SG26288G - Positive-working photoresist composition an method for forming a light-absorbing matrix in a colour crt structure - Google Patents
Positive-working photoresist composition an method for forming a light-absorbing matrix in a colour crt structureInfo
- Publication number
- SG26288G SG26288G SG262/88A SG26288A SG26288G SG 26288 G SG26288 G SG 26288G SG 262/88 A SG262/88 A SG 262/88A SG 26288 A SG26288 A SG 26288A SG 26288 G SG26288 G SG 26288G
- Authority
- SG
- Singapore
- Prior art keywords
- positive
- light
- forming
- photoresist composition
- working photoresist
- Prior art date
Links
- 239000011159 matrix material Substances 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
- H01J9/22—Applying luminescent coatings
- H01J9/227—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
- H01J9/2278—Application of light absorbing material, e.g. between the luminescent areas
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US36494982A | 1982-04-02 | 1982-04-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG26288G true SG26288G (en) | 1988-07-15 |
Family
ID=23436824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG262/88A SG26288G (en) | 1982-04-02 | 1988-04-18 | Positive-working photoresist composition an method for forming a light-absorbing matrix in a colour crt structure |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0091163B1 (OSRAM) |
| JP (1) | JPS58202442A (OSRAM) |
| KR (1) | KR910000839B1 (OSRAM) |
| DE (1) | DE3374719D1 (OSRAM) |
| HK (1) | HK59288A (OSRAM) |
| SG (1) | SG26288G (OSRAM) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6145530A (ja) * | 1984-08-08 | 1986-03-05 | Hitachi Ltd | カラ−ブラウン管螢光面の製造方法 |
| JPH06103391B2 (ja) * | 1985-09-20 | 1994-12-14 | 富士写真フイルム株式会社 | 感光性記録材料 |
| JP2550655B2 (ja) * | 1988-04-26 | 1996-11-06 | 凸版印刷株式会社 | ポジ型電子線レジスト |
| GB2218846A (en) * | 1988-05-20 | 1989-11-22 | Rank Brimar Ltd | Manufacture of colour crt phoshor screen |
| JPH07118267B2 (ja) * | 1988-08-22 | 1995-12-18 | 日本電気株式会社 | カラー受像管の製造方法 |
| EP0483693B1 (en) * | 1990-10-29 | 1998-12-30 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive colored resin composition, colored image formation method of color filter, and formation method of black matrix |
| JP3174063B2 (ja) * | 1996-01-24 | 2001-06-11 | 三星電管株式會社 | カラー受像管のブラックマトリックス及びブラックマトリックスの製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2927021A (en) * | 1956-03-27 | 1960-03-01 | Horizons Inc | Method of producing a relief image |
| DE1622462A1 (OSRAM) * | 1960-10-11 | |||
| DE1437892C3 (de) * | 1964-07-23 | 1974-08-22 | Gte Sylvania Inc., Wilmington, Del. (V.St.A.) | Verfahren zur Herstellung von Leuchtschirmen für Farbfernseh-Kathodenstrahlröhren |
| US3620735A (en) * | 1967-06-12 | 1971-11-16 | Diagravure Film Mfg Corp | Relief image process utilizing a simple and a complex ferric salt |
| US4049452A (en) * | 1975-04-23 | 1977-09-20 | Rca Corporation | Reverse-printing method for producing cathode-ray-tube-screen structure |
-
1983
- 1983-03-30 EP EP83200445A patent/EP0091163B1/en not_active Expired
- 1983-03-30 DE DE8383200445T patent/DE3374719D1/de not_active Expired
- 1983-04-02 KR KR1019830001376A patent/KR910000839B1/ko not_active Expired
- 1983-04-02 JP JP58056850A patent/JPS58202442A/ja active Granted
-
1988
- 1988-04-18 SG SG262/88A patent/SG26288G/en unknown
- 1988-08-04 HK HK592/88A patent/HK59288A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| HK59288A (en) | 1988-08-12 |
| EP0091163B1 (en) | 1987-11-25 |
| EP0091163A2 (en) | 1983-10-12 |
| DE3374719D1 (en) | 1988-01-07 |
| KR910000839B1 (ko) | 1991-02-11 |
| KR840004822A (ko) | 1984-10-24 |
| JPH03619B2 (OSRAM) | 1991-01-08 |
| EP0091163A3 (en) | 1984-09-05 |
| JPS58202442A (ja) | 1983-11-25 |
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