SG153763A1 - Immersion lithographic apparatus and device manufacturing method - Google Patents

Immersion lithographic apparatus and device manufacturing method

Info

Publication number
SG153763A1
SG153763A1 SG200809216-5A SG2008092165A SG153763A1 SG 153763 A1 SG153763 A1 SG 153763A1 SG 2008092165 A SG2008092165 A SG 2008092165A SG 153763 A1 SG153763 A1 SG 153763A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
substrate table
acceleration profile
immersion liquid
device manufacturing
Prior art date
Application number
SG200809216-5A
Other languages
English (en)
Inventor
Martinus Hendrikus Antonius Leenders
Sjoerd Nicolaas Lambertus Donders
Wagner Christian
Rogier Hendrikus Magdalena Cortie
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG153763A1 publication Critical patent/SG153763A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
SG200809216-5A 2007-12-21 2008-12-10 Immersion lithographic apparatus and device manufacturing method SG153763A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US858907P 2007-12-21 2007-12-21

Publications (1)

Publication Number Publication Date
SG153763A1 true SG153763A1 (en) 2009-07-29

Family

ID=40445611

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200809216-5A SG153763A1 (en) 2007-12-21 2008-12-10 Immersion lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US8953141B2 (zh)
EP (1) EP2073062A1 (zh)
JP (1) JP4860681B2 (zh)
KR (1) KR101077047B1 (zh)
CN (1) CN101464636B (zh)
SG (1) SG153763A1 (zh)
TW (1) TWI396056B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2221669A3 (en) 2009-02-19 2011-02-09 ASML Netherlands B.V. A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
NL2005655A (en) * 2009-12-09 2011-06-14 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
NL2006818A (en) 2010-07-02 2012-01-03 Asml Netherlands Bv A method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus.
CN103186055B (zh) * 2011-12-31 2016-04-20 中芯国际集成电路制造(上海)有限公司 光刻机及其扫描曝光方法
JP6383177B2 (ja) * 2014-05-13 2018-08-29 キヤノン株式会社 露光装置及びその制御方法、並びにデバイスの製造方法
CN108292101B (zh) * 2015-10-01 2020-07-21 Asml荷兰有限公司 光刻设备及器件制造方法
WO2018007118A1 (en) * 2016-07-07 2018-01-11 Asml Netherlands B.V. An inspection substrate and an inspection method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006130338A1 (en) * 2005-06-01 2006-12-07 Nikon Corporation Immersion fluid containment system and method for immersion lithography
US20070081133A1 (en) * 2004-12-14 2007-04-12 Niikon Corporation Projection exposure apparatus and stage unit, and exposure method
US20080297749A1 (en) * 2007-05-31 2008-12-04 Rene Wirtz Immersion lithographic process using a variable scan speed

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) * 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
JP2000040658A (ja) * 1998-07-24 2000-02-08 Nikon Corp ステージ制御方法及び走査型露光装置
JP2004072076A (ja) * 2002-06-10 2004-03-04 Nikon Corp 露光装置及びステージ装置、並びにデバイス製造方法
TWI232357B (en) 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101424881B (zh) * 2002-11-12 2011-11-30 Asml荷兰有限公司 光刻投射装置
EP1482372B1 (en) 2003-05-30 2014-10-08 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI347741B (en) 2003-05-30 2011-08-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7016019B2 (en) 2003-12-16 2006-03-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2006007111A2 (en) 2004-07-01 2006-01-19 Nikon Corporation A dynamic fluid control system for immersion lithography
JP3870207B2 (ja) 2004-08-05 2007-01-17 キヤノン株式会社 液浸露光装置及びデバイス製造方法
JP4262252B2 (ja) 2005-03-02 2009-05-13 キヤノン株式会社 露光装置
JP4605219B2 (ja) * 2005-03-30 2011-01-05 株式会社ニコン 露光条件の決定方法、露光方法及び露光装置、並びにデバイス製造方法
US7903232B2 (en) * 2006-04-12 2011-03-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070081133A1 (en) * 2004-12-14 2007-04-12 Niikon Corporation Projection exposure apparatus and stage unit, and exposure method
WO2006130338A1 (en) * 2005-06-01 2006-12-07 Nikon Corporation Immersion fluid containment system and method for immersion lithography
US20080297749A1 (en) * 2007-05-31 2008-12-04 Rene Wirtz Immersion lithographic process using a variable scan speed

Also Published As

Publication number Publication date
TW200938960A (en) 2009-09-16
EP2073062A1 (en) 2009-06-24
TWI396056B (zh) 2013-05-11
JP4860681B2 (ja) 2012-01-25
US8953141B2 (en) 2015-02-10
JP2009152595A (ja) 2009-07-09
US20090161089A1 (en) 2009-06-25
KR101077047B1 (ko) 2011-10-26
KR20090068159A (ko) 2009-06-25
CN101464636B (zh) 2011-05-04
CN101464636A (zh) 2009-06-24

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