ is calculated by interpolation as shown in the equation (12). .

The anti-glare film of the present invention is obtained by multiplying the intensity of the specific spatial frequency described above by a specific range, and by multiplying the haze of the later-described haze and the average of the inclination angles of the surface concavo-convex shapes described above. Good prevention of whitening and glare, showing excellent anti-glare. In order to exhibit such an effect, the strength I (0.01) is preferably 2.5 μm ⁴ or more and 9 μm ⁴ or less, more preferably 3 μm ⁴ or more and 8 μm ⁴ or less. Similarly, the intensity I (0.02) is preferably 0.2 μm ⁴ or more and 1.2 μm ⁴ or less, more preferably 0.25 μm ⁴ or more and 1 μm ⁴ or less, and the strength I (0.1) is preferably 0.0003 μm ⁴ or more and 0.0075 μm ⁴ or less, more preferably based 0.0005μm ⁴ less than 0.005μm ^4.

When I (0.01) is less than the above range, the wave having a period of about 100 μm (the spatial frequency corresponds to 0.01 μm ^-1 ) which is excellent in the anti-glare effect when the anti-foam film is observed from the oblique direction is small, and the anti-glare property is insufficient. When I (0.01) is higher than the above range, the wave of the period of about 100 μm becomes too large, the fine unevenness of the anti-foam film becomes thick, and the haze tends to increase, which is not preferable.

When I (0.02) is less than the above range, the wave having a period of about 50 μm (the spatial frequency corresponds to 0.02 μm ^-1 ) which is excellent in the anti-glare effect when the anti-foam film is observed from the front side is small, and the anti-glare property is insufficient. When I (0.02) is higher than the above range, the wave of the period of about 50 μm becomes too large to generate glare.

When I (0.1) is lower than the above range, the short-period shape of a short period of about 10 μm (the spatial frequency corresponds to 0.1 μm ^-1 ) is very small, and the surface uneven shape of the anti-foam film is formed only by the long-period concave-convex shape, and the anti-glare is formed. The surface texture of the film becomes thick, so it is not good. When I (0.1) is higher than the above range, scattering due to the surface unevenness of a short period of about 10 μm becomes strong, and whitening also occurs.

[Total haze, surface haze]

The anti-foaming film of the present invention has a surface haze of 0.1% or more and 2% or less in order to exhibit anti-glare property and prevent whitening, and the total haze of normal incident light is in a range of 0.1% or more and 3% or less. The total haze of the anti-foam film can be measured by a method according to the method shown in JIS K7136. An image display device equipped with an anti-glare film having a total haze or a surface haze of less than 0.1% is not preferable because sufficient anti-glare property cannot be exhibited. Further, when the total haze exceeds 3%, or when the surface haze exceeds 2%, the anti-glare film is whitened due to the image display device in which the anti-glare film is disposed, which is not preferable. Moreover, such an image display device has a lack of contrast in its comparison.

It is preferred that the internal haze obtained by subtracting the surface haze from the total haze is low. Specifically, it is preferably 2.5% or less. An image display device equipped with an anti-glare film having an internal haze of more than 2.5% has a tendency to decrease in contrast.

[Penetration sharpness Tc, reflection sharpness Rc (45), and reflection sharpness Rc (60)]

The antifoaming film of the present invention preferably has a penetration clarity and a Tc of 375% or more as determined by the following measurement conditions. The penetration sharpness and the Tc were calculated by measuring the image sharpness using the optical comb of a predetermined width according to the method of JIS K7105. Specifically, five types of optical combs having a ratio of the width of the dark portion to the bright portion of 1:1 and having a width of 0.125 mm, 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm are used to determine the image sharpness, and the sum thereof is obtained. As Tc. An anti-glare film having a Tc of less than 375% is sometimes prone to glare when disposed in a higher-definition image display device. The upper limit of Tc is selected to be in the range of 500% or less of the maximum value. However, when the Tc is too high, an image display device which is easily reduced in anti-glare from the front is obtained, and thus For example, 450% or less is preferred.

The anti-foam film of the present invention preferably has a reflection definition Rc (45) measured by incident light having an incident angle of 45° of 180% or less. The reflection sharpness Rc (45) is the same as the above Tc, and is measured by the method according to JIS K7105, and four kinds of opticals having widths of 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm are used among the five types of optical combs. Comb, the image sharpness is determined separately, and the sum is taken as Rc (45). When the Rc (45) is 180% or less, the image display device in which such an anti-glare film is disposed is preferable because it has better anti-glare property when viewed from the front side and the oblique direction. The lower limit of Rc (45) is not particularly limited, but is preferably 80% or more in order to satisfactorily suppress the occurrence of whitening or glare.

The anti-glare film of the present invention preferably has a reflection resolution Rc (60) of 240% or less measured by incident light having an incident angle of 60°. The reflection definition Rc (60) is measured by a method according to JIS K7105 in the same manner as the reflection definition Rc (45) except that the incident angle is changed. When the Rc (60) is 240% or less, the image display device in which such an anti-foam film is disposed is preferable because it has better anti-glare property when viewed from an oblique direction. The lower limit of Rc (60) is not particularly limited, but is preferably 150% or more in order to suppress the occurrence of whitening glare more satisfactorily.

[Method for Producing Anti-Fans Film of the Present Invention]

The anti-glare film of the present invention is produced, for example, in the following manner. In the first method, a fine unevenness forming mold which has been formed on the forming surface in accordance with the surface unevenness of the specified pattern is prepared, and the shape of the uneven surface of the mold is transferred to the transparent support, and the shape in which the uneven surface is transferred is transparent. A method of peeling a support from a mold. The second method is to prepare a microparticle, a resin (adhesive), and a solvent, and such a fine particle is dispersed in a composition of a resin solution, and the composition is applied onto a transparent support, and dried as needed to cure the formed coating film (coating film containing fine particles) . In the second method, the coating film thickness and the aggregation state of the fine particles are adjusted by the composition of the composition, the drying conditions of the coating film, and the like so that the fine particles are exposed on the surface of the coating film to cause irregularities. The unevenness is formed on the transparent support. From the viewpoint of production stability and production reproducibility of the anti-foam film, it is preferred to produce the anti-foam film of the present invention by the first method.

Here, a preferred first method as a method for producing an anti-glare film of the present invention will be described in detail.

In order to form an anti-glare layer having a surface unevenness shape having the above-described characteristics with high precision, a mold for forming a fine unevenness (hereinafter sometimes referred to simply as a "mold") is important. More specifically, the surface uneven shape (hereinafter sometimes referred to as "mold uneven surface") of the mold is formed according to a specified pattern, which is preferably a spatial frequency of a one-dimensional power spectrum of 0.01 μm ^{- The ratio} Γ(0.01) of the strength Γ(0.01) of ^{1 to} the intensity Γ(0.02) of the spatial frequency 0.02 μm ^-1 is 0.02 (0.02) / Γ (0.01) is 0.05 or more and 1.2 or less, and the intensity Γ (0.01) of the spatial frequency of 0.01 μm ^-1 is The ratio Γ(0.1)/Γ(0.01) of the intensity Γ(0.1) of the spatial frequency of 0.1 μm ^-1 is 4 or more and 25 or less. Here, the "pattern" refers to image data of a surface uneven shape for forming an anti-glare layer of the anti-glare film, a mask having a light transmitting portion and a light shielding portion, and the like, and is simply referred to as "pattern" hereinafter.

First, a method of setting a pattern of a surface uneven shape for forming an anti-glare layer of the anti-glare film of the present invention will be described.

A method of obtaining a two-dimensional power spectrum of a graphic, for example, when the graphic is image data. First, after the image data is converted into two-tone binarized image data, the hue is expressed by a two-dimensional function g(x, y). The obtained two-dimensional function g(x, y) is subjected to Fourier transform as in the following formula (13), and the two-dimensional function G(f _x , f _y ) is calculated as shown in the following formula (14), The square of the absolute value of the two-dimensional function G(f _x , f _y ) is obtained to obtain a two-dimensional power spectrum Γ(f _x , f _y ). Here, x and y represent orthogonal coordinates within the plane of the image data. Further, f _x and f _y represent frequencies in the x direction and the y direction, respectively, and have a dimension of the reciprocal of the length.

π in the formula (13) is a pi, and i is an imaginary unit.

Γ( f _x , f _y )=| G ( f _x , f _y )| ² (14)

The two-dimensional power spectrum f(f _x , f _y ) represents the spatial frequency distribution of the figure. In general, since the anti-foam film is required to be isotropic, the pattern for producing the anti-glare film of the present invention is also isotropic. Therefore, the two-dimensional function Γ(f _x , f _y ) representing the two-dimensional power spectrum of the figure can be expressed as a one-dimensional function Γ(f) depending only on the distance f from the origin (0, 0). Next, a method of obtaining the one-dimensional function Γ(f) from the two-dimensional function Γ(f _x , f _y ) will be described. First, the two-dimensional function Γ(f _x , f _y ) of the two-dimensional power spectrum as the hue of the pattern is expressed as a polar coordinate as in the equation (15).

Γ( f _x , f _y )=Γ( f cos θ , f sin θ )...(15)

Here, θ is the declination in the Fourier space. The one-dimensional function Γ(f) can be obtained by calculating the rotation average of the two-dimensional function Γ (fcos θ , fsins θ ) represented by the polar coordinates as in the equation (16). The one-dimensional function Γ(f) obtained from the rotational average of the two-dimensional function Γ(f _x , f _y ) of the two-dimensional power spectrum of the hue of the figure is also referred to as a one-dimensional power spectrum Γ(f) hereinafter.

