SG11201805553VA - Low pressure wire ion plasma discharge source, and application to electron source with secondary emission - Google Patents
Low pressure wire ion plasma discharge source, and application to electron source with secondary emissionInfo
- Publication number
- SG11201805553VA SG11201805553VA SG11201805553VA SG11201805553VA SG11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA
- Authority
- SG
- Singapore
- Prior art keywords
- source
- application
- low pressure
- plasma discharge
- secondary emission
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/20—Selection of substances for gas fillings; Means for obtaining or maintaining the desired pressure within the tube, e.g. by gettering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J47/00—Tubes for determining the presence, intensity, density or energy of radiation or particles
- H01J47/02—Ionisation chambers
- H01J47/026—Gas flow ionisation chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
- H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
- H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
- H01S3/09716—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation by ionising radiation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/112—Non-rotating anodes
- H01J35/116—Transmissive anodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Plasma Technology (AREA)
- X-Ray Techniques (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP16151863.4A EP3196918B1 (en) | 2016-01-19 | 2016-01-19 | Pulsed x-ray source comprising a low pressure wire ion plasma discharge source |
PCT/EP2017/050596 WO2017125315A1 (en) | 2016-01-19 | 2017-01-12 | Low pressure wire ion plasma discharge source, and application to electron source with secondary emission |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201805553VA true SG11201805553VA (en) | 2018-07-30 |
Family
ID=55177828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201805553VA SG11201805553VA (en) | 2016-01-19 | 2017-01-12 | Low pressure wire ion plasma discharge source, and application to electron source with secondary emission |
Country Status (8)
Country | Link |
---|---|
US (1) | US10763070B2 (en) |
EP (2) | EP3196918B1 (en) |
JP (1) | JP6577682B2 (en) |
KR (1) | KR102177127B1 (en) |
CN (1) | CN108701574B (en) |
MY (1) | MY190639A (en) |
SG (1) | SG11201805553VA (en) |
WO (1) | WO2017125315A1 (en) |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3721915A (en) * | 1969-09-19 | 1973-03-20 | Avco Corp | Electrically excited flowing gas laser and method of operation |
DE58901620D1 (en) | 1988-04-08 | 1992-07-16 | Siemens Ag | PLASMA X-RAY TUBES, IN PARTICULAR FOR X-RAY PREIONING OF GAS LASERS, METHOD FOR GENERATING X-RAY RADIATION WITH SUCH AN X-RAY TUBE AND USE OF THE LATER. |
WO1989010003A1 (en) | 1988-04-08 | 1989-10-19 | Siemens Aktiengesellschaft | Plasma x-ray tube, in particular for x-ray preionizing of gas lasers, and use as electron gun |
US4888776A (en) * | 1988-12-13 | 1989-12-19 | Hughes Aircraft Company | Ribbon beam free electron laser |
DE3930699C2 (en) * | 1989-09-14 | 1994-02-03 | Perzl Peter | Device for coupling energy into a flow of electrical gas discharge |
JPH04255654A (en) | 1991-02-08 | 1992-09-10 | Toshiba Corp | Pulse electron gun |
JPH05121022A (en) * | 1991-10-24 | 1993-05-18 | Toshiba Corp | Electron gun |
JPH06332327A (en) | 1993-05-24 | 1994-12-02 | Sanyo Electric Co Ltd | Image forming device |
JPH0836982A (en) * | 1994-07-22 | 1996-02-06 | Toshiba Corp | Ion beam generating method and its ion beam source |
JP3155192B2 (en) | 1996-02-23 | 2001-04-09 | シャープ株式会社 | Image forming system |
EP1668665A4 (en) * | 2003-09-25 | 2008-03-19 | Mds Inc Dba Mds Sciex | Method and apparatus for providing two-dimensional substantially quadrupole fields having selected hexapole components |
CN101300658B (en) * | 2005-11-04 | 2010-06-09 | 冯·阿德纳设备有限公司 | Redundant anode sputtering method and system |
US7800083B2 (en) * | 2007-11-06 | 2010-09-21 | Axcelis Technologies, Inc. | Plasma electron flood for ion beam implanter |
EP2079092B1 (en) | 2008-01-11 | 2010-08-11 | Excico Group | Device and method for supplying power to an electron source and electron source with secondary emission under ion bombardment |
US8747956B2 (en) * | 2011-08-11 | 2014-06-10 | Ati Properties, Inc. | Processes, systems, and apparatus for forming products from atomized metals and alloys |
EP2463890A1 (en) * | 2010-12-08 | 2012-06-13 | Applied Materials, Inc. | Generating plasmas in pulsed power systems |
US10304665B2 (en) * | 2011-09-07 | 2019-05-28 | Nano-Product Engineering, LLC | Reactors for plasma-assisted processes and associated methods |
EP2648489A1 (en) * | 2012-04-02 | 2013-10-09 | Excico France | A method for stabilizing a plasma and an improved ionization chamber |
US10056237B2 (en) * | 2012-09-14 | 2018-08-21 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
-
2016
- 2016-01-19 EP EP16151863.4A patent/EP3196918B1/en active Active
-
2017
- 2017-01-12 CN CN201780007089.6A patent/CN108701574B/en active Active
- 2017-01-12 MY MYPI2018702482A patent/MY190639A/en unknown
- 2017-01-12 SG SG11201805553VA patent/SG11201805553VA/en unknown
- 2017-01-12 WO PCT/EP2017/050596 patent/WO2017125315A1/en active Application Filing
- 2017-01-12 US US16/070,785 patent/US10763070B2/en active Active
- 2017-01-12 KR KR1020187020865A patent/KR102177127B1/en active IP Right Grant
- 2017-01-12 EP EP17700296.1A patent/EP3405969A1/en not_active Withdrawn
- 2017-01-12 JP JP2018554635A patent/JP6577682B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP6577682B2 (en) | 2019-09-18 |
EP3196918B1 (en) | 2019-02-27 |
KR102177127B1 (en) | 2020-11-10 |
MY190639A (en) | 2022-04-29 |
EP3196918A1 (en) | 2017-07-26 |
EP3405969A1 (en) | 2018-11-28 |
CN108701574A (en) | 2018-10-23 |
US10763070B2 (en) | 2020-09-01 |
WO2017125315A1 (en) | 2017-07-27 |
KR20180096747A (en) | 2018-08-29 |
CN108701574B (en) | 2020-03-06 |
US20190027336A1 (en) | 2019-01-24 |
JP2019501510A (en) | 2019-01-17 |
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SG11201805553VA (en) | Low pressure wire ion plasma discharge source, and application to electron source with secondary emission |