SG95585G - Light sensitive composition based on o-naphtoquinone diazides and light sensitive copying material produced therefrom - Google Patents
Light sensitive composition based on o-naphtoquinone diazides and light sensitive copying material produced therefromInfo
- Publication number
- SG95585G SG95585G SG955/85A SG95585A SG95585G SG 95585 G SG95585 G SG 95585G SG 955/85 A SG955/85 A SG 955/85A SG 95585 A SG95585 A SG 95585A SG 95585 G SG95585 G SG 95585G
- Authority
- SG
- Singapore
- Prior art keywords
- light sensitive
- diazides
- naphtoquinone
- material produced
- composition based
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
- Holo Graphy (AREA)
- Photoreceptors In Electrophotography (AREA)
- Optical Elements Other Than Lenses (AREA)
- Light Receiving Elements (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3100856A DE3100856A1 (de) | 1981-01-14 | 1981-01-14 | Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG95585G true SG95585G (en) | 1987-03-27 |
Family
ID=6122558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG955/85A SG95585G (en) | 1981-01-14 | 1985-12-13 | Light sensitive composition based on o-naphtoquinone diazides and light sensitive copying material produced therefrom |
Country Status (14)
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3230171A1 (de) * | 1982-08-13 | 1984-02-16 | Hoechst Ag, 6230 Frankfurt | Waessrig-alkalische loesung und verfahren zum entwickeln von positiv-arbeitenden reproduktionsschichten |
| JPS60134235A (ja) * | 1983-12-23 | 1985-07-17 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
| DE3420039A1 (de) * | 1984-05-29 | 1985-12-12 | Hoechst Ag, 6230 Frankfurt | 2,3-bis(dialkylaminophenyl)chinoxaline und ihre verwendung in elektrophotographischen aufzeichnungsmaterialien |
| DE3729034A1 (de) * | 1987-08-31 | 1989-03-09 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes lichtempfindliches kopiermaterial |
| JP2700918B2 (ja) * | 1989-04-26 | 1998-01-21 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
| US5196517A (en) * | 1989-10-30 | 1993-03-23 | Ocg Microelectronic Materials, Inc. | Selected trihydroxybenzophenone compounds and their use as photoactive compounds |
| US5019478A (en) * | 1989-10-30 | 1991-05-28 | Olin Hunt Specialty Products, Inc. | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures |
| US5219714A (en) * | 1989-10-30 | 1993-06-15 | Ocg Microelectronic Materials, Inc. | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures |
| JP2761786B2 (ja) * | 1990-02-01 | 1998-06-04 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
| US5151340A (en) * | 1990-07-02 | 1992-09-29 | Ocg Microelectronic Materials, Inc. | Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures |
| US5225318A (en) * | 1990-07-02 | 1993-07-06 | Ocg Microelectronic Materials, Inc. | Selected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patterns |
| JP5048452B2 (ja) | 2007-10-23 | 2012-10-17 | 本田技研工業株式会社 | 車両用燃料タンクの給油口装置 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL80569C (US20070031759A1-20070208-C00026.png) * | 1949-07-23 | |||
| NL185407B (nl) * | 1953-03-11 | Mitsui Petrochemical Ind | Werkwijze voor het polymeriseren of copolymeriseren van 1-alkenen alsmede katalysatorsamenstelling voor toepassing van deze werkwijze. | |
| US3802885A (en) * | 1967-08-15 | 1974-04-09 | Algraphy Ltd | Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base |
| US3647443A (en) * | 1969-09-12 | 1972-03-07 | Eastman Kodak Co | Light-sensitive quinone diazide polymers and polymer compositions |
| US3785825A (en) * | 1971-07-19 | 1974-01-15 | Polychrome Corp | Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate |
| JPS5421089B2 (US20070031759A1-20070208-C00026.png) * | 1973-05-29 | 1979-07-27 | ||
| US4005437A (en) * | 1975-04-18 | 1977-01-25 | Rca Corporation | Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil |
| DE2828037A1 (de) * | 1978-06-26 | 1980-01-10 | Hoechst Ag | Lichtempfindliches gemisch |
-
1981
- 1981-01-14 DE DE3100856A patent/DE3100856A1/de not_active Withdrawn
- 1981-10-27 AT AT81109001T patent/ATE8940T1/de not_active IP Right Cessation
- 1981-10-27 EP EP81109001A patent/EP0056092B1/de not_active Expired
- 1981-10-27 DE DE8181109001T patent/DE3165432D1/de not_active Expired
-
1982
- 1982-01-05 ZA ZA8238A patent/ZA8238B/xx unknown
- 1982-01-08 AU AU79299/82A patent/AU7929982A/en not_active Abandoned
- 1982-01-08 CA CA000393813A patent/CA1213599A/en not_active Expired
- 1982-01-11 US US06/338,640 patent/US4628020A/en not_active Expired - Fee Related
- 1982-01-12 FI FI820087A patent/FI820087L/fi not_active Application Discontinuation
- 1982-01-12 JP JP57002347A patent/JPS57142635A/ja active Granted
- 1982-01-13 BR BR8200166A patent/BR8200166A/pt unknown
- 1982-01-13 KR KR8200117A patent/KR880002517B1/ko active
-
1985
- 1985-12-13 SG SG955/85A patent/SG95585G/en unknown
-
1986
- 1986-02-27 HK HK150/86A patent/HK15086A/xx unknown
- 1986-12-30 MY MY249/86A patent/MY8600249A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE3165432D1 (en) | 1984-09-13 |
| BR8200166A (pt) | 1982-11-03 |
| ZA8238B (en) | 1982-11-24 |
| FI820087L (fi) | 1982-07-15 |
| CA1213599A (en) | 1986-11-04 |
| EP0056092A1 (de) | 1982-07-21 |
| HK15086A (en) | 1986-03-07 |
| AU7929982A (en) | 1982-07-22 |
| ATE8940T1 (de) | 1984-08-15 |
| JPS57142635A (en) | 1982-09-03 |
| EP0056092B1 (de) | 1984-08-08 |
| KR830009509A (ko) | 1983-12-21 |
| US4628020A (en) | 1986-12-09 |
| KR880002517B1 (ko) | 1988-11-26 |
| DE3100856A1 (de) | 1982-08-12 |
| MY8600249A (en) | 1986-12-31 |
| JPH0145901B2 (US20070031759A1-20070208-C00026.png) | 1989-10-05 |
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