SG165494G - Apparatus for transporting substrates - Google Patents

Apparatus for transporting substrates

Info

Publication number
SG165494G
SG165494G SG165494A SG165494A SG165494G SG 165494 G SG165494 G SG 165494G SG 165494 A SG165494 A SG 165494A SG 165494 A SG165494 A SG 165494A SG 165494 G SG165494 G SG 165494G
Authority
SG
Singapore
Prior art keywords
transporting substrates
transporting
substrates
Prior art date
Application number
SG165494A
Other languages
English (en)
Inventor
Rudolf Dr Latz
Original Assignee
Leybold Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Ag filed Critical Leybold Ag
Priority to SG165494A priority Critical patent/SG165494G/en
Publication of SG165494G publication Critical patent/SG165494G/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SG165494A 1991-07-31 1994-11-16 Apparatus for transporting substrates SG165494G (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG165494A SG165494G (en) 1991-07-31 1994-11-16 Apparatus for transporting substrates

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4125334A DE4125334C2 (de) 1991-07-31 1991-07-31 Vorrichtung für den Transport von Substraten
SG165494A SG165494G (en) 1991-07-31 1994-11-16 Apparatus for transporting substrates

Publications (1)

Publication Number Publication Date
SG165494G true SG165494G (en) 1995-06-16

Family

ID=6437393

Family Applications (1)

Application Number Title Priority Date Filing Date
SG165494A SG165494G (en) 1991-07-31 1994-11-16 Apparatus for transporting substrates

Country Status (5)

Country Link
EP (1) EP0525279B1 (fr)
JP (1) JP2740420B2 (fr)
KR (1) KR930002537A (fr)
DE (2) DE4125334C2 (fr)
SG (1) SG165494G (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6264804B1 (en) 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
DE102007052524B4 (de) * 2007-11-01 2012-05-31 Von Ardenne Anlagentechnik Gmbh Transportmittel und Vakuumbeschichtungsanlage für Substrate unterschiedlicher Größe
DE102011085789B4 (de) 2011-11-04 2015-02-12 Von Ardenne Gmbh Vertikale Durchlaufbeschichtungsanlage zur kontinuierlichen Vakuumbeschichtung von Substraten
US9527244B2 (en) 2014-02-10 2016-12-27 Global Filtration Systems Apparatus and method for forming three-dimensional objects from solidifiable paste
DE102014104009A1 (de) * 2014-03-24 2015-09-24 Aixtron Se Auf seinen beiden voneinander wegweisenden Breitseiten je ein Substrat tragender Substratträger
DE102014104011A1 (de) 2014-03-24 2015-09-24 Aixtron Se Vorrichtung zum Abscheiden von Nanotubes

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4042128A (en) * 1975-11-26 1977-08-16 Airco, Inc. Substrate transfer apparatus for a vacuum coating system
US4141811A (en) * 1978-04-24 1979-02-27 Atlantic Richfield Company Plasma etching process for the manufacture of solar cells
JPS5739430U (fr) * 1980-08-14 1982-03-03
DE3107914A1 (de) * 1981-03-02 1982-09-16 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum beschichten von formteilen durch katodenzerstaeubung
DE3623970A1 (de) * 1986-07-16 1988-01-28 Leybold Heraeus Gmbh & Co Kg Transporteinrichtung mit rollensystemen fuer vakuum-beschichtungsanlagen
DE3702775A1 (de) * 1987-01-30 1988-08-11 Leybold Ag Vorrichtung zum quasi-kontinuierlichen behandeln von substraten
CA1333547C (fr) * 1987-09-11 1994-12-20 Victor Alexander Ettel Revetement metallique pour fibres inorganiques et pour particules solides
EP0346815A3 (fr) * 1988-06-13 1990-12-19 Asahi Glass Company Ltd. Dispositif de traitement sous vide et son système de transport
JP2714833B2 (ja) * 1988-12-18 1998-02-16 日本真空技術株式会社 仕込・取出室
DE4029905C2 (de) * 1990-09-21 1993-10-28 Leybold Ag Vorrichtung für den Transport von Substraten

Also Published As

Publication number Publication date
DE59200528D1 (de) 1994-10-27
JP2740420B2 (ja) 1998-04-15
DE4125334C2 (de) 1999-08-19
EP0525279B1 (fr) 1994-09-21
DE4125334A1 (de) 1993-02-04
JPH05195207A (ja) 1993-08-03
KR930002537A (ko) 1993-02-23
EP0525279A1 (fr) 1993-02-03

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