SG11201501049QA - Surface features characterization - Google Patents

Surface features characterization

Info

Publication number
SG11201501049QA
SG11201501049QA SG11201501049QA SG11201501049QA SG11201501049QA SG 11201501049Q A SG11201501049Q A SG 11201501049QA SG 11201501049Q A SG11201501049Q A SG 11201501049QA SG 11201501049Q A SG11201501049Q A SG 11201501049QA SG 11201501049Q A SG11201501049Q A SG 11201501049QA
Authority
SG
Singapore
Prior art keywords
surface features
features characterization
characterization
features
Prior art date
Application number
SG11201501049QA
Inventor
Joachim Ahner
Keith Mclaurin
Samuel Wong
Henry Lott
Original Assignee
Seagate Technology Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seagate Technology Llc filed Critical Seagate Technology Llc
Publication of SG11201501049QA publication Critical patent/SG11201501049QA/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
SG11201501049QA 2012-08-11 2013-08-12 Surface features characterization SG11201501049QA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261682200P 2012-08-11 2012-08-11
US13/931,266 US9212900B2 (en) 2012-08-11 2013-06-28 Surface features characterization
PCT/US2013/054584 WO2014028407A1 (en) 2012-08-11 2013-08-12 Surface features characterization

Publications (1)

Publication Number Publication Date
SG11201501049QA true SG11201501049QA (en) 2015-04-29

Family

ID=50065976

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201501049QA SG11201501049QA (en) 2012-08-11 2013-08-12 Surface features characterization

Country Status (5)

Country Link
US (2) US9212900B2 (en)
JP (1) JP6522501B2 (en)
CN (1) CN104704320B (en)
SG (1) SG11201501049QA (en)
WO (1) WO2014028407A1 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104412079B (en) 2012-05-09 2018-03-27 希捷科技有限公司 Surface characteristics maps
US9297751B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Chemical characterization of surface features
US9297759B2 (en) * 2012-10-05 2016-03-29 Seagate Technology Llc Classification of surface features using fluorescence
US9377394B2 (en) 2012-10-16 2016-06-28 Seagate Technology Llc Distinguishing foreign surface features from native surface features
US9217714B2 (en) 2012-12-06 2015-12-22 Seagate Technology Llc Reflective surfaces for surface features of an article
KR20140128741A (en) * 2013-04-29 2014-11-06 삼성디스플레이 주식회사 Apparatus for detecting crystallizing stain
US9274064B2 (en) 2013-05-30 2016-03-01 Seagate Technology Llc Surface feature manager
US9581554B2 (en) * 2013-05-30 2017-02-28 Seagate Technology Llc Photon emitter array
US9201019B2 (en) 2013-05-30 2015-12-01 Seagate Technology Llc Article edge inspection
US9513215B2 (en) 2013-05-30 2016-12-06 Seagate Technology Llc Surface features by azimuthal angle
US9217715B2 (en) 2013-05-30 2015-12-22 Seagate Technology Llc Apparatuses and methods for magnetic features of articles
US9678018B2 (en) 2015-03-30 2017-06-13 Gemological Institute Of America Inc. (Gia) Apparatus and method for assessing optical quality of gemstones
KR20180028787A (en) * 2016-09-09 2018-03-19 삼성전자주식회사 Defect inspection system and method, and method for fabricating semiconductor using the inspection method
KR20190089009A (en) * 2016-11-21 2019-07-29 케어스트림 덴탈 테크놀로지 톱코 리미티드 Characterization of 3D oral surfaces
US11260678B2 (en) * 2019-06-26 2022-03-01 Xerox Corporation Print substrate optical motion sensing and dot clock generation

