SG129254A1 - Lithographic projection apparatus and reflector assembly for use in said apparatus - Google Patents

Lithographic projection apparatus and reflector assembly for use in said apparatus

Info

Publication number
SG129254A1
SG129254A1 SG200304848A SG200304848A SG129254A1 SG 129254 A1 SG129254 A1 SG 129254A1 SG 200304848 A SG200304848 A SG 200304848A SG 200304848 A SG200304848 A SG 200304848A SG 129254 A1 SG129254 A1 SG 129254A1
Authority
SG
Singapore
Prior art keywords
lithographic projection
projection apparatus
collector
reflector assembly
reflectors
Prior art date
Application number
SG200304848A
Other languages
English (en)
Inventor
Frank Jeroen Pieter Schuurmans
Levinus Pieter Bakker
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG129254A1 publication Critical patent/SG129254A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200304848A 2002-08-27 2003-08-25 Lithographic projection apparatus and reflector assembly for use in said apparatus SG129254A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02078528 2002-08-27

Publications (1)

Publication Number Publication Date
SG129254A1 true SG129254A1 (en) 2007-02-26

Family

ID=32241326

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200304848A SG129254A1 (en) 2002-08-27 2003-08-25 Lithographic projection apparatus and reflector assembly for use in said apparatus

Country Status (7)

Country Link
US (2) US7233009B2 (de)
JP (1) JP3662574B2 (de)
KR (1) KR100589233B1 (de)
CN (1) CN100447671C (de)
DE (1) DE60323911D1 (de)
SG (1) SG129254A1 (de)
TW (1) TWI262362B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1495531B (zh) * 2002-08-23 2010-05-26 Asml荷兰有限公司 光刻投射装置及用于所述装置中的粒子屏障
SG129254A1 (en) * 2002-08-27 2007-02-26 Asml Netherlands Bv Lithographic projection apparatus and reflector assembly for use in said apparatus
SG112034A1 (en) * 2003-11-06 2005-06-29 Asml Netherlands Bv Optical element, lithographic apparatus comprising such optical element and device manufacturing method
WO2005096099A2 (en) * 2004-03-31 2005-10-13 Philips Intellectual Property & Standards Gmbh Removal of particles generated by a radiation source
JP4903691B2 (ja) * 2004-05-06 2012-03-28 カール ツァイス レーザー オプティクス ゲーエムベーハー 熱挙動が改良された光学部品
US8094288B2 (en) 2004-05-11 2012-01-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7736820B2 (en) * 2006-05-05 2010-06-15 Asml Netherlands B.V. Anti-reflection coating for an EUV mask
DE102008014832A1 (de) 2007-04-19 2008-10-23 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie
US7629593B2 (en) * 2007-06-28 2009-12-08 Asml Netherlands B.V. Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method
US9052615B2 (en) * 2008-08-29 2015-06-09 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP5474522B2 (ja) * 2009-01-14 2014-04-16 ギガフォトン株式会社 極端紫外光源システム
DE102009014701A1 (de) * 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Optische Baugruppe
JP5093267B2 (ja) * 2010-03-11 2012-12-12 ウシオ電機株式会社 集光鏡アッセンブリおよびこの集光鏡アッセンブリを用いた極端紫外光光源装置
EP2465012B1 (de) 2010-06-25 2012-12-12 ASML Netherlands BV Lithographische vorrichtung und verfahren
WO2014170093A2 (en) * 2013-04-17 2014-10-23 Asml Netherlands B.V. Radiation collector, radiation source and lithographic apparatus
CN103869633B (zh) * 2014-04-11 2015-08-05 哈尔滨工业大学 极紫外光刻光源收集及照明系统
CN105573346A (zh) * 2014-10-15 2016-05-11 光之源工业(以色列)有限公司 用于定日镜的反射镜
DE102017204312A1 (de) 2016-05-30 2017-11-30 Carl Zeiss Smt Gmbh Optische Wellenlängen-Filterkomponente für ein Lichtbündel
DE102020203750A1 (de) * 2020-03-24 2021-09-30 Carl Zeiss Smt Gmbh Vorrichtung zur Erfassung einer Temperatur, Anlage zur Herstellung eines optischen Elementes und Verfahren zur Herstellung eines optischen Elementes

