SG11201602162VA - End-hall ion source with enhanced radiation cooling - Google Patents

End-hall ion source with enhanced radiation cooling

Info

Publication number
SG11201602162VA
SG11201602162VA SG11201602162VA SG11201602162VA SG11201602162VA SG 11201602162V A SG11201602162V A SG 11201602162VA SG 11201602162V A SG11201602162V A SG 11201602162VA SG 11201602162V A SG11201602162V A SG 11201602162VA SG 11201602162V A SG11201602162V A SG 11201602162VA
Authority
SG
Singapore
Prior art keywords
ion source
radiation cooling
hall ion
enhanced radiation
enhanced
Prior art date
Application number
SG11201602162VA
Other languages
English (en)
Inventor
Harold R Kaufman
James R Kahn
Richard E Nethery
Original Assignee
Kaufman & Robinson Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaufman & Robinson Inc filed Critical Kaufman & Robinson Inc
Publication of SG11201602162VA publication Critical patent/SG11201602162VA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H01J27/146—End-Hall type ion sources, wherein the magnetic field confines the electrons in a central cylinder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Manufacturing & Machinery (AREA)
  • Plasma Technology (AREA)
SG11201602162VA 2013-09-25 2014-07-29 End-hall ion source with enhanced radiation cooling SG11201602162VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/998,044 US8994258B1 (en) 2013-09-25 2013-09-25 End-hall ion source with enhanced radiation cooling
PCT/US2014/000171 WO2015047446A1 (en) 2013-09-25 2014-07-29 End-hall ion source with enhanced radiation cooling

Publications (1)

Publication Number Publication Date
SG11201602162VA true SG11201602162VA (en) 2016-04-28

Family

ID=52690357

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201602162VA SG11201602162VA (en) 2013-09-25 2014-07-29 End-hall ion source with enhanced radiation cooling

Country Status (8)

Country Link
US (2) US8994258B1 (enrdf_load_stackoverflow)
EP (1) EP3050071B1 (enrdf_load_stackoverflow)
JP (1) JP6655007B2 (enrdf_load_stackoverflow)
AU (1) AU2014328759B9 (enrdf_load_stackoverflow)
CA (1) CA2920813C (enrdf_load_stackoverflow)
IL (1) IL244155B (enrdf_load_stackoverflow)
SG (1) SG11201602162VA (enrdf_load_stackoverflow)
WO (1) WO2015047446A1 (enrdf_load_stackoverflow)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2969372B1 (fr) * 2010-12-21 2015-04-17 Commissariat Energie Atomique Dispositif d’ionisation a la resonance cyclotron electronique
US8994258B1 (en) * 2013-09-25 2015-03-31 Kaufman & Robinson, Inc. End-hall ion source with enhanced radiation cooling
US9859098B2 (en) 2015-12-22 2018-01-02 Varian Semiconductor Equipment Associates, Inc. Temperature controlled ion source
US10347457B1 (en) * 2017-12-19 2019-07-09 Varian Semiconductor Equipment Associates, Inc. Dynamic temperature control of an ion source
KR102533881B1 (ko) 2018-06-20 2023-05-17 보드 오브 트러스티즈 오브 미시건 스테이트 유니버시티 단일 빔 플라즈마 소스
CN109087840B (zh) * 2018-09-27 2023-11-07 中山市博顿光电科技有限公司 一种水冷式射频中和器
US11393652B2 (en) * 2019-01-25 2022-07-19 Muons, Inc. Bi-metallic anode for amplitude modulated magnetron
WO2020198012A1 (en) 2019-03-26 2020-10-01 Board Of Trustees Of Michigan State University Single beam plasma source
CN111081510A (zh) * 2020-03-02 2020-04-28 成都国泰真空设备有限公司 一种霍尔离子源装置
CN111710580B (zh) * 2020-07-16 2025-03-04 中山市博顿光电科技有限公司 离子源电场结构及离子源装置
US11823867B2 (en) * 2021-05-20 2023-11-21 Kaufman & Robinson, Inc. Load current derived switch timing of switching resonant topology
JP7695555B2 (ja) * 2021-12-24 2025-06-19 日本製鉄株式会社 接触熱コンダクタンス推定方法及び接触電気抵抗推定方法
JP7688272B2 (ja) * 2021-12-24 2025-06-04 日本製鉄株式会社 接触熱コンダクタンス推定方法及び接触電気抵抗推定方法

