JP6522501B2 - Feature determination of surface features - Google Patents

Description

This application claims the benefit of US Provisional Patent Application No. 61 / 682,200 filed August 11, 2012.

BACKGROUND [0002] Articles made on a production line can be inspected for certain features, including defects that can reduce the performance of the article or the system that contains the article. For example, hard disks for hard disk drives may be fabricated on a production line and inspected for certain surface features including surface defects and subsurface defects that may reduce the performance of the disk or hard disk drive. Thus, there is an advantage to an apparatus and method operable to inspect an article for features such as defects.

SUMMARY The apparatus provided herein includes a photon detector array configured to receive photons scattered from features on the surface of an article, and characterization means for characterizing features on the surface of the article. The characterization means contrasts the signals from the photon detector array corresponding to the two sets of photons scattered from the features on the surface of the article, wherein the two sets of photons originate respectively from photon emitters at different locations.

  These and other features and aspects of the present invention may be better understood with reference to the following drawings, description and appended claims.

FIG. 7 provides a schematic diagram illustrating the detection of surface features of an article where the photon emitter is at a high angle according to an embodiment. FIG. 6 provides a schematic diagram illustrating the detection of surface features of an article where the photon emitter is at a low angle according to an embodiment. FIG. 7 provides a schematic diagram illustrating photon scattering from surface features of an article according to an embodiment. FIG. 7 provides a schematic diagram illustrating photons scattering from surface features of an article through an optical component onto a photon detector array according to an embodiment. FIG. 5 provides an image of a surface feature map of an article according to an embodiment. Fig. 5 provides a proximity image of the surface feature map provided in Fig. 4; The top is a diagram providing a proximity image of surface features from the map provided in FIG. 5, and the bottom is a diagram providing photon scattering intensity distribution of the surface features. The top is a diagram providing a pixel-interpolated image of the surface feature from FIG. 6A, and the bottom is a diagram providing a pixel-interpolated photon scattering intensity distribution of the surface feature. FIG. 7 provides a schematic diagram illustrating different surface features of an article, according to an embodiment. FIG. 4 provides a proximity image of a surface feature map of an article, wherein the photon emitter is positioned at a relatively high angle with respect to the surface of the article, according to an embodiment. FIG. 7 provides a proximity image of a surface feature map of an article, wherein the photon emitter is positioned at a relatively low angle with respect to the surface of the article, according to an embodiment.

DESCRIPTION Before describing the embodiments of the present invention in more detail, it is understood that the elements in such embodiments may vary and that the present invention is not limited to the specific embodiments described and / or described herein. It should be understood by those skilled in the art to which the present invention relates. Similarly, whether the particular embodiments described and / or described herein can be easily separated from the particular embodiments and optionally be combined with any of several other embodiments, It should be understood that it has elements that can be substituted for elements in any of the several other embodiments described herein.

  Further, it is understood by those skilled in the art to which the present invention relates that the terms used in the present specification are for describing the specific embodiments of the present invention and the terms are not intended to be limiting. It should. Unless otherwise indicated, ordinal numbers (eg, first, second, third, etc.) are used to distinguish or distinguish different elements or steps in a group of elements or steps, and claimed inventions or inventions There is no continuous or numerical limitation on the elements or steps of a particular embodiment. For example, the "first", "second" and "third" elements or steps need not necessarily appear in that order, and the claimed invention or particular embodiment of the present invention does not necessarily have three elements or There is no need to be limited to the steps. Furthermore, unless indicated otherwise, "left", "right", "front", "back", "top", "bottom", "front", "reverse", "clockwise", "counterclockwise" , Any classification such as "upper", "lower" or "upper", "lower", "back", "front", "vertical", "horizontal", "proximal", "distal" It should be understood that other similar terms such as etc are used for convenience and are not intended to suggest any particular fixed position, orientation or orientation, for example. Instead, such classification is used, for example, to reflect relative position, orientation or orientation. Further, it should be understood that the singular forms "a" and "the" include plural references unless the context clearly dictates otherwise.

  Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains.

