SG11201505307QA - Sputtering target for magnetic recording medium - Google Patents
Sputtering target for magnetic recording mediumInfo
- Publication number
- SG11201505307QA SG11201505307QA SG11201505307QA SG11201505307QA SG11201505307QA SG 11201505307Q A SG11201505307Q A SG 11201505307QA SG 11201505307Q A SG11201505307Q A SG 11201505307QA SG 11201505307Q A SG11201505307Q A SG 11201505307QA SG 11201505307Q A SG11201505307Q A SG 11201505307QA
- Authority
- SG
- Singapore
- Prior art keywords
- recording medium
- magnetic recording
- sputtering target
- sputtering
- target
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/04—Alloys based on a platinum group metal
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C2202/00—Physical properties
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Powder Metallurgy (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013119818 | 2013-06-06 | ||
PCT/JP2014/063676 WO2014196377A1 (en) | 2013-06-06 | 2014-05-23 | Sputtering target for magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201505307QA true SG11201505307QA (en) | 2015-08-28 |
Family
ID=52008028
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201505307QA SG11201505307QA (en) | 2013-06-06 | 2014-05-23 | Sputtering target for magnetic recording medium |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5946922B2 (en) |
MY (1) | MY175024A (en) |
SG (1) | SG11201505307QA (en) |
TW (1) | TWI605143B (en) |
WO (1) | WO2014196377A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6692724B2 (en) * | 2016-09-02 | 2020-05-13 | Jx金属株式会社 | Non-magnetic material dispersed Fe-Pt based sputtering target |
JP7104001B2 (en) * | 2019-06-28 | 2022-07-20 | 田中貴金属工業株式会社 | Fe-Pt-BN-based sputtering target and its manufacturing method |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103270554B (en) * | 2010-12-20 | 2016-09-28 | 吉坤日矿日石金属株式会社 | It is dispersed with the Fe-Pt type sputtering target of C particle |
SG191134A1 (en) * | 2011-03-30 | 2013-07-31 | Jx Nippon Mining & Metals Corp | Sputtering target for magnetic recording film |
JP6108064B2 (en) * | 2012-08-24 | 2017-04-05 | 三菱マテリアル株式会社 | Sputtering target for forming a magnetic recording medium film and method for producing the same |
-
2014
- 2014-05-23 JP JP2014550564A patent/JP5946922B2/en active Active
- 2014-05-23 WO PCT/JP2014/063676 patent/WO2014196377A1/en active Application Filing
- 2014-05-23 SG SG11201505307QA patent/SG11201505307QA/en unknown
- 2014-05-23 MY MYPI2015702496A patent/MY175024A/en unknown
- 2014-05-28 TW TW103118555A patent/TWI605143B/en active
Also Published As
Publication number | Publication date |
---|---|
TW201510257A (en) | 2015-03-16 |
WO2014196377A1 (en) | 2014-12-11 |
TWI605143B (en) | 2017-11-11 |
JPWO2014196377A1 (en) | 2017-02-23 |
MY175024A (en) | 2020-06-03 |
JP5946922B2 (en) | 2016-07-06 |
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