SG123681A1 - Radiation exposure apparatus comprising a gas flushing system - Google Patents

Radiation exposure apparatus comprising a gas flushing system

Info

Publication number
SG123681A1
SG123681A1 SG200507762A SG200507762A SG123681A1 SG 123681 A1 SG123681 A1 SG 123681A1 SG 200507762 A SG200507762 A SG 200507762A SG 200507762 A SG200507762 A SG 200507762A SG 123681 A1 SG123681 A1 SG 123681A1
Authority
SG
Singapore
Prior art keywords
exposure apparatus
radiation exposure
flushing system
gas flushing
gas
Prior art date
Application number
SG200507762A
Other languages
English (en)
Inventor
Klaus Simon
Van Den Enno Brink
Gerardus Johannes Jos Keijsers
Van Adrianus Hubertus Hen Dijk
Hubertus Antonius Mari Baijens
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG123681A1 publication Critical patent/SG123681A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200507762A 2004-12-07 2005-12-02 Radiation exposure apparatus comprising a gas flushing system SG123681A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63372704P 2004-12-07 2004-12-07
US11/036,186 US20060119811A1 (en) 2004-12-07 2005-01-18 Radiation exposure apparatus comprising a gas flushing system

Publications (1)

Publication Number Publication Date
SG123681A1 true SG123681A1 (en) 2006-07-26

Family

ID=36084297

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200507762A SG123681A1 (en) 2004-12-07 2005-12-02 Radiation exposure apparatus comprising a gas flushing system

Country Status (7)

Country Link
US (2) US20060119811A1 (ko)
EP (1) EP1669809A3 (ko)
JP (1) JP2006186352A (ko)
KR (1) KR100749943B1 (ko)
CN (1) CN1797220A (ko)
SG (1) SG123681A1 (ko)
TW (1) TW200628997A (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100727847B1 (ko) * 2005-09-07 2007-06-14 세메스 주식회사 기판 가장자리 노광 장치
JP4814610B2 (ja) * 2005-10-25 2011-11-16 株式会社ニューフレアテクノロジー 吸引補助具
IL183693A0 (en) * 2007-06-05 2007-09-20 Nova Measuring Instr Ltd Optical method and system
JP5448724B2 (ja) * 2009-10-29 2014-03-19 キヤノン株式会社 露光装置及びデバイスの製造方法
NL2006243A (en) * 2010-03-19 2011-09-20 Asml Netherlands Bv A lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus.
KR102007352B1 (ko) 2015-04-20 2019-08-05 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 리소그래피 프로세스에서의 방법
US10018920B2 (en) * 2016-03-04 2018-07-10 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography patterning with a gas phase resist
US10168626B2 (en) * 2016-06-17 2019-01-01 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and a method of forming a particle shield
US10788764B2 (en) * 2016-06-17 2020-09-29 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and a method of forming a particle shield
US11397385B2 (en) 2016-06-17 2022-07-26 Taiwan Semiconductor Manufacturing Company, Ltd Apparatus and a method of forming a particle shield
CN107552258B (zh) * 2016-07-01 2019-06-07 江苏鲁汶仪器有限公司 气体喷射装置
CN109283797B (zh) * 2017-07-21 2021-04-30 上海微电子装备（集团）股份有限公司 物镜保护装置、物镜系统以及光刻设备
US20230205102A1 (en) * 2020-06-04 2023-06-29 Asml Netherlands B.V. A fluid purging system, projection system, illumination system, lithographic apparatus, and method
EP3923076A1 (en) * 2020-06-09 2021-12-15 ASML Netherlands B.V. Fluid purging system
CN114460814B (zh) * 2022-01-20 2024-04-02 中国科学院微电子研究所 光刻设备、气浴装置及其气浴发生器

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
ATE123885T1 (de) 1990-05-02 1995-06-15 Fraunhofer Ges Forschung Belichtungsvorrichtung.
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US5559584A (en) * 1993-03-08 1996-09-24 Nikon Corporation Exposure apparatus
JP3387075B2 (ja) * 1994-12-12 2003-03-17 株式会社ニコン 走査露光方法、露光装置、及び走査型露光装置
WO1998028665A1 (en) 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
EP0956516B1 (en) 1997-01-29 2002-04-10 Micronic Laser Systems Ab Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
US6262796B1 (en) 1997-03-10 2001-07-17 Asm Lithography B.V. Positioning device having two object holders
US6771314B1 (en) * 1998-03-31 2004-08-03 Intel Corporation Orange-green-blue (OGB) color system for digital image sensor applications
JP2000200745A (ja) * 1999-01-07 2000-07-18 Nikon Corp 投影露光装置
EP1229573A4 (en) * 1999-07-16 2006-11-08 Nikon Corp EXPOSURE METHOD AND SYSTEM
TW480372B (en) * 1999-11-05 2002-03-21 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method
EP1098226A3 (en) 1999-11-05 2002-01-09 Asm Lithography B.V. Lithographic apparatus with gas flushing system
US6933513B2 (en) * 1999-11-05 2005-08-23 Asml Netherlands B.V. Gas flushing system for use in lithographic apparatus
TW563002B (en) * 1999-11-05 2003-11-21 Asml Netherlands Bv Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method
EP1107316A3 (en) * 1999-12-02 2004-05-19 Nikon Corporation Solid-state image sensor, production method of the same and digital camera
US6747729B2 (en) * 2000-07-14 2004-06-08 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas composition
US6671396B1 (en) * 2000-09-18 2003-12-30 Taiwan Semiconductor Manufacturing Company Method to monitor stepper lens quality in color filter process
AU2002214269A1 (en) * 2000-11-10 2002-05-21 Nikon Corporation Optical device, exposure device and device manufacturing method
KR100866818B1 (ko) * 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
JP2002373852A (ja) * 2001-06-15 2002-12-26 Canon Inc 露光装置
US6828569B2 (en) * 2001-11-19 2004-12-07 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method and device manufactured thereby
US20030224265A1 (en) * 2001-12-11 2003-12-04 Uzodinma Okoroanyanwu System and method for reducing photoresist photo-oxidative degradation in 193 nm photolithography
US6710370B2 (en) * 2002-01-07 2004-03-23 Xerox Corporation Image sensor with performance enhancing structures
DE10211611A1 (de) 2002-03-12 2003-09-25 Zeiss Carl Smt Ag Verfahren und Vorrichtung zur Dekontamination optischer Oberflächen
JP4677174B2 (ja) * 2003-02-03 2011-04-27 キヤノン株式会社 位置検出装置
JP4035510B2 (ja) * 2003-02-12 2008-01-23 エーエスエムエル ネザーランズ ビー．ブイ． ガス洗浄システムを含むリソグラフィ装置
JP4289906B2 (ja) * 2003-02-28 2009-07-01 キヤノン株式会社 露光装置
JP2004080052A (ja) 2003-11-04 2004-03-11 Canon Inc 露光装置、デバイスの製造方法
US7136142B2 (en) * 2004-05-25 2006-11-14 Asml Netherlands B.V. Lithographic apparatus having a gas flushing device
US7446850B2 (en) * 2004-12-03 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
US20060146300A1 (en) 2006-07-06
US20060119811A1 (en) 2006-06-08
US7570342B2 (en) 2009-08-04
CN1797220A (zh) 2006-07-05
EP1669809A2 (en) 2006-06-14
KR100749943B1 (ko) 2007-08-16
KR20060083853A (ko) 2006-07-21
TW200628997A (en) 2006-08-16
EP1669809A3 (en) 2006-11-29
JP2006186352A (ja) 2006-07-13

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