SG11202107216XA - Chemical-mechanical polishing particle and polishing slurry composition comprising same - Google Patents
Chemical-mechanical polishing particle and polishing slurry composition comprising sameInfo
- Publication number
- SG11202107216XA SG11202107216XA SG11202107216XA SG11202107216XA SG11202107216XA SG 11202107216X A SG11202107216X A SG 11202107216XA SG 11202107216X A SG11202107216X A SG 11202107216XA SG 11202107216X A SG11202107216X A SG 11202107216XA SG 11202107216X A SG11202107216X A SG 11202107216XA
- Authority
- SG
- Singapore
- Prior art keywords
- chemical
- same
- slurry composition
- polishing
- particle
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/04—Aqueous dispersions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/10—Production of cement, e.g. improving or optimising the production methods; Cement grinding
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Composite Materials (AREA)
- Dispersion Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Silicon Compounds (AREA)
- Catalysts (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180173796A KR20200082827A (en) | 2018-12-31 | 2018-12-31 | CMP particle and CMP slurry composition |
PCT/KR2019/018546 WO2020141804A1 (en) | 2018-12-31 | 2019-12-27 | Chemical-mechanical polishing particle and polishing slurry composition comprising same |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202107216XA true SG11202107216XA (en) | 2021-08-30 |
Family
ID=71406916
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202107216XA SG11202107216XA (en) | 2018-12-31 | 2019-12-27 | Chemical-mechanical polishing particle and polishing slurry composition comprising same |
Country Status (7)
Country | Link |
---|---|
US (1) | US11787974B2 (en) |
JP (1) | JP7404393B2 (en) |
KR (1) | KR20200082827A (en) |
CN (1) | CN113302256B (en) |
SG (1) | SG11202107216XA (en) |
TW (1) | TW202101560A (en) |
WO (1) | WO2020141804A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113138203B (en) * | 2021-05-31 | 2022-08-30 | 中南大学 | Preparation method of 4D printed CuAl-based alloy EBSD sample |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4346712B2 (en) * | 1998-11-20 | 2009-10-21 | スピードファム株式会社 | Wafer edge polishing method |
US7077880B2 (en) * | 2004-01-16 | 2006-07-18 | Dupont Air Products Nanomaterials Llc | Surface modified colloidal abrasives, including stable bimetallic surface coated silica sols for chemical mechanical planarization |
US7071105B2 (en) * | 2003-02-03 | 2006-07-04 | Cabot Microelectronics Corporation | Method of polishing a silicon-containing dielectric |
JP2006231436A (en) * | 2005-02-23 | 2006-09-07 | Tokyo Seimitsu Co Ltd | Polishing slurry and polishing method |
WO2006103092A1 (en) * | 2005-03-31 | 2006-10-05 | Unilever Plc | Process of preparing aluminium species |
JP2007299942A (en) * | 2006-04-28 | 2007-11-15 | Fujifilm Corp | Metal polishing composition, and chemical-mechanical polishing method using it |
US20070298611A1 (en) * | 2006-06-27 | 2007-12-27 | Jinru Bian | Selective barrier slurry for chemical mechanical polishing |
JP5327427B2 (en) * | 2007-06-19 | 2013-10-30 | Jsr株式会社 | Chemical mechanical polishing aqueous dispersion preparation set, chemical mechanical polishing aqueous dispersion preparation method, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing method |
KR100928456B1 (en) * | 2009-06-01 | 2009-11-25 | 주식회사 동진쎄미켐 | Chemical mechanical polishing slurry composition including non-ionized, heat activated nano catalyst and polishing method using the same |
JP7032327B2 (en) * | 2016-05-19 | 2022-03-08 | ドンジン セミケム カンパニー リミテッド | Slurry composition for chemical-mechanical polishing |
JP6878783B2 (en) * | 2016-07-19 | 2021-06-02 | 昭和電工マテリアルズ株式会社 | Abrasives, storage solutions for abrasives and polishing methods |
WO2018102555A1 (en) * | 2016-12-02 | 2018-06-07 | Ecolab USA, Inc. | Polyaluminum salts and their uses in preparation of high-purity colloidal aluminum-silica composite particles and zeolites |
-
2018
- 2018-12-31 KR KR1020180173796A patent/KR20200082827A/en not_active Application Discontinuation
-
2019
- 2019-12-27 SG SG11202107216XA patent/SG11202107216XA/en unknown
- 2019-12-27 CN CN201980087413.9A patent/CN113302256B/en active Active
- 2019-12-27 WO PCT/KR2019/018546 patent/WO2020141804A1/en active Application Filing
- 2019-12-27 JP JP2021561593A patent/JP7404393B2/en active Active
- 2019-12-31 TW TW108148675A patent/TW202101560A/en unknown
-
2021
- 2021-06-30 US US17/363,105 patent/US11787974B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20210340405A1 (en) | 2021-11-04 |
WO2020141804A1 (en) | 2020-07-09 |
CN113302256A (en) | 2021-08-24 |
KR20200082827A (en) | 2020-07-08 |
JP2022517875A (en) | 2022-03-10 |
US11787974B2 (en) | 2023-10-17 |
TW202101560A (en) | 2021-01-01 |
JP7404393B2 (en) | 2023-12-25 |
CN113302256B (en) | 2023-07-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
PL3532562T3 (en) | Magnetizable abrasive particle and method of making the same | |
EP3265534A4 (en) | Polishing composition containing ceria abrasive | |
PL3475379T3 (en) | Sintered abrasive particle comprising oxides present in bauxite | |
TWI561620B (en) | Cmp slurry compositions and methods for aluminum polishing | |
EP3493244A4 (en) | Polishing pad and polishing method using same | |
EP3265526A4 (en) | Polishing composition containing ceria particles and method of use | |
SG11202100589TA (en) | Slurry and polishing method | |
EP3508550A4 (en) | Polishing composition and polishing composition set | |
IL277199B1 (en) | Automatic grinder and grinding method thereof | |
EP3532247A4 (en) | Magnetizable abrasive particle and method of making the same | |
SG11202106585UA (en) | Polishing compositions and methods of using same | |
EP3437798A4 (en) | Polishing pad and polishing method | |
SG11202106584QA (en) | Polishing compositions and methods of using same | |
EP3492546A4 (en) | Abrasive grains, manufacturing method therefor, polishing slurry containing said abrasive grains, and polishing method using said polishing slurry | |
IL281875A (en) | Slurry and solution compositions | |
EP3731996A4 (en) | Abrasive buffing articles | |
TWI563073B (en) | Cmp compositions and methods for polishing rigid disk surfaces | |
EP3421174A4 (en) | Polishing method and polishing pad | |
EP3692107A4 (en) | Surface treated abrasive particles for tungsten buff applications | |
SG11202107216XA (en) | Chemical-mechanical polishing particle and polishing slurry composition comprising same | |
SG10201904669TA (en) | Polishing Slurry Composition | |
SG10202009340YA (en) | Polishing composition and polishing method | |
SG11202001700XA (en) | Slurry and polishing method | |
TWI800589B (en) | Polishing pad | |
PL3582932T3 (en) | Alumina abrasive particles used for automotive finishing compositions |