GB9823967D0 - Resist removing method and apparatus - Google Patents

Resist removing method and apparatus

Info

Publication number
GB9823967D0
GB9823967D0 GBGB9823967.6A GB9823967A GB9823967D0 GB 9823967 D0 GB9823967 D0 GB 9823967D0 GB 9823967 A GB9823967 A GB 9823967A GB 9823967 D0 GB9823967 D0 GB 9823967D0
Authority
GB
United Kingdom
Prior art keywords
removing method
resist removing
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB9823967.6A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of GB9823967D0 publication Critical patent/GB9823967D0/en
Ceased legal-status Critical Current

Links

GBGB9823967.6A 1998-08-05 1998-11-02 Resist removing method and apparatus Ceased GB9823967D0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR19980032355 1998-08-05

Publications (1)

Publication Number Publication Date
GB9823967D0 true GB9823967D0 (en) 1998-12-30

Family

ID=19546809

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB9823967.6A Ceased GB9823967D0 (en) 1998-08-05 1998-11-02 Resist removing method and apparatus

Country Status (5)

Country Link
CN (1) CN1244029A (en)
FR (1) FR2782175A1 (en)
GB (1) GB9823967D0 (en)
SG (1) SG76567A1 (en)
TW (1) TW594442B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100434491B1 (en) * 2001-08-17 2004-06-05 삼성전자주식회사 Resist or etching by-products removing composition and resist removing method using the same
US10395915B2 (en) * 2013-02-28 2019-08-27 Semes Co., Ltd. Nozzle assembly, substrate treatment apparatus including the nozzle assembly, and method of treating substrate using the assembly

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4722355A (en) * 1985-08-19 1988-02-02 Rolf Moe Machine and method for stripping photoresist from wafers
GB2199587B (en) * 1986-12-10 1991-03-27 Advanced Chem Tech Stripping compositions and use therof
US5690747A (en) * 1988-05-20 1997-11-25 The Boeing Company Method for removing photoresist with solvent and ultrasonic agitation
US5204026A (en) * 1988-05-20 1993-04-20 The Boeing Company Solvent with alicyclic carbonate and ethylene dipropionate
JPH02253265A (en) * 1989-03-28 1990-10-12 Nippon Zeon Co Ltd Resist peeling agent
US5753601A (en) * 1991-01-25 1998-05-19 Ashland Inc Organic stripping composition
US5753135A (en) * 1995-10-23 1998-05-19 Jablonsky; Julius James Apparatus and method for recovering photoresist developers and strippers
KR100234532B1 (en) * 1996-09-21 1999-12-15 윤종용 Thinner composition used in cleaning photoresist and semiconductor manufacturing method using the same

Also Published As

Publication number Publication date
SG76567A1 (en) 2000-11-21
TW594442B (en) 2004-06-21
FR2782175A1 (en) 2000-02-11
CN1244029A (en) 2000-02-09

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)