SU1574697A1 - Device for depositing films of solid solutions - Google Patents

Abstract

This invention relates to devices for producing semiconductor materials. The purpose of the invention is to maintain a constant pressure of the mixed vapors of the components. The device contains a heated vacuum chamber. The chamber contains an evaporator for the mixture of components and a substrate fixed above the evaporator and equipped with a cooling system. An elastic partition with a throttling nozzle is installed between the substrate and the evaporator. When the chamber is heated to the evaporation temperature of the components, the vapors are mixed in the evaporator, and then in the lower part of the chamber. As the vapor passes through the nozzle, the elastic wall is deformed. Couples come to the top of the chamber. At the same time, a certain pressure is maintained above the evaporator and the stability of the composition of the deposited vapors on the substrate is ensured. Films (RB SE) _X (SN TE) _{1-X are} obtained. 1 il.

Description

The invention relates to the growth of crystals, in particular, to devices for producing semiconductor materials.

The aim of the invention is to maintain a constant pressure of the mixed vapors of the components.

The drawing shows the device, General view, section.

The device contains a vacuum chamber 1, the casing of which is made of spectrally pure graphite and connected with the help of electrodes 2 to a current source. In the chamber 1, placed the evaporator 3, containing a mixture of components of a solid solution. A substrate 4 is installed above the evaporator, equipped with a cooling system 5 and a mechanical valve 6. Between the evaporator 3 and the substrate 4, a partition 7 is fixed, made of an elastic material and provided with a throttling nozzle 8 installed centrally.

The device works as follows.

After the evaporator is loaded with 3 components of a solid solution, it is installed in the lower part of chamber 1. Substrate 4 with cooling system 5 and mechanical flap 6 is mounted in the upper part of chamber 1, then it is evacuated. Heating chamber 1 to a predetermined temperature required for evaporating the components of the solid solution is carried out by supplying electricity through electrodes 2. The vapor formed during heating is pre-mixed inside the evaporator 3 and the lower part of chamber 1 is filled. When a certain value of pressure is reached, the evaporated vapor is 8, deform the partition 7, enter the upper part of the vacuum chamber 1. When the mechanical flap 6 is opened due to the different temperatures created by the cooling system 1

4b

with & with

nor 5, happened; The vapor deposition on the jio-surfaces of the substrate 4 is observed. The loss of pressure in the tubular nozzle 8 makes it possible to maintain certain pressures over the evaporator and to ensure the stability of the composition of the deposited vapors on the substrate 4.

A device for deposition of films of solid solutions, containing a heated vacuum chamber placed opposite one another in an evaporator for a mixture of components of a solid solution and a cooled substrate, characterized in that, in order to maintain a constant pressure of the mixed vapors of components, solid solutions connections А В from mechanical mixture of powdered components-- - -

For example, (PbSe), (SnTe) i, for 10, the smart camera is equipped with a partition with sync circuits. At the same time, provide a settling nozzle in the center, made

saves by reducing the rejection of the elastic material and the established

on J2 / between the substrate and the evaporator.

Claims (1)

Invention Formula A device for the deposition of films of solid solutions, containing a heated vacuum chamber placed opposite to it another evaporator for a mixture of components of a solid solution and a cooled substrate, characterized in that, in order to maintain a constant pressure of the mixed vapors of the components, vacuum - -  smart camera is equipped with a partition with dro