GB2199587B - Stripping compositions and use therof - Google Patents

Stripping compositions and use therof

Info

Publication number
GB2199587B
GB2199587B GB8728587A GB8728587A GB2199587B GB 2199587 B GB2199587 B GB 2199587B GB 8728587 A GB8728587 A GB 8728587A GB 8728587 A GB8728587 A GB 8728587A GB 2199587 B GB2199587 B GB 2199587B
Authority
GB
United Kingdom
Prior art keywords
stripping compositions
use therof
therof
stripping
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB8728587A
Other versions
GB2199587A (en
GB8728587D0 (en
Inventor
Irl E Ward
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Chem Tech
Advanced Chemical Technologies Inc
Original Assignee
Advanced Chem Tech
Advanced Chemical Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Chem Tech, Advanced Chemical Technologies Inc filed Critical Advanced Chem Tech
Publication of GB8728587D0 publication Critical patent/GB8728587D0/en
Publication of GB2199587A publication Critical patent/GB2199587A/en
Application granted granted Critical
Publication of GB2199587B publication Critical patent/GB2199587B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D9/00—Chemical paint or ink removers
GB8728587A 1986-12-10 1987-12-07 Stripping compositions and use therof Expired - Fee Related GB2199587B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US94009886A 1986-12-10 1986-12-10

Publications (3)

Publication Number Publication Date
GB8728587D0 GB8728587D0 (en) 1988-01-13
GB2199587A GB2199587A (en) 1988-07-13
GB2199587B true GB2199587B (en) 1991-03-27

Family

ID=25474222

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8728587A Expired - Fee Related GB2199587B (en) 1986-12-10 1987-12-07 Stripping compositions and use therof

Country Status (1)

Country Link
GB (1) GB2199587B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100271761B1 (en) * 1997-11-21 2000-12-01 윤종용 Manufacturing method of semiconductor device
US6274537B1 (en) 1998-08-05 2001-08-14 Samsung Electronics Co., Ltd. Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same
TW594442B (en) * 1998-08-05 2004-06-21 Samsung Electronics Co Ltd Resist removing method and apparatus
KR100335484B1 (en) * 1998-08-05 2002-05-04 윤종용 Use of an Alkoxy N-Hydroxyalkyl Alkanamide as Resist Removing Agent, Composition for Removing Resist, Method for Preparing the Same and Resist Removing Method Using the Same
DE19936626B4 (en) * 1998-08-05 2007-12-06 Samsung Electronics Co., Ltd., Suwon Resistant remover and resist removal method
KR100360397B1 (en) * 1999-11-26 2002-11-18 삼성전자 주식회사 Resist removing composition and resist removing method using the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3784477A (en) * 1971-08-13 1974-01-08 R Esposito Paint removal compositions
US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3784477A (en) * 1971-08-13 1974-01-08 R Esposito Paint removal compositions
US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same

Also Published As

Publication number Publication date
GB2199587A (en) 1988-07-13
GB8728587D0 (en) 1988-01-13

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20051207