SG11201805580QA - Boron nitride material and method of preparation thereof - Google Patents
Boron nitride material and method of preparation thereofInfo
- Publication number
- SG11201805580QA SG11201805580QA SG11201805580QA SG11201805580QA SG11201805580QA SG 11201805580Q A SG11201805580Q A SG 11201805580QA SG 11201805580Q A SG11201805580Q A SG 11201805580QA SG 11201805580Q A SG11201805580Q A SG 11201805580QA SG 11201805580Q A SG11201805580Q A SG 11201805580QA
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- Singapore
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- nanyang
- international
- singapore
- boron nitride
- avenue
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- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
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- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/583—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on boron nitride
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- C04B35/62272—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining fibres based on non-oxide ceramics
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- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
- C04B35/62844—Coating fibres
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- C04B38/00—Porous mortars, concrete, artificial stone or ceramic ware; Preparation thereof
- C04B38/06—Porous mortars, concrete, artificial stone or ceramic ware; Preparation thereof by burning-out added substances by burning natural expanding materials or by sublimating or melting out added substances
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
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- C23C16/36—Carbonitrides
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
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- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
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- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
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- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
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Abstract
INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property -, Organization 1111111101111011101010111110101111101110111011111111111111011011111101111011111 International Bureau ... .1 j ..... .....!;,,, (10) International Publication Number (43) International Publication Date WO 2017/119851 Al 13 July 2017 (13.07.2017) WI P0 I P CT (51) International Patent Classification: (81) Designated States (unless otherwise indicated, for every C23C 16/34 (2006.01) CO1B 6/11 (2006.01) kind of national protection available): AE, AG, AL, AM, C23C 16/36 (2006.01) AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, (21) International Application Number: DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, PCT/SG2017/050011 HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, (22) International Filing Date: KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, 9 January 2017 (09.01.2017) MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, (25) Filing Language: English RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, (26) Publication Language: English TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (30) Priority Data: 10201600155R 8 January 2016 (08.01.2016) SG (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, (71) Applicant: NANYANG TECHNOLOGICAL UNIVER- GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, SITY [SG/SG]; 50 Nanyang Avenue, Singapore 639798 TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, (SG). TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FL FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, (72) Inventors: TAY, Yingjie Roland; c/o Nanyang Technolo gical University, 50 Nanyang Avenue, Singapore 639798 LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CL CM, GA, GN, GQ, (SG). LI, Hongling; c/o Nanyang Technological Univer- GW, KM, ML, MR, NE, SN, TD, TG). sity, 50 Nanyang Avenue, Singapore 639798 (SG). TSANG, Siu Hon; c/o Nanyang Technological University, Published: 50 Nanyang Avenue, Singapore 639798 (SG). TEO, Hang with international search report (Art. 2 1 (3)) Tong Edwin; c/o Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798 (SG). (74) Agent: VIERING, JENTSCHURA & PARTNER LLP; P.O Box 1088, Rochor Post Office, Rochor Road, Singa- pore 911833 (SG). (54) Title: BORON NITRIDE MATERIAL AND METHOD OF PREPARATION THEREOF FIG. 1E ve 8 .- '1A-‘3,—• ..., 0 .,,,,,,.., 10 ,,,, tir VP' AV 'lir —\"*. • h-BN Il .4 Me a l\ • ifir s •-(3/ 3 13 •.. 