SG11202109744RA - Crosslinkable siloxane compounds for the preparation of dielectric materials - Google Patents

Crosslinkable siloxane compounds for the preparation of dielectric materials

Info

Publication number
SG11202109744RA
SG11202109744RA SG11202109744RA SG11202109744RA SG 11202109744R A SG11202109744R A SG 11202109744RA SG 11202109744R A SG11202109744R A SG 11202109744RA SG 11202109744R A SG11202109744R A SG 11202109744RA
Authority
SG
Singapore
Prior art keywords
preparation
dielectric materials
siloxane compounds
crosslinkable siloxane
crosslinkable
Prior art date
Application number
Inventor
Karsten Koppe
Jens Eichhorn
Ben Jeffery
Alex Davis
William Mitchell
Pawel Miskiewicz
Toshiaki Nonaka
Original Assignee
Merck Patent Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent Gmbh filed Critical Merck Patent Gmbh
Publication of SG11202109744RA publication Critical patent/SG11202109744RA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/045—Polysiloxanes containing less than 25 silicon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Silicon Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
SG11202109744R 2019-03-08 2020-03-06 Crosslinkable siloxane compounds for the preparation of dielectric materials SG11202109744RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19161650 2019-03-08
PCT/EP2020/055952 WO2020182636A1 (en) 2019-03-08 2020-03-06 Crosslinkable siloxane compounds for the preparation of dielectric materials

Publications (1)

Publication Number Publication Date
SG11202109744RA true SG11202109744RA (en) 2021-10-28

Family

ID=65729237

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202109744R SG11202109744RA (en) 2019-03-08 2020-03-06 Crosslinkable siloxane compounds for the preparation of dielectric materials

Country Status (6)

Country Link
US (1) US20220177651A1 (en)
JP (1) JP2022523249A (en)
KR (1) KR20210139310A (en)
CN (1) CN113508152B (en)
SG (1) SG11202109744RA (en)
WO (1) WO2020182636A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023077454A (en) * 2021-11-25 2023-06-06 信越化学工業株式会社 Cyclic organosiloxane containing imide bonds and polymerizable unsaturated bonds, and curable resin composition comprising the same
CN117467353A (en) * 2022-07-18 2024-01-30 康宁股份有限公司 Composition, dielectric material, electronic device and forming method thereof
GB2623090A (en) 2022-10-04 2024-04-10 Sublino Ltd Method of colouring

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51125277A (en) * 1974-12-28 1976-11-01 Shin Etsu Chem Co Ltd Aprocess for preparing organosilane compounds
CH649772A5 (en) * 1981-10-01 1985-06-14 Ciba Geigy Ag LIGHT CROSSLINKABLE POLYSILOXANES, METHOD FOR THE PRODUCTION AND THEIR USE.
DE4014882A1 (en) 1990-05-09 1991-11-14 Siemens Ag Polyfunctional poly-organo-siloxane(s) - by low-temp. nitration of poly-methyl-phenyl-siloxane(s), and conversion of nitro gps. into other functional gp(s)
US20060009578A1 (en) * 2004-07-07 2006-01-12 Dershem Stephen M Compositions containing maleimide-substituted silsesquioxanes and methods for use thereof
US7777064B2 (en) 2006-03-02 2010-08-17 Designer Molecules, Inc. Adhesive compositions containing cyclic siloxanes and methods for use thereof
JP4967687B2 (en) * 2007-01-29 2012-07-04 東レ株式会社 Photosensitive siloxane composition, cured film formed therefrom, and device having cured film
EP2239301B1 (en) * 2008-01-28 2016-04-27 Toray Industries, Inc. Siloxane resin compositions
US8530546B2 (en) 2008-12-12 2013-09-10 Toagosei Co., Ltd. Curable composition comprising inorganic oxide microparticles that are surface-modified with maleimide groups
CN103097420B (en) 2010-09-02 2016-06-22 默克专利股份有限公司 Interlayer for electronic device
JP2012149196A (en) * 2011-01-21 2012-08-09 Jnc Corp Thermosetting composition, cured film, and display element
WO2012147828A1 (en) * 2011-04-27 2012-11-01 富士フイルム株式会社 Curable composition for imprinting, pattern formation method, and pattern
KR20130042867A (en) 2011-10-19 2013-04-29 삼성디스플레이 주식회사 Solution composition for passivation layer, thin film transistor array panel and manufacturing method for thin film transistor array panel
CN104447849A (en) 2014-12-26 2015-03-25 上海爱默金山药业有限公司 Synthesis method of siloxane-substituted maleimide
JP2017151209A (en) 2016-02-23 2017-08-31 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ Positive photosensitive siloxane composition

Also Published As

Publication number Publication date
CN113508152A (en) 2021-10-15
KR20210139310A (en) 2021-11-22
JP2022523249A (en) 2022-04-21
TW202104380A (en) 2021-02-01
WO2020182636A1 (en) 2020-09-17
CN113508152B (en) 2023-08-08
US20220177651A1 (en) 2022-06-09

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