SG11201901050SA - Method and device for aligning substrates - Google Patents
Method and device for aligning substratesInfo
- Publication number
- SG11201901050SA SG11201901050SA SG11201901050SA SG11201901050SA SG11201901050SA SG 11201901050S A SG11201901050S A SG 11201901050SA SG 11201901050S A SG11201901050S A SG 11201901050SA SG 11201901050S A SG11201901050S A SG 11201901050SA SG 11201901050S A SG11201901050S A SG 11201901050SA
- Authority
- SG
- Singapore
- Prior art keywords
- aligning substrates
- aligning
- substrates
- substrate
- regard
- Prior art date
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67121—Apparatus for making assemblies not otherwise provided for, e.g. package constructions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/5442—Marks applied to semiconductor devices or parts comprising non digital, non alphanumeric information, e.g. symbols
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Wire Bonding (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2016/070289 WO2018041326A1 (de) | 2016-08-29 | 2016-08-29 | Verfahren und vorrichtung zum ausrichten von substraten |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201901050SA true SG11201901050SA (en) | 2019-03-28 |
Family
ID=57044904
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201901050SA SG11201901050SA (en) | 2016-08-29 | 2016-08-29 | Method and device for aligning substrates |
Country Status (8)
Country | Link |
---|---|
US (3) | US10692747B2 (zh) |
EP (2) | EP3734650B1 (zh) |
JP (1) | JP6801085B2 (zh) |
KR (2) | KR102386005B1 (zh) |
CN (2) | CN109643674B (zh) |
SG (1) | SG11201901050SA (zh) |
TW (2) | TWI778973B (zh) |
WO (1) | WO2018041326A1 (zh) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10692747B2 (en) * | 2016-08-29 | 2020-06-23 | Ev Group E. Thallner Gmbh | Method and device for alignment of substrates |
CN114167690A (zh) | 2016-12-20 | 2022-03-11 | Ev 集团 E·索尔纳有限责任公司 | 不同焦点平面 |
EP3559724B1 (de) | 2016-12-20 | 2020-06-17 | EV Group E. Thallner GmbH | Vorrichtung und verfahren zur belichtung einer lichtempfindlichen schicht |
US10073239B1 (en) * | 2017-05-15 | 2018-09-11 | Omnivision Technologies, Inc. | Dual photodiode for phase detection autofocus |
TWI661518B (zh) * | 2018-06-29 | 2019-06-01 | 欣興電子股份有限公司 | 接合電子元件的方法 |
WO2020226095A1 (ja) * | 2019-05-08 | 2020-11-12 | 東京エレクトロン株式会社 | 接合装置、接合システム及び接合方法 |
WO2020226093A1 (ja) * | 2019-05-08 | 2020-11-12 | 東京エレクトロン株式会社 | 接合装置、接合システム及び接合方法 |
WO2020234850A1 (en) * | 2019-05-22 | 2020-11-26 | Vuereal Inc. | An alignment process for the transfer setup |
CN114144868A (zh) * | 2019-08-23 | 2022-03-04 | Ev 集团 E·索尔纳有限责任公司 | 用于使基板对准的方法和装置 |
US11136202B2 (en) * | 2020-01-06 | 2021-10-05 | Asm Technology Singapore Pte Ltd | Direct transfer apparatus for electronic components |
KR20220167376A (ko) | 2020-06-29 | 2022-12-20 | 에베 그룹 에. 탈너 게엠베하 | 기판 접합 방법 및 장치 |
KR102472252B1 (ko) * | 2020-12-28 | 2022-11-30 | 주식회사 테스 | 기판접합장치의 예비정렬장치 및 예비정렬방법 |
KR102677190B1 (ko) * | 2020-12-31 | 2024-06-20 | 주식회사 테스 | 기판접합장치 및 기판접합방법 |
TWI792785B (zh) * | 2020-12-31 | 2023-02-11 | 南韓商Tes股份有限公司 | 基板接合裝置及基板接合方法 |
US11756921B2 (en) | 2021-03-18 | 2023-09-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for bonding semiconductor devices |
CN113594076B (zh) * | 2021-07-22 | 2023-06-20 | 上海精测半导体技术有限公司 | 有图形晶圆的对准方法及半导体设备 |
WO2023110113A1 (de) | 2021-12-17 | 2023-06-22 | Ev Group E. Thallner Gmbh | Verfahren und vorrichtung zum ausrichten eines substrates |
WO2023110114A1 (de) | 2021-12-17 | 2023-06-22 | Ev Group E. Thallner Gmbh | Vorrichtung und verfahren zur justierung eines erfassungsmittels |
JP2023183276A (ja) * | 2022-06-15 | 2023-12-27 | キオクシア株式会社 | 接合装置、接合方法、及び半導体装置の製造方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT405775B (de) | 1998-01-13 | 1999-11-25 | Thallner Erich | Verfahren und vorrichtung zum ausgerichteten zusammenführen von scheibenförmigen halbleitersubstraten |