Family Cites Families (128)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4207467A (en) 1978-09-05 1980-06-10 Laser Precision Corp. Film measuring apparatus and method
US4806776A (en) * 1980-03-10 1989-02-21 Kley Victor B Electrical illumination and detecting apparatus
US4598997A (en) 1982-02-15 1986-07-08 Rca Corporation Apparatus and method for detecting defects and dust on a patterned surface
US4477890A (en) 1982-03-01 1984-10-16 Discovision Associates Mapping disc defect detector
GB2130835A (en) 1982-10-04 1984-06-06 Andrzej Kamil Drukier Apparatus for the diagnosis of body structures into which a gamma-emitting radioactive isotape has been introduced
US4551919A (en) 1982-10-27 1985-11-12 Mitutoyo Mfg. Co., Ltd. Measuring instrument
US4794550A (en) * 1986-10-15 1988-12-27 Eastman Kodak Company Extended-range moire contouring
GB8729246D0 (en) 1987-12-15 1988-01-27 Renishaw Plc Opto-electronic scale-reading apparatus
US5131755A (en) 1988-02-19 1992-07-21 Chadwick Curt H Automatic high speed optical inspection system
US5066130A (en) 1988-05-10 1991-11-19 Canon Kabushiki Kaisha Displacement measuring apparatus
US5058178A (en) * 1989-12-21 1991-10-15 At&T Bell Laboratories Method and apparatus for inspection of specular, three-dimensional features
DE4222804A1 (en) * 1991-07-10 1993-04-01 Raytheon Co Automatic visual tester for electrical and electronic components - performs video scans of different surfaces with unequal intensities of illumination by annular and halogen lamps
US5168322A (en) 1991-08-19 1992-12-01 Diffracto Ltd. Surface inspection using retro-reflective light field
US5563702A (en) 1991-08-22 1996-10-08 Kla Instruments Corporation Automated photomask inspection apparatus and method
JPH06241758A (en) 1993-02-15 1994-09-02 Canon Inc Flaw inspection device
EP0622624B1 (en) 1993-04-23 1999-12-01 Research Development Corporation Of Japan A method for observing film thickness and/or refractive index
US5627638A (en) 1993-07-01 1997-05-06 Prolaser Ltd. Method and apparatus for detecting defects in lenses
IL110618A (en) 1994-08-10 1996-12-05 Optomic Techn Corp Ltd Device for testing optical elements
JP3483948B2 (en) 1994-09-01 2004-01-06 オリンパス株式会社 Defect detection device
US5548403A (en) 1994-11-28 1996-08-20 The Regents Of The University Of California Phase shifting diffraction interferometer
JPH08178867A (en) 1994-12-26 1996-07-12 Aichi Steel Works Ltd Flat steel hot flaw-detecting device
US20020054291A1 (en) 1997-06-27 2002-05-09 Tsai Bin-Ming Benjamin Inspection system simultaneously utilizing monochromatic darkfield and broadband brightfield illumination sources
US5726455A (en) 1995-06-30 1998-03-10 Stormedia, Inc. Disk film optical measurement system
EP0766298A3 (en) * 1995-09-27 1998-09-16 Shin-Etsu Handotai Co., Ltd. Method of and apparatus for determining residual damage to wafer edges
US5778039A (en) 1996-02-21 1998-07-07 Advanced Micro Devices, Inc. Method and apparatus for the detection of light elements on the surface of a semiconductor substrate using x-ray fluorescence (XRF)
US5661559A (en) 1996-03-14 1997-08-26 Phase Metrics, Inc. Optical surface detection for magnetic disks
US5781649A (en) 1996-04-15 1998-07-14 Phase Metrics, Inc. Surface inspection of a disk by diffraction pattern sampling
US6556783B1 (en) * 1997-01-16 2003-04-29 Janet L. Gelphman Method and apparatus for three dimensional modeling of an object
US5774212A (en) 1997-03-19 1998-06-30 General Electric Co. Method and apparatus for detecting and analyzing directionally reflective surface flaws
US5898491A (en) 1997-03-28 1999-04-27 Hitachi Electronics Engineering Co. Ltd. Surface defect test method and surface defect tester
DE19717488C2 (en) 1997-04-25 2003-05-15 Baumer Optronic Gmbh Device for inspecting the surface of objects
US5859698A (en) 1997-05-07 1999-01-12 Nikon Corporation Method and apparatus for macro defect detection using scattered light
US6040592A (en) * 1997-06-12 2000-03-21 Intel Corporation Well to substrate photodiode for use in a CMOS sensor on a salicide process
US5973839A (en) 1998-03-05 1999-10-26 Hewlett-Packard Company Optical homogenizer
US20010036588A1 (en) 1998-05-05 2001-11-01 Ims-Ionen Mikrofabrikations Systeme Gmbh Lithographic imaging of a structure pattern onto one or more fields on a substrate
IL126866A (en) * 1998-11-02 2003-02-12 Orbotech Ltd Apparatus and method for fabricating flat workpieces
US6256097B1 (en) 1999-01-08 2001-07-03 Rudolph Technologies, Inc. Ellipsometer and ellipsometry method
US6327374B1 (en) * 1999-02-18 2001-12-04 Thermo Radiometrie Oy Arrangement and method for inspection of surface quality
DE19909534B4 (en) 1999-03-04 2011-07-07 BYK-Gardner GmbH, 82538 Apparatus and method for determining the quality of structured surfaces
US6529270B1 (en) 1999-03-31 2003-03-04 Ade Optical Systems Corporation Apparatus and method for detecting defects in the surface of a workpiece
US6544332B1 (en) * 1999-08-30 2003-04-08 Shin-Etsu Handotai Co., Ltd. Method for manufacturing silicon single crystal, silicon single crystal manufactured by the method, and silicon wafer