0** \ :, v . lir kin ( sum, a 2 .1, 0 ,,, ,,• co a --. sr- . tz. 13.04 11 11 L ---- (57) : A method of preparing a boron nitride material, such as boron nitride (BN) or boron carbonitride (BCN), is provided. .::::) The method may include providing a substrate, and sublimating an amine borane complex onto the substrate to obtain the boron ni - el tride material. The amine borane complex may include, but is not limited to, borazine, amino borane, trimethylamine borane and tri- O ethylamine borane. In addition, the temperature at which the sublimating is carried out may be varied to control composition of the boron nitride material formed. In addition, various morphologies can be obtained by using the present method, namely films, nan- otubes and porous foam.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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SG10201600155R | 2016-01-08 | ||
PCT/SG2017/050011 WO2017119851A1 (en) | 2016-01-08 | 2017-01-09 | Boron nitride material and method of preparation thereof |
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SG11201805580QA true SG11201805580QA (en) | 2018-07-30 |
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SG11201805580QA SG11201805580QA (en) | 2016-01-08 | 2017-01-09 | Boron nitride material and method of preparation thereof |
Country Status (6)
Country | Link |
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US (1) | US10457553B2 (en) |
EP (1) | EP3400319A4 (en) |
JP (1) | JP2019503326A (en) |
CN (1) | CN109196139B (en) |
SG (1) | SG11201805580QA (en) |
WO (1) | WO2017119851A1 (en) |
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CN113176247A (en) * | 2015-10-07 | 2021-07-27 | 加利福尼亚大学校董会 | Graphene-based multi-modal sensor |
CN111099601A (en) * | 2019-11-15 | 2020-05-05 | 成都理工大学 | Preparation method of micro-mesoporous boron nitride oxide |
WO2021150569A2 (en) * | 2020-01-21 | 2021-07-29 | The Trustees Of Princeton University | Ultra-lightweight graphene-hbn nanoparticle aerogels |
CN112551991B (en) * | 2021-01-15 | 2021-08-31 | 福州大学 | Photocatalytic cement concrete and preparation method thereof |
CN113151803A (en) * | 2021-03-15 | 2021-07-23 | 杭州电子科技大学 | Preparation method of boron-carbon-nitrogen film |
CN113871581B (en) * | 2021-08-16 | 2023-03-03 | 广东轻工职业技术学院 | Zinc manganate graphene positive electrode material for regulating and controlling electron density, chemical self-charging aqueous zinc ion battery, and preparation method and application of positive electrode material |
CN114180972B (en) * | 2021-12-08 | 2022-10-11 | 安徽壹石通材料科技股份有限公司 | Preparation method of boron nitride/carbon foam material |
CN114436225B (en) * | 2022-03-02 | 2023-02-28 | 福州大学 | Boron nitride-based bowl-shaped foam material and preparation method thereof |
CN115051003A (en) * | 2022-04-07 | 2022-09-13 | 电子科技大学 | Borohydride ion conductor electrolyte material and preparation method and application thereof |
CN117004920A (en) * | 2023-07-28 | 2023-11-07 | 上海大学 | Gradient h-BNC nano self-cleaning film design method |
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US5169613A (en) * | 1991-02-06 | 1992-12-08 | The Ohio State University Research Foundation | Method for the preparation of boron nitride using ammonia-monohaloborane |
JPH06115913A (en) * | 1992-01-20 | 1994-04-26 | Natl Inst For Res In Inorg Mater | Synthesis of boron carbonitride |
US7144803B2 (en) | 2003-04-17 | 2006-12-05 | Semiconductor Research Corporation | Methods of forming boron carbo-nitride layers for integrated circuit devices |
KR101878746B1 (en) * | 2011-12-06 | 2018-07-17 | 삼성전자주식회사 | Hexagonal boron nitride sheet, process for preparing the sheet and electronic device comprising the sheet |
CN103232027B (en) * | 2013-04-22 | 2015-05-20 | 南京航空航天大学 | Three-dimensional boron nitride foam and preparation method thereof |
US10458049B2 (en) | 2013-07-30 | 2019-10-29 | University Of New Hampshire | Continuous boron nitride nanotube yarns and methods of production |
CN104129763A (en) * | 2014-06-12 | 2014-11-05 | 南京航空航天大学 | Preparation method of large-grain single-layer hexagonal boron nitride |
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2017
- 2017-01-09 WO PCT/SG2017/050011 patent/WO2017119851A1/en active Application Filing
- 2017-01-09 CN CN201780016466.2A patent/CN109196139B/en not_active Expired - Fee Related
- 2017-01-09 EP EP17736186.2A patent/EP3400319A4/en not_active Withdrawn
- 2017-01-09 US US16/068,590 patent/US10457553B2/en not_active Expired - Fee Related
- 2017-01-09 SG SG11201805580QA patent/SG11201805580QA/en unknown
- 2017-01-09 JP JP2018535333A patent/JP2019503326A/en active Pending
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US10457553B2 (en) | 2019-10-29 |
WO2017119851A1 (en) | 2017-07-13 |
EP3400319A4 (en) | 2019-06-26 |
EP3400319A1 (en) | 2018-11-14 |
US20190016600A1 (en) | 2019-01-17 |
JP2019503326A (en) | 2019-02-07 |
CN109196139A (en) | 2019-01-11 |
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