SG11201805553VA - Low pressure wire ion plasma discharge source, and application to electron source with secondary emission - Google Patents

Low pressure wire ion plasma discharge source, and application to electron source with secondary emission

Info

Publication number
SG11201805553VA
SG11201805553VA SG11201805553VA SG11201805553VA SG11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA
Authority
SG
Singapore
Prior art keywords
source
application
low pressure
plasma discharge
secondary emission
Prior art date
Application number
SG11201805553VA
Other languages
English (en)
Inventor
Paul Ceccato
Hervé Besaucele
Original Assignee
Laser Systems & Solutions Of Europe
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Laser Systems & Solutions Of Europe filed Critical Laser Systems & Solutions Of Europe
Publication of SG11201805553VA publication Critical patent/SG11201805553VA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/20—Selection of substances for gas fillings; Means for obtaining or maintaining the desired pressure within the tube, e.g. by gettering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J47/00—Tubes for determining the presence, intensity, density or energy of radiation or particles
    • H01J47/02—Ionisation chambers
    • H01J47/026—Gas flow ionisation chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • H01S3/09716—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation by ionising radiation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H01J35/116—Transmissive anodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma Technology (AREA)
  • X-Ray Techniques (AREA)
  • Electron Sources, Ion Sources (AREA)
SG11201805553VA 2016-01-19 2017-01-12 Low pressure wire ion plasma discharge source, and application to electron source with secondary emission SG11201805553VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP16151863.4A EP3196918B1 (en) 2016-01-19 2016-01-19 Pulsed x-ray source comprising a low pressure wire ion plasma discharge source
PCT/EP2017/050596 WO2017125315A1 (en) 2016-01-19 2017-01-12 Low pressure wire ion plasma discharge source, and application to electron source with secondary emission

Publications (1)

Publication Number Publication Date
SG11201805553VA true SG11201805553VA (en) 2018-07-30

Family

ID=55177828

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201805553VA SG11201805553VA (en) 2016-01-19 2017-01-12 Low pressure wire ion plasma discharge source, and application to electron source with secondary emission

Country Status (8)

Country Link
US (1) US10763070B2 (ja)
EP (2) EP3196918B1 (ja)
JP (1) JP6577682B2 (ja)
KR (1) KR102177127B1 (ja)
CN (1) CN108701574B (ja)
MY (1) MY190639A (ja)
SG (1) SG11201805553VA (ja)
WO (1) WO2017125315A1 (ja)

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3721915A (en) * 1969-09-19 1973-03-20 Avco Corp Electrically excited flowing gas laser and method of operation
EP0336282B1 (de) 1988-04-08 1992-06-10 Siemens Aktiengesellschaft Plasma-Röntgenröhre, insbesondere zur Röntgen-Vorionisierung von Gaslasern, Verfahren zur Erzeugung von Röntgenstrahlung mit einer solchen Röntgenröhre und Verwendung letzterer
WO1989010003A1 (en) 1988-04-08 1989-10-19 Siemens Aktiengesellschaft Plasma x-ray tube, in particular for x-ray preionizing of gas lasers, and use as electron gun
US4888776A (en) * 1988-12-13 1989-12-19 Hughes Aircraft Company Ribbon beam free electron laser
DE3930699C2 (de) * 1989-09-14 1994-02-03 Perzl Peter Vorrichtung zur Energieeinkopplung in eine durchströmte elektrische Gasentladung
JPH04255654A (ja) 1991-02-08 1992-09-10 Toshiba Corp パルス電子銃
JPH05121022A (ja) * 1991-10-24 1993-05-18 Toshiba Corp 電子銃
JPH06332327A (ja) 1993-05-24 1994-12-02 Sanyo Electric Co Ltd 画像形成装置
JPH0836982A (ja) 1994-07-22 1996-02-06 Toshiba Corp イオンビーム発生方法及びそのイオンビーム源
JP3155192B2 (ja) 1996-02-23 2001-04-09 シャープ株式会社 画像形成システム
CA2539221A1 (en) * 2003-09-25 2005-03-31 Mds Inc., Doing Business As Mds Sciex Method and apparatus for providing two-dimensional substantially quadrupole fields having selected hexapole components
DE112006003188B4 (de) * 2005-11-04 2013-12-24 Von Ardenne Anlagentechnik Gmbh Verfahren und Anordnung zum Redundanten Anoden-Sputtern
US7800083B2 (en) * 2007-11-06 2010-09-21 Axcelis Technologies, Inc. Plasma electron flood for ion beam implanter
ATE477585T1 (de) 2008-01-11 2010-08-15 Excico Group Vorrichtung und verfahren zur stromversorgung einer elektronenquelle und elektronenquelle mit sekundäremission unter ionenbombardierung
US8747956B2 (en) * 2011-08-11 2014-06-10 Ati Properties, Inc. Processes, systems, and apparatus for forming products from atomized metals and alloys
EP2463890A1 (en) * 2010-12-08 2012-06-13 Applied Materials, Inc. Generating plasmas in pulsed power systems
US10304665B2 (en) * 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
EP2648489A1 (en) * 2012-04-02 2013-10-09 Excico France A method for stabilizing a plasma and an improved ionization chamber
US10056237B2 (en) * 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment

Also Published As

Publication number Publication date
KR20180096747A (ko) 2018-08-29
EP3196918B1 (en) 2019-02-27
EP3196918A1 (en) 2017-07-26
CN108701574B (zh) 2020-03-06
MY190639A (en) 2022-04-29
KR102177127B1 (ko) 2020-11-10
CN108701574A (zh) 2018-10-23
US10763070B2 (en) 2020-09-01
US20190027336A1 (en) 2019-01-24
JP2019501510A (ja) 2019-01-17
JP6577682B2 (ja) 2019-09-18
EP3405969A1 (en) 2018-11-28
WO2017125315A1 (en) 2017-07-27

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