In order to accurately obtain the anti-glare film of the present invention, the one-dimensional power spectral spatial frequency intensity pattern of Γ 0.01μm ^-1 (0.01) of the spatial frequency intensity 0.02μm ^-1 Γ (0.02) the ratio Γ (0.02) /Γ(0.01) is 0.05 or more and 1.2 or less, the spatial frequency of the intensity Γ 0.01μm ^-1 (0.01) and the spatial frequency of the intensity of 0.1μm ^-1 Γ (0.1) the ratio Γ (0.1) / Γ (0.01 ) of 4 or more 25 or less.

When the two-dimensional power spectrum of the graph is obtained, the two-dimensional function g(x, y) of the hue is usually obtained as a discrete function. In this case, the two-dimensional power spectrum can be calculated by discrete Fourier transform. The one-dimensional power spectrum of the graph is obtained by the two-dimensional power spectrum of the graph.

Moreover, in order to make the obtained surface uneven shape into a uniform and continuous curved surface, the average value of the two-dimensional function g(x, y) is the maximum value of the two-dimensional function g(x, y) and the two-dimensional function g(x, It is preferred that 30% to 70% of the difference between the minimum values of y). When the concave-convex surface of the mold is produced by the lithography method, the two-dimensional function g(x, y) becomes the aperture ratio of the pattern. When the embossed surface of the mold is manufactured by the lithography method, the aperture ratio of the pattern is first defined here. The aperture ratio when the photoresist used in the lithography method is a positive photoresist refers to the entire surface area of the coating film when the image data of the coating film of the positive photoresist is drawn. The ratio of the areas exposed. On the other hand, the aperture ratio when the photoresist used in the lithography method is a negative photoresist refers to the entire surface of the coating film when the image data is drawn on the coating film of the negative photoresist. The ratio of areas, areas that are not exposed. The lithography method is an aperture ratio at the time of exposure, and refers to a ratio of a light-transmitting portion of a mask having a light-transmitting portion and a light-shielding portion.

The anti-glare film of the present invention can produce a desired mold by making the intensity ratios of 一(0.02)/Γ(0.01) and Γ(0.1)/Γ(0.01) of the one-dimensional power spectrum of the pattern into the foregoing ranges, respectively. Manufactured using the first method of the mold.

In order to produce a pattern having such a power ratio to one-dimensional power spectrum, a pattern in which dots are arranged to be irregular, a random number, or a computer-generated similar random number is used to determine the shaded pattern having an irregular brightness distribution. (Preparation pattern), the component of the specific spatial frequency range is removed from the preliminary pattern. The removal of the components in the specific spatial frequency range may be performed by passing the preliminary pattern through a band pass filter.

In order to manufacture an anti-foam film having an anti-glare layer formed with a surface uneven shape according to a prescribed pattern, a mold having a mold uneven surface for transferring the surface uneven shape formed according to the designated pattern to the transparent support is manufactured. The first method of using such a mold is characterized in that embossing of an anti-glare layer is formed on a transparent support.

As the imprint method, a photoimprint method using a photocurable resin, a hot stamp method using a thermoplastic resin, or the like is exemplified. Among them, from the viewpoint of productivity, photoimprinting is preferred.

Photoimprinting on a transparent support (transparent support) A method of forming a photocurable resin layer and laminating the photocurable resin on the uneven surface of the mold of the mold, and transferring the shape of the uneven surface of the mold to the photocurable resin layer. Specifically, the photocurable resin layer formed of the photocurable resin is applied onto the transparent support, and the light is irradiated from the transparent support side in a state of being in close contact with the uneven surface of the mold (this light system can be used to harden the light). The photocurable resin (photocurable resin contained in the photocurable resin layer) is cured, and then a transparent support having a cured photocurable resin layer is peeled off from the mold. The anti-foam film obtained by such a production method has a photocurable resin layer after curing to form an anti-glare layer. In addition, it is preferable that the photocurable resin is an ultraviolet curable resin, and when the ultraviolet curable resin is used, ultraviolet light is used for the light to be irradiated (the ultraviolet curable resin is used as the photocurability). The resin imprint method is hereinafter referred to as "UV imprint method"). In order to manufacture an anti-foam film integrated with a polarizing film, a polarizing film is used as a transparent support, and in the imprint method described here, the transparent support may be replaced by a polarizing film.

The type of the ultraviolet curable resin to be used in the UV imprinting method is not particularly limited, and a commercially available resin can be suitably used depending on the type of the transparent support to be used and the type of ultraviolet rays. Such an ultraviolet curable resin includes a concept of a monomer (polyfunctional monomer), an oligomer, a polymer, and a mixture thereof which are photopolymerized by ultraviolet irradiation. In addition, it is possible to use a selected photoinitiator in accordance with the type of the ultraviolet curable resin, and it is also possible to use a resin which can be cured even if it is longer than the wavelength of ultraviolet light. The ultraviolet curable resin The description of the preferred examples and the like will be described later.

As the transparent support used in the UV imprint method, for example, glass, a plastic film, or the like can be used. As the plastic film, it can be used as long as it has moderate transparency and mechanical strength. Specifically, for example, cellulose acetate resin such as TAC (triethyl fluorenyl cellulose); acrylic resin; polycarbonate resin; polyester resin such as polyethylene terephthalate; polyethylene, poly A transparent resin film composed of a polyolefin resin such as propylene. The transparent resin film may be a solvent cast film or an extruded film.

The thickness of the transparent support is, for example, 10 to 500 μm, preferably 10 to 100 μm, more preferably 10 to 60 μm. When the thickness of the transparent support is within this range, an anti-foam film having sufficient mechanical strength tends to be obtained, and an image display device including the anti-foam film is more likely to cause glare.

On the other hand, the hot stamping method is a method in which a transparent resin film formed of a thermoplastic resin is heated, and the surface of the uneven surface of the mold is pressed against the uneven surface of the mold to be transferred to the transparent resin film in a softened state. The transparent resin film used in the hot stamping method may be substantially transparent, and specific examples thereof include an example of a transparent resin film used in the UV imprint method.

Next, a method of manufacturing a mold used in the imprint method will be described.

Regarding the manufacturing method of the mold, the forming surface of the mold is such that the surface uneven shape formed by the predetermined pattern can be transferred onto the transparent support (the surface uneven shape formed according to the specified pattern can be formed) The range of the uneven surface of the mold of the anti-glare layer is not particularly limited, and a lithography method is preferably used for producing the anti-dazzle layer having the surface unevenness with high precision and reproducibility. Furthermore, the lithography method preferably includes [1] a first plating step, [2] a polishing step, [3] a photosensitive resin film forming step, [4] an exposure step, a [5] developing step, and [ 6] an etching step, [7] a photosensitive resin film peeling step, and [8] a second plating step.

Fig. 7 is a view showing a preferred embodiment of the first half of the manufacturing method of the mold. Fig. 7 is a view showing a cross section of the mold of each step. Hereinafter, each step of the method for producing a mold for producing an anti-glare film according to the present invention will be described in detail with reference to Fig. 7.

[1] 1st plating step

First, a substrate (a substrate for a mold) used for mold production is prepared, and copper plating is applied to the surface of the substrate for the mold. In this way, by performing copper plating on the surface of the substrate for a mold, the adhesion and gloss of the chromium plating in the second plating step to be described later can be improved. Since the copper plating has high coating property and strong smoothing action, it can fill the fine unevenness, pores, and the like of the base material for the mold to form a flat and shiny surface. Therefore, in such a manner, copper plating is performed on the surface of the substrate for a mold, and in the second plating step to be described later, even if chrome plating is performed, chrome plating which is considered to be caused by fine irregularities and pores existing in the substrate is solved. The surface is rough, and the coating of copper plating is high, and the occurrence of fine cracks is lowered. Therefore, even if the surface unevenness shape (fine uneven surface shape) according to the predetermined pattern is formed on the molding surface of the base material for the mold, the influence of the surface of the base (substrate for the mold) such as fine unevenness, pores, and cracks can be sufficiently prevented. Caused by the misplacement.

As the copper used for the copper plating in the first plating step, a pure copper metal or an alloy containing copper as a main component (copper alloy) can be used. Therefore, the "copper" used in copper plating is a concept including copper and a copper alloy. The copper plating may be electrolytic plating or electroless plating, but the copper plating in the first plating step is preferably electrolytic plating. Further, the preferred plating layer in the first plating step may be formed not only by a copper plating layer but also by a copper plating layer and a plating layer made of a metal other than copper.

When the plating layer formed by copper plating on the surface of the substrate for a mold is too thin, the influence of the surface of the substrate (fine irregularities, pores, cracks, etc.) cannot be completely excluded, and the thickness thereof is preferably 50 μm or more. The upper limit of the thickness of the plating layer is not limited, and when it is considered to be a cost or the like, it is preferably about 500 μm or less.

The substrate for a mold is preferably a substrate composed of a metal material. Further, from the viewpoint of cost, aluminum, iron, or the like is preferable as the material of the metal material. Further, from the viewpoint of the convenience of the treatment of the substrate for a mold, a substrate composed of lightweight aluminum is particularly preferable as a substrate for a mold. Further, the aluminum and iron referred to herein are not necessarily pure metals, and may be an alloy mainly composed of aluminum or iron.

The shape of the substrate for a mold may be a shape suitable for the method for producing an anti-foam film according to the present invention. Specifically, it is selected from a flat substrate, a cylindrical substrate, or a cylindrical (roller) substrate. In the continuous production of the anti-glare film of the present invention, the mold is preferably in the form of a roll. Such a mold is produced from a roll-form substrate for a mold.

