SG11201805553VA - Low pressure wire ion plasma discharge source, and application to electron source with secondary emission - Google Patents

Low pressure wire ion plasma discharge source, and application to electron source with secondary emission

Info

Publication number
SG11201805553VA
SG11201805553VA SG11201805553VA SG11201805553VA SG11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA
Authority
SG
Singapore
Prior art keywords
source
application
low pressure
plasma discharge
secondary emission
Prior art date
Application number
SG11201805553VA
Other languages
English (en)
Inventor
Paul Ceccato
Hervé Besaucele
Original Assignee
Laser Systems & Solutions Of Europe
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Laser Systems & Solutions Of Europe filed Critical Laser Systems & Solutions Of Europe
Publication of SG11201805553VA publication Critical patent/SG11201805553VA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/20—Selection of substances for gas fillings; Means for obtaining or maintaining the desired pressure within the tube, e.g. by gettering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J47/00—Tubes for determining the presence, intensity, density or energy of radiation or particles
    • H01J47/02—Ionisation chambers
    • H01J47/026—Gas flow ionisation chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • H01S3/09716—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation by ionising radiation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H01J35/116—Transmissive anodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma Technology (AREA)
  • X-Ray Techniques (AREA)
  • Electron Sources, Ion Sources (AREA)
SG11201805553VA 2016-01-19 2017-01-12 Low pressure wire ion plasma discharge source, and application to electron source with secondary emission SG11201805553VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP16151863.4A EP3196918B1 (en) 2016-01-19 2016-01-19 Pulsed x-ray source comprising a low pressure wire ion plasma discharge source
PCT/EP2017/050596 WO2017125315A1 (en) 2016-01-19 2017-01-12 Low pressure wire ion plasma discharge source, and application to electron source with secondary emission

Publications (1)

Publication Number Publication Date
SG11201805553VA true SG11201805553VA (en) 2018-07-30

Family

ID=55177828

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201805553VA SG11201805553VA (en) 2016-01-19 2017-01-12 Low pressure wire ion plasma discharge source, and application to electron source with secondary emission

Country Status (8)

Country Link
US (1) US10763070B2 (ja)
EP (2) EP3196918B1 (ja)
JP (1) JP6577682B2 (ja)
KR (1) KR102177127B1 (ja)
CN (1) CN108701574B (ja)
MY (1) MY190639A (ja)
SG (1) SG11201805553VA (ja)
WO (1) WO2017125315A1 (ja)

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3721915A (en) * 1969-09-19 1973-03-20 Avco Corp Electrically excited flowing gas laser and method of operation
DE58901620D1 (de) 1988-04-08 1992-07-16 Siemens Ag Plasma-roentgenroehre, insbesondere zur roentgen-vorionisierung von gaslasern, verfahren zur erzeugung von roentgenstrahlung mit einer solchen roentgenroehre und verwendung letzterer.
DE58904809D1 (de) * 1988-04-08 1993-07-29 Siemens Ag Plasma-roentgenroehre, insbesondere zur roentgen-vorionisierung von gaslasern, und verwendung als elektronenkanone.
US4888776A (en) * 1988-12-13 1989-12-19 Hughes Aircraft Company Ribbon beam free electron laser
DE3930699C2 (de) * 1989-09-14 1994-02-03 Perzl Peter Vorrichtung zur Energieeinkopplung in eine durchströmte elektrische Gasentladung
JPH04255654A (ja) 1991-02-08 1992-09-10 Toshiba Corp パルス電子銃
JPH05121022A (ja) * 1991-10-24 1993-05-18 Toshiba Corp 電子銃
JPH06332327A (ja) 1993-05-24 1994-12-02 Sanyo Electric Co Ltd 画像形成装置
JPH0836982A (ja) * 1994-07-22 1996-02-06 Toshiba Corp イオンビーム発生方法及びそのイオンビーム源
JP3155192B2 (ja) 1996-02-23 2001-04-09 シャープ株式会社 画像形成システム
JP5027507B2 (ja) * 2003-09-25 2012-09-19 エムディーエス インコーポレイテッド ドゥーイング ビジネス アズ エムディーエス サイエックス 選択された六重極成分を有する２次元の実質的四重極電場を提供するための方法及び装置
KR101089427B1 (ko) * 2005-11-04 2011-12-07 폰 아르데네 안라겐테크닉 게엠베하 리던던시형 애노드 스퍼터링 방법 및 조립체
US7800083B2 (en) * 2007-11-06 2010-09-21 Axcelis Technologies, Inc. Plasma electron flood for ion beam implanter
ATE477585T1 (de) 2008-01-11 2010-08-15 Excico Group Vorrichtung und verfahren zur stromversorgung einer elektronenquelle und elektronenquelle mit sekundäremission unter ionenbombardierung
US8747956B2 (en) * 2011-08-11 2014-06-10 Ati Properties, Inc. Processes, systems, and apparatus for forming products from atomized metals and alloys
EP2463890A1 (en) * 2010-12-08 2012-06-13 Applied Materials, Inc. Generating plasmas in pulsed power systems
US10304665B2 (en) * 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
EP2648489A1 (en) * 2012-04-02 2013-10-09 Excico France A method for stabilizing a plasma and an improved ionization chamber
US10056237B2 (en) * 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment

