SG11202109744RA - Crosslinkable siloxane compounds for the preparation of dielectric materials - Google Patents

Crosslinkable siloxane compounds for the preparation of dielectric materials

Info

Publication number
SG11202109744RA
SG11202109744RA SG11202109744RA SG11202109744RA SG 11202109744R A SG11202109744R A SG 11202109744RA SG 11202109744R A SG11202109744R A SG 11202109744RA SG 11202109744R A SG11202109744R A SG 11202109744RA
Authority
SG
Singapore
Prior art keywords
preparation
dielectric materials
siloxane compounds
crosslinkable siloxane
crosslinkable
Prior art date
Application number
Other languages
English (en)
Inventor
Karsten Koppe
Jens Eichhorn
Ben Jeffery
Alex Davis
William Mitchell
Pawel Miskiewicz
Toshiaki Nonaka
Original Assignee
Merck Patent Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent Gmbh filed Critical Merck Patent Gmbh
Publication of SG11202109744RA publication Critical patent/SG11202109744RA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/045—Polysiloxanes containing less than 25 silicon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Silicon Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
SG11202109744R 2019-03-08 2020-03-06 Crosslinkable siloxane compounds for the preparation of dielectric materials SG11202109744RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19161650 2019-03-08
PCT/EP2020/055952 WO2020182636A1 (en) 2019-03-08 2020-03-06 Crosslinkable siloxane compounds for the preparation of dielectric materials

Publications (1)

Publication Number Publication Date
SG11202109744RA true SG11202109744RA (en) 2021-10-28

Family

ID=65729237

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202109744R SG11202109744RA (en) 2019-03-08 2020-03-06 Crosslinkable siloxane compounds for the preparation of dielectric materials

Country Status (6)

Country Link
US (1) US20220177651A1 (ko)
JP (1) JP2022523249A (ko)
KR (1) KR20210139310A (ko)
CN (1) CN113508152B (ko)
SG (1) SG11202109744RA (ko)
WO (1) WO2020182636A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023077454A (ja) * 2021-11-25 2023-06-06 信越化学工業株式会社 イミド結合及び重合性不飽和結合含有環状オルガノシロキサン、及びそれを含む硬化性樹脂組成物
CN117467353A (zh) * 2022-07-18 2024-01-30 康宁股份有限公司 组合物、介电材料、电子装置及其形成方法
GB2623090A (en) 2022-10-04 2024-04-10 Sublino Ltd Method of colouring

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51125277A (en) * 1974-12-28 1976-11-01 Shin Etsu Chem Co Ltd Aprocess for preparing organosilane compounds
CH649772A5 (de) * 1981-10-01 1985-06-14 Ciba Geigy Ag Lichtvernetzbare polysiloxane, verfahren zu deren herstellung und deren verwendung.
DE4014882A1 (de) 1990-05-09 1991-11-14 Siemens Ag Polyfunktionelle polyorganosiloxane
US20060009578A1 (en) 2004-07-07 2006-01-12 Dershem Stephen M Compositions containing maleimide-substituted silsesquioxanes and methods for use thereof
US7777064B2 (en) 2006-03-02 2010-08-17 Designer Molecules, Inc. Adhesive compositions containing cyclic siloxanes and methods for use thereof
JP4967687B2 (ja) * 2007-01-29 2012-07-04 東レ株式会社 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子
JP5375094B2 (ja) * 2008-01-28 2013-12-25 東レ株式会社 シロキサン系樹脂組成物
CN102245662B (zh) 2008-12-12 2014-01-22 东亚合成株式会社 包含用马来酰亚胺基进行了表面修饰的无机氧化物微粒的固化型组合物
KR20180011862A (ko) 2010-09-02 2018-02-02 메르크 파텐트 게엠베하 전자 디바이스용 중간층
JP2012149196A (ja) * 2011-01-21 2012-08-09 Jnc Corp 熱硬化性組成物、硬化膜、及び表示素子
KR101686024B1 (ko) * 2011-04-27 2016-12-13 후지필름 가부시키가이샤 임프린트용 경화성 조성물, 패턴 형성 방법 및 패턴
KR20130042867A (ko) 2011-10-19 2013-04-29 삼성디스플레이 주식회사 보호막 용액 조성물, 박막 트랜지스터 표시판 및 박막 트랜지스터 표시판 제조 방법
CN104447849A (zh) 2014-12-26 2015-03-25 上海爱默金山药业有限公司 烷基硅氧烷取代的马来酰亚胺的合成方法
JP2017151209A (ja) 2016-02-23 2017-08-31 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ ポジ型感光性シロキサン組成物

Also Published As

Publication number Publication date
JP2022523249A (ja) 2022-04-21
TW202104380A (zh) 2021-02-01
WO2020182636A1 (en) 2020-09-17
KR20210139310A (ko) 2021-11-22
US20220177651A1 (en) 2022-06-09
CN113508152B (zh) 2023-08-08
CN113508152A (zh) 2021-10-15

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