[2] Grinding step

Next, in the polishing step, the surface (plating layer) of the substrate for a mold which has been subjected to copper plating in the first plating step is polished. In the method for producing a mold used in the method for producing an anti-glare film of the present invention, it is preferred that the surface of the substrate for a mold is polished to a state close to the mirror surface through the polishing step. A commercially available product of a flat substrate or a roll-shaped base material used as a base material for a mold is often subjected to machining such as cutting or polishing in order to form a desired precision, thereby leaving a fine surface on the surface of the base material for a mold. Processing marks. Therefore, even if a plating layer (preferably copper plating) is formed by the first plating step, the above-described processing marks remain. Further, even if the plating in the first plating step is performed, the surface of the substrate for a mold may not be completely smooth. In other words, in the substrate for a mold in which the surface of such a deep processing mark or the like remains, even if the steps [3] to [8] described later are performed, the surface unevenness of the surface of the obtained mold may be based on the specified pattern. The surface irregularities are different, or include irregularities from processing marks and the like. When an anti-foam film is produced by using a mold having an influence of processing marks or the like, the optical characteristics such as anti-glare property cannot be sufficiently exhibited, which may cause unpredictable effects.

The polishing method to be applied in the polishing step is not particularly limited, and the polishing method is selected depending on the shape and properties of the substrate for the mold to be polished. Specific examples of the polishing method applicable to the polishing step include a mechanical polishing method, an electrolytic polishing method, and a chemical polishing method. Among these, as the mechanical polishing method, any of an ultrafine processing method, a lapping method, a fluid polishing method, and a buffing polishing method can be used. Further, in the polishing step, the surface of the substrate for the mold can be mirror-finished by mirror-cutting using a cutting tool. The material of the cutting tool in this case The quality/shape may be a hard drill, a CBN drill, a ceramic drill, a diamond drill or the like depending on the type of the material (metal material) of the base material for the mold, and it is preferable to use a diamond drill from the viewpoint of processing accuracy. The surface roughness after polishing is expressed by the center line average roughness Ra according to JIS B0601, and is preferably 0.1 μm or less, more preferably 0.05 μm or less. If the center line average roughness Ra after grinding is more than 0.1 μm, the influence of such surface roughness may remain on the uneven surface of the mold of the finally obtained mold. Further, the lower limit of the center line average roughness Ra is not particularly limited. Therefore, the lower limit may be determined from the viewpoint of the processing time (polishing time) of the polishing step and the processing cost.

[3] Photosensitive resin film forming step

Next, referring to Fig. 7, a photosensitive resin film forming step will be described.

In the photosensitive resin film forming step, a solution (photosensitive resin solution) in which a photosensitive resin is dissolved in a solvent is applied onto the surface 41 of the substrate 40 for a mirror which has been subjected to mirror polishing obtained by the above-described polishing step, A photosensitive resin film (photoresist film) is formed by heating/drying. Fig. 7 is a view schematically showing a state in which the photosensitive resin film 50 is formed on the surface 41 of the substrate 40 for a mold (Fig. 7(b)).

As the photosensitive resin, a conventionally known photosensitive resin can be used, and it can be used as it is commercially available as a photoresist or, if necessary, by filtration or the like. For example, as a negative photosensitive resin having a photosensitive portion hardening property, a monomer, a prepolymer, a double azide which is used for a (meth) acrylate having an acryl fluorenyl group or a methacryl fluorenyl group in a molecule can be used. A mixture with a diene rubber, a polyvinyl cinnamate compound, or the like. and Further, as the positive photosensitive resin having a property of eluting the photosensitive portion by development and leaving only the photosensitive portion, a phenol resin, a novolak or the like can be used. Such a positive or negative photosensitive resin can be easily obtained from the market in terms of positive photoresist and negative photoresist. Further, the photosensitive resin solution may be blended with various additives such as a sensitizer, a development accelerator, an adhesion modifier, and a coating improver as needed, and such additives may be mixed with a commercially available photoresist. Used as a photosensitive resin solution.

In order to apply the photosensitive resin solution to the surface 41 of the mold substrate 40, a more suitable solvent is formed on the smoother photosensitive resin film, and the photosensitive resin is dissolved/diluted in such a solvent. A photosensitive resin solution is preferred. Such a solvent is selected depending on the kind of the photosensitive resin and its solubility. Specifically, for example, it is selected from a cellosolve solvent, a propylene glycol solvent, an ester solvent, an alcohol solvent, a ketone solvent, a highly polar solvent, or the like. When a commercially available photoresist is used, an optimum photoresist is selected depending on the kind of the solvent contained in the photoresist or an appropriate preliminary test, and it is used as a photosensitive resin solution.

A method of applying a photosensitive resin solution to a mirror-polished surface of a substrate for a mold, from meniscus coating, fountain coating, dip coating, spin coating, roll coating, wire bar coating, air knife coating A conventional method such as cloth, doctor blade coating, curtain coating, or ring coating is selected depending on the shape of the substrate for the mold and the like. The thickness of the photosensitive resin film after application is preferably in the range of 1 to 10 μm after drying, and more preferably in the range of 6 to 9 μm.

[4] Exposure step

Next, the exposure step is a step of transferring the intended pattern to the photosensitive resin film 50 by exposing the photosensitive resin film 50 formed in the photosensitive resin film forming step. The light source used in the exposure step may be appropriately selected as long as it conforms to the photosensitive wavelength, sensitivity, and the like of the photosensitive resin contained in the photosensitive resin film. For example, a g-line (wavelength: 436 nm) and an h-line (wavelength) of a high-pressure mercury lamp can be used. : 405 nm) or i line (wavelength: 365 nm), semiconductor laser (wavelength: 830 nm, 532 nm, 488 nm, 405 nm, etc.), YAG laser (wavelength: 1064 nm), KrF excimer laser (wavelength: 248 nm), ArF Molecular laser (wavelength: 193 nm), F2 excimer laser (wavelength: 157 nm), and the like. The exposure mode may be a method in which the mask corresponding to the graphic of the purpose is used for exposure, or may be a drawing mode. Furthermore, the graph of the purpose is as described above, and the intensity ratios of the spatial frequencies of the one-dimensional power spectrum are Γ(0.02)/Γ(0.01) and Γ(0.1)/Γ(0.01), respectively, to a specific preferred range.

In the method for producing a mold, in order to accurately form the surface uneven shape of the mold, it is preferred that the intended pattern is exposed on the photosensitive resin film in a state of precise control. In order to expose in such a state, it is preferable to form the image of the object into image data on the computer, and the laser light emitted from the laser light controlled by the computer is drawn on the image according to the image data. On the resin film (laser drawing). For laser drawing, a general-purpose laser drawing device such as a printing plate can be used. As a commercial item of such a laser drawing device, for example, Laser Stream FX (manufactured by Think Laboratory) or the like.

Fig. 7(c) is a view schematically showing a state in which the pattern on the photosensitive resin film 50 is exposed. The photosensitive resin film 50 contains a negative photosensitive resin At the time (for example, when a negative photoresist is used as the photosensitive resin solution), the exposed region 51 receives the energy of the exposure to carry out the crosslinking reaction of the photosensitive resin, and the solubility in the developing solution to be described later is lowered. Therefore, in the developing step, the unexposed area 52 is dissolved by the developing liquid, and only the exposed area 51 remains on the surface of the substrate to become the mask 60. On the other hand, when the photosensitive resin film 50 contains a positive photosensitive resin (for example, when a positive photoresist is used as the photosensitive resin solution), exposure energy is received in the exposed region 51, and the bonding of the photosensitive resin is cut. It becomes easily soluble in the developing liquid mentioned later. Therefore, the exposed region 51 in the developing step is dissolved by the developing liquid, and only the unexposed region 52 remains on the surface of the substrate to become the mask 60.

[5] imaging steps

In the developing step, when the photosensitive resin film 50 contains the negative photosensitive resin, the unexposed region 52 is dissolved by the developing solution, and the exposed region 51 remains on the substrate for the mold to form the mask 60. On the other hand, when the photosensitive resin film 50 contains a positive photosensitive resin, only the exposed region 51 is dissolved by the developing liquid, and the unexposed region 52 remains on the substrate for the mold to form the mask 60. The predetermined pattern is formed into a base material for a mold of a photosensitive resin film, and the photosensitive resin film remaining on the substrate for a mold in the etching step acts as a mask in an etching step to be described later.

The developer used in the development step can be selected from conventional ones according to the type of photosensitive resin to be used. Examples of the developing solution include inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium citrate, sodium metasilicate, and aqueous ammonia; and amines such as ethylamine and n-propylamine; Amine, di-n-butylamine and other amines; triethylamine, methyldiethyl a tertiary amine such as a base amine; an alcohol amine such as dimethylethanolamine or triethanolamine; a tetra-ammonium compound such as tetramethylammonium hydroxide, tetraethylammonium hydroxide or trimethylhydroxyethylammonium hydroxide; An alkaline aqueous solution such as a cyclic amine such as piperidine, an organic solvent such as xylene or toluene, or the like.

The developing method in the developing step is not particularly limited, and immersion development, spray development, brush development, ultrasonic imaging, or the like can be used.

