SG71843A1 - Reactor for generation of moisture - Google Patents

Reactor for generation of moisture

Info

Publication number
SG71843A1
SG71843A1 SG1998003776A SG1998003776A SG71843A1 SG 71843 A1 SG71843 A1 SG 71843A1 SG 1998003776 A SG1998003776 A SG 1998003776A SG 1998003776 A SG1998003776 A SG 1998003776A SG 71843 A1 SG71843 A1 SG 71843A1
Authority
SG
Singapore
Prior art keywords
reactor
moisture
generation
Prior art date
Application number
SG1998003776A
Other languages
English (en)
Inventor
Tadahiro Ohmi
Koji Kawada
Yoshikazu Tanabe
Novukazu Ikeda
Akihiro Morimoto
Yukio Minami
Original Assignee
Fujikin Kk
Tadahiro Ohmi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP10998997A priority Critical patent/JP3644790B2/ja
Priority to IL12629398A priority patent/IL126293A/en
Priority to EP98307592A priority patent/EP0987217B1/en
Application filed by Fujikin Kk, Tadahiro Ohmi filed Critical Fujikin Kk
Priority to SG1998003776A priority patent/SG71843A1/en
Priority to KR1019980039721A priority patent/KR100270501B1/ko
Priority to TW087116013A priority patent/TW440542B/zh
Priority to CA002249079A priority patent/CA2249079C/en
Priority to US09/160,188 priority patent/US6180067B1/en
Publication of SG71843A1 publication Critical patent/SG71843A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/007—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor in the presence of catalytically active bodies, e.g. porous plates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B5/00—Water

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Catalysts (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Fuel Cell (AREA)
SG1998003776A 1997-03-26 1998-09-21 Reactor for generation of moisture SG71843A1 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP10998997A JP3644790B2 (ja) 1997-04-28 1997-04-28 水分発生用反応炉
IL12629398A IL126293A (en) 1997-04-28 1998-09-18 Backed to produce moisture
EP98307592A EP0987217B1 (en) 1997-04-28 1998-09-18 Reactor for generation of moisture
SG1998003776A SG71843A1 (en) 1997-04-28 1998-09-21 Reactor for generation of moisture
KR1019980039721A KR100270501B1 (ko) 1997-04-28 1998-09-24 수분 발생용 반응로
TW087116013A TW440542B (en) 1997-03-26 1998-09-25 Reactor for generation of moisture
CA002249079A CA2249079C (en) 1997-04-28 1998-09-25 Reactor for generation of moisture
US09/160,188 US6180067B1 (en) 1997-04-28 1998-09-25 Reactor for the generation of water

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP10998997A JP3644790B2 (ja) 1997-04-28 1997-04-28 水分発生用反応炉
IL12629398A IL126293A (en) 1997-04-28 1998-09-18 Backed to produce moisture
EP98307592A EP0987217B1 (en) 1997-04-28 1998-09-18 Reactor for generation of moisture
SG1998003776A SG71843A1 (en) 1997-04-28 1998-09-21 Reactor for generation of moisture
KR1019980039721A KR100270501B1 (ko) 1997-04-28 1998-09-24 수분 발생용 반응로
CA002249079A CA2249079C (en) 1997-04-28 1998-09-25 Reactor for generation of moisture
US09/160,188 US6180067B1 (en) 1997-04-28 1998-09-25 Reactor for the generation of water

Publications (1)

Publication Number Publication Date
SG71843A1 true SG71843A1 (en) 2000-04-18

Family

ID=33437294

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1998003776A SG71843A1 (en) 1997-03-26 1998-09-21 Reactor for generation of moisture

Country Status (7)

Country Link
US (1) US6180067B1 (ja)
EP (1) EP0987217B1 (ja)
JP (1) JP3644790B2 (ja)
KR (1) KR100270501B1 (ja)
CA (1) CA2249079C (ja)
IL (1) IL126293A (ja)
SG (1) SG71843A1 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI250583B (en) * 1997-03-05 2006-03-01 Hitachi Ltd Manufacturing method for semiconductor integrated circuit device
JP3644790B2 (ja) * 1997-04-28 2005-05-11 忠弘 大見 水分発生用反応炉
EP1138631A1 (en) 1999-08-06 2001-10-04 Fujikin Incorporated Moisture generating/supplying device and moisture generating reactor
US6524934B1 (en) 1999-10-28 2003-02-25 Lorimer D'arcy H. Method of manufacture for generation of high purity water vapor
WO2001094254A1 (fr) * 2000-06-05 2001-12-13 Fujikin Incorporated Reacteur de production d'humidite
JP2002274812A (ja) * 2001-03-23 2002-09-25 Fujikin Inc 水分発生用反応炉
US20030124049A1 (en) * 2001-08-13 2003-07-03 Sowmya Krishnan Catalytic reactor apparatus and method for generating high purity water vapor
US20090028781A1 (en) * 2002-08-13 2009-01-29 Sowmya Krishnan Catalytic reactor method for generating high purity water vapor
US20050252449A1 (en) * 2004-05-12 2005-11-17 Nguyen Son T Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
US10983537B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller
WO2023176208A1 (ja) * 2022-03-14 2023-09-21 株式会社フジキン 水分発生用反応炉

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6025188B2 (ja) * 1978-07-03 1985-06-17 広栄化学工業株式会社 固定触媒接触反応装置
JPS5815007A (ja) * 1981-07-13 1983-01-28 Hitachi Ltd 酸水素再結合装置
JPS60185198A (ja) * 1984-03-05 1985-09-20 株式会社日立製作所 酸素・水素再結合器
US5355973A (en) * 1992-06-02 1994-10-18 Donaldson Company, Inc. Muffler with catalytic converter arrangement; and method
JPH0812303A (ja) * 1994-07-05 1996-01-16 Ishikawajima Harima Heavy Ind Co Ltd プレートリフォーマ
JP3110465B2 (ja) * 1996-01-29 2000-11-20 株式会社 フジキン 水分発生用反応炉と水分発生用反応炉の温度制御方法及び白金コーティング触媒層の形成方法
JP3644790B2 (ja) * 1997-04-28 2005-05-11 忠弘 大見 水分発生用反応炉

Also Published As

Publication number Publication date
CA2249079A1 (en) 2000-03-25
CA2249079C (en) 2001-11-27
KR20000020907A (ko) 2000-04-15
US6180067B1 (en) 2001-01-30
EP0987217B1 (en) 2004-08-04
KR100270501B1 (ko) 2000-12-01
IL126293A0 (en) 1999-08-17
JPH10297907A (ja) 1998-11-10
EP0987217A1 (en) 2000-03-22
IL126293A (en) 2001-08-08
JP3644790B2 (ja) 2005-05-11

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