JPH04265217A - Method for purifying gas consisting of mainly carbon monoxide - Google Patents
Method for purifying gas consisting of mainly carbon monoxideInfo
- Publication number
- JPH04265217A JPH04265217A JP3024490A JP2449091A JPH04265217A JP H04265217 A JPH04265217 A JP H04265217A JP 3024490 A JP3024490 A JP 3024490A JP 2449091 A JP2449091 A JP 2449091A JP H04265217 A JPH04265217 A JP H04265217A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- catalyst
- main component
- remove
- small amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 title claims description 33
- 229910002091 carbon monoxide Inorganic materials 0.000 title claims description 33
- 238000000034 method Methods 0.000 title claims description 22
- 239000003054 catalyst Substances 0.000 claims abstract description 22
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000003463 adsorbent Substances 0.000 claims abstract description 9
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000741 silica gel Substances 0.000 claims abstract description 4
- 229910002027 silica gel Inorganic materials 0.000 claims abstract description 4
- 239000007789 gas Substances 0.000 claims description 76
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 4
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 3
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 3
- 238000000746 purification Methods 0.000 claims description 3
- 238000001179 sorption measurement Methods 0.000 abstract description 9
- 238000010438 heat treatment Methods 0.000 abstract description 7
- 229910052681 coesite Inorganic materials 0.000 abstract description 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 3
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 3
- 229910052682 stishovite Inorganic materials 0.000 abstract description 3
- 229910052905 tridymite Inorganic materials 0.000 abstract description 3
- 230000006835 compression Effects 0.000 abstract 1
- 238000007906 compression Methods 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 239000007858 starting material Substances 0.000 abstract 1
- 239000012535 impurity Substances 0.000 description 12
- 239000002994 raw material Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000008929 regeneration Effects 0.000 description 3
- 238000011069 regeneration method Methods 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- 230000001603 reducing effect Effects 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- OUCSEDFVYPBLLF-KAYWLYCHSA-N 5-(4-fluorophenyl)-1-[2-[(2r,4r)-4-hydroxy-6-oxooxan-2-yl]ethyl]-n,4-diphenyl-2-propan-2-ylpyrrole-3-carboxamide Chemical compound C=1C=CC=CC=1C1=C(C=2C=CC(F)=CC=2)N(CC[C@H]2OC(=O)C[C@H](O)C2)C(C(C)C)=C1C(=O)NC1=CC=CC=C1 OUCSEDFVYPBLLF-KAYWLYCHSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Landscapes
- Carbon And Carbon Compounds (AREA)
- Catalysts (AREA)
- Drying Of Gases (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は、一酸化炭素（ＣＯ）を
主成分として不純物として少量の水素（Ｈ２ ）を含む
ガスの精製方法に関し、特に簡潔な工程で少量の不純物
Ｈ２ を除去することが可能なＣＯを主成分とするガス
の精製方法に関する。[Industrial Application Field] The present invention relates to a method for purifying gas containing carbon monoxide (CO) as a main component and a small amount of hydrogen (H2) as an impurity, and in particular to a method for removing a small amount of impurity H2 in a simple process. This invention relates to a method for purifying a gas containing CO as a main component.
【０００２】0002
【従来の技術】従来、Ｈ２ を主成分とするガスの精製
法として、Ｈ２ を主成分とするガス中のＣＯ成分をメ
タネーション法により除去する方法は一般に行われてい
る。2. Description of the Related Art Conventionally, as a method for purifying a gas containing H2 as a main component, a method has been generally used in which a CO component in a gas containing H2 as a main component is removed by a methanation method.
