SU762939A1 - Method of fine purification of inert gases - Google Patents

Method of fine purification of inert gases Download PDF

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Publication number
SU762939A1
SU762939A1 SU731947246A SU1947246A SU762939A1 SU 762939 A1 SU762939 A1 SU 762939A1 SU 731947246 A SU731947246 A SU 731947246A SU 1947246 A SU1947246 A SU 1947246A SU 762939 A1 SU762939 A1 SU 762939A1
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SU
USSR - Soviet Union
Prior art keywords
inert gases
reactor
purification
fine purification
titanium
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Application number
SU731947246A
Other languages
Russian (ru)
Inventor
Yurij G Yukov
Vladislav A Balebanov
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Yurij G Yukov
Vladislav A Balebanov
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Application filed by Yurij G Yukov, Vladislav A Balebanov filed Critical Yurij G Yukov
Priority to SU731947246A priority Critical patent/SU762939A1/en
Application granted granted Critical
Publication of SU762939A1 publication Critical patent/SU762939A1/en

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Description

Изобретение относится к технике очистки инертных газов от примесей активных газов в металлургии, сварочном производстве и других областях техники, требующих применения инертных газов высокой частоты.The invention relates to techniques for cleaning inert gases from impurities of active gases in metallurgy, welding and other fields of technology requiring the use of inert gases of high frequency.

Известен способ тонкой очистки инертных газов от примесей газов путем поглощения их .активированным металлическим титаном (порошком или губчатой массой) при 850-950°С. После реактора, в котором происходит очистка, остаточное содержание кислорода составляет 5- 1010^06.%, а азота 2 · юАэ'б. % [ 1]яедостатки известного способа заключаются в недостаточно высокой степени очистки' газов от примесей и проведении процесса очистки при высокой температуре.A known method of fine purification of inert gases from gas impurities by absorbing them. Activated metal titanium (powder or sponge mass) at 850-950 ° C. After the reactor in which the purification takes place, the residual oxygen content is 5-1010 ^ 06.%, and nitrogen 2 · 10Ae'b. % [1] the disadvantages of this method are the insufficiently high degree of purification of the gases from impurities and the cleaning process at high temperature.

Целью изобретения является повышение степени очистки и снижение температуры процесса.The aim of the invention is to increase the degree of purification and lower process temperature.

С этой целью металлический титан предварительно наполняют электродуговым испарением на стенки реактора при давлении 1,5 ·10~1- 5«10*2мм рт. ст., а затем через реактор пропускают очищаемый газ при температуре окружающей среды.To this end, titanium metal is preliminarily filled with electric arc evaporation onto the walls of the reactor at a pressure of 1.5 · 10 ~ 1 - 5 "10 * 2 mm Hg. Art., and then through the reactor pass purified gas at ambient temperature.

При этом титан, активированный электродуговым испарением в вакууме, поглощает при нормальной температуре примеси активных газов до остаточных содержаний в очищенном газе кислорода ’ 10'5об. %,азота 105об.%.In this case, titanium activated by electric arc evaporation in vacuum absorbs impurities of active gases at normal temperature to a residual oxygen content of '10' 5 vol. %, nitrogen 10 5 vol.%.

ТАким образом, изобретение позволяет повысить степень очистки от кислорода на 1,5-2 порядка, а от азота примерно в 2 раза, и проводить процесс очистки при температуре окружающей среды.Thus, the invention allows to increase the degree of purification from oxygen by 1.5-2 orders of magnitude, and from nitrogen by about 2 times, and to conduct the cleaning process at ambient temperature.

Пример. На стенки реактора испарителя объемом 12 л напыляют титановую пленку при давлении в реак торе 1,5*10~1мм рт. ст., токе дуги 70 а, напряжении 21 в и температуре поверхности осаждения пленки менее 100°С. Продолжительность горения дуги 1 ч.Example. A titanium film is sprayed on the walls of a 12-liter evaporator reactor at a pressure of 1.5 * 10 ~ 1 mm Hg in the reactor. century, arc current 70 a, voltage 21 V and the surface temperature of the deposition of the film less than 100 ° C. Duration of arc burning 1 h.

По окончании процесса напыления через реактор при температуре окружающей среды пропускают аргон, содержащий, об.%: азота 0,08, кислорода 0,01. Расход газа 1,8 м^/ч, давление 1,05 ата. Через два часа содер жание примесей на выходе из реактора составило: об.%: кислорода 10 , азота 10“ь.At the end of the deposition process, argon is passed through the reactor at ambient temperature, containing, vol.%: Nitrogen 0.08, oxygen 0.01. Gas consumption 1.8 m ^ / h, pressure 1.05 at. After two hours, the content of impurities at the outlet of the reactor was: vol%: oxygen 10, nitrogen 10 “ b .

Claims (1)

Формула изобретенияClaim Способ тонкой очистки инертных газов от примесей газов путем поглощения их активированным металлическим титаном, отличающийс я тем, что, с целью повьаиения степени очистки и снижения температуры процесса, титан предварительно на762939 пыляют электродуговым испарением на стенки реактора при давлении 1,5·10'1 ,5<Ί0 мм рт. ст., а затем через реактор пропускают очищаемый газ при температуре окружающей среды.The method of fine purification of inert gases from gas impurities by absorbing them with activated metal titanium, characterized in that, in order to increase the degree of purification and lower the process temperature, titanium is preliminarily sprayed by electric arc evaporation onto the walls of the reactor at a pressure of 1.5 · 10 ' 1 , 5 <Ί0 mmHg Art., and then through the reactor pass purified gas at ambient temperature.
SU731947246A 1973-07-02 1973-07-02 Method of fine purification of inert gases SU762939A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU731947246A SU762939A1 (en) 1973-07-02 1973-07-02 Method of fine purification of inert gases

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SU731947246A SU762939A1 (en) 1973-07-02 1973-07-02 Method of fine purification of inert gases

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5489327A (en) * 1994-03-04 1996-02-06 Japan Pionics Co., Ltd. Process for purifying hydrogen gas
WO2002040135A1 (en) * 2000-11-16 2002-05-23 Ub Foundation Services, Inc. A Not-For Profit, Educational Corporation Of The State Of New York Purification of argon

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5489327A (en) * 1994-03-04 1996-02-06 Japan Pionics Co., Ltd. Process for purifying hydrogen gas
WO2002040135A1 (en) * 2000-11-16 2002-05-23 Ub Foundation Services, Inc. A Not-For Profit, Educational Corporation Of The State Of New York Purification of argon

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