In Fig. 7(d), a state in which a negative type is used as a photosensitive resin and a development step is performed is schematically shown. In Fig. 7(d), the unexposed region 52 is dissolved by the image forming liquid, and only the exposed region 51 remains on the surface of the substrate, and the photosensitive resin film in this region serves as the mask 60. Fig. 7(e) is a view schematically showing a state in which a positive type is used as a photosensitive resin and a developing step is performed. The exposed region 51 in Fig. 7(e) is dissolved by the developing solution, and only the unexposed region 52 remains on the surface of the substrate, and the photosensitive resin film in this region serves as the mask 60.

[6] Etching step

In the etching step, a photosensitive resin film remaining on the surface of the substrate for a mold after the above-described developing step is used as a mask, and in the surface of the substrate for a mold, a plating layer in a region having no mask is mainly etched.

Fig. 8 is a view schematically showing a preferred example of the latter half of the method of manufacturing the mold. In Fig. 8(a), the etching step is mainly used to schematically show the state in which the plating layer in the region without the mask is etched. Since the plating layer on the lower portion of the mask 60 acts as the mask 60 by the photosensitive resin film, it is not etched, but etching is performed while etching from the unmasked region 45. Therefore, in the area with the mask 60 and the area without the mask 45 Near the boundary, the plating of the lower portion of the mask 60 is also etched. Thus, in the vicinity of the boundary of the region having the mask 60 and the region 45 without the mask, the case where the plating of the lower portion of the mask 60 is also etched is referred to as side etching.

In the etching treatment in the etching step, an etching solution such as ferric chloride (FeCl ₃ ) solution, copper chloride (CuCl ₂ ) solution, or alkali etching solution (Cu(NH ₃ ) ₄ Cl ₂ ) is usually used, and the surface of the substrate for the mold is used. This is mainly done by etching a plating layer (metal surface) of the region without the mask 60. As the etching treatment, a strong acid such as hydrochloric acid or sulfuric acid may be used as the etching liquid, and when the plating layer is formed by electrolytic plating, the etching treatment may be performed by reverse electrolytic etching which gives a potential opposite to that at the time of electrolytic plating. When the etching treatment is performed, the surface of the substrate for a mold has an uneven shape, and the material (metal material) of the substrate for the mold, the type of the plating layer, the type of the photosensitive resin film, and the type of etching treatment in the etching step, etc. The difference is not uniform. When the etching amount is 10 μm or less, the surface of the substrate for the mold which is in contact with the etching liquid is etched in approximately the same direction. The amount of etching referred to herein means the thickness of the plating layer which is etched and removed.

The etching amount in the etching step is preferably from 1 to 10 μm, more preferably from 1 to 6 μm, still more preferably from 1 to 3 μm. When the etching amount is less than 1 μm, the mold has almost no surface unevenness and a mold having a nearly flat surface. Therefore, even if the anti-foam film is produced using the mold, such an anti-foam film has almost no surface unevenness. In the image display device in which such an anti-glare film is disposed, sufficient anti-glare property is not exhibited. Further, when the amount of etching is too large, the uneven surface of the final obtained mold tends to be a large difference in height. Even if an anti-glare film is produced using the mold, the image display device including the anti-glare film may not sufficiently prevent the occurrence of whitening. The etching treatment in the etching step can be performed by one etching treatment or by two or more etching treatments. Here, when the etching treatment is performed twice or more, the total of the etching amounts in the etching treatment of two or more times is preferably 1 to 10 μm.

[7] Photosensitive resin film peeling step

Next, the photosensitive resin film peeling step is a step of removing the photosensitive resin film which acts as a mask 60 in the etching step and remains on the substrate for a mold, and it is preferable to completely remove the remaining mold in the mold by this step. A photosensitive resin film on a substrate. In the photosensitive resin film peeling step, it is preferred to dissolve the photosensitive resin film by using a peeling liquid. As the peeling liquid, those which are exemplified as the developing liquid and whose concentration, pH, and the like are changed can be used. Alternatively, in the same manner as the developing solution used in the developing step, the developing step may be performed by peeling off the photosensitive resin film by changing the temperature, the immersion time, or the like. In the photosensitive resin film peeling step, the contact method (peeling method) of the peeling liquid and the substrate for a mold is not particularly limited, and immersion peeling, spray peeling, brush peeling, ultrasonic peeling, or the like can be used.

Fig. 8(b) is a view schematically showing a state in which the photosensitive resin film is removed by the photosensitive resin film as the mask 60 in the etching step by the photosensitive resin film peeling step. The first surface uneven shape 46 is formed on the surface of the substrate for a mold by the mask 60 obtained by the photosensitive resin film and the etching treatment.

[8] 2nd plating step

The final stage of the mold manufacturing is the second plating of the surface of the substrate for the mold subjected to the steps [6] and [7] described above (preferably, the chromium plating described later). Plating step. By performing the second plating step, the surface uneven shape 46 of the mold base material is passivated, and the surface of the mold can be protected by the plating. Hereinafter, the surface uneven shape of the base material for a mold is referred to as "shape passivation". In the eighth surface (c), as described above, the chrome plating layer 71 is formed on the first surface uneven shape 46 formed by the etching treatment, and the state in which the surface uneven shape is passivated (the mold uneven surface 70) is displayed.

The plating layer formed by the second plating step preferably has a gloss, a high hardness, a small friction coefficient, and a good release property, and is preferably chrome plated. Among the chromium plating, it is called so-called gloss chrome plating, decorative chrome plating, etc., and chrome plating which exhibits good gloss is particularly preferable. Chromium plating is usually carried out by electrolysis, but as a plating bath, an aqueous solution containing anhydrous chromic acid (CrO ₃ ) and a small amount of sulfuric acid is used as a plating solution. The thickness of the chrome plating can be controlled by adjusting the current density and the electrolysis time.

In such a manner, the plating of the second plating step is preferably performed by chrome plating, and a mold for producing an anti-foam film of the present invention can be obtained. The surface unevenness shape of the surface of the substrate for a mold after the etching treatment can be passivated by chrome plating, and a mold having improved surface hardness can be obtained. The most important factor in controlling the degree of passivation at this time is the thickness of the chrome plating. If the thickness is thin, the degree of passivation of the shape becomes insufficient, and the anti-foam film obtained by using such a mold is liable to cause whitening. On the other hand, if the thickness of the chrome plating layer is too thick, the degree of passivation of the shape is too large, and the anti-foaming film obtained by using such a mold tends to have insufficient anti-glare property. The inventors of the present invention have found that the anti-glare film for obtaining an image display device which is excellent in preventing the occurrence of whitening and having excellent anti-glare property is formed by the thickness of the chrome plating layer. It is effective to manufacture the mold in a specific range. That is, the thickness of the chrome plating layer is preferably in the range of 3 to 10 μm, more preferably in the range of 4 to 8 μm.

The chrome plating layer formed in the second plating step is preferably formed so that the Vickers hardness is 800 or more, and more preferably 1000 or more. When the Vickers hardness of the chrome plating layer is less than 800, when the antiglare film is produced using a mold, the durability of the mold tends to be lowered.

Hereinafter, the above-described photoimprint method which is preferable as a method for producing the anti-glare film of the present invention will be described. As described above, the UV imprint method is particularly preferable as the photoimprint method, but the imprint method using the active energy ray-curable resin will be specifically described here.

In order to continuously manufacture the anti-foam film of the present invention, when the anti-foam film of the present invention is produced by photoimprinting, it preferably comprises the following steps: [P1] a coating step on a transparent support for continuous conveyance Applying a coating liquid containing an active energy ray-curable resin to form a coating layer; and [P2] a main curing step of illuminating the transparent support side in a state where the surface of the coating layer is pressed against the surface of the mold Active energy line.

Further, when the anti-foam film of the present invention is produced by photoimprinting, it is more preferable to include: [P3] preliminary hardening step after coating step [P1], before hardening step [P2], coating Both ends of the layer in the width direction are irradiated with active energy rays.

Hereinafter, each step will be described in detail with reference to the drawings. Fig. 9 is a schematic view showing a preferred example of a manufacturing apparatus used in the method for producing an anti-glare film of the present invention. The arrow in Figure 9 indicates the membrane The direction of transport or the direction of rotation of the roller.

[P1] Coating step

In the coating step, a coating liquid containing an active energy ray-curable resin is applied onto a transparent support to form a coating layer. In the coating step, for example, as shown in FIG. 9, a coating liquid containing an active energy ray-curable resin composition is applied to the transparent support 81 which is successively discharged from the delivery roller 80.

Coating of the coating liquid on the transparent support 81 can be performed, for example, by gravure coating method, micro gravure coating method, rod coating method, knife coating method, air knife coating method, conformal coating method, and mold coating. Bufa and so on.

(transparent support)

As long as the transparent support 81 is translucent, for example, glass, a plastic film, or the like can be used. As the plastic film, it is sufficient as long as it has moderate transparency and mechanical strength. Specifically, any of the transparent supports which have been used as the UV imprint method can be used, and in order to continuously manufacture the anti-foam film of the present invention by photoimprinting, a person having moderate flexibility is selected. .

Various surface treatments can be performed on the surface (coating layer side surface) of the transparent support 81 for the purpose of improving the coating property of the coating liquid and improving the adhesion between the transparent support and the coating layer. Examples of the surface treatment include corona discharge treatment, glow discharge treatment, acid surface treatment, alkali surface treatment, and ultraviolet irradiation treatment. Further, on the transparent support 81, for example, another layer such as a primer layer may be formed, and a coating liquid may be applied to the other layer.

Further, as the anti-glare film of the present invention, in order to improve the adhesion of the transparent support and the polarizing film when the integrated film is formed integrally with the polarizing film Preferably, the surface of the transparent support (the surface opposite to the coating layer) is hydrophilized by various surface treatments. This surface treatment can also be carried out after the manufacture of the anti-glare film.