EP1116932A3 (en) 2000-01-14 2003-04-16 Leica Microsystems Wetzlar GmbH Measuring apparatus and method for measuring structures on a substrat
US6476908B1 (en) * 2000-04-10 2002-11-05 Eclipse Optics, Inc. Optical probe
US6483584B1 (en) 2000-04-14 2002-11-19 National Science Council Device for measuring the complex refractive index and thin film thickness of a sample
US7751609B1 (en) * 2000-04-20 2010-07-06 Lsi Logic Corporation Determination of film thickness during chemical mechanical polishing
JP2001304835A (en) * 2000-04-26 2001-10-31 Toshiba Eng Co Ltd Illuminating device for measuring unevenness, unevenness measuring device, illuminating device for inspecting defect, defect inspection device and illuminating method therefor
US6392745B1 (en) 2000-06-13 2002-05-21 American Air Liquide, Inc. Method and apparatus for the fast detection of surface characteristics
US6552783B1 (en) * 2000-06-28 2003-04-22 Teradyne, Inc. Optical system
DE10031558A1 (en) 2000-06-28 2002-01-10 Clariant Gmbh Process for conditioning organic pigments
FR2811761B1 (en) 2000-07-17 2002-10-11 Production Rech S Appliquees HIGH SPACE RESOLUTION ELLIPSOMETER OPERATING IN THE INFRARED
JP2002049143A (en) * 2000-08-03 2002-02-15 Dainippon Printing Co Ltd Defect inspection apparatus for phase shift mask
JP2002190444A (en) 2000-10-10 2002-07-05 Canon Inc Pattern projection aligner, pattern preparation method, and device prepared by the pattern projection aligner and the preparation method
US6809809B2 (en) 2000-11-15 2004-10-26 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
US6630996B2 (en) 2000-11-15 2003-10-07 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
US6515742B1 (en) 2000-11-28 2003-02-04 Memc Electronic Materials, Inc. Defect classification using scattered light intensities
US6509966B2 (en) 2000-12-27 2003-01-21 Hitachi Electronics Engineering Co., Ltd. Optical system for detecting surface defect and surface defect tester using the same
US6617603B2 (en) 2001-03-06 2003-09-09 Hitachi Electronics Engineering Co., Ltd. Surface defect tester
WO2002079760A2 (en) 2001-03-30 2002-10-10 Therma-Wave, Inc. Polarimetric scatterometer for critical dimension measurements of periodic structures
US6617087B1 (en) * 2001-06-27 2003-09-09 Advanced Micro Devices, Inc. Use of scatterometry to measure pattern accuracy
JP4808871B2 (en) * 2001-07-12 2011-11-02 倉敷紡績株式会社 Surface texture evaluation device
US7046353B2 (en) * 2001-12-04 2006-05-16 Kabushiki Kaisha Topcon Surface inspection system
JP2003202214A (en) 2002-01-04 2003-07-18 Mitsubishi Electric Corp Shape measuring device and shape measuring method
JP4102081B2 (en) 2002-02-28 2008-06-18 株式会社荏原製作所 Polishing apparatus and foreign matter detection method for polished surface
KR100798320B1 (en) 2002-03-06 2008-01-28 엘지.필립스 엘시디 주식회사 Appratus and method for testing liquid crystal display panel
US20040207836A1 (en) * 2002-09-27 2004-10-21 Rajeshwar Chhibber High dynamic range optical inspection system and method
US6847907B1 (en) 2002-12-31 2005-01-25 Active Optical Networks, Inc. Defect detection and repair of micro-electro-mechanical systems (MEMS) devices
DE10313038B4 (en) * 2003-03-24 2005-02-17 Klingelnberg Gmbh Device for detecting the position of a probe element in a multi-coordinate measuring device
US7068363B2 (en) * 2003-06-06 2006-06-27 Kla-Tencor Technologies Corp. Systems for inspection of patterned or unpatterned wafers and other specimen
US20050067740A1 (en) 2003-09-29 2005-03-31 Frederick Haubensak Wafer defect reduction by short pulse laser ablation
US7433031B2 (en) * 2003-10-29 2008-10-07 Core Tech Optical, Inc. Defect review system with 2D scanning and a ring detector
DE102004004761A1 (en) 2004-01-30 2005-09-08 Leica Microsystems Semiconductor Gmbh Apparatus and method for inspecting a wafer
US8077305B2 (en) * 2004-04-19 2011-12-13 Owen Mark D Imaging semiconductor structures using solid state illumination
DE102004029014B4 (en) * 2004-06-16 2006-06-22 Leica Microsystems Semiconductor Gmbh Method and system for inspecting a wafer
US7580126B2 (en) 2004-06-30 2009-08-25 Chemimage Corp. Method and apparatus for producing a streaming Raman image of nucleation, aggregation, and chemical interaction
US7489399B1 (en) 2004-08-20 2009-02-10 Kla-Tencor Corporation Spectroscopic multi angle ellipsometry
US7295739B2 (en) * 2004-10-20 2007-11-13 Kla-Tencor Technologies Corporation Coherent DUV illumination for semiconductor wafer inspection
WO2006066207A2 (en) 2004-12-19 2006-06-22 Ade Corporation System and method for inspecting a workpiece surface using combinations of light collectors
US20060147814A1 (en) 2005-01-03 2006-07-06 Ted Liang Methods for repairing an alternating phase-shift mask
JP2006214886A (en) * 2005-02-03 2006-08-17 Sharp Corp Method and device for detecting defect of optical element
JP2006308511A (en) 2005-05-02 2006-11-09 Canon Inc Chemical analysis apparatus and analysis method
US8243272B2 (en) 2005-09-19 2012-08-14 Jmar Llc Systems and methods for detecting normal levels of bacteria in water using a multiple angle light scattering (MALS) instrument
JP4988224B2 (en) 2006-03-01 2012-08-01 株式会社日立ハイテクノロジーズ Defect inspection method and apparatus
