SG76567A1 - Resist removing method and apparatus - Google Patents

Resist removing method and apparatus

Info

Publication number
SG76567A1
SG76567A1 SG1998004235A SG1998004235A SG76567A1 SG 76567 A1 SG76567 A1 SG 76567A1 SG 1998004235 A SG1998004235 A SG 1998004235A SG 1998004235 A SG1998004235 A SG 1998004235A SG 76567 A1 SG76567 A1 SG 76567A1
Authority
SG
Singapore
Prior art keywords
removing method
resist removing
resist
Prior art date
Application number
SG1998004235A
Other languages
English (en)
Inventor
Dong-Jin Park
Jin-Ho Hwang
June-Ing Gil
Je-Eung Park
Sang-Mun Chon
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Priority to SG9903740A priority Critical patent/SG110995A1/en
Publication of SG76567A1 publication Critical patent/SG76567A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
SG1998004235A 1998-08-05 1998-10-21 Resist removing method and apparatus SG76567A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG9903740A SG110995A1 (en) 1998-08-05 1999-08-03 Use of alkoxy n-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same, and resist removing method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR19980032355 1998-08-05

Publications (1)

Publication Number Publication Date
SG76567A1 true SG76567A1 (en) 2000-11-21

Family

ID=19546809

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1998004235A SG76567A1 (en) 1998-08-05 1998-10-21 Resist removing method and apparatus

Country Status (5)

Country Link
CN (1) CN1244029A (zh)
FR (1) FR2782175A1 (zh)
GB (1) GB9823967D0 (zh)
SG (1) SG76567A1 (zh)
TW (1) TW594442B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100434491B1 (ko) 2001-08-17 2004-06-05 삼성전자주식회사 레지스트 또는 식각 부산물 제거용 조성물 및 이를 이용한레지스트 제거 방법
US10395915B2 (en) * 2013-02-28 2019-08-27 Semes Co., Ltd. Nozzle assembly, substrate treatment apparatus including the nozzle assembly, and method of treating substrate using the assembly

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4722355A (en) * 1985-08-19 1988-02-02 Rolf Moe Machine and method for stripping photoresist from wafers
GB2199587B (en) * 1986-12-10 1991-03-27 Advanced Chem Tech Stripping compositions and use therof
US5690747A (en) * 1988-05-20 1997-11-25 The Boeing Company Method for removing photoresist with solvent and ultrasonic agitation
US5204026A (en) * 1988-05-20 1993-04-20 The Boeing Company Solvent with alicyclic carbonate and ethylene dipropionate
JPH02253265A (ja) * 1989-03-28 1990-10-12 Nippon Zeon Co Ltd レジスト剥離剤
US5753601A (en) * 1991-01-25 1998-05-19 Ashland Inc Organic stripping composition
US5753135A (en) * 1995-10-23 1998-05-19 Jablonsky; Julius James Apparatus and method for recovering photoresist developers and strippers
KR100234532B1 (ko) * 1996-09-21 1999-12-15 윤종용 반도체 제조공정의 포토레지스트 세정용 시너 조성물 및 그를 이용한 반도체장치의 제조방법

Also Published As

Publication number Publication date
CN1244029A (zh) 2000-02-09
TW594442B (en) 2004-06-21
GB9823967D0 (en) 1998-12-30
FR2782175A1 (fr) 2000-02-11

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