(coating liquid)

The coating liquid contains an active energy ray-curable resin, and usually further contains a photopolymerization initiator (radical polymerization initiator). Various additives such as a light-transmitting fine particle, an organic solvent, a solvent, a leveling agent, a dispersing agent, an antistatic agent, an antifouling agent, and a surfactant may be contained as needed.

(1) Active energy ray-curable resin

As the active energy ray-curable resin, for example, a polyfunctional (meth) acrylate compound can be preferably used. The polyfunctional (meth) acrylate compound is a compound having at least two (meth) acryloxy groups in the molecule. Specific examples of the polyfunctional (meth) acrylate compound include, for example, an ester compound of a polyhydric alcohol and (meth)acrylic acid, an ethyl urethane (meth) acrylate compound, and a polyester (meth) acrylate compound. A polyfunctional polymerizable compound containing two or more (meth)acryl fluorenyl groups, such as an epoxy group (meth) acrylate compound.

Examples of the polyhydric alcohol include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, tetrapropylene glycol, polypropylene glycol, propanediol, and butyl. Alkanediol, pentanediol, hexanediol, neopentyl glycol, 2-ethyl-1,3-hexanediol, 2,2'-thiodiethanol, 1,4-cyclohexane Alcohol of 2 yuan of methanol; triol or more of trimethylolpropane, glycerol, neopentyl alcohol, diglycerin, dipentaerythritol or ditrimethylolpropane.

Specific examples of the esterified product of a polyhydric alcohol and (meth)acrylic acid include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, and 1,6-hexanediol. (Meth) acrylate, neopentyl glycol di(meth) acrylate, trimethylolpropane tri(meth) acrylate, trimethylolethane tri(meth) acrylate, tetramethylol Methane tri(meth) acrylate, 1,6-hexanediol di(meth) acrylate, tetramethylol methane tetra(meth) acrylate, penta glycerol tri(meth) acrylate, Neopentyl triol (meth) acrylate, neopentyl alcohol tetra (meth) acrylate, glycerol tri (meth) acrylate, dipentaerythritol tri (meth) acrylate, two new Pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate.

The ethyl urethane (meth) acrylate compound may, for example, be an organic isocyanate having a plurality of isocyanate groups in one molecule, and an ethyl carbazate reactant having a (meth)acrylic acid derivative having a hydroxyl group. . Examples of the organic isocyanate having a plurality of isocyanate groups in one molecule include hexamethylene diisocyanate, isophorone diisocyanate, toluene diisocyanate, naphthalene diisocyanate, diphenylmethane diisocyanate, and xylylene diisocyanate. Dicyclohexylmethane diisocyanate is equivalent to an organic isocyanate having two isocyanate groups in one molecule, and the organic isocyanates are modified by isocyanurate, addition product modification, and biuret modification in one molecule. Three isocyanate-based organic isocyanates and the like. Examples of the (meth)acrylic acid derivative having a hydroxyl group include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate. 2-hydroxybutyl acrylate, 2-(meth)acrylic acid Hydroxy-3-phenoxypropyl ester, neopentyl alcohol triacrylate.

The polyester (meth) acrylate compound is preferably a polyester (meth) acrylate obtained by reacting a hydroxyl group-containing polyester with (meth)acrylic acid. The hydroxyl group-containing polyester which is preferably used is a hydroxyl group-containing polyester obtained by esterification reaction of a polyhydric alcohol with a carboxylic acid, a compound having a plurality of carboxyl groups, and/or an acid anhydride thereof. The polyhydric alcohol is, for example, the same as the aforementioned compound. Further, examples of the phenols other than the polyhydric alcohol include bisphenol A and the like. Examples of the carboxylic acid include formic acid, acetic acid, butyric acid, and benzoic acid. Examples of the compound having a plurality of carboxyl groups and/or an acid anhydride thereof include maleic acid, phthalic acid, fumaric acid, methylene succinic acid, adipic acid, terephthalic acid, and cis. Butenic anhydride, phthalic anhydride, trimellitic acid, cyclohexane dicarboxylic anhydride, and the like.

In the above polyfunctional (meth) acrylate compound, hexane diol di(meth) acrylate or pentylene is preferred from the viewpoint of improvement in the strength of the cured product and ease of availability. Alcohol di(meth)acrylate, diethylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol three ( An ester compound such as methyl acrylate or dipentaerythritol hexa(meth) acrylate; an adduct of hexamethylene diisocyanate and 2-hydroxyethyl (meth) acrylate; isophorone diisocyanate and An adduct of 2-hydroxyethyl (meth)acrylate; an adduct of toluene diisocyanate and 2-hydroxyethyl (meth)acrylate; an adduct-modified isophorone diisocyanate and (meth)acrylic acid An adduct of 2-hydroxyethyl ester; and an adduct of a biuret-modified isophorone diisocyanate and 2-hydroxyethyl (meth)acrylate. Furthermore, these polyfunctional groups (methyl) The acrylate compounds may be used alone or in combination of two or more.

The active energy ray-curable resin may contain a monofunctional (meth) acrylate compound in addition to the above-described polyfunctional (meth) acrylate compound. Examples of the monofunctional (meth) acrylate compound include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, and isobutyl (meth) acrylate. Base 3) butyl acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, glycidyl (meth)acrylate, acryloylmorpholine, N-vinylpyrrolidone, tetrahydrofuranmethyl (meth)acrylate, Cyclohexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isodecyl (meth)acrylate, acetyl (meth)acrylate, benzyl (meth)acrylate, (A) 2-ethyl acrylate, 3-methoxybutyl (meth) acrylate, ethyl carbitol (meth) acrylate, phenoxy (meth) acrylate, ethylene oxide Phenyl (meth) acrylate, propylene oxide (meth) acrylate, nonyl phenol (meth) acrylate, ethylene oxide modified (meth) acrylate, propylene oxide modified sulfhydryl Phenol (meth) acrylate, methoxy Diethylene glycol (meth) acrylate, 2-(methyl) propylene methoxyethyl 2-hydroxypropyl phthalate, dimethylaminoethyl (meth) acrylate, methoxy (Meth) acrylates such as triethylene glycol (meth) acrylate. These compounds may be used alone or in combination of two or more.

Further, the active energy ray-curable resin may contain a polymerizable oligomer. The hardness of the cured product can be adjusted by containing a polymerizable oligomer. a polymerizable oligomer such as the aforementioned polyfunctional (meth) acrylate compound, That is, dimerization of a polyhydric alcohol with an ester of (meth)acrylic acid, an ethyl urethane (meth) acrylate compound, a polyester (meth) acrylate compound or an epoxy (meth) acrylate. Oligomers such as materials and terpolymers.

The other polymerizable oligomer may, for example, be a polyisocyanate having at least two isocyanate groups in the molecule, and a urethane (methyl group) obtained by reacting a polyol having at least one (meth) acryloxy group. ) acrylate oligomers. As the polyisocyanate, for example, a polymer of hexamethylene diisocyanate, isophorone diisocyanate, toluene diisocyanate, diphenylmethane diisocyanate or xylylene diisocyanate, as having at least one (meth) propylene hydride An oxygen-containing polyol, for example, a hydroxyl group-containing (meth) acrylate obtained by esterification of a polyol with (meth)acrylic acid, as a polyol, for example, 1,3-butanediol, 1,4-butyl Alkanediol, 1,6-hexanediol, diethylene glycol, triethylene glycol, neopentyl glycol, polyethylene glycol, polypropylene glycol, trimethylolpropane, glycerol, neopentyl alcohol , dipentaerythritol and the like. The polyol having at least one (meth) acryloxy group is a part of an alcoholic hydroxyl group of the polyol and is esterified with (meth)acrylic acid, and the alcoholic hydroxyl group remains in the molecule.

Further, examples of the other polymerizable oligomer include, for example, a compound obtained by reacting a compound having a plurality of carboxyl groups and/or an acid anhydride thereof with a polyol having at least one (meth)acryloxy group. Ester (meth) acrylate oligomer. The compound having a plurality of carboxyl groups and/or an acid anhydride thereof is, for example, the same as those described for the polyester (meth) acrylate of the above polyfunctional (meth) acrylate compound. Further, a polyol having at least one (meth) propylene fluorenyloxy group, for example, with the above-mentioned ethyl urethane (meth) acrylate The same is described in the enoate oligomer.

In addition to the above polymerizable oligomer, and examples of the ethyl urethane (meth) acrylate oligomer, for example, a hydroxyl group-containing polyester, a hydroxyl group-containing polyether or a hydroxyl group-containing (methyl group) may be mentioned. a compound obtained by reacting a hydroxyl group of an acrylate with an isocyanate. The hydroxyl group-containing polyester which is preferably used is a hydroxyl group-containing polyester obtained by esterification reaction of a polyhydric alcohol with a carboxylic acid, a compound having a plurality of carboxyl groups, and/or an acid anhydride thereof. The polyhydric alcohol, the compound having a plurality of carboxyl groups, and/or the anhydride thereof are, for example, the same as those described for the polyester (meth) acrylate of the polyfunctional (meth) acrylate compound. The hydroxyl group-containing polyether which is preferably used is a hydroxyl group-containing polyether obtained by adding one or two or more kinds of alkylene oxide and/or ε-caprolactone to a polyol. The polyol may be the same as the above-mentioned hydroxyl group-containing polyester. The hydroxyl group-containing (meth) acrylate which is preferably used is, for example, the same as those described for the urethane (meth) acrylate oligomer of the polymerizable oligomer. The isocyanate is preferably a compound having one or more isocyanate groups in the molecule, and particularly preferably a divalent isocyanate compound such as toluene diisocyanate, hexamethylene diisocyanate or isophorone diisocyanate.

