GB9823967D0 - Resist removing method and apparatus - Google Patents
Resist removing method and apparatusInfo
- Publication number
- GB9823967D0 GB9823967D0 GBGB9823967.6A GB9823967A GB9823967D0 GB 9823967 D0 GB9823967 D0 GB 9823967D0 GB 9823967 A GB9823967 A GB 9823967A GB 9823967 D0 GB9823967 D0 GB 9823967D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- removing method
- resist removing
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR19980032355 | 1998-08-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB9823967D0 true GB9823967D0 (en) | 1998-12-30 |
Family
ID=19546809
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB9823967.6A Ceased GB9823967D0 (en) | 1998-08-05 | 1998-11-02 | Resist removing method and apparatus |
Country Status (5)
Country | Link |
---|---|
CN (1) | CN1244029A (en) |
FR (1) | FR2782175A1 (en) |
GB (1) | GB9823967D0 (en) |
SG (1) | SG76567A1 (en) |
TW (1) | TW594442B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100434491B1 (en) * | 2001-08-17 | 2004-06-05 | 삼성전자주식회사 | Resist or etching by-products removing composition and resist removing method using the same |
US10395915B2 (en) * | 2013-02-28 | 2019-08-27 | Semes Co., Ltd. | Nozzle assembly, substrate treatment apparatus including the nozzle assembly, and method of treating substrate using the assembly |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4722355A (en) * | 1985-08-19 | 1988-02-02 | Rolf Moe | Machine and method for stripping photoresist from wafers |
GB2199587B (en) * | 1986-12-10 | 1991-03-27 | Advanced Chem Tech | Stripping compositions and use therof |
US5690747A (en) * | 1988-05-20 | 1997-11-25 | The Boeing Company | Method for removing photoresist with solvent and ultrasonic agitation |
US5204026A (en) * | 1988-05-20 | 1993-04-20 | The Boeing Company | Solvent with alicyclic carbonate and ethylene dipropionate |
JPH02253265A (en) * | 1989-03-28 | 1990-10-12 | Nippon Zeon Co Ltd | Resist peeling agent |
US5753601A (en) * | 1991-01-25 | 1998-05-19 | Ashland Inc | Organic stripping composition |
US5753135A (en) * | 1995-10-23 | 1998-05-19 | Jablonsky; Julius James | Apparatus and method for recovering photoresist developers and strippers |
KR100234532B1 (en) * | 1996-09-21 | 1999-12-15 | 윤종용 | Thinner composition used in cleaning photoresist and semiconductor manufacturing method using the same |
-
1998
- 1998-10-21 TW TW87117417A patent/TW594442B/en not_active IP Right Cessation
- 1998-10-21 SG SG1998004235A patent/SG76567A1/en unknown
- 1998-11-02 GB GBGB9823967.6A patent/GB9823967D0/en not_active Ceased
- 1998-11-04 FR FR9813857A patent/FR2782175A1/en active Pending
- 1998-11-05 CN CN 98123847 patent/CN1244029A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
SG76567A1 (en) | 2000-11-21 |
TW594442B (en) | 2004-06-21 |
FR2782175A1 (en) | 2000-02-11 |
CN1244029A (en) | 2000-02-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AT | Applications terminated before publication under section 16(1) |