SG11202001474UA - Mask transfer system and transfer method - Google Patents
Mask transfer system and transfer methodInfo
- Publication number
- SG11202001474UA SG11202001474UA SG11202001474UA SG11202001474UA SG11202001474UA SG 11202001474U A SG11202001474U A SG 11202001474UA SG 11202001474U A SG11202001474U A SG 11202001474UA SG 11202001474U A SG11202001474U A SG 11202001474UA SG 11202001474U A SG11202001474U A SG 11202001474UA
- Authority
- SG
- Singapore
- Prior art keywords
- transfer
- mask
- transfer system
- transfer method
- mask transfer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710719532.4A CN109426082A (zh) | 2017-08-21 | 2017-08-21 | 一种掩模版的传输系统以及传输方法 |
PCT/CN2018/101173 WO2019037672A1 (zh) | 2017-08-21 | 2018-08-17 | 一种掩模版的传输系统以及传输方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202001474UA true SG11202001474UA (en) | 2020-03-30 |
Family
ID=65439808
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202001474UA SG11202001474UA (en) | 2017-08-21 | 2018-08-17 | Mask transfer system and transfer method |
Country Status (7)
Country | Link |
---|---|
US (1) | US20200356014A1 (ja) |
JP (1) | JP7012143B2 (ja) |
KR (1) | KR102379581B1 (ja) |
CN (1) | CN109426082A (ja) |
SG (1) | SG11202001474UA (ja) |
TW (1) | TWI720332B (ja) |
WO (1) | WO2019037672A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110255156A (zh) * | 2019-06-29 | 2019-09-20 | 苏州精濑光电有限公司 | 一种中转装置 |
US20230005698A1 (en) * | 2019-10-28 | 2023-01-05 | Asml Netherlands B.V. | System for inspecting and grounding a mask in a charged particle system |
KR102481920B1 (ko) * | 2019-12-19 | 2022-12-26 | 캐논 톡키 가부시키가이샤 | 처리체 수납 장치와, 이를 포함하는 성막 장치 |
US11774866B2 (en) | 2020-09-03 | 2023-10-03 | Kla Corporation | Active reticle carrier for in situ stage correction |
CN114408518B (zh) * | 2022-04-01 | 2022-08-19 | 深圳市龙图光电有限公司 | 半导体芯片用掩模版传送装置及其传送方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1055944A (ja) * | 1996-08-08 | 1998-02-24 | Toshiba Corp | パターン転写装置 |
TW446858B (en) * | 1999-04-21 | 2001-07-21 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using such a lithographic projection apparatus, and device made by such a method of manufacturing |
JP2001168008A (ja) * | 1999-12-09 | 2001-06-22 | Canon Inc | 基板ステージ装置および該基板ステージ装置を用いた半導体露光装置 |
US6468022B1 (en) * | 2000-07-05 | 2002-10-22 | Integrated Dynamics Engineering, Inc. | Edge-gripping pre-aligner |
JP2004071730A (ja) * | 2002-08-05 | 2004-03-04 | Sendai Nikon:Kk | レチクルハンドリング方法、レチクルハンドリング装置及び露光装置 |
US7397539B2 (en) * | 2003-03-31 | 2008-07-08 | Asml Netherlands, B.V. | Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof |
JP2006351863A (ja) * | 2005-06-16 | 2006-12-28 | Nikon Corp | 物体搬送装置及び露光装置 |
JP2008100805A (ja) * | 2006-10-18 | 2008-05-01 | Ihi Corp | 基板保管庫 |
JP2009099854A (ja) * | 2007-10-18 | 2009-05-07 | Elpida Memory Inc | 縦型相変化メモリ装置の製造方法 |
CN102109768B (zh) * | 2009-12-29 | 2013-07-17 | 上海微电子装备有限公司 | 旋转式硅片承片台及利用其进行硅片精对准的方法 |
JP5532110B2 (ja) * | 2012-11-16 | 2014-06-25 | 株式会社安川電機 | 基板搬送ロボットおよび基板搬送方法 |
CN103972135B (zh) * | 2013-01-25 | 2017-02-22 | 上海微电子装备有限公司 | 一种硅片精确定位传输装置及定位方法 |
CN105988303B (zh) * | 2015-02-26 | 2018-03-30 | 上海微电子装备(集团)股份有限公司 | 一种掩模版传输装置及传输方法 |
CN206209287U (zh) * | 2016-09-30 | 2017-05-31 | 上海微电子装备有限公司 | 掩模版传输系统 |
-
2017
- 2017-08-21 CN CN201710719532.4A patent/CN109426082A/zh active Pending
-
2018
- 2018-08-17 KR KR1020207007835A patent/KR102379581B1/ko active IP Right Grant
- 2018-08-17 JP JP2020510090A patent/JP7012143B2/ja active Active
- 2018-08-17 US US16/640,540 patent/US20200356014A1/en not_active Abandoned
- 2018-08-17 WO PCT/CN2018/101173 patent/WO2019037672A1/zh active Application Filing
- 2018-08-17 SG SG11202001474UA patent/SG11202001474UA/en unknown
- 2018-08-20 TW TW107128997A patent/TWI720332B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR20200040846A (ko) | 2020-04-20 |
KR102379581B1 (ko) | 2022-03-28 |
CN109426082A (zh) | 2019-03-05 |
TW201912342A (zh) | 2019-04-01 |
JP2020532119A (ja) | 2020-11-05 |
US20200356014A1 (en) | 2020-11-12 |
TWI720332B (zh) | 2021-03-01 |
JP7012143B2 (ja) | 2022-01-27 |
WO2019037672A1 (zh) | 2019-02-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IL284864A (en) | A system and method for communication between devices connected to weapons | |
SG11201914025YA (en) | Order completion system and method | |
GB2563925B (en) | System and method | |
SG11202001474UA (en) | Mask transfer system and transfer method | |
IL271508B (en) | Transportation system and transportation method | |
SG11202003088RA (en) | Biocementation method and system | |
SG11201912679WA (en) | Transport system and transport method | |
GB2559889B (en) | System and method | |
FI3590725T3 (fi) | Alustan toimitusjärjestelmä ja alustan toimitusmenetelmä | |
GB201717821D0 (en) | System and method | |
IL273294A (en) | Metrology method and system | |
GB2572677B (en) | System and method | |
GB2567958B (en) | Release system and method | |
GB201802171D0 (en) | System and method | |
EP3320243C0 (en) | MOUNTING SHOCK TRANSMISSION SYSTEM AND METHOD | |
GB201717039D0 (en) | Marking method and system | |
GB2582491B (en) | Method and system | |
GB201809582D0 (en) | System and method | |
HK1244571A1 (zh) | 點交換系統以及點交換方法 | |
IL257059B (en) | Multi-beamforming system and method | |
GB201816668D0 (en) | System and method | |
GB201812593D0 (en) | Illimination system and method | |
SG11202002049TA (en) | Communication system and communication method | |
GB201713588D0 (en) | Method and system for network devices | |
GB2575765B (en) | Fluid transfer system and method |