SG71178A1 - Method of measuring electromagnetic radiation - Google Patents

Method of measuring electromagnetic radiation

Info

Publication number
SG71178A1
SG71178A1 SG9805352A SG1998005352A SG71178A1 SG 71178 A1 SG71178 A1 SG 71178A1 SG 9805352 A SG9805352 A SG 9805352A SG 1998005352 A SG1998005352 A SG 1998005352A SG 71178 A1 SG71178 A1 SG 71178A1
Authority
SG
Singapore
Prior art keywords
electromagnetic radiation
measuring electromagnetic
measuring
radiation
electromagnetic
Prior art date
Application number
SG9805352A
Other languages
English (en)
Inventor
Hauf Markus
Knarr Thomas
Walk Heinrich
Balthasar Horst
Muller Uwe
Original Assignee
Steag Rtp Systems Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19855683A external-priority patent/DE19855683A1/de
Application filed by Steag Rtp Systems Gmbh filed Critical Steag Rtp Systems Gmbh
Publication of SG71178A1 publication Critical patent/SG71178A1/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Radiation Pyrometers (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
SG9805352A 1997-12-08 1998-12-08 Method of measuring electromagnetic radiation SG71178A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19754386 1997-12-08
DE19852320 1998-11-12
DE19855683A DE19855683A1 (de) 1997-12-08 1998-12-02 Verfahren zum Messen elektromagnetischer Strahlung

Publications (1)

Publication Number Publication Date
SG71178A1 true SG71178A1 (en) 2003-08-20

Family

ID=27217999

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9805352A SG71178A1 (en) 1997-12-08 1998-12-08 Method of measuring electromagnetic radiation

Country Status (5)

Country Link
US (2) US6191392B1 (ja)
EP (1) EP0924500B1 (ja)
JP (1) JP3403099B2 (ja)
DE (1) DE59813773D1 (ja)
SG (1) SG71178A1 (ja)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19964183B4 (de) * 1999-02-10 2004-04-29 Steag Rtp Systems Gmbh Vorrichtung und Verfahen zum Messen der Temperatur von Substraten
US6331212B1 (en) * 2000-04-17 2001-12-18 Avansys, Llc Methods and apparatus for thermally processing wafers
US6799137B2 (en) * 2000-06-02 2004-09-28 Engelhard Corporation Wafer temperature measurement method for plasma environments
US6465761B2 (en) * 2000-07-24 2002-10-15 Asm America, Inc. Heat lamps for zone heating
JP2002118071A (ja) * 2000-10-10 2002-04-19 Ushio Inc 光照射式加熱処理装置及び方法
DE10051125A1 (de) * 2000-10-16 2002-05-02 Steag Rtp Systems Gmbh Vorrichtung zum thermischen Behandeln von Substraten
US6707011B2 (en) 2001-04-17 2004-03-16 Mattson Technology, Inc. Rapid thermal processing system for integrated circuits
EP1393354A1 (de) * 2001-05-23 2004-03-03 Mattson Thermal Products GmbH Verfahren und vorrichtung zum thermischen behandeln von substraten
US6917039B2 (en) * 2002-02-13 2005-07-12 Therma-Wave, Inc. Method and system for combined photothermal modulated reflectance and photothermal IR radiometric system
US6849831B2 (en) * 2002-03-29 2005-02-01 Mattson Technology, Inc. Pulsed processing semiconductor heating methods using combinations of heating sources
US7734439B2 (en) 2002-06-24 2010-06-08 Mattson Technology, Inc. System and process for calibrating pyrometers in thermal processing chambers
DE10329107B4 (de) * 2002-12-23 2015-05-28 Mattson Thermal Products Gmbh Verfahren zum Bestimmung wenigstens einer Zustandsvariablen aus einem Modell eines RTP-Systems
US7412299B2 (en) * 2002-12-23 2008-08-12 Mattson Thermal Products Gmbh Process for determining the temperature of a semiconductor wafer in a rapid heating unit
JP4618705B2 (ja) * 2003-09-18 2011-01-26 大日本スクリーン製造株式会社 熱処理装置
CN101002110B (zh) * 2004-08-10 2010-12-08 佳能株式会社 放射线探测装置、闪烁体板及其制造方法和放射线探测系统
CN1828829A (zh) * 2005-03-02 2006-09-06 优志旺电机株式会社 加热器及具备加热器的加热装置
WO2007005489A2 (en) 2005-07-05 2007-01-11 Mattson Technology, Inc. Method and system for determining optical properties of semiconductor wafers
DE102006019807B3 (de) * 2006-04-21 2007-08-23 Leibnitz-Institut für Festkörper- und Werkstoffforschung Dresden e.V. Verfahren zur pyrometrischen Messung der Temperatur des Schmelzgutes in Einkristallzüchtungsanlagen
US7543981B2 (en) 2006-06-29 2009-06-09 Mattson Technology, Inc. Methods for determining wafer temperature
DE102006036585B4 (de) * 2006-08-04 2008-04-17 Mattson Thermal Products Gmbh Verfahren und Vorrichtung zum Ermitteln von Messwerten
US7976216B2 (en) * 2007-12-20 2011-07-12 Mattson Technology, Inc. Determining the temperature of silicon at high temperatures
KR101819636B1 (ko) * 2009-12-23 2018-01-17 헤라우스 노블라이트 아메리카 엘엘씨 컴팩트한 ｕｖ 경화 램프 어셈블리들을 위한 ｕｖ ｌｅｄ 기반 램프
WO2011156037A2 (en) 2010-03-16 2011-12-15 The Penn State Research Foundation Methods and apparatus for ultra-sensitive temperature detection using resonant devices
TWM413957U (en) * 2010-10-27 2011-10-11 Tangteck Equipment Inc Diffusion furnace apparatus
DE102011116243B4 (de) * 2011-10-17 2014-04-17 Centrotherm Photovoltaics Ag Vorrichtung zum Bestimmen der Temperatur eines Substrats
US9159597B2 (en) * 2012-05-15 2015-10-13 Taiwan Semiconductor Manufacturing Company, Ltd. Real-time calibration for wafer processing chamber lamp modules
JP7274512B2 (ja) * 2018-06-26 2023-05-16 アプライド マテリアルズ インコーポレイテッド 温度を測定するための方法及び装置
US11032945B2 (en) * 2019-07-12 2021-06-08 Applied Materials, Inc. Heat shield assembly for an epitaxy chamber
TW202200989A (zh) * 2020-03-13 2022-01-01 美商應用材料股份有限公司 用於檢查燈的設備及方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5180226A (en) * 1991-10-30 1993-01-19 Texas Instruments Incorporated Method and apparatus for precise temperature measurement
WO1994000744A1 (en) * 1992-06-29 1994-01-06 Interuniversitair Micro-Elektronica Centrum Vzw Device and method for heating objects wherein the temperature of the object is measured