These polymerizable oligomer compounds may be used alone or in combination of two or more.

(2) Photopolymerization initiator

The photopolymerization initiator can be appropriately selected depending on the kind of active energy ray applied to the production of the anti-foam film of the present invention. Moreover, when an electron beam is used as the active energy ray, it is sometimes used in the manufacture of the anti-glare film of the present invention. A coating liquid containing no photopolymerization initiator is used.

As the photopolymerization initiator, for example, an acetophenone-based photopolymerization initiator, a benzoin-based photopolymerization initiator, a benzophenone-based photopolymerization initiator, a thioxanthone-based photopolymerization initiator, or the like can be used. (triazine) is a photopolymerization initiator, An oxadiazole is a photopolymerization initiator or the like. Further, as the photopolymerization initiator, for example, 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, 2,2'-bis(o-chlorophenyl)-4,4',5 can be used. , 5'-tetraphenyl-1,2'-biimidazole, 10-butyl-2-chloroacridone, 2-ethyl hydrazine, benzil, 9,10-phenanthrenequinone ( 9,10-phenanthrenequinone), camphorquinone, methyl phenylglyoxylate, titanium titanate compound, and the like. The amount of the photopolymerization initiator to be used is usually 0.5 to 20 parts by weight, preferably 1 to 5 parts by weight, per 100 parts by weight of the active energy ray-curable resin.

The coating liquid may contain a solvent such as an organic solvent in order to improve the coating property to the transparent support. Examples of the organic solvent include aliphatic hydrocarbons such as hexane, cyclohexane, and octane; aromatic hydrocarbons such as toluene and xylene; ethanol, 1-propanol, isopropanol, 1-butanol, and cyclohexanol. Alcohols; ketones such as methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone; esters such as ethyl acetate, butyl acetate, isobutyl acetate; ethylene glycol monomethyl ether, ethylene glycol Ethylene glycol, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether and other glycol ethers; ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate and other esterified glycol ethers; Cellosolve such as methoxyethanol, 2-ethoxyethanol, 2-butoxyethanol, 2-(2-methoxyethoxy)ethanol, 2-(2-ethoxyB) Carboxyls such as oxy)ethanol and 2-(2-butoxyethoxy)ethanol Etc., choose to use in consideration of viscosity, etc. These solvents may be used singly or in combination of plural kinds as needed. After coating, the above organic solvent must be evaporated. Therefore, the boiling point is preferably in the range of 60 ° C to 160 ° C. Further, the saturated vapor pressure at 20 ° C is preferably from 0.1 kPa to 20 kPa.

When the coating liquid contains a solvent, it is preferred to provide a drying step of evaporating the solvent and drying it after the coating step, before the first curing step. The drying system, for example, the example shown in Fig. 9, can be carried out by passing the transparent support 81 having the coating layer through the drying region 84. The drying temperature is appropriately selected depending on the type of solvent or transparent support to be used. It is generally in the range of 20 ° C to 120 ° C, but is not limited to this range. Moreover, the temperature of each drying oven can be varied when there are multiple drying ovens. The thickness of the coating layer after drying is preferably from 1 to 30 μm.

Thereby, a laminate in which a transparent support and a coating layer are laminated is formed.

[P2] hardening step

In this step, the coating layer is cured by irradiating the active energy ray from the transparent support side in a state in which the surface of the coating layer is pressed against the concave-convex surface (forming surface) of the mold having the desired surface unevenness. The step of forming a hardened resin layer on the transparent support. Thereby, while the coating layer is hardened, the surface uneven shape of the uneven surface of the mold is transferred to the surface of the coating layer. The mold used here is a roll shape, and is a one manufactured by using a roll-shaped base material for a mold in the mold manufacturing method described above.

This step, for example, as shown in Fig. 9, is performed by applying the coating region 83 (the drying region 84 is dried during drying). In the case where the hardening step is a pre-hardened region to which the active energy ray irradiation device 86 is further irradiated, the layered body having the coating layer is used, and the active energy ray irradiation device 86 such as an ultraviolet ray irradiation device disposed on the side of the transparent support 81 is used. It is carried out by irradiating the active energy ray.

First, the surface of the coating layer of the laminated body subjected to the hardening step is pressed against the roll-shaped mold 87 by a pressure bonding device such as a nip roll 88. In this state, the active energy ray irradiation device 86 is used, from the transparent support 81. The active energy ray is irradiated to the side to harden the coating layer 82. Here, the term "curing the coating layer" means an active energy ray-curable resin contained in the coating layer, and receives energy of the active energy ray to cause a curing reaction. The use of the nip rolls is effective in preventing air bubbles from being mixed between the coating layer of the laminate and the mold. The active energy ray irradiation device can use one machine or a plurality of machines.

After the active energy ray is irradiated, the laminated system is peeled off from the mold 87 with the nip roller 89 on the outlet side as a fulcrum. The obtained transparent support and the hardened coating layer, which becomes an anti-glare layer, can obtain the anti-foam film of the present invention. The resulting anti-glare film is typically taken up by a film take-up device 90. In this case, under the purpose of protecting the anti-glare layer, a protective film made of polyethylene terephthalate or polyethylene is bonded to the surface of the anti-dazzle layer via an adhesive layer having re-peelability. Take it on one side. Here, although the case where the mold used is a roll shape is described here, a mold other than the roll shape may be used. Further, after being peeled off from the mold, additional active energy ray irradiation can be performed.

The active energy ray used in this step can be obtained from ultraviolet rays and electricity depending on the type of active energy ray-curable resin contained in the coating liquid. The sub-beam, near-ultraviolet light, visible light, near-infrared rays, infrared rays, X-rays, and the like are appropriately selected, but among these, ultraviolet rays and electron beams are preferable, and ultraviolet rays are particularly excellent in terms of easy handling and high energy. As described above, as the photoimprint method, a UV imprint method is preferred.

As the light source of the ultraviolet light, for example, a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a carbon arc lamp, an electrodeless lamp, a metal halide lamp, a xenon arc lamp, or the like can be used. Further, an ArF excimer laser, a KrF excimer laser, an excimer lamp, or synchrotron radiation may be used. Among these, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, an electrodeless lamp, a xenon arc lamp, and a metal halide lamp are preferably used.

Further, as an electron beam, for example, a Cockroft-Waltons type, a Van de Graaff type, a resonance transformer type, an insulating core transformation type, a linear type, a Dynamitron type, a high frequency type, and the like, which are emitted from various electron beam accelerators, have a density of 50 to 1000 keV. An electron beam of energy of preferably 100 to 300 keV is preferred.

When the active energy ray is ultraviolet ray, the cumulative amount of UVA of the ultraviolet ray is preferably 100 mJ/cm ² or more and 3,000 mJ/cm ² or less, more preferably 200 mJ/cm ² or more and 2000 mJ/cm ² or less. In addition, the transparent support absorbs ultraviolet rays on the short-wavelength side to suppress the absorption, and may adjust the irradiation so that the cumulative amount of ultraviolet light (UV to 395 to 445 nm) in the wavelength region including visible light is better. the amount. The cumulative amount of light in the UVV is preferably 100 mJ/cm ² or more and 3000 mJ/cm ² or less, more preferably 200 mJ/cm ² or more and 2000 mJ/cm ² or less. When the cumulative amount of light is less than 100 mJ/cm ² , the hardening of the coating layer is insufficient, the hardness of the obtained antiglare layer is lowered, and the unhardened resin adheres to the guide roll or the like, which tends to cause contamination of the step. When the amount of accumulated light exceeds 3,000 mJ/cm ² , the heat radiated from the ultraviolet irradiation device may cause shrinkage of the transparent support and wrinkles.

[P3] preliminary hardening step

In this step, before the hardening step, the active energy ray is irradiated to both end portions of the transparent support of the coating layer in the width direction, and the both end portions are preliminarily hardened. Fig. 10 is a schematic cross-sectional view showing a preliminary hardening step. In Fig. 10, the end portion 82b of the coating layer in the width direction (the direction perpendicular to the conveying direction) is a region including the designated width of the end portion of the coating layer from the end portion.

In the preliminary hardening step, the end region is hardened in advance, and the adhesion to the transparent support 81 is further improved in the end region, and in the step after the hardening step, a part of the hardened resin is prevented from peeling off, and the step is Pollution. The end region 82b is a region of, for example, 5 mm or more and 50 mm or less from the end of the coating layer 82.

Irradiating the active energy lines with the end regions of the coating layer, with reference to Figures 9 and 10, for example, by having a coating layer 82 that has passed through the coating region 83 (drying region 84 when dried) The transparent support 81 is irradiated with an active energy ray by using an active energy ray irradiation device 85 such as an ultraviolet ray irradiation device provided in the vicinity of both end portions on the coating layer 82 side. The active energy ray irradiation device 85 may be provided on the transparent support 81 side as long as it can illuminate the end region 82b of the coating layer 82 with an active energy ray.