US7463369B2 (en) 2006-03-29 2008-12-09 Kla-Tencor Technologies Corp. Systems and methods for measuring one or more characteristics of patterned features on a specimen
US7474410B2 (en) * 2006-04-11 2009-01-06 Massachusetts Institute Of Technology Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography
US20090122304A1 (en) 2006-05-02 2009-05-14 Accretech Usa, Inc. Apparatus and Method for Wafer Edge Exclusion Measurement
JP4959225B2 (en) 2006-05-17 2012-06-20 株式会社日立ハイテクノロジーズ Optical inspection method and optical inspection apparatus
JP5138268B2 (en) * 2006-06-14 2013-02-06 株式会社タニタ Dimensional measuring device
WO2008002659A2 (en) 2006-06-29 2008-01-03 Cdex, Inc. Methods and apparatus for molecular species detection, inspection and classification using ultraviolet to near infrared enhanced photoemission spectroscopy
US8139232B2 (en) 2006-07-27 2012-03-20 Rudolph Technologies, Inc. Multiple measurement techniques including focused beam scatterometry for characterization of samples
JP4843399B2 (en) 2006-07-31 2011-12-21 株式会社日立ハイテクノロジーズ Inspection apparatus and inspection method
KR100763942B1 (en) 2006-09-04 2007-10-05 (주)포씨스 Surface inspection system
EP1901190A1 (en) 2006-09-15 2008-03-19 Sony DADC Austria AG Method and system for managing access to add-on data files
US7714996B2 (en) 2007-01-23 2010-05-11 3i Systems Corporation Automatic inspection system for flat panel substrate
KR20100007968A (en) 2007-05-14 2010-01-22 가부시키가이샤 니콘 Surface tester and surface testing method
US7636156B2 (en) 2007-06-15 2009-12-22 Qimonda Ag Wafer inspection system and method
JP2009014510A (en) 2007-07-04 2009-01-22 Hitachi High-Technologies Corp Inspection method and inspection apparatus
JP2009139248A (en) 2007-12-07 2009-06-25 Hitachi High-Technologies Corp Defect detecting optical system and surface defect inspecting device for mounting defect detecting image processing
KR100913484B1 (en) 2008-02-19 2009-08-25 에스엔유 프리시젼 주식회사 Dark field inspection apparatus
JP2010050167A (en) * 2008-08-19 2010-03-04 Fujitsu Microelectronics Ltd Device and method for inspecting defect
JP5198189B2 (en) 2008-08-29 2013-05-15 富士フイルム株式会社 Hard disk inspection device
CN102209609B (en) * 2008-09-09 2013-12-25 康奈尔大学 Wafer-scale nano-metrology system and method for sensing position of processing elements
JP5341440B2 (en) 2008-09-10 2013-11-13 株式会社日立ハイテクノロジーズ Inspection device
JP5469839B2 (en) 2008-09-30 2014-04-16 株式会社日立ハイテクノロジーズ Device surface defect inspection apparatus and method
JP5027775B2 (en) 2008-10-03 2012-09-19 株式会社日立ハイテクノロジーズ Substrate surface shape detection method and apparatus
JP4719284B2 (en) 2008-10-10 2011-07-06 トヨタ自動車株式会社 Surface inspection device
KR101493133B1 (en) * 2009-07-01 2015-02-12 가부시키가이샤 니콘 Exposure condition evaluation method and exposure condition evaluatin apparatus
KR101123638B1 (en) 2009-08-26 2012-03-20 주식회사 케이엔제이 Apparatus for detecting scratch and method adopting the same
JP5282002B2 (en) 2009-09-30 2013-09-04 株式会社日立ハイテクノロジーズ Magnetic disk double-sided defect inspection method and apparatus
KR101177299B1 (en) * 2010-01-29 2012-08-30 삼성코닝정밀소재 주식회사 Detection apparatus for particle on the glass
JP5321490B2 (en) 2010-02-08 2013-10-23 新日鐵住金株式会社 Particle analysis method
JP2011185503A (en) 2010-03-08 2011-09-22 Bekku Kk Temperature control method
JP2012026862A (en) 2010-07-23 2012-02-09 Konica Minolta Business Technologies Inc Surface inspection device and surface inspection method
JP5806808B2 (en) * 2010-08-18 2015-11-10 倉敷紡績株式会社 Imaging optical inspection device
JP2012078140A (en) * 2010-09-30 2012-04-19 Hitachi High-Technologies Corp Substrate surface defect inspection method and device thereof
JP5721070B2 (en) 2011-03-08 2015-05-20 国立研究開発法人産業技術総合研究所 Optical property measuring device
US9075934B2 (en) 2011-09-24 2015-07-07 Globalfoundries Inc. Reticle defect correction by second exposure
JP5875812B2 (en) * 2011-09-27 2016-03-02 オリンパス株式会社 Microscope system and illumination intensity adjustment method
CN104412079B (en) 2012-05-09 2018-03-27 希捷科技有限公司 Surface characteristics maps
US9297759B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Classification of surface features using fluorescence
US9297751B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Chemical characterization of surface features
US9377394B2 (en) 2012-10-16 2016-06-28 Seagate Technology Llc Distinguishing foreign surface features from native surface features
US20140129179A1 (en) 2012-11-08 2014-05-08 Datacolor, Inc. System and apparatus for multi channel gloss measurements
US9217714B2 (en) 2012-12-06 2015-12-22 Seagate Technology Llc Reflective surfaces for surface features of an article
US9274064B2 (en) 2013-05-30 2016-03-01 Seagate Technology Llc Surface feature manager
US9201019B2 (en) 2013-05-30 2015-12-01 Seagate Technology Llc Article edge inspection
US9513215B2 (en) 2013-05-30 2016-12-06 Seagate Technology Llc Surface features by azimuthal angle
US9581554B2 (en) * 2013-05-30 2017-02-28 Seagate Technology Llc Photon emitter array
US9217715B2 (en) 2013-05-30 2015-12-22 Seagate Technology Llc Apparatuses and methods for magnetic features of articles

