SU983463A1 - Device for batching resist - Google Patents

Description

The invention relates to metering devices used primarily in microelectronics, and is intended for applying a resist in an automatic mode during lithography processes in a planar technology for manufacturing microelectronics products.

A device for applying a predetermined portion of resist to semiconductor wafers is known, comprising a metering chamber, intermittent valves, and a valve control system i3.

However, the formation of a film on the dosing elements during the dosing of the reeist indicated device does not have sufficient accuracy and reproducibility of the dosing process, i. during prolonged operation of the dispenser, the accuracy of the dose, the shape of the drop (or jet) of the resist delivered by the dispenser, and the direction of movement of the drop (jet) of the resist toward the plate are not maintained.

The closest to the invention in its technical essence is a device for dispensing a resist, comprising a sealed feed tank, a dispensing chamber connected to it with a nozzle and a valve, and a master of supplying pressurized gas to the feed.

The disadvantage of the device is that during repeated dosing a resist film is formed on the surface of the dosing elements. This film is partially washed off with subsequent doses and drops onto the substrate, resulting in a deteriorated quality.

10 resistive coating. In addition, the thickened resist formed on the surface of the metering elements reduces the accuracy of a given dose and impairs the reproducibility of the dosing process, and when the dispenser operates in an automatic mode, periodic stops are required to allow manual cleaning of the dispensing elements from clots.

The aim of the invention is to improve the quality of the resistive coating by washing and drying the nozzle and valve after each dosing cycle.

The goal is achieved by the fact that a device for dosing a resist, containing a sealed supply tank, a connecting chamber with an injector and a valve connected to it, a gas supply line under pressure to the supply tank, is equipped with washing and day lines, a collecting chamber, an actuator movement of the dosing chamber from the dosing position to the position of stripping and drying, as well as the mechanism for tightly pressing the dosing chamber to the assembly, and the hole in the casing of the dosing chamber and the outer surface of the nozzle are made conical ormy, wherein the bottom portions of the nozzle is formed with a recess to form an annular gap housing, to which there are connected master washing and drying. Fig. 1 shows a functional diagram of a device for dispensing a resist; in Fig.2. - section A-A in Fig. The device contains a sealed supply tank 1, gas supply line 2 under pressure, nozzle 3 with dispensing valve 4 therein. A nozzle 3 is installed in the housing 5, which forms a conical annular gap 6 with it, to which the channel 7 for supplying the solvent resist is connected. and a channel 8 extending tangentially to the conical annular gap 6 for supplying the process gas. The device is equipped with a displacement actuator 9 from position 10 for dispensing the resist to position 11 for washing and drying, as well as a collection chamber 12 and a mechanism 13 for pressurizing the metering unit to the collection chamber in the position for washing and drying. The resist in the consumable cavity 14 formed by the housing 15, the diaphragm 16 and the nozzle 3 is locked with a metering valve 4, a controlled actuator 17. The flow cavity is connected to the tank 1 through a filter 18. The hermetic consumable tank 19 containing the resist solvent is connected to a conical ring gap rum b by pipe 20 through the check valve 21. For supplying process gas to channel 8, a line 22 is provided with a pneumatic valve 23 and a back valve 24. For pressure generation in the tanks 1 and 19, the installation of pneumatic valves 25 and 26 is provided. stroystva mounted. the application of the resist, where a plate 28 is mounted on the table 27. The device operates as follows. In the initial state, i.e. in the interval between the issuance of doses of resist; The device is placed in position 11 for washing and drying the resist and pressed by the mechanism 13 to the collecting chamber 12. After installing the plate 28 on the table 27, the pressing mechanism 13 is turned off, the moving mechanism 9 is turned on and the device is moved to the resist delivery position 10. When the pneumatic valve 25 is turned on, an overpressure in the supply tank 1 is created. The resist passes the filter 18 into the discharge cavity 14. Simultaneously with the creation of overpressure in the supply tank 1, the actuator 17 is turned on for a specified time, raising the metering valve 4 by the adjusted value. The resulting annular gap between the metering valve 4 and the nozzle 3 enters the resist, which is poured onto the plate 28 as a trickle. After the pneumatic valve 25 and the actuator 17 are turned off simultaneously, the metering valve 4 returns to its original position and locks the resist. A mechanism 9 is then activated, which retracts the device in position 11 of washing and drying. In this position, the mechanism 13 moves down the device and hermetically closes the collecting chamber 12 with the body 5; pneumatic valves 23 and 26 are included, up-. washing and drying. Through the pneumatic valve 26, the purified process gas is supplied, which creates an overpressure in the supply tank 19 with the valve; The solvent through the pipeline 20 enters the conical annular gap 6 through the check valve 21. At the same time in the gap. 6, a clean process gas is supplied through line 22 through pneumatic valve 23 and check valve 24. after a predetermined time, the pneumatic valve 26 controlling the supply of the solvent is turned off. The non-return valve 21 locks the solvent, and the compressed gas that continues to flow into the channel 8 removes residual solvent from the conical annular gap, dries the nozzle 3, the projecting part of the metering valve 4 and the internal cavity of the housing 5. After a specified time, the pneumatic valve 23 is turned off. resist. Introduction to the device for dispensing and dispensing a resist to periodically cleaning the surfaces of the dispensing elements from resist clots improves the quality of the applied resistive coating, i.e. reduce the scrap on the main repeated operation of the planar technological process of manufacturing microelectronic products. Cleaning the surfaces of the metering elements from the resist clots not only eliminates the ingress of solid particles larger than 0.5 µm onto a substrate with a resistive coating, but also contributes to improving the accuracy and reproducibility of the dosing process due to the stable wettability of the components of the metering elements with a resist nozzle and metering valve. The latter, in turn, ensures reliable operation of the device in automatic mode.

Claims (1)

Claim A device for dosing a resist, comprising a sealed supply tank, a metering chamber connected thereto with a nozzle and valve, a gas supply line under pressure into the supply tank, characterized in that, in order to improve the quality of the resistive coating by washing and drying the nozzle and valve after each dosing cycle, it is equipped with washing and drying lines, a collection chamber, a drive for moving the dosing chamber from the dosing position to the washing and drying position, and 15 also with a mechanism for tightly pressing the dose uyuschey chamber to the team, and the opening in the housing of the metering chamber and the outer surface of the nozzle are made conical in shape, while in the lower part 5. The nozzle is made undercut to form with the housing an annular gap which is connected to line flushing and drying.