SG138572A1 - Correction of off-axis translation of optical elements in an optical zoom assembly - Google Patents

Correction of off-axis translation of optical elements in an optical zoom assembly

Info

Publication number
SG138572A1
SG138572A1 SG200704578-4A SG2007045784A SG138572A1 SG 138572 A1 SG138572 A1 SG 138572A1 SG 2007045784 A SG2007045784 A SG 2007045784A SG 138572 A1 SG138572 A1 SG 138572A1
Authority
SG
Singapore
Prior art keywords
optical
correction
axis translation
zoom assembly
optical elements
Prior art date
Application number
SG200704578-4A
Other languages
English (en)
Inventor
Kevin J Violette
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of SG138572A1 publication Critical patent/SG138572A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200704578-4A 2006-06-23 2007-06-20 Correction of off-axis translation of optical elements in an optical zoom assembly SG138572A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/473,114 US7508514B2 (en) 2006-06-23 2006-06-23 Correction of off-axis translation of optical elements in an optical zoom assembly

Publications (1)

Publication Number Publication Date
SG138572A1 true SG138572A1 (en) 2008-01-28

Family

ID=38291283

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200704578-4A SG138572A1 (en) 2006-06-23 2007-06-20 Correction of off-axis translation of optical elements in an optical zoom assembly

Country Status (7)

Country Link
US (1) US7508514B2 (ko)
EP (1) EP1870668A1 (ko)
JP (1) JP2008003607A (ko)
KR (1) KR100883612B1 (ko)
CN (1) CN101105641A (ko)
SG (1) SG138572A1 (ko)
TW (1) TW200809428A (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102095390A (zh) * 2010-12-29 2011-06-15 哈尔滨工业大学 空间光通信终端光轴与其定位研磨面夹角的精确测量方法
EP3441790A1 (en) 2013-10-23 2019-02-13 Ladar Limited A laser detection and ranging device for detecting an object under a water surface
DE102017101824A1 (de) 2017-01-31 2018-08-02 Carl Zeiss Microscopy Gmbh Verfahren zum Bestimmen einer Abweichung auf einem Verschiebeweg einer Zoom-Optik und Verfahren zur Korrektur sowie Bildaufnahmevorrichtung
TWI701497B (zh) * 2018-10-17 2020-08-11 英錡科技股份有限公司 具有光點自動校正的投影裝置
KR102525326B1 (ko) * 2022-03-15 2023-04-25 (주)오로스 테크놀로지 입사각을 갖는 오프-액시스 렌즈 조립체
CN116009231B (zh) * 2022-12-15 2023-09-22 江苏缪斯光电科技有限公司 一种用于镭射光学瞄准镜的校准装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3723013A (en) 1970-10-23 1973-03-27 Atomic Energy Commission Alignment system
US3726013A (en) * 1971-03-01 1973-04-10 R Page Foot controller for dental instruments
JPS59163943U (ja) * 1983-04-18 1984-11-02 パイオニア株式会社 光軸モニタ装置
JPS62293212A (ja) * 1986-06-13 1987-12-19 Fujitsu Ltd 光軸調整装置
JPH02300697A (ja) * 1989-05-15 1990-12-12 Nec Corp シンクロトロン放射光と露光装置の軸ずれ検出方法
JPH02300700A (ja) * 1989-05-15 1990-12-12 Nec Corp シンクロトロン放射光と露光装置の軸ずれ検出方法
JP2579955Y2 (ja) * 1991-11-11 1998-09-03 旭光学工業株式会社 レンズ鏡筒
JP2857306B2 (ja) * 1992-12-14 1999-02-17 三菱電機株式会社 光空間伝送装置
JPH06310400A (ja) * 1993-04-12 1994-11-04 Svg Lithography Syst Inc 軸上マスクとウェーハ直線配列システム
US6023337A (en) 1997-09-26 2000-02-08 Schmitt Measurement Systems, Inc. See through laser alignment target device
JPH11297611A (ja) 1998-04-08 1999-10-29 Nikon Corp 荷電粒子線描画装置
JP2000019385A (ja) 1998-06-30 2000-01-21 Canon Inc 露光装置およびデバイス製造方法
EP1014196A3 (en) 1998-12-17 2002-05-29 Nikon Corporation Method and system of illumination for a projection optical apparatus
US6288381B1 (en) 1999-08-26 2001-09-11 Raytheon Company Integrated system for line-of-sight stabilization and auto-alignment of off-gimbal passive and active electro-optical sensors
DE10144244A1 (de) 2001-09-05 2003-03-20 Zeiss Carl Zoom-System, insbesondere für eine Beleuchtungseinrichtung
US7079321B2 (en) 2001-10-18 2006-07-18 Asml Holding N.V. Illumination system and method allowing for varying of both field height and pupil
JP2004311742A (ja) * 2003-04-08 2004-11-04 Nikon Corp 光学系の調整方法、照明光学装置、露光装置、および露光方法
JP4654915B2 (ja) * 2003-12-25 2011-03-23 株式会社ニコン 光学素子の保持装置、鏡筒、露光装置、及びデバイスの製造方法
US7609362B2 (en) * 2004-11-08 2009-10-27 Asml Netherlands B.V. Scanning lithographic apparatus and device manufacturing method
US7349068B2 (en) * 2004-12-17 2008-03-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
KR100883612B1 (ko) 2009-02-13
TW200809428A (en) 2008-02-16
EP1870668A1 (en) 2007-12-26
KR20070122173A (ko) 2007-12-28
JP2008003607A (ja) 2008-01-10
US20070296974A1 (en) 2007-12-27
CN101105641A (zh) 2008-01-16
US7508514B2 (en) 2009-03-24

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