SG11201503003YA - Vacuum chamber elements made of aluminium alloy - Google Patents

Vacuum chamber elements made of aluminium alloy

Info

Publication number
SG11201503003YA
SG11201503003YA SG11201503003YA SG11201503003YA SG11201503003YA SG 11201503003Y A SG11201503003Y A SG 11201503003YA SG 11201503003Y A SG11201503003Y A SG 11201503003YA SG 11201503003Y A SG11201503003Y A SG 11201503003YA SG 11201503003Y A SG11201503003Y A SG 11201503003YA
Authority
SG
Singapore
Prior art keywords
vacuum chamber
aluminium alloy
elements made
chamber elements
aluminium
Prior art date
Application number
SG11201503003YA
Other languages
English (en)
Inventor
KAPPEL Joost Michel VAN
Cedric Gasqueres
Schmid Kristin Pippig
GUTIERREZ Maria Belen DAVO
Original Assignee
Constellium France
Constellium Valais Sa Ag Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Constellium France, Constellium Valais Sa Ag Ltd filed Critical Constellium France
Publication of SG11201503003YA publication Critical patent/SG11201503003YA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C22C21/02—Alloys based on aluminium with silicon as the next major constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32467—Material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C22C21/06—Alloys based on aluminium with magnesium as the next major constituent
    • C22C21/08—Alloys based on aluminium with magnesium as the next major constituent with silicon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/002—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working by rapid cooling or quenching; cooling agents used therefor
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/04—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon
    • C22F1/05—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon of alloys of the Al-Si-Mg type, i.e. containing silicon and magnesium in approximately equal proportions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/10—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing organic acids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/16—Pretreatment, e.g. desmutting
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32495—Means for protecting the vessel against plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Heat Treatment Of Articles (AREA)
  • Chemical Vapour Deposition (AREA)
  • Fuel Cell (AREA)
SG11201503003YA 2012-10-17 2013-10-15 Vacuum chamber elements made of aluminium alloy SG11201503003YA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1202766A FR2996857B1 (fr) 2012-10-17 2012-10-17 Elements de chambres a vide en alliage d'aluminium
US201261728021P 2012-11-19 2012-11-19
PCT/FR2013/000271 WO2014060660A1 (fr) 2012-10-17 2013-10-15 Eléments de chambres à vide en alliage d'aluminium

Publications (1)

Publication Number Publication Date
SG11201503003YA true SG11201503003YA (en) 2015-05-28

Family

ID=47901155

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201503003YA SG11201503003YA (en) 2012-10-17 2013-10-15 Vacuum chamber elements made of aluminium alloy

Country Status (11)

Country Link
US (1) US20150255253A1 (fr)
EP (2) EP2909351B1 (fr)
JP (1) JP6438400B2 (fr)
KR (2) KR101970043B1 (fr)
CN (1) CN104797726B (fr)
FR (2) FR2996857B1 (fr)
MX (1) MX2015004667A (fr)
MY (1) MY173510A (fr)
SG (1) SG11201503003YA (fr)
TW (1) TWI615480B (fr)
WO (1) WO2014060660A1 (fr)

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CN105734640A (zh) * 2014-12-12 2016-07-06 富泰华工业（深圳）有限公司 铝合金件阳极氧化和表面处理方法，及其阳极氧化处理液
CN105442018B (zh) * 2015-10-26 2018-08-14 安徽长安专用汽车制造有限公司 汽车铝合金零件导电氧化工艺
CN109890663B (zh) 2016-08-26 2023-04-14 形状集团 用于横向弯曲挤压成形铝梁从而温热成型车辆结构件的温热成型工艺和设备
MX2019004494A (es) 2016-10-24 2019-12-18 Shape Corp Metodo de formacion y procesamiento termico de aleacion de aluminio de multiples etapas para la produccion de componentes de vehiculo.
FR3063740B1 (fr) * 2017-03-10 2019-03-15 Constellium Issoire Elements de chambres a vide en alliage d’aluminium stables a haute temperature
CN108220706B (zh) * 2018-01-02 2020-03-13 山东友升铝业有限公司 一种改善挤压型材圧溃性能用变形铝合金
CN110246738A (zh) * 2018-03-08 2019-09-17 北京北方华创微电子装备有限公司 反应腔室部件结构及其制备方法、反应腔室
US20200406222A1 (en) * 2018-03-08 2020-12-31 Beijing Naura Microelectronics Equipment Co., Ltd. Reaction chamber component, preparation method, and reaction chamber
FR3101641B1 (fr) 2019-10-04 2022-01-21 Constellium Issoire Tôles de précision en alliage d’aluminium
EP3922743A1 (fr) * 2020-06-10 2021-12-15 Aleris Rolled Products Germany GmbH Procédé de fabrication de plaque d'aluminium pour chambres à vide
KR102467268B1 (ko) * 2020-10-29 2022-11-17 주식회사 영광와이케이엠씨 옥살산 전해액에서 전류밀도 변화에 따른 아노다이징 처리 방법
US11905583B2 (en) 2021-06-09 2024-02-20 Applied Materials, Inc. Gas quench for diffusion bonding
FR3136242B1 (fr) 2022-06-01 2024-05-03 Constellium Valais Tôles pour éléments de chambres à vide en alliage d’aluminium
TWI830452B (zh) 2022-10-21 2024-01-21 財團法人工業技術研究院 鋁合金材料與鋁合金物件及其形成方法

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KR101193571B1 (ko) * 2011-12-23 2012-10-25 (주)아인스 알루미늄 피막 형성을 위한 전해액 및 이를 이용한 알루미늄 피막 형성방법
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Also Published As

Publication number Publication date
JP2016500757A (ja) 2016-01-14
CN104797726A (zh) 2015-07-22
KR102032686B1 (ko) 2019-10-15
FR2996859A1 (fr) 2014-04-18
US20150255253A1 (en) 2015-09-10
WO2014060660A8 (fr) 2015-05-14
KR101970043B1 (ko) 2019-04-17
FR2996857B1 (fr) 2015-02-27
EP3168316B1 (fr) 2018-12-26
MX2015004667A (es) 2015-07-23
KR20150067211A (ko) 2015-06-17
WO2014060660A1 (fr) 2014-04-24
EP3168316A1 (fr) 2017-05-17
EP2909351A1 (fr) 2015-08-26
EP2909351B1 (fr) 2017-02-01
TW201422821A (zh) 2014-06-16
JP6438400B2 (ja) 2018-12-12
FR2996859B1 (fr) 2015-06-05
CN104797726B (zh) 2017-10-24
FR2996857A1 (fr) 2014-04-18
MY173510A (en) 2020-01-30
KR20190040378A (ko) 2019-04-17
TWI615480B (zh) 2018-02-21

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