SG11202100517VA - Positive working photosensitive material - Google Patents
Positive working photosensitive materialInfo
- Publication number
- SG11202100517VA SG11202100517VA SG11202100517VA SG11202100517VA SG11202100517VA SG 11202100517V A SG11202100517V A SG 11202100517VA SG 11202100517V A SG11202100517V A SG 11202100517VA SG 11202100517V A SG11202100517V A SG 11202100517VA SG 11202100517V A SG11202100517V A SG 11202100517VA
- Authority
- SG
- Singapore
- Prior art keywords
- photosensitive material
- positive working
- working photosensitive
- positive
- working
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
- C07C69/84—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862727180P | 2018-09-05 | 2018-09-05 | |
PCT/EP2019/073430 WO2020048957A1 (en) | 2018-09-05 | 2019-09-03 | Positive working photosensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202100517VA true SG11202100517VA (en) | 2021-02-25 |
Family
ID=67874438
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202100517VA SG11202100517VA (en) | 2018-09-05 | 2019-09-03 | Positive working photosensitive material |
Country Status (9)
Country | Link |
---|---|
US (1) | US20220019141A1 (ja) |
EP (1) | EP3847506A1 (ja) |
JP (2) | JP7381566B2 (ja) |
KR (1) | KR20210053963A (ja) |
CN (1) | CN112654928A (ja) |
PH (1) | PH12021550383A1 (ja) |
SG (1) | SG11202100517VA (ja) |
TW (1) | TWI826515B (ja) |
WO (1) | WO2020048957A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI760123B (zh) * | 2021-02-26 | 2022-04-01 | 新應材股份有限公司 | 用於低溫製程的正型感光性樹脂組成物以及光阻膜的製造方法 |
TW202336531A (zh) | 2021-11-17 | 2023-09-16 | 德商馬克專利公司 | 藉濕式化學蝕刻以改善金屬結構製造的組合物和方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7103379A (ja) * | 1971-03-13 | 1972-09-15 | ||
US4073773A (en) * | 1976-12-30 | 1978-02-14 | General Electric Company | Melt polymerization method for making polyetherimides |
DE3405436A1 (de) * | 1984-02-15 | 1985-08-29 | Wacker-Chemie GmbH, 8000 München | Verfahren zur herstellung von polymerisaten ethylenisch ungesaettigter verbindungen |
DE3886616T2 (de) * | 1987-02-02 | 1994-07-21 | Nippon Paint Co Ltd | Positive photoempfindliche harzzubereitung und verfahren zur herstellung. |
EP0608894A1 (en) * | 1993-01-29 | 1994-08-03 | Nippon Paint Co., Ltd. | Positive-type photosensitive resin compositions |
US5817722A (en) | 1995-10-10 | 1998-10-06 | Exxon Chemical Patents Inc. | Low viscosity, high solids polyesterdiols and compositions containing same |
US6042988A (en) | 1996-12-26 | 2000-03-28 | Tokyo Ohka Kogyo Co., Ltd. | Chemical-amplification-type negative resist composition |
WO2001063363A2 (en) | 2000-02-27 | 2001-08-30 | Shipley Company, L.L.C. | Photoacid generators and photoresists comprising same |
CN1916760B (zh) | 2001-06-29 | 2010-10-13 | Jsr株式会社 | 酸发生剂、磺酸、磺酸衍生物及辐射敏感树脂组合物 |
JP4214380B2 (ja) * | 2003-01-09 | 2009-01-28 | 日産化学工業株式会社 | エポキシ化合物誘導体を含む反射防止膜形成組成物 |
JP4438931B2 (ja) * | 2003-08-18 | 2010-03-24 | 日産化学工業株式会社 | フォトレジストパターンの形成方法 |
WO2005111724A1 (ja) * | 2004-05-14 | 2005-11-24 | Nissan Chemical Industries, Ltd. | ビニルエーテル化合物を含む反射防止膜形成組成物 |
DE102005052885A1 (de) * | 2005-11-07 | 2007-05-10 | Az Electronic Materials (Germany) Gmbh | Lichtempfindliche Komponente zur Verwendung in Photoresists |
KR100886314B1 (ko) * | 2007-06-25 | 2009-03-04 | 금호석유화학 주식회사 | 유기반사방지막용 공중합체 및 이를 포함하는유기반사방지막 조성물 |
JP5191567B2 (ja) | 2011-01-12 | 2013-05-08 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機el表示装置、及び、液晶表示装置 |
US9012126B2 (en) * | 2012-06-15 | 2015-04-21 | Az Electronic Materials (Luxembourg) S.A.R.L. | Positive photosensitive material |
US8841062B2 (en) * | 2012-12-04 | 2014-09-23 | Az Electronic Materials (Luxembourg) S.A.R.L. | Positive working photosensitive material |
JP6923334B2 (ja) * | 2016-04-14 | 2021-08-18 | 旭化成株式会社 | 感光性樹脂組成物及び硬化レリーフパターンの製造方法 |
TWI731961B (zh) * | 2016-04-19 | 2021-07-01 | 德商馬克專利公司 | 正向感光材料及形成正向凸紋影像之方法 |
TWI685714B (zh) | 2016-12-27 | 2020-02-21 | 奇美實業股份有限公司 | 化學增幅型正型感光性樹脂組成物、附有鑄模的基板的製造方法以及電鍍成形體的製造方法 |
-
2019
- 2019-09-03 TW TW108131621A patent/TWI826515B/zh active
- 2019-09-03 JP JP2021511604A patent/JP7381566B2/ja active Active
- 2019-09-03 KR KR1020217009789A patent/KR20210053963A/ko not_active Application Discontinuation
- 2019-09-03 US US17/265,855 patent/US20220019141A1/en active Pending
- 2019-09-03 SG SG11202100517VA patent/SG11202100517VA/en unknown
- 2019-09-03 CN CN201980057768.3A patent/CN112654928A/zh active Pending
- 2019-09-03 EP EP19765215.9A patent/EP3847506A1/en active Pending
- 2019-09-03 WO PCT/EP2019/073430 patent/WO2020048957A1/en unknown
-
2021
- 2021-02-24 PH PH12021550383A patent/PH12021550383A1/en unknown
-
2023
- 2023-07-11 JP JP2023113648A patent/JP2023145510A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
CN112654928A (zh) | 2021-04-13 |
JP2021535441A (ja) | 2021-12-16 |
TWI826515B (zh) | 2023-12-21 |
KR20210053963A (ko) | 2021-05-12 |
TW202024794A (zh) | 2020-07-01 |
JP2023145510A (ja) | 2023-10-11 |
EP3847506A1 (en) | 2021-07-14 |
PH12021550383A1 (en) | 2021-11-29 |
US20220019141A1 (en) | 2022-01-20 |
WO2020048957A1 (en) | 2020-03-12 |
JP7381566B2 (ja) | 2023-11-15 |
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