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8316306D0 (en) * 1983-06-15 1983-07-20 Thorn Emi Domestic Appliances Heating apparatus
US4680451A (en) * 1985-07-29 1987-07-14 A. G. Associates Apparatus using high intensity CW lamps for improved heat treating of semiconductor wafers
US4818102A (en) 1986-12-22 1989-04-04 United Technologies Corporation Active optical pyrometer
US5310260A (en) 1990-04-10 1994-05-10 Luxtron Corporation Non-contact optical techniques for measuring surface conditions
US5154512A (en) * 1990-04-10 1992-10-13 Luxtron Corporation Non-contact techniques for measuring temperature or radiation-heated objects
EP0522632B1 (en) * 1991-07-08 1996-01-31 Koninklijke Philips Electronics N.V. Electrical appliance for preparing food and electric lamp for use in this appliance
US5714392A (en) * 1996-07-26 1998-02-03 Advanced Micro Devices, Inc. Rapid thermal anneal system and method including improved temperature sensing and monitoring

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5180226A (en) * 1991-10-30 1993-01-19 Texas Instruments Incorporated Method and apparatus for precise temperature measurement
WO1994000744A1 (en) * 1992-06-29 1994-01-06 Interuniversitair Micro-Elektronica Centrum Vzw Device and method for heating objects wherein the temperature of the object is measured

Also Published As

Publication number Publication date
EP0924500B1 (de) 2006-10-18
JP3403099B2 (ja) 2003-05-06
EP0924500A2 (de) 1999-06-23
DE59813773D1 (de) 2006-11-30
EP0924500A3 (de) 2001-04-04
JPH11237281A (ja) 1999-08-31
US6369363B2 (en) 2002-04-09
US20010010308A1 (en) 2001-08-02
US6191392B1 (en) 2001-02-20

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