SG11201805553VA - Low pressure wire ion plasma discharge source, and application to electron source with secondary emission - Google Patents
Low pressure wire ion plasma discharge source, and application to electron source with secondary emissionInfo
- Publication number
- SG11201805553VA SG11201805553VA SG11201805553VA SG11201805553VA SG11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA SG 11201805553V A SG11201805553V A SG 11201805553VA
- Authority
- SG
- Singapore
- Prior art keywords
- source
- application
- low pressure
- plasma discharge
- secondary emission
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/20—Selection of substances for gas fillings; Means for obtaining or maintaining the desired pressure within the tube, e.g. by gettering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J47/00—Tubes for determining the presence, intensity, density or energy of radiation or particles
- H01J47/02—Ionisation chambers
- H01J47/026—Gas flow ionisation chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
- H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
- H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
- H01S3/09716—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation by ionising radiation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/112—Non-rotating anodes
- H01J35/116—Transmissive anodes
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP16151863.4A EP3196918B1 (de) | 2016-01-19 | 2016-01-19 | Gepulste röntgenquelle umfassend eine niederdruckionenplasmaentladungsquelle mit drähten |
| PCT/EP2017/050596 WO2017125315A1 (en) | 2016-01-19 | 2017-01-12 | Low pressure wire ion plasma discharge source, and application to electron source with secondary emission |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201805553VA true SG11201805553VA (en) | 2018-07-30 |
Family
ID=55177828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201805553VA SG11201805553VA (en) | 2016-01-19 | 2017-01-12 | Low pressure wire ion plasma discharge source, and application to electron source with secondary emission |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10763070B2 (de) |
| EP (2) | EP3196918B1 (de) |
| JP (1) | JP6577682B2 (de) |
| KR (1) | KR102177127B1 (de) |
| CN (1) | CN108701574B (de) |
| MY (1) | MY190639A (de) |
| SG (1) | SG11201805553VA (de) |
| WO (1) | WO2017125315A1 (de) |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3721915A (en) * | 1969-09-19 | 1973-03-20 | Avco Corp | Electrically excited flowing gas laser and method of operation |
| EP0336282B1 (de) | 1988-04-08 | 1992-06-10 | Siemens Aktiengesellschaft | Plasma-Röntgenröhre, insbesondere zur Röntgen-Vorionisierung von Gaslasern, Verfahren zur Erzeugung von Röntgenstrahlung mit einer solchen Röntgenröhre und Verwendung letzterer |
| WO1989010003A1 (en) | 1988-04-08 | 1989-10-19 | Siemens Aktiengesellschaft | Plasma x-ray tube, in particular for x-ray preionizing of gas lasers, and use as electron gun |
| US4888776A (en) * | 1988-12-13 | 1989-12-19 | Hughes Aircraft Company | Ribbon beam free electron laser |
| DE3930699C2 (de) * | 1989-09-14 | 1994-02-03 | Perzl Peter | Vorrichtung zur Energieeinkopplung in eine durchströmte elektrische Gasentladung |
| JPH04255654A (ja) | 1991-02-08 | 1992-09-10 | Toshiba Corp | パルス電子銃 |
| JPH05121022A (ja) * | 1991-10-24 | 1993-05-18 | Toshiba Corp | 電子銃 |
| JPH06332327A (ja) | 1993-05-24 | 1994-12-02 | Sanyo Electric Co Ltd | 画像形成装置 |
| JPH0836982A (ja) | 1994-07-22 | 1996-02-06 | Toshiba Corp | イオンビーム発生方法及びそのイオンビーム源 |
| JP3155192B2 (ja) | 1996-02-23 | 2001-04-09 | シャープ株式会社 | 画像形成システム |
| WO2005029533A1 (en) * | 2003-09-25 | 2005-03-31 | Mds Inc., Doing Business As Mds Sciex | Method and apparatus for providing two-dimensional substantially quadrupole fields having selected hexapole components |
| KR101089427B1 (ko) * | 2005-11-04 | 2011-12-07 | 폰 아르데네 안라겐테크닉 게엠베하 | 리던던시형 애노드 스퍼터링 방법 및 조립체 |
| US7800083B2 (en) * | 2007-11-06 | 2010-09-21 | Axcelis Technologies, Inc. | Plasma electron flood for ion beam implanter |
| DE602008002138D1 (de) | 2008-01-11 | 2010-09-23 | Excico Group N V | Vorrichtung und Verfahren zur Stromversorgung einer Elektronenquelle und Elektronenquelle mit Sekundäremission unter Ionenbombardierung |
| US8747956B2 (en) * | 2011-08-11 | 2014-06-10 | Ati Properties, Inc. | Processes, systems, and apparatus for forming products from atomized metals and alloys |
| EP2463890A1 (de) * | 2010-12-08 | 2012-06-13 | Applied Materials, Inc. | Erzeugung von Plasmen in gepulsten Stromversorgungssystemen |
| US10304665B2 (en) * | 2011-09-07 | 2019-05-28 | Nano-Product Engineering, LLC | Reactors for plasma-assisted processes and associated methods |
| EP2648489A1 (de) * | 2012-04-02 | 2013-10-09 | Excico France | Verfahren zur Stabilisierung eines Plasmas und eine verbesserte Ionisierungskammer |
| US10056237B2 (en) * | 2012-09-14 | 2018-08-21 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
-
2016
- 2016-01-19 EP EP16151863.4A patent/EP3196918B1/de active Active
-
2017
- 2017-01-12 MY MYPI2018702482A patent/MY190639A/en unknown
- 2017-01-12 EP EP17700296.1A patent/EP3405969A1/de not_active Withdrawn
- 2017-01-12 JP JP2018554635A patent/JP6577682B2/ja active Active
- 2017-01-12 KR KR1020187020865A patent/KR102177127B1/ko active IP Right Grant
- 2017-01-12 US US16/070,785 patent/US10763070B2/en active Active
- 2017-01-12 SG SG11201805553VA patent/SG11201805553VA/en unknown
- 2017-01-12 WO PCT/EP2017/050596 patent/WO2017125315A1/en active Application Filing
- 2017-01-12 CN CN201780007089.6A patent/CN108701574B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US20190027336A1 (en) | 2019-01-24 |
| EP3196918B1 (de) | 2019-02-27 |
| CN108701574A (zh) | 2018-10-23 |
| JP2019501510A (ja) | 2019-01-17 |
| KR20180096747A (ko) | 2018-08-29 |
| EP3196918A1 (de) | 2017-07-26 |
| JP6577682B2 (ja) | 2019-09-18 |
| US10763070B2 (en) | 2020-09-01 |
| KR102177127B1 (ko) | 2020-11-10 |
| CN108701574B (zh) | 2020-03-06 |
| EP3405969A1 (de) | 2018-11-28 |
| MY190639A (en) | 2022-04-29 |
| WO2017125315A1 (en) | 2017-07-27 |
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