The type of active energy ray and the light source are the same as the main hardening step. When the active energy ray is ultraviolet ray, the cumulative amount of UVA of the ultraviolet ray is preferably 10 mJ/cm ² or more and 400 mJ/cm ² or less, more preferably 50 mJ/cm ² or more and 400 mJ/cm ² or less. By the irradiation of 50 mJ/cm ² or more, the deformation in the main hardening step can be more effectively prevented. In addition, when the curing reaction exceeds 400 mJ/cm ² , the boundary between the cured portion and the uncured portion is caused by the difference in film thickness and internal stress, and resin peeling may occur.

[Use of Anti-glare Film of the Present Invention]

The anti-glare film of the present invention obtained as described above can be used for an image display device or the like, and is usually used as an identification side protective film of the identification side polarizing plate, and is bonded to a polarizing film (that is, disposed on an image display device). surface). Further, as described above, when a polarizing film is used as the transparent support, an anti-glare film having a polarizing film-integrated type can be obtained, and such a polarizing film-integrated anti-glare film can also be used in an image display device. The image display device including the anti-glare film of the present invention has sufficient anti-glare property at a wide viewing angle, and can well prevent whitening and glare.

(Example)

Hereinafter, the present invention will be described in more detail by way of examples. In the example, the "%" and "parts" indicating the content or the amount used are based on weight unless otherwise specified.

The evaluation methods of the mold or the anti-glare film of the following examples are as follows.

[1] Determination of surface shape of anti-glare film

(inclination angle of surface uneven shape)

The surface elevation of the anti-foam film was measured using a three-dimensional microscope PL μ 2300 (manufactured by Sensofar Co., Ltd.). In order to prevent the warpage of the measurement sample, an optically transparent adhesive was used, and the surface opposite to the anti-glare layer of the measurement sample was bonded to the glass substrate to provide a measurement. The magnification of the objective lens at the time of measurement was set to 50 times. The horizontal resolution Δx and Δy were both 0.332 μm, and the measurement area was 255 μm × 191 μm. Based on the obtained measurement data, the calculation is performed according to the above-described calculation method, and the average value and standard deviation of the inclination angle of the surface uneven shape are calculated.

(power spectrum of the elevation of the surface relief shape)

Using a three-dimensional microscope PL μ 2300 (manufactured by Sensofar Co., Ltd.), the elevation of the surface uneven shape of the anti-glare layer as the anti-glare film of the measurement sample was measured. In order to prevent the warpage of the measurement sample, an optically transparent adhesive was used, and the surface opposite to the anti-glare layer of the measurement sample was bonded to the glass substrate to provide a measurement. In the measurement, the magnification of the objective lens was set to 10 times and the measurement was performed. The horizontal resolution Δx and Δy were both 1.66 μm, and the measurement area was 1270 μm × 950 μm. From the central portion of the obtained measurement data, 512 × 512 (measurement area: 850 μm × 850 μm) data were sampled, and the elevation of the surface uneven shape (surface unevenness shape of the anti-glare layer) of the anti-foam film was obtained as a two-dimensional function. h(x, y). Then, the two-dimensional function h(x, y) is subjected to discrete Fourier transform to obtain a two-dimensional function H(f _x , f _y ). Calculating the two-dimensional function I(f _x , f _y ) of the two-dimensional power spectrum by squaring the absolute value of the two-dimensional function H(f _x , f _y ), and calculating the power spectrum of one of the functions of the distance f from the origin The one-dimensional function I(f). For each sample, the elevation is determined for the surface irregularities at five locations, and the average of the one-dimensional function I(f) of the one-dimensional power spectrum calculated from the data is used as a one-dimensional function of the dimensional power spectrum of each sample. I(f).

[2] Determination of optical properties of anti-foam film

(haze)

The total haze of the anti-glare film is an optically transparent adhesive for the anti-foam film, and the surface opposite to the anti-glare layer of the measurement sample is attached to the glass substrate, and the anti-foam film is attached to the glass substrate. The light was incident from the side of the glass substrate, and the measurement was carried out by using a haze meter "HM-150" manufactured by Murakami Color Research Laboratory Co., Ltd. according to the method of JIS K7136. The surface haze is obtained by taking the internal haze of the anti-glare film and subtracting the internal haze from the total haze according to the following formula: surface haze = total haze - internal haze

The internal haze was measured on the anti-glare layer of the measurement sample after the measurement of the total haze, and the triacetonitrile-based cellulose film having a haze of almost 0 was attached thereto using glycerin, and then measured in the same manner as the total haze.

(penetration clarity)

The penetration clarity of the anti-glare film was measured by the image sharpness measuring device "ICM-1DP" manufactured by Suga Tester Co., Ltd. according to the method of JIS K7105. In this case, in order to prevent the sample from being warped, an optically transparent adhesive was used, and the surface opposite to the anti-glare layer of the measurement sample was bonded to the glass substrate, and measurement was performed. In this state, light was incident from the glass substrate side, and measurement was performed. Here, the measured value is a total value of the values measured by using five types of optical combs having a width of the dark portion and the bright portion of 0.125 mm, 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm, respectively.

(reflection resolution measured at an incident angle of light of 45°)

The reflection of the anti-glare film was determined by the image sharpness measuring device "ICM-1DP" manufactured by Suga Tester (Unit) according to the method of JIS K7105. degree. At this time, in order to prevent the warpage of the sample, an optically transparent adhesive was used, and the surface opposite to the anti-glare layer of the measurement sample was bonded to the black acrylic substrate, and measurement was performed. In this state, light was incident at 45° from the side of the anti-glare layer, and measurement was performed. Here, the measured value is a total value of the values measured by using four types of optical combs having a width of the dark portion and the bright portion of 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm, respectively.

(reflection resolution measured at an incident angle of light of 60°)

The reflection sharpness of the anti-foam film was measured by the image sharpness measuring device "ICM-1DP" manufactured by Suga Tester Co., Ltd. according to the method of JIS K7105. At this time, in order to prevent the warpage of the sample, an optically transparent adhesive was used, and the surface opposite to the anti-glare layer of the measurement sample was bonded to the black acrylic substrate, and measurement was performed. In this state, light was incident at 60° from the side of the anti-glare layer, and the measurement was performed. Here, the measured value is a total value of the values measured by using four types of optical combs having a width of the dark portion and the bright portion of 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm, respectively.

[3] Evaluation of anti-glare performance of anti-foam film

(Visual evaluation of mapping and whitening)

In order to prevent reflection from the back surface of the anti-glare film, the anti-foam film is bonded to the black acrylic plate on the surface opposite to the anti-glare layer of the measurement sample, and the anti-glare layer is placed in the bright room where the fluorescent lamp is lit. The degree of mapping of the fluorescent lamp and the degree of whitening were visually evaluated by visual observation. Regarding the mapping, the degree of mapping when the anti-glare film was observed from the front side and the degree of mapping when observing from the inclination of 30° were evaluated. The map and the whitening were evaluated based on the following criteria in three stages of 1 to 3, respectively.

Map 1: no observed mapping

2: Observed a little mapping

3: Obviously observed mapping

Albino 1: no whitening observed

2: A little whitening was observed

3: Obviously observed whitening

(Evaluation of glare)

The glare is evaluated in the following order. That is, first, a mask having a pattern of cell cells, as shown in the plan view of Fig. 11, is prepared. In the figure, the cell chamber 100 is formed on a transparent substrate to form a hook-shaped chrome-shielding pattern 101 having a line width of 10 μm, and a portion where the chrome-shielding pattern 101 is not formed is the opening portion 102. Here, since the size of the cell chamber is 211 μm × 70 μm (length × width of the drawing), the size of the opening is 201 μm × 60 μm (length × width of the drawing). The cell chambers shown in the figure are arranged in a plurality of vertical and horizontal directions to form a photomask.

Then, as shown in the cross-sectional view of FIG. 12, the chrome-shielding pattern 111 of the mask 113 is placed upward, placed in the light box 115, and the anti-foam film 110 is attached to the anti-glare layer by using an adhesive as a surface. A sample was formed on the glass plate 117, and the sample was placed on the reticle 113. In the light box 115, a light source 116 is disposed. In this state, the degree of glare was evaluated in a seven-stage sensory state by visual observation from a position 119 at a sample distance of about 30 cm. Level 1 is a state in which glare is completely unrecognizable, level 7 is a state in which severe glare is observed, and level 4 is a state in which a slight glare is observed.

(comparative evaluation)

The polarizing plates on both sides of the front and back sides were peeled off from a commercially available liquid crystal television ["KY-32EX550" manufactured by SONY Co., Ltd.]. In place of the original polarizing plates, the back side and the surface side are each adhered to the polarizing plate "SUMIKALAN" manufactured by Sumitomo Chemical Co., Ltd. in such a manner that their respective absorption axes coincide with the absorption axis of the original polarizing plate. In the SRDB 831E", the anti-foam film shown in the following examples was bonded to the polarizing plate on the display surface side with the adhesive interposed therebetween so that the uneven surface was a surface. The liquid crystal television thus obtained was started in a dark room, and the brightness of the black display state and the white display state was measured using a TOPCON (Brightness) brightness meter "BM5A" type, and the contrast was calculated. Here, the contrast is expressed by the ratio of the brightness of the white display state to the brightness of the black display state. As a result, the contrast measured by the anti-foam film in the bonded state was expressed by the ratio of the contrast measured in the state in which the anti-glare film was not attached.

[4] Evaluation of graphics for anti-glare film manufacturing

The created graphic data is set to two-tone binary image data, and the color tone is represented by a two-dimensional discrete function g(x, y). The horizontal resolution Δx and Δy of the discrete function g(x, y) are both 2 μm. The obtained two-dimensional function g(x, y) is subjected to discrete Fourier transform to obtain a two-dimensional function G(f _x , f _y ). To square the absolute value of the two-dimensional function G(f _x ,f _y ), calculate the two-dimensional function 二维(f _x ,f _y ) of the two-dimensional power spectrum, and calculate the power spectrum of one of the functions of the distance f from the origin. One-dimensional function Γ(f).