Family Cites Families (19)

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US3275829A (en) * 1960-08-15 1966-09-27 Special Devices Inc Cavity radiator with a pyrotechnic charge that remains intact during and after combustion
US4126489A (en) * 1973-07-17 1978-11-21 Varian Associates, Inc. Method of making cathode heaters
US4862032A (en) 1986-10-20 1989-08-29 Kaufman Harold R End-Hall ion source
JP2628533B2 (ja) * 1988-10-25 1997-07-09 文夫 渡辺 質量分析型残留ガス分析計
JPH03266336A (ja) * 1990-03-15 1991-11-27 Fujitsu Ltd ガスイオン源装置
US5402032A (en) * 1992-10-29 1995-03-28 Litton Systems, Inc. Traveling wave tube with plate for bonding thermally-mismatched elements
UA27921C2 (uk) * 1993-06-21 2000-10-16 Сосьєте Національ Д`Етюд Ет Де Конструкцьон Де Мотер Д`Авіацьон (С.Н.Е.К.М.А.) Плазмовий двигун зменшеної довжини з замкненим дрейфом електронів
US6750600B2 (en) * 2001-05-03 2004-06-15 Kaufman & Robinson, Inc. Hall-current ion source
US6454910B1 (en) 2001-09-21 2002-09-24 Kaufman & Robinson, Inc. Ion-assisted magnetron deposition
US6608431B1 (en) * 2002-05-24 2003-08-19 Kaufman & Robinson, Inc. Modular gridless ion source
US7667379B2 (en) 2002-06-27 2010-02-23 Kaufman & Robinson, Inc. Industrial hollow cathode with radiation shield structure
US7342236B2 (en) 2004-02-23 2008-03-11 Veeco Instruments, Inc. Fluid-cooled ion source
US7116054B2 (en) * 2004-04-23 2006-10-03 Viacheslav V. Zhurin High-efficient ion source with improved magnetic field
US7476869B2 (en) * 2005-02-18 2009-01-13 Veeco Instruments, Inc. Gas distributor for ion source
US7566883B2 (en) 2005-02-18 2009-07-28 Veeco Instruments, Inc. Thermal transfer sheet for ion source
US7312579B2 (en) * 2006-04-18 2007-12-25 Colorado Advanced Technology Llc Hall-current ion source for ion beams of low and high energy for technological applications
EP2276054A1 (en) * 2009-07-13 2011-01-19 Applied Materials, Inc. Sputtering system, rotatable cylindrical target assembly, backing tube, target element and cooling shield
WO2013120097A1 (en) * 2012-02-09 2013-08-15 Fluxion Inc. Compact, filtered ion source
US8994258B1 (en) * 2013-09-25 2015-03-31 Kaufman & Robinson, Inc. End-hall ion source with enhanced radiation cooling

Also Published As

Publication number Publication date
IL244155A0 (en) 2016-04-21
EP3050071A4 (en) 2017-05-03
CA2920813C (en) 2020-02-18
AU2014328759A1 (en) 2016-03-03
US8994258B1 (en) 2015-03-31
AU2014328759B2 (en) 2018-12-20
EP3050071A1 (en) 2016-08-03
US20180012722A1 (en) 2018-01-11
US20150084496A1 (en) 2015-03-26
JP2016536740A (ja) 2016-11-24
CA2920813A1 (en) 2015-04-02
EP3050071B1 (en) 2018-06-13
WO2015047446A1 (en) 2015-04-02
IL244155B (en) 2019-10-31
US10068739B2 (en) 2018-09-04
AU2014328759B9 (en) 2019-02-14
JP6655007B2 (ja) 2020-02-26

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