SU789682A1 - Interferometer for monitoring film thickness in the process of applying it on part surface in vacuum - Google Patents
Interferometer for monitoring film thickness in the process of applying it on part surface in vacuum Download PDFInfo
- Publication number
- SU789682A1 SU789682A1 SU792718460A SU2718460A SU789682A1 SU 789682 A1 SU789682 A1 SU 789682A1 SU 792718460 A SU792718460 A SU 792718460A SU 2718460 A SU2718460 A SU 2718460A SU 789682 A1 SU789682 A1 SU 789682A1
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- SU
- USSR - Soviet Union
- Prior art keywords
- interferometer
- vacuum
- applying
- film thickness
- part surface
- Prior art date
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- Length Measuring Devices By Optical Means (AREA)
Description
Рабоча ветвь интерферометра включает в себ верхние призму 3 и клин 5 и участок поверхности детали (:Ьочка F,) , на который напыл етс пленка, эталонна ветвь - нижние призму 4 и клин 6и участок поверхности (точка Fjj,) , свободный от напыл емой пленки благодар экрану 11.The working branch of the interferometer includes the upper prism 3 and wedge 5 and the surface area of the part (: point F,) on which the film is deposited, the reference branch — the lower prism 4 and wedge 6, and the surface area (point Fjj) free film thanks to screen 11.
Клинь 5 и б имеют форму полудисков , попарно скрепленных вершинами, и могут разворачиватьс вокруг оптической оси интерферометра на равные углы в противоположные стороны.Wedges 5 and b have the shape of half disks, fastened in pairs by their vertices, and can turn around the optical axis of the interferometer at equal angles in opposite directions.
Отражатели 12 и 13 склеены с объективами 8 и 9 и перемещаютс поступательно вдоль оптической оси интерферометра .Reflectors 12 and 13 are glued with lenses 8 and 9 and move progressively along the optical axis of the interferometer.
Интерферометр работает следующим образом.The interferometer works as follows.
Пучок света от осветительной системы 1 попадает на.призмы 3 и 4, которые дел т его на две ветви - рабочую и эталонную и отклон ютс клинь ми 5 и б на одинаковые углы в противоположные стороны. Затем пучки обеих ветвей проход т через светоделитель 7 и фокусируютс объективом 8 на поверхность детали: пучок рабочей ветви - в точке F , а пучокэталонной ветви - в точке F поверхности детали. Пучок рабочей ветви отражаетс от поверхности детали, проходит объектив 9, смещаетс и отражаетс экраном 11,. попадает в объектив 9, вновь фокусируетс в точке Ц , повторно отражаетс от поверхности детали , попадает в объектив 8 и, отража сь , от светоделител 7, направл етс в регистрирующий узел 10.A beam of light from the lighting system 1 hits the prisms 3 and 4, which divide it into two branches, working and reference, and are deflected with wedges 5 and 6 at equal angles in opposite directions. Then the beams of both branches pass through the beam splitter 7 and are focused by the lens 8 onto the surface of the part: the working branch beam at point F, and the standard-pattern branch at point F of the surface of the part. The working branch beam is reflected from the surface of the part, the lens 9 passes, is shifted and reflected by the screen 11 ,. enters the lens 9, focuses again at the point C, re-reflects from the surface of the part, enters the lens 8 and, reflecting from the beam splitter 7, is sent to the registering node 10.
Эталонный пучок в той же последовательности .проходит те же оптические элементы и попадает в регистрирующий узел 10,где рабочий и эталонный пучки интерферируют между собойThe reference beam in the same sequence passes through the same optical elements and enters the registering node 10, where the working and reference beams interfere with each other
При напылении пленки в точке Fj происходит изменение разности хода в ветв х интерферометра, что вызывает изменение освещенности интерференционной картины, по которой суд т о контролируемом параметре.When the film is deposited at the point Fj, there is a change in the path difference in the branches x of the interferometer, which causes a change in the illumination of the interference pattern, according to which the controlled parameter is judged.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU792718460A SU789682A1 (en) | 1979-01-25 | 1979-01-25 | Interferometer for monitoring film thickness in the process of applying it on part surface in vacuum |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU792718460A SU789682A1 (en) | 1979-01-25 | 1979-01-25 | Interferometer for monitoring film thickness in the process of applying it on part surface in vacuum |
Publications (1)
Publication Number | Publication Date |
---|---|
SU789682A1 true SU789682A1 (en) | 1980-12-23 |
Family
ID=20807589
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SU792718460A SU789682A1 (en) | 1979-01-25 | 1979-01-25 | Interferometer for monitoring film thickness in the process of applying it on part surface in vacuum |
Country Status (1)
Country | Link |
---|---|
SU (1) | SU789682A1 (en) |
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1979
- 1979-01-25 SU SU792718460A patent/SU789682A1/en active
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