Also Published As

Publication number Publication date
JP6522501B2 (en) 2019-05-29
WO2014028407A1 (en) 2014-02-20
US9766184B2 (en) 2017-09-19
JP2015531068A (en) 2015-10-29
US20140043621A1 (en) 2014-02-13
CN104704320B (en) 2017-06-30
US20160077018A1 (en) 2016-03-17
CN104704320A (en) 2015-06-10
US9212900B2 (en) 2015-12-15

Similar Documents

Publication Publication Date Title
IL237181A0 (en) Surface coatings
TWI561618B (en) Polishing component
SG11201501049QA (en) Surface features characterization
DK3327112T3 (en) Agse-deficient stamme
EP2754580A4 (en) Dumptruck
DK2830816T3 (en) Hidtil ukendt coatingkoncept
GB201222361D0 (en) Surface geometry imaging
IL236330A0 (en) Particle characterization
IL235589A0 (en) Surface features mapping
EP2920142A4 (en) Methanofullerenes
EP2812698A4 (en) Dual-acceptor time-resolved-fret
GB201122269D0 (en) Surface
HK1205208A1 (en) Surface
IL238257A0 (en) Surface coatings
EP2920157A4 (en) Di-macrocycles
EP2873363A4 (en) Diopsimeter
GB201202019D0 (en) Tile
GB2508050B (en) An improved tiler
GB2518990B (en) Controls
AP00445S1 (en) Substrate
EP2834250A4 (en) Lithiumsilicate
GB201219031D0 (en) Surface
GB201218055D0 (en) Surface coatings
GB201218058D0 (en) Surface coatings
GB201214390D0 (en) Surface coating