【０００３】この従来の方法ではＮｉ系触媒を使用して
４００℃程度の温度条件で行なっているが、この温度条
件をＣＯを主成分とするガス中のＨ２ の除去に適用す
る場合は、Ｈ２ の除去と同時に起こるＣＯの分解（下
記（１）式に示す）によるカーボンの析出が問題となり
、析出したカーボンが触媒表面上を覆い、反応を妨げる
、カーボンの粉により製品ガスが汚染される等の問題が
有る。
ＣＯ＋Ｈ２ →Ｈ２ Ｏ＋Ｃ
………（１）[0003] This conventional method uses a Ni-based catalyst at a temperature of about 400°C, but when this temperature condition is applied to the removal of H2 from a gas containing CO as the main component, H2 The precipitation of carbon due to the decomposition of CO (as shown in equation (1) below) that occurs at the same time as the removal of CO causes problems, such as the precipitated carbon covering the catalyst surface and hindering the reaction, and the product gas being contaminated by carbon powder. There is a problem. CO+H2 →H2 O+C
......(1)
【００
０４】ＣＯを主成分とするガスとして、例えば製鉄所の
転炉から得られる転炉ガス、高炉から得られる高炉ガス
などがあるが、通常その殆どが燃料として用いられてい
る。00
[04] Gases containing CO as a main component include, for example, converter gas obtained from converters in steel plants and blast furnace gas obtained from blast furnaces, most of which are normally used as fuel.
【０００５】これらのＣＯを主成分とするガスを、さら
に圧力スイング法等により高純度ＣＯガスとして種々の
用途に利用されるが、不純物としてＨ２ が相当量含ま
れている。そのためこのままでは、例えば焼結鉱等の還
元テスト用ガスとして使用した場合には少量含まれるＨ
２ の還元作用により誤差を生ずる。[0005] These gases containing CO as a main component are used for various purposes as high-purity CO gas by a pressure swing method or the like, but they contain a considerable amount of H2 as an impurity. Therefore, if this condition is used as a gas for reducing test of sintered ore, etc., a small amount of H will be contained.
An error occurs due to the reduction effect of 2.
【０００６】一方、ＣＯを主成分とし不純物として少量
のＨ２ を含むガスから前記問題を起こすことなくＨ２
を除去する技術は見当らない。On the other hand, H2 can be extracted from a gas mainly composed of CO and containing a small amount of H2 as an impurity without causing the above problems.
There is no technology to remove it.
【０００７】[0007]
【発明が解決しようとする課題】本発明は、ＣＯを主成
分として不純物として少量のＨ２ を含むガスから簡潔
な工程で少量の不純物Ｈ２ を除去することが可能なＣ
Ｏを主成分とするガスの精製方法を提供することを目的
としている。Problem to be Solved by the Invention The present invention provides a CO gas that can remove a small amount of impurity H2 in a simple process from a gas containing CO as a main component and a small amount of H2 as an impurity.
The object of the present invention is to provide a method for purifying a gas containing O as a main component.
【０００８】[0008]
【課題を解決するための手段】本発明者は、ＣＯを主成
分とするガス中に含まれる少量の不純物Ｈ２ を除去す
るにあたり、特定の金属、金属酸化物を添着させた触媒
による反応が有効なことを見いだした。[Means for Solving the Problem] The present inventor has discovered that a reaction using a catalyst impregnated with a specific metal or metal oxide is effective in removing a small amount of impurity H2 contained in a gas containing CO as a main component. I found something.
【０００９】さらに、前記触媒反応の前に前記ガス中の
水分を一定量以下に除去しておかないと、この水分が触
媒作用でＨ２ とＯ２ に分解し、ガス中のＨ２ が逆
に増加することもあるとの知見を得、水分を除去するこ
とにより安定したガス精製を行うことができることを見
いだし、本発明に至った。Furthermore, if the moisture in the gas is not removed to a certain amount or less before the catalytic reaction, this moisture will be decomposed into H2 and O2 by the catalytic action, and the H2 in the gas will increase. They found that stable gas purification can be achieved by removing moisture, and the present invention was developed based on this finding.
