SG134226A1 - Physical vapor deposition process and apparatus therefor - Google Patents
Physical vapor deposition process and apparatus thereforInfo
- Publication number
- SG134226A1 SG134226A1 SG200609098-9A SG2006090989A SG134226A1 SG 134226 A1 SG134226 A1 SG 134226A1 SG 2006090989 A SG2006090989 A SG 2006090989A SG 134226 A1 SG134226 A1 SG 134226A1
- Authority
- SG
- Singapore
- Prior art keywords
- vapor deposition
- deposition process
- physical vapor
- apparatus therefor
- therefor
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Turbine Rotor Nozzle Sealing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/306,740 US20070160775A1 (en) | 2006-01-10 | 2006-01-10 | Physical vapor deposition process and apparatus therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
SG134226A1 true SG134226A1 (en) | 2007-08-29 |
Family
ID=37866012
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200609098-9A SG134226A1 (en) | 2006-01-10 | 2006-12-28 | Physical vapor deposition process and apparatus therefor |
Country Status (5)
Country | Link |
---|---|
US (1) | US20070160775A1 (de) |
EP (1) | EP1806424B1 (de) |
JP (1) | JP2007186792A (de) |
DE (1) | DE602006006784D1 (de) |
SG (1) | SG134226A1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5802681B2 (ja) * | 2009-12-21 | 2015-10-28 | ゼネラル・エレクトリック・カンパニイ | ニッケルアルミナイドコーティングの形成方法 |
GB201112776D0 (en) * | 2011-07-23 | 2011-09-07 | Univ York | An electron beam evaporator |
CN104911549B (zh) * | 2015-07-10 | 2017-05-24 | 哈尔滨工业大学 | 一种用EBPVD制备Al/Ni反应叠层箔的方法 |
FR3072717B1 (fr) * | 2017-10-20 | 2019-10-11 | Safran | Piece de turbine en superalliage comprenant du rhenium et procede de fabrication associe |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05255836A (ja) * | 1992-03-10 | 1993-10-05 | Kobe Steel Ltd | 表面処理金属板およびその製造方法 |
JPH08283942A (ja) * | 1995-04-14 | 1996-10-29 | Ishikawajima Harima Heavy Ind Co Ltd | 昇華性金属材料の蒸発方法 |
US6054184A (en) * | 1996-06-04 | 2000-04-25 | General Electric Company | Method for forming a multilayer thermal barrier coating |
US5975852A (en) * | 1997-03-31 | 1999-11-02 | General Electric Company | Thermal barrier coating system and method therefor |
SG71151A1 (en) * | 1997-09-17 | 2000-03-21 | Gen Electric | Bond coat for a thermal barrier coating system and method therefor |
US6153313A (en) * | 1998-10-06 | 2000-11-28 | General Electric Company | Nickel aluminide coating and coating systems formed therewith |
US6291084B1 (en) * | 1998-10-06 | 2001-09-18 | General Electric Company | Nickel aluminide coating and coating systems formed therewith |
US6145470A (en) * | 1998-12-11 | 2000-11-14 | General Electric Company | Apparatus for electron beam physical vapor deposition |
UA78487C2 (uk) * | 2002-08-15 | 2007-04-10 | Дженерал Електрік Компані | Спосіб нанесення керамічного покриття та пристрій для його здійснення |
UA56228C2 (uk) * | 1999-11-01 | 2003-05-15 | Міжнародний Центр Електронно-Променевих Технологій Інституту Електрозварювання Ім. Е.О.Патона Нану | Композиційний зливок для одержання шляхом випаровування функціонально градієнтного покриття із зовнішнім керамічним шаром на металевій підкладці (варіанти) |
US6869508B2 (en) * | 2001-10-19 | 2005-03-22 | General Electric Company | Physical vapor deposition apparatus and process |
US6682827B2 (en) * | 2001-12-20 | 2004-01-27 | General Electric Company | Nickel aluminide coating and coating systems formed therewith |
US6620524B2 (en) * | 2002-01-11 | 2003-09-16 | General Electric Company | Nickel aluminide coating and coating systems formed therewith |
EP1445344B1 (de) * | 2003-02-07 | 2009-06-03 | General Electric Company | PVD-Vorrichtung und Verfahren |
-
2006
- 2006-01-10 US US11/306,740 patent/US20070160775A1/en not_active Abandoned
- 2006-12-21 EP EP06126830A patent/EP1806424B1/de not_active Expired - Fee Related
- 2006-12-21 DE DE602006006784T patent/DE602006006784D1/de active Active
- 2006-12-28 JP JP2006353662A patent/JP2007186792A/ja active Pending
- 2006-12-28 SG SG200609098-9A patent/SG134226A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
US20070160775A1 (en) | 2007-07-12 |
JP2007186792A (ja) | 2007-07-26 |
EP1806424A1 (de) | 2007-07-11 |
EP1806424B1 (de) | 2009-05-13 |
DE602006006784D1 (de) | 2009-06-25 |
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