  Articles made on a production line can be inspected for certain features, including defects that can degrade the performance of the article or the system that includes the article. For example, hard disks for hard disk drives may be fabricated on a production line and inspected for certain surface features including surface defects and subsurface defects that may reduce the performance of the disk or hard disk drive. Provided herein are devices and methods for inspecting an article to detect, map and / or characterize certain surface features, such as surface defects and / or subsurface defects. Embodiments of the invention will now be described in more detail.

  With respect to the articles that can be inspected by the devices and methods herein, such articles include any article of manufacture or workpiece thereof having one or more optically smooth surfaces at any stage of manufacture, Examples include, but are not limited to, semiconductor wafers at any stage of manufacture, magnetic recording media (eg hard disks for hard disk drives), and their workpieces. Such articles can be inspected for certain features including surface defects and / or subsurface defects that can reduce the performance of the article. The surface defects and / or subsurface defects include particle and stain contamination and defects including scratches and voids. For example, with respect to particle contamination, particles trapped on the surface of an intermediate hard disk (i.e., a workpiece) for a hard disk drive can subsequently damage the sputtered film. Particle contamination can further contaminate the finished surface of the hard disk in the hard disk drive, which leads to the formation of scratches and the occurrence of debris. Contamination of the finished surface of the hard disk can also exacerbate the distance between the hard disk and the read / write head of the hard disk drive, which is also a concern. By distinguishing between particle contamination and, for example, voids by characterizing such features, concerns about the spacing between the hard disk and the read / write head are minimized while maintaining high manufacturing yield. Ru. As such, it is important to inspect the articles with the apparatus and methods herein to correct production trends leading to surface defects and / or subsurface defects and to increase product quality.

1A and 1B provide combined schematics for detection, mapping and / or characterization of surface features of an article, according to an embodiment, a pair of photon emitters 110A and 110B, optical An apparatus 100 including a setup 120, a photon detector array 130, and a computer or equivalent device 140, an article 150, and a pair of differential surface feature maps 160A and 160B on the surface of the article 150 are shown. In such embodiments, photon emitter 110A may be positioned at a relatively high angle with respect to surface feature map 160A, and photon emitter 110B may be positioned at a relatively low angle with respect to surface feature map 160B. The information used to generate the differential surface feature maps 160A and 160B or the surface feature maps 160A and 160B may be used to characterize the surface features of the article and to distinguish such surface features. The articles and devices of the present invention and the method of the present invention are not limited to the embodiments in FIGS. 1A and 1B, but the features described in more detail herein provide additional embodiments of the present invention. obtain.

  An apparatus for detection, mapping and / or characterization of surface features of an article (e.g., if desired, for incremental rotation of the article for piece-wise inspection) Two photon emitters (see, eg, photon emitters 110A and 110B in FIGS. 1A and 1B) or three that can be used to emit photons on the surface of the article, such as the entire surface of the article or some predetermined portion of the surface of the article The above-mentioned photon emitter may be included. In some embodiments, for example, the device may include multiple photon emitters such as two, three, four, five, six, seven, eight, nine or ten or more. In some embodiments, for example, the device may include multiple photon emitters, such as ten, nine, eight, seven, six, five, four, three or two or less. Combinations of the above may also be used to describe the multiple photon emitters described above. In some embodiments, for example, the plurality of photon emitters may include 2 or more and 10 or less photon emitters (eg, between 2 and 10 photon emitters), eg, 2 or more photon emitters and Six or fewer photon emitters (eg, between two and six photon emitters), eg, two or more photon emitters and four or less photon emitters (eg, between two and four photon emitters) May be included. Additionally, for multiple photon emitters, each photon emitter of the multiple photon emitters may be the same, different, or some combination thereof (eg, at least two are the same photon emitter, The remaining photon emitters are different, or at least four are the same photon emitters, and the remaining photon emitters are different, etc.). Additionally, for multiple photon emitters, the photon emitters may be configured into one or more pairs of photon emitters as described herein.