<Example 1>

(Production of mold for manufacturing anti-glare film)

A copper ballard plater has been applied to the surface of an aluminum roll (JIS A6063) having a diameter of 300 mm. The copper Balad plating is composed of a copper plating layer/a thin silver plating layer/a surface copper plating layer, and the thickness of the entire plating layer is set to be about 200 μm. The copper plating surface is mirror-polished, and a photosensitive resin is applied onto the surface of the copper plating to be polished, and dried to form a photosensitive resin film. Then, the pattern in which the pattern A shown in Fig. 13 is repeatedly arranged is exposed on the photosensitive resin film by laser light to be developed. The exposure and development of the laser light were carried out using Laser Stream FX (Think Laboratory). As the photosensitive resin film, those containing a positive photosensitive resin are used. Here, the pattern A is formed from a pattern having an irregular luminance distribution by a complex Gaussian function type band pass filter, the aperture ratio is 45%, and the spatial frequency of the one-dimensional power spectrum is 0.01 μm ^-1 . (0.01) 0.02μm ^-1 of the spatial frequency intensity Γ (0.02) the ratio Γ (0.02) / Γ (0.01 ) is 0.11, the spatial frequency of the intensity Γ 0.01μm ^-1 (0.01) of the spatial frequency 0.1μm ^-1 The ratio Γ(0.1)/Γ(0.01) of the strength Γ(0.1) was 10.97.

Then, etching treatment is performed with a copper chloride solution. The etching amount at this time was set to 2 μm. The photosensitive resin film was removed from the roll after the etching treatment, and chrome plating was performed to prepare a mold A. At this time, the thickness of the chromium plating was set to 8 μm.

(production of anti-glare film)

Each of the following components was dissolved in ethyl acetate at a solid concentration of 60% to prepare an ultraviolet curable resin composition A which can form a film having a refractive index of 1.53 after curing.

Neopentyl alcohol triacrylate 60 parts

Polyfunctional urethane acrylate 40 parts

(Reaction of hexamethylene diisocyanate with neopentyl alcohol triacrylate Object)

Diphenyl (2,4,6-trimethoxy benzhydryl) phosphine oxide 5 parts

The ultraviolet curable resin composition A was applied onto a triacetonitrile cellulose (TAC) film having a thickness of 60 μm, and applied so that the thickness of the dried coating layer was 5 μm, and the dryer was set to 60 ° C. Dry for 3 minutes. The film after drying is adhered to the molding surface (surface having the surface uneven shape) of the previously obtained mold A by a rubber roller so that the dried coating layer becomes the mold side. In this state, light from a high-pressure mercury lamp having a strength of 20 mW/cm ^{2 was} irradiated from the TAC film side so that the amount of converted h-line light became 200 mJ/cm ² , and the coating layer was cured to produce an anti-foam film. Then, the obtained anti-foam film was peeled off from the mold, and a transparent anti-foam film A having an anti-glare layer on the TAC film was produced.

<Example 2>

A mold B was produced in the same manner as in the mold A of Example 1, except that the mold B was replaced with the mold A, and an anti-foam film was produced in the same manner as in Example 1 except that the thickness of the chromium plating in the chrome plating was set to 6 μm. . The anti-glare film is set as the anti-glare film B.

<Example 3>

A mold C was produced in the same manner as in the production of the mold A of Example 1, except that the mold C was used instead of the mold A, and the anti-glare was produced in the same manner as in Example 1 except that the thickness of the chromium plating in the chrome plating was set to 4 μm. membrane. The anti-glare film is set as an anti-glare film C.

<Comparative Example 1>

In addition to setting the chrome plating thickness in the chrome plating process to 3 μm A mold D was produced in the same manner as in the production of the mold A of Example 1, except that the mold D was used instead of the mold A, and an anti-foam film was produced in the same manner as in Example 1. The anti-glare film is set as the anti-glare film D.

<Comparative Example 2>

A mold E was produced in the same manner as the mold A of Example 1 except that the pattern B shown in Fig. 14 was repeatedly arranged, and exposed to laser light on the photosensitive resin film, except that the mold E was used instead of the mold A. An anti-foam film was produced in the same manner as in Example 1. The anti-glare film is set as an anti-glare film E. Here, the pattern B is formed from a pattern having an irregular luminance distribution by a complex Gaussian function type band pass filter, the aperture ratio is 45.0%, and the spatial frequency of the one-dimensional power spectrum is 0.01 μm ^-1 . (0.01) 0.02μm ^-1 of the spatial frequency intensity Γ (0.02) the ratio Γ (0.02) / Γ (0.01 ) is 2.69, the spatial frequency of the intensity Γ 0.01μm ^-1 (0.01) of the spatial frequency 0.1μm ^-1 The ratio Γ(0.1)/Γ(0.01) of the strength Γ(0.1) was 278.67.

<Comparative Example 3>

The surface of an aluminum roll (JIS A5056) having a diameter of 300 mm was mirror-polished, and zirconia beads TZ-SX-17 were placed on the ground aluminum surface by using a blast apparatus (manufactured by Fujitsu Seisakusho Co., Ltd.). (Tosoh (manufactured by Tosoh), average particle diameter: 20 μm), the injection pressure is 0.1 MPa (gauge pressure, the same applies hereinafter), and the bead usage amount is 8 g/cm ² (the surface area of the roll is used per 1 cm ² , The same applies to the following blowing, and the surface of the aluminum roll is provided with irregularities. The obtained aluminum roll with irregularities was subjected to electroless nickel plating to prepare a mold F. At this time, the thickness of electroless nickel plating was set to 15 μm. An anti-foam film was produced in the same manner as in Example 1 except that the mold A was used instead of the mold A. The anti-glare film is set as an anti-glare film F.

<Comparative Example 4>

Prepared on the surface of an aluminum roll (JIS A5056) having a diameter of 200 mm, and has been subjected to copper ballard plating. The copper Balad plating is composed of a copper plating layer/a thin silver plating layer/a surface copper plating layer, and the entire plating layer has a thickness of about 200 μm. The copper-plated surface was mirror-polished, and the zirconia beads TZ-SX-17 (made by Tosoh) were fabricated on the polished surface using a blowing device (manufactured by Fujitsu Seisakusho Co., Ltd.). The average particle diameter: 20 μm) was sprayed at a blowing pressure of 0.05 MPa (gauge pressure, the same applies hereinafter), and the bead usage amount was 6 g/cm ² to impart irregularities to the surface of the aluminum roll. The obtained copper-plated aluminum roll with irregularities was subjected to chromium plating to prepare a mold G. At this time, the thickness of the chromium plating was set to 6 μm. An anti-foam film was produced in the same manner as in Example 1 except that the mold A was used instead of the mold A. This anti-glare film is set as the anti-glare film G.

[Evaluation results]

The results of the evaluation of the antiglare film described above in the above examples and comparative examples are shown in Table 1.

Anti-fog films A to C (Examples 1 to 3) satisfying the requirements of the present invention, although low in haze, have excellent anti-glare properties even when the viewing angle is front or oblique, and have sufficient whitening and dazzling Light suppression effect By. On the other hand, the anti-foam film D (Comparative Example 1) produced whitening. The anti-foam film E (Comparative Example 2) was insufficient in anti-glare property when viewed from an oblique direction. The anti-glare film F (Comparative Example 3) is susceptible to glare. The anti-glare film G (Comparative Example 4) was insufficient in anti-glare property when viewed from an oblique direction.

(industrial availability)

The anti-glare film of the present invention can be used for an image display device such as a liquid crystal display.

1‧‧‧Anti-glare film

2‧‧‧Micro bumps

3‧‧‧film projection surface

5‧‧‧Main normal direction

6‧‧‧Average normal vector

Claims (2)

An anti-glare film comprising a transparent support body and an anti-glare layer having a fine surface irregular shape formed on the support body; wherein the total haze of the anti-foam film is 0.1% or more and 3% or less; surface haze 0.1% or more and 2% or less; the average value of the inclination angle of the surface unevenness shape is 0.2° or more and 1.2° or less, and the standard deviation of the inclination angle is 0.1° or more and 0.8° or less, and the power spectrum of the elevation of the surface unevenness shape satisfies All the conditions (1) to (3) are as follows: (1) The intensity I (0.01) of the spatial frequency of 0.01 μm ^-1 is 2 μm ⁴ or more and 10 μm ⁴ or less; (2) The intensity of the spatial frequency of 0.02 μm ^-1 (0.02) 0.1μm ⁴ is less than 1.5μm ^4; and (3) the spatial frequency of the intensity I 0.1μm ^-1 (0.1) is more than 0.01μm ⁴ 0.0001μm ⁴ or less. The anti-glare film according to claim 1, wherein the penetration clarity measured by using five kinds of optical combs having a width of 0.125 mm, 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm in the dark portion and the bright portion is used. And Tc of 375% or more; using the optical portion of the dark portion and the bright portion of the width of 0.25mm, 0.5mm, 1.0mm and 2.0mm, the reflection resolution and Rc (measured by the incident angle of light of 45°) 45) is less than 180%; four kinds of optical combs with a width of 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm in the dark portion and the bright portion are used, and the opposite is determined by the incident angle of light of 60°. The sum of the sharpness of the shot and the Rc (60) are 240% or less.