【００１０】すなわち、上記目的を達成するために本発
明によれば、一酸化炭素を主成分とするガス中に含まれ
る少量の水素を除去するにあたり、前記ガスを吸着剤と
接触させ水分を除去する工程、水分を除去した前記ガス
を１５０〜３００℃の範囲に加温する工程、加温された
前記ガスを接触させ該ガス中に含まれる少量の水素を除
去する工程を有することを特徴とする一酸化炭素を主成
分とするガスの精製方法が提供される。前記触媒は、活
性アルミナまたはシリカゲルにニッケルまたは酸化ニッ
ケルを添着させた触媒であるのが好ましい。That is, in order to achieve the above object, according to the present invention, when removing a small amount of hydrogen contained in a gas mainly composed of carbon monoxide, the gas is brought into contact with an adsorbent to remove moisture. A step of heating the gas from which moisture has been removed to a range of 150 to 300°C, and a step of bringing the heated gas into contact to remove a small amount of hydrogen contained in the gas. A method for purifying a gas containing carbon monoxide as a main component is provided. The catalyst is preferably a catalyst in which nickel or nickel oxide is impregnated with activated alumina or silica gel.
【００１１】以下に本発明をさらに詳細に説明する。図
１は、本発明の１実施例を示す反応系統図である。The present invention will be explained in more detail below. FIG. 1 is a reaction system diagram showing one example of the present invention.
【００１２】処理すべきＣＯを主成分とし不純物として
少量のＨ２ を含むガス（以下、原料ガスという）１は
、水分除去吸着筒２→ＣＯガスヒーター３→触媒筒４の
順序で処理される。A gas (hereinafter referred to as raw material gas) 1 which is mainly composed of CO and contains a small amount of H2 as an impurity to be treated is processed in the order of water removal adsorption cylinder 2 → CO gas heater 3 → catalyst cylinder 4.
【００１３】処理すべき原料ガス１としては、ＣＯを主
成分とし不純物としてＨ２ を約１０〜５０００ｐｐｍ
含有するガスであればいかなるガスでもよく、例えば転
炉ガス、高炉ガスを精製して前記範囲のＨ２ 濃度とし
たガスを挙げることができる。The raw material gas 1 to be treated contains CO as a main component and H2 as an impurity in an amount of about 10 to 5000 ppm.
Any gas may be used as long as it contains the H2 concentration, such as converter gas or blast furnace gas purified to have an H2 concentration within the above range.
【００１４】処理すべき原料ガス１中の水分は、１００
ｐｐｍ以下、好ましくは１０ｐｐｍ以下とする必要があ
る。ガス中の水分が２０ｐｐｍを越えると前述したよう
に後記する触媒筒４においてＨ２ とＯ２ に分解し、
ガス中のＨ２ 濃度を増大させてしまう。The moisture content in the raw material gas 1 to be treated is 100
It is necessary to keep it below ppm, preferably below 10 ppm. When the moisture in the gas exceeds 20 ppm, it is decomposed into H2 and O2 in the catalyst cylinder 4, which will be described later, as described above.
This increases the H2 concentration in the gas.
【００１５】そこで原料ガス１は、まず水分除去吸着筒
２へ導入する。吸着筒２としては、モレキュラシーブ、
活性アルミナ、シリカゲル等の脱水用吸着剤を充填した
筒が用いられる。[0015] The raw material gas 1 is first introduced into the moisture removal adsorption column 2. As the adsorption column 2, molecular sieve,
A cylinder filled with a dehydrating adsorbent such as activated alumina or silica gel is used.
【００１６】この吸着剤の再生には、加温する方法（Ｔ
ＳＡ法）、筒内圧力を減圧して行う方法（ＰＳＡ法）な
どがある。図１には、Ｎ２ ガス５をヒーター６で約３
００℃に加温して再生を行う場合を示した。[0016] To regenerate this adsorbent, a heating method (T
SA method), and a method in which the cylinder pressure is reduced (PSA method). In Figure 1, N2 gas 5 is heated to about 3
The case where regeneration is performed by heating to 00°C is shown.
