SG11201710709SA - Electrolytic hard gold plating solution substitution inhibitor and electrolytic hard gold plating solution including same - Google Patents

Electrolytic hard gold plating solution substitution inhibitor and electrolytic hard gold plating solution including same

Info

Publication number
SG11201710709SA
SG11201710709SA SG11201710709SA SG11201710709SA SG11201710709SA SG 11201710709S A SG11201710709S A SG 11201710709SA SG 11201710709S A SG11201710709S A SG 11201710709SA SG 11201710709S A SG11201710709S A SG 11201710709SA SG 11201710709S A SG11201710709S A SG 11201710709SA
Authority
SG
Singapore
Prior art keywords
plating solution
gold plating
hard gold
electrolytic hard
including same
Prior art date
Application number
SG11201710709SA
Inventor
Masato Furukawa
Original Assignee
Metalor Tech (Japan) Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metalor Tech (Japan) Corporation filed Critical Metalor Tech (Japan) Corporation
Publication of SG11201710709SA publication Critical patent/SG11201710709SA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/62Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
SG11201710709SA 2015-06-26 2016-06-01 Electrolytic hard gold plating solution substitution inhibitor and electrolytic hard gold plating solution including same SG11201710709SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015129063 2015-06-26
PCT/JP2016/066152 WO2016208340A1 (en) 2015-06-26 2016-06-01 Electrolytic hard gold plating solution substitution inhibitor and electrolytic hard gold plating solution including same

Publications (1)

Publication Number Publication Date
SG11201710709SA true SG11201710709SA (en) 2018-01-30

Family

ID=57586255

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201710709SA SG11201710709SA (en) 2015-06-26 2016-06-01 Electrolytic hard gold plating solution substitution inhibitor and electrolytic hard gold plating solution including same

Country Status (8)

Country Link
US (1) US10577704B2 (en)
EP (1) EP3315635B1 (en)
JP (1) JP6715246B2 (en)
KR (1) KR102670599B1 (en)
CN (1) CN107709628B (en)
SG (1) SG11201710709SA (en)
TW (1) TWI717360B (en)
WO (1) WO2016208340A1 (en)

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5134974Y2 (en) 1971-02-02 1976-08-30
JPS53137035A (en) * 1977-12-19 1978-11-30 Nippon Dento Kougiyou Kk Method of electrodepositing glossy gold and nickel
JP2529021Y2 (en) 1988-06-02 1997-03-12 カヤバ工業株式会社 Active suspension
JP2529021B2 (en) 1990-08-30 1996-08-28 日本エレクトロプレイテイング・エンジニヤース株式会社 Cyan-based gold plating solution containing gold replacement / electrolytic corrosion inhibitor
FR2828889B1 (en) * 2001-08-24 2004-05-07 Engelhard Clal Sas ELECTROLYTIC BATH FOR THE ELECTROCHEMICAL DEPOSITION OF GOLD AND ITS ALLOYS
JP2003226993A (en) * 2002-02-01 2003-08-15 Electroplating Eng Of Japan Co Gold plating solution and gold plating treatment method
JP4179165B2 (en) * 2002-02-28 2008-11-12 日本ゼオン株式会社 Partial plating method, partial plating resin base material, and manufacturing method of multilayer circuit board
JP4129363B2 (en) * 2002-03-15 2008-08-06 エヌ・イーケムキャット株式会社 Electrolytic gold plating solution and gold plating method
JP2004176171A (en) * 2002-09-30 2004-06-24 Shinko Electric Ind Co Ltd Non-cyanogen type electrolytic solution for plating gold
JP2004190093A (en) * 2002-12-11 2004-07-08 Ne Chemcat Corp Displacement electroless gold plating bath
JP5558675B2 (en) 2007-04-03 2014-07-23 ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. Metal plating composition
CN102105623B (en) 2008-06-11 2013-10-02 日本高纯度化学株式会社 Electrolytic gold plating solution and gold film obtained using same
JP5513784B2 (en) 2008-08-25 2014-06-04 日本エレクトロプレイテイング・エンジニヤース株式会社 Hard gold plating solution
JP5619348B2 (en) 2008-11-21 2014-11-05 住友化学株式会社 Mold sheet inspection system
US8608931B2 (en) * 2009-09-25 2013-12-17 Rohm And Haas Electronic Materials Llc Anti-displacement hard gold compositions
JP6145671B2 (en) * 2012-12-24 2017-06-14 石原ケミカル株式会社 A tin or tin alloy plating bath and an electronic component formed using the plating bath
EP2982743B1 (en) * 2013-04-04 2019-07-17 Hitachi Chemical Company, Ltd. Filter for capturing biological substance
EP2990507A1 (en) * 2014-08-25 2016-03-02 ATOTECH Deutschland GmbH Composition, use thereof and method for electrodepositing gold containing layers
CN104264195A (en) * 2014-10-22 2015-01-07 华文蔚 Mercaptoiminazole cyanide-free gold-electroplating solution and electroplating method thereof

Also Published As

Publication number Publication date
EP3315635A1 (en) 2018-05-02
KR102670599B1 (en) 2024-05-29
EP3315635A4 (en) 2019-05-08
CN107709628B (en) 2020-06-16
JPWO2016208340A1 (en) 2018-04-12
TW201715090A (en) 2017-05-01
EP3315635B1 (en) 2020-11-04
TWI717360B (en) 2021-02-01
US10577704B2 (en) 2020-03-03
WO2016208340A1 (en) 2016-12-29
US20180187321A1 (en) 2018-07-05
CN107709628A (en) 2018-02-16
KR20180021734A (en) 2018-03-05
JP6715246B2 (en) 2020-07-01

Similar Documents

Publication Publication Date Title
IL277342B (en) Glycan therapeutics and related methods thereof
PT3575434T (en) Plated steel
PL3245308T3 (en) Titanium alloy
HK1200505A1 (en) Gold electroplating method and hard gold preparation method
PL3319436T3 (en) Herbicidal composition comprising cinmethylin and quinmerac
AU365269S (en) Bracelet
SG11201710312SA (en) Modified cyanide-free gold plating solution and use thereof, as well as preparation method for hard gold
EP3042985A4 (en) Zinc alloy plating method
HK1200506A1 (en) Cyanide-free electroplating solution and application thereof
EP3042984A4 (en) Zinc alloy plating method
EP3212823A4 (en) Plating bath solutions
SG10201504959UA (en) Plating method
SG11201700896XA (en) Copper-nickel alloy electroplating bath
SG11201703049XA (en) Copper-Nickel Alloy Electroplating Apparatus
AU363908S (en) Bracelet
EP3149223A4 (en) Aqueous electroless nickel plating bath and method of using the same
EP3363928A4 (en) Electroless platinum plating solution
AU364270S (en) Bracelet
HK1232261A1 (en) Copper tin alloy plating bath
EP3399071A4 (en) Snag alloy plating liquid
GB201508385D0 (en) Metal treatment
EP3394319A4 (en) Gold plating solution
GB2542519B (en) Low ductility alloy
GB201514501D0 (en) Electroless plating method
SG11201710709SA (en) Electrolytic hard gold plating solution substitution inhibitor and electrolytic hard gold plating solution including same