SG76599A1 - Tunneling magnetoresistance element and magnetic sensor magnetic head and magnetic memory using the element - Google Patents

Tunneling magnetoresistance element and magnetic sensor magnetic head and magnetic memory using the element

Info

Publication number
SG76599A1
SG76599A1 SG1999001365A SG1999001365A SG76599A1 SG 76599 A1 SG76599 A1 SG 76599A1 SG 1999001365 A SG1999001365 A SG 1999001365A SG 1999001365 A SG1999001365 A SG 1999001365A SG 76599 A1 SG76599 A1 SG 76599A1
Authority
SG
Singapore
Prior art keywords
magnetic
tunneling magnetoresistance
memory
head
sensor
Prior art date
Application number
SG1999001365A
Other languages
English (en)
Inventor
Sato Toshihiko
Nakatani Ryoichi
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of SG76599A1 publication Critical patent/SG76599A1/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B61/00Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H10B61/20Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
    • H10B61/22Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3909Arrangements using a magnetic tunnel junction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Theoretical Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Hall/Mr Elements (AREA)
  • Thin Magnetic Films (AREA)
  • Semiconductor Memories (AREA)
  • Measuring Magnetic Variables (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Magnetic Heads (AREA)
SG1999001365A 1998-03-18 1999-03-13 Tunneling magnetoresistance element and magnetic sensor magnetic head and magnetic memory using the element SG76599A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06809698A JP3646508B2 (ja) 1998-03-18 1998-03-18 トンネル磁気抵抗効果素子、これを用いた磁気センサー及び磁気ヘッド

Publications (1)

Publication Number Publication Date
SG76599A1 true SG76599A1 (en) 2000-11-21

Family

ID=13363877

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1999001365A SG76599A1 (en) 1998-03-18 1999-03-13 Tunneling magnetoresistance element and magnetic sensor magnetic head and magnetic memory using the element

Country Status (4)

Country Link
US (1) US6201259B1 (ko)
JP (1) JP3646508B2 (ko)
KR (1) KR100636698B1 (ko)
SG (1) SG76599A1 (ko)

