SG140459A1 - Cleaning apparatus - Google Patents

Cleaning apparatus

Info

Publication number
SG140459A1
SG140459A1 SG200403063-1A SG2004030631A SG140459A1 SG 140459 A1 SG140459 A1 SG 140459A1 SG 2004030631 A SG2004030631 A SG 2004030631A SG 140459 A1 SG140459 A1 SG 140459A1
Authority
SG
Singapore
Prior art keywords
cleaned
cleaning
cleaning apparatus
ejecting
heated gas
Prior art date
Application number
SG200403063-1A
Inventor
Kurao Habaya
Tatsuro Yano
Takahiro Shiroma
Original Assignee
Fuji Elec Device Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Elec Device Tech Co Ltd filed Critical Fuji Elec Device Tech Co Ltd
Publication of SG140459A1 publication Critical patent/SG140459A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/003—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods using material which dissolves or changes phase after the treatment, e.g. ice, CO2

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning In General (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

CLEANING APPARATUS To prevent dew condensation of an object to be cleaned, a cleaning apparatus which cleans the object to be cleaned by ejecting a solvent from a nozzle comprises gas ejecting means for ejecting heated gas to a surface of the object to be cleaned, wherein the wing ejecting means is configured to move on the object to be cleaned when cleaning is performed, and retract from the object to be cleaned when cleaning is not performed, so that a small quantity of heated gas is ejected, and a large quantity of heated gas is ejected when cleaning is performed.
SG200403063-1A 2003-06-02 2004-05-28 Cleaning apparatus SG140459A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003156321A JP4118194B2 (en) 2003-06-02 2003-06-02 Cleaning device

Publications (1)

Publication Number Publication Date
SG140459A1 true SG140459A1 (en) 2008-03-28

Family

ID=34050437

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200403063-1A SG140459A1 (en) 2003-06-02 2004-05-28 Cleaning apparatus

Country Status (5)

Country Link
US (1) US20050160552A1 (en)
JP (1) JP4118194B2 (en)
CN (1) CN1572383A (en)
MY (1) MY135287A (en)
SG (1) SG140459A1 (en)

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JPH0975958A (en) * 1995-09-06 1997-03-25 Daiei Kogyo Kk Ozone water discharging device
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JP5829082B2 (en) * 2011-09-09 2015-12-09 オリンパス株式会社 Cleaning device
CN102380492A (en) * 2011-09-30 2012-03-21 么丽敏 Cleaning machine of plastic greenhouse
FR2983106B1 (en) 2011-11-24 2014-01-10 Air Liquide DEVICE FOR DISPENSING CRYOGENIC FLUID JETS WITH A TRANQUILIZING CHAMBER
CN105027201A (en) * 2013-03-14 2015-11-04 酷兰斯公司 Phonograph record cleaner
DE102013102703A1 (en) * 2013-03-18 2014-09-18 Sandvik Materials Technology Deutschland Gmbh Method for producing a steel pipe with cleaning of the pipe outer wall
KR101387024B1 (en) * 2013-11-25 2014-04-21 한모기술주식회사 The combined cleaning system for hear exchanger
JP6509104B2 (en) * 2015-09-30 2019-05-08 東京エレクトロン株式会社 Substrate liquid processing system
CN106078530B (en) * 2016-06-23 2018-08-17 南通普瑞特机械有限公司 A kind of ball blast abrasive jet cleaning device
EP3330660B1 (en) * 2016-11-30 2019-04-24 AIC GmbH Method, use and device for cleaning cooling tower inserts
CN108188112B (en) * 2018-01-08 2020-10-30 迪普干冰制造(大连)有限公司 Liquid carbon dioxide cleaning system
CN113814226B (en) * 2020-06-19 2023-01-24 理光高科技(深圳)有限公司 Dry type cleaning device
CN113701068B (en) * 2021-09-11 2023-12-29 深圳市源科光电有限公司 Anti-interference LED lamp bead

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US3635454A (en) * 1970-05-07 1972-01-18 Ibm Apparatus and process for the removal of insulation from wire
US5125979A (en) * 1990-07-02 1992-06-30 Xerox Corporation Carbon dioxide snow agglomeration and acceleration
US5315793A (en) * 1991-10-01 1994-05-31 Hughes Aircraft Company System for precision cleaning by jet spray
US5372652A (en) * 1993-06-14 1994-12-13 International Business Machines Corporation Aerosol cleaning method
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US5939139A (en) * 1997-01-24 1999-08-17 Tokyo Electron Limited Method of removing coated film from substrate edge surface and apparatus for removing coated film

Also Published As

Publication number Publication date
CN1572383A (en) 2005-02-02
MY135287A (en) 2008-03-31
US20050160552A1 (en) 2005-07-28
JP2004363145A (en) 2004-12-24
JP4118194B2 (en) 2008-07-16

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