【００１７】吸着筒２の数は、一般には図１に示すよう
に２筒以上とし、その一部の筒を再生しながら他の筒を
使用するようにして連続稼動するようにしている。Generally, the number of adsorption cylinders 2 is two or more as shown in FIG. 1, and some of the cylinders are regenerated while other cylinders are used to operate continuously.
【００１８】脱水された原料ガスは、ＣＯガスヒーター
３で加温される。ＣＯガスヒーター３は、スチームヒー
ター電気ヒーター等を用いることができる。The dehydrated raw material gas is heated by a CO gas heater 3. As the CO gas heater 3, a steam heater, an electric heater, or the like can be used.
【００１９】加温後のガス温度は、１５０〜３００℃の
範囲とし、好ましくは１５０〜２００℃である。３００
℃を越えるとＣＯの分解によるカーボンの発生が懸念さ
れる。また、１５０℃未満では、毒性の強いニッケルカ
ルボニルの生成の危険があるので、避ける必要がある。The gas temperature after heating is in the range of 150 to 300°C, preferably 150 to 200°C. 300
If the temperature exceeds ℃, there is a concern that carbon will be generated due to decomposition of CO. Furthermore, if the temperature is lower than 150°C, there is a risk of the formation of highly toxic nickel carbonyl, so it must be avoided.
【００２０】加温された原料ガスは、触媒筒４へ導入さ
れガス中のＨ２ が除去されたのち、精製ガス７となる
。
このとき使用する触媒としては、Ａｌ２ Ｏ３ 、Ｓｉ
Ｏ２ あるいはその他の担体好ましくはＳｉＯ２ にニ
ッケルまたは酸化ニッケルを添着させたものが好ましい
。Ｎｉ以外に、Ｚｎ，Ｍｇ，Ｍｎ等を少量加えてもほぼ
同等の効果を得られる場合が有るが、この主効果はＮｉ
によるものである。The heated raw material gas is introduced into the catalyst cylinder 4 and becomes purified gas 7 after H2 in the gas is removed. The catalysts used at this time include Al2O3, Si
O2 or another carrier, preferably SiO2, impregnated with nickel or nickel oxide is preferred. In some cases, almost the same effect can be obtained by adding a small amount of Zn, Mg, Mn, etc. in addition to Ni, but this main effect is due to the addition of Zn, Mg, Mn, etc.
This is due to
【００２１】なお、担持した金属（Ｎｉ）は酸化された
状態となっていることが一般的で、このままで１５０〜
２００℃で使用すると、完全に還元された状態となりに
くく、活性が小さい。そこで、使用前に、一度１００〜
２００℃でＨ２ ＣＯガスを通し、還元することが望ま
しい。[0021] The supported metal (Ni) is generally in an oxidized state, and as it is, the metal (Ni) is
When used at 200°C, it is difficult to reach a completely reduced state and the activity is low. Therefore, before use, please check the
It is desirable to reduce by passing H2 CO gas at 200°C.
【００２２】前述したように、Ｎｉ触媒で用いて４００
℃程度の高温でＨ２ を除去しようとすると、下記式で
示すＣＯの分解反応が顕著となって問題となる。
ＣＯ＋Ｈ２ →Ｃ＋Ｈ２ Ｏ
そのため本発明では１５０〜３００℃の低温域でＨ２
の除去を行ない、ＣＯの分解を回避する。しかし、それ
でも上記反応が全く起らないわけではない。As mentioned above, 400
When attempting to remove H2 at a high temperature of about 0.degree. C., the decomposition reaction of CO as shown in the following formula becomes significant and becomes a problem. CO+H2 →C+H2 O Therefore, in the present invention, H2 is
to avoid decomposition of CO. However, this does not mean that the above reaction does not occur at all.