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US6381171B1 (en) * 1999-05-19 2002-04-30 Kabushiki Kaisha Toshiba Magnetic element, magnetic read head, magnetic storage device, magnetic memory device
US6515957B1 (en) * 1999-10-06 2003-02-04 International Business Machines Corporation Ferroelectric drive for data storage
DE10007868B4 (de) * 2000-02-21 2010-02-18 Robert Bosch Gmbh Elektronische Steuerschaltung
US6281538B1 (en) * 2000-03-22 2001-08-28 Motorola, Inc. Multi-layer tunneling device with a graded stoichiometry insulating layer
AU2001269828A1 (en) * 2000-06-15 2001-12-24 Estancia Limited Non-volatile ferromagnetic memory having sensor circuitry shared with its state change circuitry
JP4309075B2 (ja) * 2000-07-27 2009-08-05 株式会社東芝 磁気記憶装置
US6400600B1 (en) * 2000-09-30 2002-06-04 Hewlett-Packard Company Method of repairing defective tunnel junctions
KR100396602B1 (ko) * 2000-12-12 2003-09-02 엘지전자 주식회사 탄소나노튜브를 이용한 터널접합 자기저항 소자
US6356147B1 (en) * 2000-12-19 2002-03-12 International Business Machines Corporation Wideband dual amplifier circuits
DE10114963A1 (de) * 2001-03-20 2002-10-02 Infineon Technologies Ag Halbleiterelement mit einem semimagnetischen Kontakt
US6829160B1 (en) * 2001-04-06 2004-12-07 Western Digital (Fremont), Inc. Magnetic ram cell with amplification circuitry and MRAM memory array formed using the MRAM cells
TWI222630B (en) * 2001-04-24 2004-10-21 Matsushita Electric Ind Co Ltd Magnetoresistive element and magnetoresistive memory device using the same
KR100772797B1 (ko) * 2001-06-30 2007-11-01 주식회사 하이닉스반도체 자기저항램과 그의 셀 및 셀 어레이
KR100519751B1 (ko) * 2001-07-05 2005-10-07 삼성전자주식회사 단일 트랜지스터형 자기 랜덤 액세스 메모리 소자와 그구동 및 제조방법
KR100446616B1 (ko) * 2001-10-18 2004-09-04 삼성전자주식회사 단일 트랜지스터형 자기 랜덤 액세스 메모리 소자와 그구동 및 제조방법
KR100486708B1 (ko) * 2001-11-24 2005-05-03 삼성전자주식회사 자기 랜덤 액세스 메모리 및 그 작동 방법
JP3661652B2 (ja) * 2002-02-15 2005-06-15 ソニー株式会社 磁気抵抗効果素子および磁気メモリ装置
WO2003092084A1 (fr) 2002-04-23 2003-11-06 Matsushita Electric Industrial Co., Ltd. Element magnetoresistif, procede de fabrication associe, tete magnetique, memoire magnetique et dispositif d'enregistrement magnetique utilisant un tel element
US6936763B2 (en) * 2002-06-28 2005-08-30 Freescale Semiconductor, Inc. Magnetic shielding for electronic circuits which include magnetic materials
KR20040006765A (ko) * 2002-07-15 2004-01-24 주식회사 하이닉스반도체 자기저항 램
JP3959335B2 (ja) 2002-07-30 2007-08-15 株式会社東芝 磁気記憶装置及びその製造方法
US20040060164A1 (en) * 2002-09-26 2004-04-01 Honeywell International Inc. High-performance substrate for magnetic isolator
JP4509467B2 (ja) 2002-11-08 2010-07-21 シャープ株式会社 不揮発可変抵抗素子、及び記憶装置
US6784091B1 (en) 2003-06-05 2004-08-31 International Business Machines Corporation Maskless array protection process flow for forming interconnect vias in magnetic random access memory devices
US7321734B2 (en) * 2004-07-29 2008-01-22 Nortel Networks Limited Digital synthesis of readily compensated optical signals
US7349185B2 (en) * 2004-07-30 2008-03-25 Hitachi Global Storage Technologies Netherlands, B.V. Three terminal magnetic sensor for magnetic heads with a semiconductor junction
JP4783002B2 (ja) 2004-11-10 2011-09-28 株式会社東芝 半導体メモリ素子
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US7636223B2 (en) * 2005-01-10 2009-12-22 Hitachi Global Storage Technologies Netherlands B.V. Three terminal magnetic sensor having an in-stack longitudinal biasing layer structure and a self-pinned layer structure
US7639459B2 (en) * 2005-01-10 2009-12-29 Hitachi Global Storage Technologies Netherlands B.V. Three terminal magnetic sensor having an in-stack longitudinal biasing layer structure
US7710691B2 (en) * 2005-01-10 2010-05-04 Hitachi Global Storage Technologies Netherlands B.V. Three terminal magnetic sensor having an in-stack longitudinal biasing layer structure in the collector region and a pinned layer structure in the emitter region
KR100697779B1 (ko) * 2005-03-05 2007-03-20 한국과학기술연구원 Soi기판을 이용한 하이브리드형 자성체/반도체 스핀소자및 그 제조방법
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KR20080090932A (ko) * 2007-04-06 2008-10-09 삼성전자주식회사 강유전체 하드디스크 장치
CN101821666A (zh) * 2007-09-07 2010-09-01 瑞尔·D公司 用于观看立体图像的系统和眼镜
WO2009102577A1 (en) * 2008-02-13 2009-08-20 University Of Delaware Electromagnetic wave detection methods and apparatus
US7961493B2 (en) * 2008-06-06 2011-06-14 International Business Machines Corporation Programmable device
US8941379B2 (en) * 2009-05-14 2015-01-27 University Of Delaware Electromagnetic wave detection systems and methods
JP2010146723A (ja) * 2010-01-27 2010-07-01 Fujitsu Ltd 磁性メモリデバイス、および磁性メモリデバイスにおけるデータ読み出し方法
JP2011243716A (ja) * 2010-05-18 2011-12-01 Toshiba Corp スピントランジスタ及び集積回路
ES2698153B2 (es) 2017-07-31 2019-06-07 Univ Madrid Carlos Iii Procedimiento para la producción de partículas de corcho magnéticas, partículas así obtenidas y usos de las mismas
US10892299B2 (en) 2018-07-31 2021-01-12 International Business Machines Corporation Magnetic field controlled transistor
JP7127454B2 (ja) * 2018-09-26 2022-08-30 Tdk株式会社 メモリスタ回路、メモリスタ制御システム、アナログ積和演算器、及びニューロモーフィックデバイス
CN114062978B (zh) * 2021-11-15 2024-02-02 东南大学 一种基于压电隧道效应的mems磁场传感器及测量磁场方法
CN115542207B (zh) * 2022-09-22 2023-10-31 江苏多维科技有限公司 一种磁电阻结构及单轴向测量磁传感器

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JP3253696B2 (ja) * 1992-09-11 2002-02-04 株式会社東芝 磁気抵抗効果素子
JP3258241B2 (ja) * 1996-09-30 2002-02-18 株式会社東芝 単一電子制御磁気抵抗素子
US5801984A (en) * 1996-11-27 1998-09-01 International Business Machines Corporation Magnetic tunnel junction device with ferromagnetic multilayer having fixed magnetic moment

Also Published As

Publication number Publication date
KR100636698B1 (ko) 2006-10-23
KR19990077881A (ko) 1999-10-25
JPH11266043A (ja) 1999-09-28
US6201259B1 (en) 2001-03-13
JP3646508B2 (ja) 2005-05-11

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