SG11201505307QA - Sputtering target for magnetic recording medium - Google Patents

Sputtering target for magnetic recording medium

Info

Publication number
SG11201505307QA
SG11201505307QA SG11201505307QA SG11201505307QA SG11201505307QA SG 11201505307Q A SG11201505307Q A SG 11201505307QA SG 11201505307Q A SG11201505307Q A SG 11201505307QA SG 11201505307Q A SG11201505307Q A SG 11201505307QA SG 11201505307Q A SG11201505307Q A SG 11201505307QA
Authority
SG
Singapore
Prior art keywords
recording medium
magnetic recording
sputtering target
sputtering
target
Prior art date
Application number
SG11201505307QA
Inventor
Atsushi Sato
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of SG11201505307QA publication Critical patent/SG11201505307QA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12Both compacting and sintering
    • B22F3/14Both compacting and sintering simultaneously
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C32/00Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C33/00Making ferrous alloys
    • C22C33/02Making ferrous alloys by powder metallurgy
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C5/00Alloys based on noble metals
    • C22C5/04Alloys based on a platinum group metal
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851Coating a support with a magnetic layer by sputtering
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C2202/00Physical properties

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
SG11201505307QA 2013-06-06 2014-05-23 Sputtering target for magnetic recording medium SG11201505307QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013119818 2013-06-06
PCT/JP2014/063676 WO2014196377A1 (en) 2013-06-06 2014-05-23 Sputtering target for magnetic recording medium

Publications (1)

Publication Number Publication Date
SG11201505307QA true SG11201505307QA (en) 2015-08-28

Family

ID=52008028

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201505307QA SG11201505307QA (en) 2013-06-06 2014-05-23 Sputtering target for magnetic recording medium

Country Status (5)

Country Link
JP (1) JP5946922B2 (en)
MY (1) MY175024A (en)
SG (1) SG11201505307QA (en)
TW (1) TWI605143B (en)
WO (1) WO2014196377A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6692724B2 (en) * 2016-09-02 2020-05-13 Jx金属株式会社 Non-magnetic material dispersed Fe-Pt based sputtering target
JP7104001B2 (en) * 2019-06-28 2022-07-20 田中貴金属工業株式会社 Fe-Pt-BN-based sputtering target and its manufacturing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103270554B (en) * 2010-12-20 2016-09-28 吉坤日矿日石金属株式会社 It is dispersed with the Fe-Pt type sputtering target of C particle
SG191134A1 (en) * 2011-03-30 2013-07-31 Jx Nippon Mining & Metals Corp Sputtering target for magnetic recording film
JP6108064B2 (en) * 2012-08-24 2017-04-05 三菱マテリアル株式会社 Sputtering target for forming a magnetic recording medium film and method for producing the same

Also Published As

Publication number Publication date
TW201510257A (en) 2015-03-16
WO2014196377A1 (en) 2014-12-11
TWI605143B (en) 2017-11-11
JPWO2014196377A1 (en) 2017-02-23
MY175024A (en) 2020-06-03
JP5946922B2 (en) 2016-07-06

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