Also Published As

Publication number Publication date
WO2017125315A1 (en) 2017-07-27
KR102177127B1 (ko) 2020-11-10
CN108701574A (zh) 2018-10-23
EP3196918A1 (en) 2017-07-26
JP6577682B2 (ja) 2019-09-18
EP3196918B1 (en) 2019-02-27
US20190027336A1 (en) 2019-01-24
JP2019501510A (ja) 2019-01-17
US10763070B2 (en) 2020-09-01
KR20180096747A (ko) 2018-08-29
MY190639A (en) 2022-04-29
CN108701574B (zh) 2020-03-06
EP3405969A1 (en) 2018-11-28

Similar Documents

Publication Publication Date Title
EP3175474A4 (en) Ion funnel for efficient transmission of low mass-to-charge ratio ions with reduced gas flow at the exit
SG10201504088VA (en) Hollow cathode discharge (hcd) suppressing capacitively coupled plasma electrode and gas distribution faceplate
IL284458B (en) electron source
EP3711078A4 (en) LINEARIZED ENERGETIC HIGH FREQUENCY PLASMA ION SOURCE
IL245520A0 (en) A device for emitting electrons resistant to ion bombardment
EP3385975A4 (en) GAS DISCHARGE TUBE
EP3469239A4 (en) GAS SEAL WITH REDUCED EMISSION
GB201408113D0 (en) Electron ionization (EI) utilizing different EI energies
EP3396752A4 (en) GAS DIFFUSION ELECTRODE
EP3648140A4 (en) ELECTRON MULTIPLE
GB201521498D0 (en) Ion source for soft electron ionization and related systems and methods
EP3163659A4 (en) Air electrode, metal air battery, and air electrode material
EP3353536A4 (en) ANALYSIS OF ELEMENTS THROUGH SOLUTION CATHODE GLIMETRY LOAD
EP3648139A4 (en) ELECTRON MULTIPLE
EP3607576B8 (en) Ion transfer from electron ionization sources
EP3074765A4 (en) Dielectric barrier discharge ionization source for spectrometry
EP3625815A4 (en) ELECTRON PHOTOINJECTOR
EP3343680A4 (en) GAS DIFFUSION ELECTRODE
EP3316277A4 (en) DEVICE FOR ION IMPLANTER, CATHODE, CHAMBER WALL, SLOT ELEMENT AND ION GENERATING DEVICE THEREWITH
EP3271934A4 (en) DEVICES AND METHODS FOR FLAT GAS DISCHARGE TUBE
EP3654362A4 (en) ELECTRON TUBE
GB2567853B (en) Gas-source mass spectrometer comprising an electron source
EP3444835A4 (en) SPIN-POLARIZED PHOTO CATHODE FOR THE PRODUCTION OF ELECTRONS WITH HIGH BRIGHTNESS AND METHOD FOR THE PRODUCTION THEREOF
SG10201505519VA (en) Filament For Mass Spectrometric Electron Impact Ion Source
GB201708486D0 (en) Mercury-free gas discharge lamp