JP4626160B2 (ja) * | 2004-03-04 | 2011-02-02 | 株式会社ニコン | ウェハ重ね合わせ方法及びウェハ重ね合わせ装置 |
JP4867373B2 (ja) * | 2006-02-02 | 2012-02-01 | 株式会社ニコン | ウェハホルダ及び半導体装置の製造方法 |
US7433038B2 (en) * | 2006-04-27 | 2008-10-07 | Asml Netherlands B.V. | Alignment of substrates for bonding |
CN103258762B (zh) * | 2007-08-10 | 2016-08-03 | 株式会社尼康 | 基板贴合装置及基板贴合方法 |
WO2010023935A1 (ja) * | 2008-08-29 | 2010-03-04 | 株式会社ニコン | 基板位置合わせ装置、基板位置合わせ方法および積層型半導体の製造方法 |
WO2010038454A1 (ja) | 2008-10-01 | 2010-04-08 | 株式会社ニコン | アラインメント装置およびアラインメント方法 |
EP3731258A1 (de) * | 2009-09-22 | 2020-10-28 | EV Group E. Thallner GmbH | Vorrichtung zum ausrichten zweier substrate |
JP5672715B2 (ja) | 2010-02-19 | 2015-02-18 | 株式会社ニコン | 重ね合わせ方法 |
JP5454310B2 (ja) * | 2010-04-01 | 2014-03-26 | 株式会社ニコン | 基板貼り合わせ装置および基板貼り合わせ方法 |
EP2612109B1 (de) | 2010-09-03 | 2014-06-04 | Ev Group E. Thallner GmbH | Vorrichtung und verfahren zur verringerung eines keilfehlers |
EP4290563A3 (de) | 2010-12-20 | 2024-03-20 | EV Group E. Thallner GmbH | Aufnahmeeinrichtung zur halterung von wafern |
TWI625797B (zh) * | 2012-10-26 | 2018-06-01 | Nikon Corp | Substrate bonding device, substrate position matching device, substrate bonding method, and substrate position matching method |
WO2014191033A1 (de) | 2013-05-29 | 2014-12-04 | Ev Group E. Thallner Gmbh | Vorrichtung und verfahren zum bonden von substraten |
CN105283950B (zh) * | 2013-06-17 | 2018-03-13 | Ev 集团 E·索尔纳有限责任公司 | 用于衬底对准的装置及方法 |
JP6111943B2 (ja) * | 2013-09-11 | 2017-04-12 | 富士通セミコンダクター株式会社 | 半導体装置の検査装置、及び半導体装置の製造方法 |
CN105247670B (zh) * | 2013-12-06 | 2018-06-12 | Ev 集团 E·索尔纳有限责任公司 | 用于对齐衬底的装置和方法 |
JP6353373B2 (ja) | 2015-01-16 | 2018-07-04 | 東京エレクトロン株式会社 | 接合装置、接合システムおよび接合方法 |
US10692747B2 (en) * | 2016-08-29 | 2020-06-23 | Ev Group E. Thallner Gmbh | Method and device for alignment of substrates |
-
2016
- 2016-08-29 US US16/323,539 patent/US10692747B2/en active Active
- 2016-08-29 EP EP20182353.1A patent/EP3734650B1/de active Active
- 2016-08-29 KR KR1020217005302A patent/KR102386005B1/ko active IP Right Grant
- 2016-08-29 JP JP2019506179A patent/JP6801085B2/ja active Active
- 2016-08-29 SG SG11201901050SA patent/SG11201901050SA/en unknown
- 2016-08-29 KR KR1020197003696A patent/KR102221965B1/ko active IP Right Grant
- 2016-08-29 CN CN201680088184.9A patent/CN109643674B/zh active Active
- 2016-08-29 WO PCT/EP2016/070289 patent/WO2018041326A1/de active Application Filing
- 2016-08-29 EP EP16774860.7A patent/EP3504733B1/de active Active
- 2016-08-29 CN CN202211652707.1A patent/CN115719721A/zh active Pending
-
2017
- 2017-08-14 TW TW106127416A patent/TWI778973B/zh active
- 2017-08-14 TW TW111132567A patent/TWI825958B/zh active
-
2020
- 2020-03-26 US US16/830,389 patent/US10943807B2/en active Active
-
2021
- 2021-01-29 US US17/162,180 patent/US11488851B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20200227299A1 (en) | 2020-07-16 |
CN109643674B (zh) | 2023-01-10 |
TWI825958B (zh) | 2023-12-11 |
WO2018041326A1 (de) | 2018-03-08 |
US20210151339A1 (en) | 2021-05-20 |
TW201812975A (zh) | 2018-04-01 |
US20190198371A1 (en) | 2019-06-27 |
CN115719721A (zh) | 2023-02-28 |
JP2019530206A (ja) | 2019-10-17 |
KR20210024662A (ko) | 2021-03-05 |
KR20190042561A (ko) | 2019-04-24 |
EP3504733B1 (de) | 2020-09-23 |
TW202310146A (zh) | 2023-03-01 |
TWI778973B (zh) | 2022-10-01 |
EP3734650B1 (de) | 2023-09-27 |
CN109643674A (zh) | 2019-04-16 |
EP3504733A1 (de) | 2019-07-03 |
KR102221965B1 (ko) | 2021-03-03 |
US11488851B2 (en) | 2022-11-01 |
EP3734650A1 (de) | 2020-11-04 |
US10943807B2 (en) | 2021-03-09 |
KR102386005B1 (ko) | 2022-04-12 |
US10692747B2 (en) | 2020-06-23 |
JP6801085B2 (ja) | 2020-12-16 |
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