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4206494A (en) * 1978-09-05 1980-06-03 Gca Corporation High throughput illuminator
US4916322A (en) * 1988-01-22 1990-04-10 Osterreichische Investitionskredit Aktiengesellschaft Arrangement for stabilizing an irradiated mask
US5768339A (en) * 1995-10-13 1998-06-16 O'hara; David B. Collimator for x-ray spectroscopy
EP1037510A2 (de) * 1999-03-15 2000-09-20 Cymer, Inc. Plasmaquelle von Hochenergie-Photonen mit Schutzwand
US6285737B1 (en) * 2000-01-21 2001-09-04 Euv Llc Condenser for extreme-UV lithography with discharge source
EP1225481A2 (de) * 2001-01-23 2002-07-24 Carl Zeiss Semiconductor Manufacturing Technologies Ag Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07115512A (ja) * 1993-10-14 1995-05-02 Nikon Corp 光源装置
US6744060B2 (en) * 1997-05-12 2004-06-01 Cymer, Inc. Pulse power system for extreme ultraviolet and x-ray sources
US6064072A (en) * 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US6566667B1 (en) 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
EP0955565A3 (de) * 1998-05-08 2001-05-30 Nikon Corporation Spiegel für einen Belichtungsapparat unter Verwendung weicher Röntgenstrahlen
US6621557B2 (en) * 2000-01-13 2003-09-16 Nikon Corporation Projection exposure apparatus and exposure methods
WO2002084406A1 (en) * 2001-04-17 2002-10-24 Koninklijke Philips Electronics N.V. Euv-transparent interface structure
DE10138284A1 (de) * 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren
KR20040052231A (ko) * 2001-10-12 2004-06-22 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 리소그래피용 투영 장치, 소자 제조 방법 및 오염 물질집진부
US6700127B2 (en) * 2002-01-09 2004-03-02 Biomed Solutions Llc Point source for producing electrons beams
SG129254A1 (en) * 2002-08-27 2007-02-26 Asml Netherlands Bv Lithographic projection apparatus and reflector assembly for use in said apparatus
US7002168B2 (en) * 2002-10-15 2006-02-21 Cymer, Inc. Dense plasma focus radiation source

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4206494A (en) * 1978-09-05 1980-06-03 Gca Corporation High throughput illuminator
US4916322A (en) * 1988-01-22 1990-04-10 Osterreichische Investitionskredit Aktiengesellschaft Arrangement for stabilizing an irradiated mask
US5768339A (en) * 1995-10-13 1998-06-16 O'hara; David B. Collimator for x-ray spectroscopy
EP1037510A2 (de) * 1999-03-15 2000-09-20 Cymer, Inc. Plasmaquelle von Hochenergie-Photonen mit Schutzwand
US6285737B1 (en) * 2000-01-21 2001-09-04 Euv Llc Condenser for extreme-UV lithography with discharge source
EP1225481A2 (de) * 2001-01-23 2002-07-24 Carl Zeiss Semiconductor Manufacturing Technologies Ag Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm
WO2002065482A2 (de) * 2001-01-23 2002-08-22 Carl Zeiss Smt Ag KOLLEKTOR MIT UNGENUTZTEM BEREICH FÜR BELEUCHTUNGSSYSTEME MIT EINER WELLENLÄNGE ≤ 193 nm

Also Published As

Publication number Publication date
TW200416492A (en) 2004-09-01
US20040094724A1 (en) 2004-05-20
KR20040030268A (ko) 2004-04-09
DE60323911D1 (de) 2008-11-20
US7256407B2 (en) 2007-08-14
CN100447671C (zh) 2008-12-31
KR100589233B1 (ko) 2006-06-14
JP3662574B2 (ja) 2005-06-22
JP2004134794A (ja) 2004-04-30
CN1495532A (zh) 2004-05-12
TWI262362B (en) 2006-09-21
US7233009B2 (en) 2007-06-19
US20060006350A1 (en) 2006-01-12

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