【００２３】この反応で発生するＣは担持したＮｉ中に
拡散すると考えられる。本発明の加温域では発生するＣ
は微量であり且つＮｉは、比較的安価で５０％以上の担
持量を持たせることは十分可能であるためＮｉ触媒の寿
命の確保の点からは問題ない。また、Ｈ２ Ｏについて
は吸着剤で吸着除去する工程を加えて除去することがで
きる。It is believed that C generated in this reaction diffuses into the supported Ni. C generated in the heating region of the present invention
is a very small amount, and Ni is relatively cheap and it is possible to have a supported amount of 50% or more, so there is no problem from the point of view of ensuring the life of the Ni catalyst. Furthermore, H2O can be removed by adding a step of adsorbing and removing it with an adsorbent.
【００２４】以上により、ＣＯを主成分として不純物と
して少量のを含むガスから簡潔な工程で少量の不純物Ｈ
２ を除去することができる。As described above, a small amount of impurity H can be obtained in a simple process from a gas containing CO as the main component and a small amount of impurity.
2 can be removed.
【００２５】[0025]
【実施例】以下に本発明を実施例に基づき具体的に説明
する。EXAMPLES The present invention will be specifically explained below based on examples.
【００２６】（実施例１）転炉ガスを圧力スイング法に
より濃縮したガスで表１に示す組成のガスについて図１
に示す反応系統図に従ってガスの精製を行った。(Example 1) Figure 1 shows the composition of the gas obtained by concentrating converter gas using the pressure swing method as shown in Table 1.
The gas was purified according to the reaction diagram shown in .
【００２７】まず、表１のガスを圧縮機により９〜９．
５Ｋｇ／ｃｍ２に加圧し約３０℃に冷却後水分除去吸着
筒２に供給した。この時、原料ガス中に含まれる水分は
飽和であった。[0027] First, the gases shown in Table 1 were compressed by compressors 9 to 9.
The mixture was pressurized to 5 kg/cm2, cooled to about 30°C, and then supplied to the moisture removal adsorption cylinder 2. At this time, the moisture contained in the raw material gas was saturated.
【００２８】乾燥用吸着剤はモレキュラシーブを使用し
、ガス中の水分を１０ｐｐｍ以下まで除去した。また、
吸着剤の再生は、約３００℃に加温したＮ２ によって
実施し、Ｎ２ ガス５の加温は電気ヒーター６によって
行った。水分の吸着（使用）と再生の切替周期は６時間
で行った。Molecular sieve was used as the drying adsorbent to remove moisture in the gas to 10 ppm or less. Also,
Regeneration of the adsorbent was performed using N2 heated to about 300°C, and heating of the N2 gas 5 was performed using an electric heater 6. The switching cycle between moisture adsorption (use) and regeneration was performed every 6 hours.
【００２９】脱水された前記ガスは、ＣＯガスヒーター
６へ送られ約２００℃まで加温した。このヒーター６に
は、電気ヒーターを使用した。The dehydrated gas was sent to the CO gas heater 6 and heated to about 200°C. As this heater 6, an electric heater was used.
【００３０】つぎに、触媒筒４中の触媒と接触させガス
中Ｈ２ を除去した。使用した触媒はＳｉＯ２ にＮｉ
を４０ｗｔ％担持したものを使用した。触媒空間速度は
５００ｈ−１で通ガスした。Next, the gas was brought into contact with the catalyst in the catalyst cylinder 4 to remove H2 from the gas. The catalyst used was SiO2 and Ni.
A material carrying 40 wt% of was used. Gas was passed through the catalyst at a space velocity of 500 h-1.
【００３１】得られた精製ガス中の不純物を、表２に示
す。Table 2 shows the impurities in the purified gas obtained.
【００３２】また、本実施例は現在まで約３０００時間
連続使用しているが、触媒の劣化は認められず、連続精
製が可能であることがわかった。Furthermore, although this example has been used continuously for approximately 3000 hours, no deterioration of the catalyst was observed, indicating that continuous purification is possible.
