SG77710A1 - Photoresist ashing residue cleaning agent - Google Patents

Photoresist ashing residue cleaning agent

Info

Publication number
SG77710A1
SG77710A1 SG1999004207A SG1999004207A SG77710A1 SG 77710 A1 SG77710 A1 SG 77710A1 SG 1999004207 A SG1999004207 A SG 1999004207A SG 1999004207 A SG1999004207 A SG 1999004207A SG 77710 A1 SG77710 A1 SG 77710A1
Authority
SG
Singapore
Prior art keywords
cleaning agent
residue cleaning
photoresist ashing
ashing residue
photoresist
Prior art date
Application number
SG1999004207A
Other languages
English (en)
Inventor
Ichiro Mikami
Yoshifumi Yamashita
Toru Nonaka
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP25474098A external-priority patent/JP2000089479A/ja
Priority claimed from JP37346398A external-priority patent/JP2000194144A/ja
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Publication of SG77710A1 publication Critical patent/SG77710A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/046—Salts
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/88—Ampholytes; Electroneutral compounds
    • C11D1/90—Betaines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/88—Ampholytes; Electroneutral compounds
    • C11D1/94—Mixtures with anionic, cationic or non-ionic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/38—Cationic compounds
    • C11D1/62—Quaternary ammonium compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
SG1999004207A 1998-09-09 1999-08-26 Photoresist ashing residue cleaning agent SG77710A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP25474098A JP2000089479A (ja) 1998-09-09 1998-09-09 フォトレジストアッシング残滓洗浄剤
JP37346398A JP2000194144A (ja) 1998-12-28 1998-12-28 フォトレジストアッシング残滓洗浄剤

Publications (1)

Publication Number Publication Date
SG77710A1 true SG77710A1 (en) 2001-01-16

Family

ID=26541815

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1999004207A SG77710A1 (en) 1998-09-09 1999-08-26 Photoresist ashing residue cleaning agent

Country Status (3)

Country Link
US (1) US6197733B1 (ko)
KR (1) KR20000022966A (ko)
SG (1) SG77710A1 (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002237481A (ja) * 2001-02-09 2002-08-23 Kobe Steel Ltd 微細構造体の洗浄方法
US6861007B2 (en) * 2001-03-02 2005-03-01 Micron Technology, Inc. Method for removing organic material from a substrate and for oxidizing oxidizable material thereon
US6773873B2 (en) 2002-03-25 2004-08-10 Advanced Technology Materials, Inc. pH buffered compositions useful for cleaning residue from semiconductor substrates
JP3974465B2 (ja) * 2002-07-10 2007-09-12 Ｎｅｃエレクトロニクス株式会社 ポリマー除去方法
JP2005115029A (ja) * 2003-10-08 2005-04-28 Ricoh Co Ltd トナー及びその製造方法、並びに、現像剤、トナー入り容器、プロセスカートリッジ、画像形成装置及び画像形成方法
CN1934233B (zh) * 2003-10-28 2015-02-04 塞克姆公司 清洁溶液和蚀刻剂及其使用方法
CA2525205C (en) * 2004-11-08 2013-06-25 Ecolab Inc. Foam cleaning and brightening composition, and methods
KR101088568B1 (ko) * 2005-04-19 2011-12-05 아반토르 퍼포먼스 머티리얼스, 인크. 갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼
US7534753B2 (en) * 2006-01-12 2009-05-19 Air Products And Chemicals, Inc. pH buffered aqueous cleaning composition and method for removing photoresist residue
US20090029274A1 (en) * 2007-07-25 2009-01-29 3M Innovative Properties Company Method for removing contamination with fluorinated compositions
EP2398300B1 (en) * 2009-02-10 2017-08-23 Joled Inc. Method for manufacturing light-emitting element, light-emitting element, method for manufacturing light-emitting device, and light-emitting device
WO2011049091A1 (ja) * 2009-10-22 2011-04-28 三菱瓦斯化学株式会社 金属微細構造体のパターン倒壊抑制用処理液及びこれを用いた金属微細構造体の製造方法
JP5741589B2 (ja) * 2010-09-08 2015-07-01 三菱瓦斯化学株式会社 微細構造体のパターン倒壊抑制用処理液及びこれを用いた微細構造体の製造方法
MY181531A (en) 2013-01-18 2020-12-25 Mimos Berhad Method of fabricating a bond pad in a semiconductor device
JP7495672B2 (ja) * 2019-03-05 2024-06-05 日産化学株式会社 洗浄剤組成物及び洗浄方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3236220B2 (ja) * 1995-11-13 2001-12-10 東京応化工業株式会社 レジスト用剥離液組成物
US5759973A (en) * 1996-09-06 1998-06-02 Olin Microelectronic Chemicals, Inc. Photoresist stripping and cleaning compositions

Also Published As

Publication number Publication date
KR20000022966A (ko) 2000-04-25
US6197733B1 (en) 2001-03-06

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