SG120300A1 - System and method for reducing disturbances causedby movement in an immersion lithography system - Google Patents

System and method for reducing disturbances causedby movement in an immersion lithography system

Info

Publication number
SG120300A1
SG120300A1 SG200505493A SG200505493A SG120300A1 SG 120300 A1 SG120300 A1 SG 120300A1 SG 200505493 A SG200505493 A SG 200505493A SG 200505493 A SG200505493 A SG 200505493A SG 120300 A1 SG120300 A1 SG 120300A1
Authority
SG
Singapore
Prior art keywords
causedby
movement
immersion lithography
reducing disturbances
lithography system
Prior art date
Application number
SG200505493A
Other languages
English (en)
Inventor
Ryzhikov Lev
Vladimirsky Yuli
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of SG120300A1 publication Critical patent/SG120300A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG200505493A 2004-08-27 2005-08-26 System and method for reducing disturbances causedby movement in an immersion lithography system SG120300A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/927,394 US20060044533A1 (en) 2004-08-27 2004-08-27 System and method for reducing disturbances caused by movement in an immersion lithography system

Publications (1)

Publication Number Publication Date
SG120300A1 true SG120300A1 (en) 2006-03-28

Family

ID=34982028

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200505493A SG120300A1 (en) 2004-08-27 2005-08-26 System and method for reducing disturbances causedby movement in an immersion lithography system

Country Status (7)

Country Link
US (3) US20060044533A1 (ko)
EP (1) EP1630616A3 (ko)
JP (1) JP4355691B2 (ko)
KR (1) KR100728844B1 (ko)
CN (1) CN100485528C (ko)
SG (1) SG120300A1 (ko)
TW (1) TWI308675B (ko)

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Publication number Priority date Publication date Assignee Title
KR100965330B1 (ko) 2003-12-15 2010-06-22 칼 짜이스 에스엠티 아게 적어도 한 개의 액체 렌즈를 가진 마이크로리소그래피 투사대물렌즈로서의 대물렌즈
CN100592210C (zh) 2004-02-13 2010-02-24 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
US20060044533A1 (en) * 2004-08-27 2006-03-02 Asmlholding N.V. System and method for reducing disturbances caused by movement in an immersion lithography system
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JP2007194484A (ja) * 2006-01-20 2007-08-02 Toshiba Corp 液浸露光方法
CN100456138C (zh) * 2006-06-13 2009-01-28 上海微电子装备有限公司 浸没式光刻机浸液流场维持系统
KR101509553B1 (ko) * 2007-11-08 2015-04-06 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영 장치 및 섭동 인자들을 보상하는 방법
CN103513324A (zh) * 2012-06-25 2014-01-15 鸿富锦精密工业（深圳）有限公司 光纤装置
CN107093564B (zh) * 2016-02-18 2021-01-26 中芯国际集成电路制造(上海)有限公司 一种全纵深高分辨在线实时气泡监控装置及监控方法

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US20050145803A1 (en) * 2003-12-31 2005-07-07 International Business Machines Corporation Moving lens for immersion optical lithography

Also Published As

Publication number Publication date
US20060044533A1 (en) 2006-03-02
EP1630616A3 (en) 2007-10-31
TW200608155A (en) 2006-03-01
JP4355691B2 (ja) 2009-11-04
US20070165200A1 (en) 2007-07-19
CN1740916A (zh) 2006-03-01
TWI308675B (en) 2009-04-11
US20070165201A1 (en) 2007-07-19
KR100728844B1 (ko) 2007-06-14
JP2006066921A (ja) 2006-03-09
CN100485528C (zh) 2009-05-06
EP1630616A2 (en) 2006-03-01
KR20060050711A (ko) 2006-05-19

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