【００３３】[0033]
【発明の効果】本発明は、以上説明したように構成され
ているので、本発明によればＣＯとおなじ還元作用を持
つＨ２ 成分をＣＯを主成分とするガス中から簡潔な工
程で除去することができるようになった。その結果、焼
結鉱物等の還元テスト用ガスとして使用できるガスが容
易に得られるようになった。[Effects of the Invention] Since the present invention is constructed as described above, according to the present invention, the H2 component, which has the same reducing effect as CO, can be removed from a gas mainly composed of CO in a simple process. Now I can do it. As a result, it has become possible to easily obtain a gas that can be used as a gas for reduction testing of sintered minerals and the like.
【００３４】また、本発明で得られる精製ガス中のその
他の不純成分を既存技術で除去することにより容易に分
析用標準ガス等へ使用可能なガスを得ることができる。Furthermore, by removing other impurity components from the purified gas obtained by the present invention using existing techniques, it is possible to easily obtain a gas that can be used as a standard gas for analysis or the like.
【００３５】[0035]
【図１】 本発明の１実施例を示す反応系統図である
。FIG. 1 is a reaction system diagram showing one example of the present invention.
１ 原料ガス ２ 水分除去吸着筒 ３ ＣＯガスヒーター ４ 触媒筒 ５ Ｎ２ ガス ６ Ｎ２ ガスヒーター ７ 精製ガス ８ Ｈ２ ガス 1 Raw material gas 2 Moisture removal adsorption cylinder 3 CO gas heater 4 Catalyst cylinder 5 N2 gas 6 N2 gas heater 7 Purified gas 8 H2 gas
Claims (2)
まれる少量の水素を除去するにあたり、前記ガスを吸着
剤と接触させ水分を除去する工程、水分を除去した前記
ガスを１５０〜３００℃の範囲に加温する工程、加温さ
れた前記ガスを触媒と接触させ該ガス中に含まれる少量
の水素を除去する工程を有することを特徴とする一酸化
炭素を主成分とするガスの精製方法。1. In removing a small amount of hydrogen contained in a gas containing carbon monoxide as a main component, a step of bringing the gas into contact with an adsorbent to remove water; ℃ range, and a step of bringing the heated gas into contact with a catalyst to remove a small amount of hydrogen contained in the gas. Purification method.
カゲルにニッケルまたは酸化ニッケルを添着させた触媒
である請求項１に記載の一酸化炭素を主成分とするガス
の精製方法。2. The method for purifying a gas containing carbon monoxide as a main component according to claim 1, wherein the catalyst is a catalyst in which nickel or nickel oxide is impregnated with activated alumina or silica gel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3024490A JPH04265217A (en) | 1991-02-19 | 1991-02-19 | Method for purifying gas consisting of mainly carbon monoxide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3024490A JPH04265217A (en) | 1991-02-19 | 1991-02-19 | Method for purifying gas consisting of mainly carbon monoxide |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04265217A true JPH04265217A (en) | 1992-09-21 |
Family
ID=12139628
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3024490A Withdrawn JPH04265217A (en) | 1991-02-19 | 1991-02-19 | Method for purifying gas consisting of mainly carbon monoxide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04265217A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000001467A1 (en) * | 1998-07-07 | 2000-01-13 | Nippon Sanso Corporation | Method and apparatus for producing highly clean dry air |
| JP2000024444A (en) * | 1998-07-07 | 2000-01-25 | Nippon Sanso Kk | Production of highly purified dry air and device therefor |
-
1991
- 1991-02-19 JP JP3024490A patent/JPH04265217A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000001467A1 (en) * | 1998-07-07 | 2000-01-13 | Nippon Sanso Corporation | Method and apparatus for producing highly clean dry air |
| JP2000024444A (en) * | 1998-07-07 | 2000-01-25 | Nippon Sanso Kk | Production of highly purified dry air and device therefor |
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| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19980514 |