  Regardless of whether the device includes two photon emitters or more than two photon emitters, each photon emitter is the surface of the article at a distance and / or angle optimized for one or more types of features. It can emit photons on the top. Features of that type are described in more detail herein. Allow each photon emitter to emit photons on the surface of the article at different times and / or angles at different times (eg for continuous imaging) for characterization of one or more types of features , Two photon emitters can be paired. The characterization may be performed by using two different surface feature maps generated under two photon emitters and / or information used to generate such surface feature maps. The angle optimized for one or more types of features may be equal to the glancing angle. The glancing angle is the complement of the incident angle, which is the light beam containing the radiation photons incident on the surface of the article and the normal to the point at which the light beam is incident (ie a line perpendicular to the surface of the article) Is the angle between them. The glancing angle is also described as the angle between the ray containing the radiation photons incident on the surface of the article and the surface at the point where the ray is incident.

  FIG. 2 is a diagram providing a number of rays of light incident on surface 152 of article 150, including radiation photons that form a glancing angle with surface 152. FIG. FIG. 2 further defines a number of light rays comprising reflected photons forming an angle of reflection with the normal to the surface, said angle of reflection being equal to the angle of incidence, and FIG. A plurality of light beams are defined, including scattered photons from feature 154, which include scattered photons from various scattering angles. A photon emitter can emit photons at a glancing angle in the range of 0 ° to 90 °, and a glancing angle of 0 ° indicates that the photon emitter emits photons on the surface of the article from the side with the article A glancing angle of 90 ° indicates that the photon emitter emits photons directly on the article and onto the surface of the article. In some embodiments, for example, the photon emitter has a glancing angle of at least 0 °, 5 °, 10 °, 15 °, 20 °, 25 °, 30 °, 35 °, 40 °, 45 °, 50 ° Photons may be emitted on the surface of the article such that 55 °, 60 °, 65 °, 70 °, 75 °, 80 °, 85 ° or 90 °. In some embodiments, for example, the photon emitters have glancing angles of 90 °, 85 °, 80 °, 75 °, 70 °, 65 °, 60 °, 55 °, 50 °, 45 °, 40 °, Photons may be emitted on the surface of the article to be less than 35 °, 30 °, 25 °, 20 °, 15 °, 10 ° or 5 °. Combinations of the above may also be used to describe the glancing angle at which the photon emitter may emit photons on the surface of the article. In some embodiments, for example, the photon emitter has a glancing angle of 0 ° or more and 90 ° or less (ie, between 0 ° and 90 °), such as 0 ° or more and 45 ° or less (ie, 0). Photons can be emitted on the surface of the article such that it is between 45 ° and 45 °, including 45 ° to 90 ° (ie, between 45 ° and 90 °).

The device may optionally include a pair of photon emitters (see, eg, photon emitters 110A and 110B in FIGS. 1A and 1B) located on the same side of the device. Each photon emitter may emit photons on the surface of the article at different times and / or different angles at different times (e.g. sequentially for successive imaging). The pair of photon emitters in such a device may be positioned at a relatively high angle with respect to the surface of the article with the first photon emitter (eg photon emitter 110A of FIGS. 1A and 1B) being a second photon emitter (eg The photon emitters 110B) of 1A and FIG. 1B can be configured to be positioned at relatively low angles with respect to the surface of the article. In some embodiments, for example, the first photon emitter is 30 °, 35 °, 40 °, 45 °, 50 °, 55 °, 60 °, 65 °, 70 °, 75 °, 75 °, 80 °, or It can be positioned at a relatively high angle of 85 °, which is the glancing angle. In some embodiments, for example, the first photon emitter is 90 °, 85 °, 80 °, 75 °, 70 °, 65 °, 60 °, 55 °, 50 °, 45 °, 40 °, or It can be positioned at a relatively high angle of 35 ° or less, which is the glancing angle. Combinations of the above may be used to illustrate the relatively high angles at which the first photon emitter can be positioned with respect to the surface of the article. In some embodiments, for example, the first photon emitter may be 30 ° or more and 90 ° or less (ie, between 30 ° and 90 °), such as 30 ° or more and 50 ° or less (ie, 30 ° and 50 ° And 30 ° or more and 40 ° or less (ie, between 30 ° and 40 °) and can be arranged at relatively high angles of 30 ° or more and 60 ° or less (ie, between 30 ° and 60 °) The angle is a glancing angle. In some embodiments, for example, the second photon emitter may be positioned at a relatively low angle of 0 °, 5 °, 10 °, 15 °, 20 ° or 25 ° or more, said angle being the glancing angle It is. In some embodiments, for example, the second photon emitter may be positioned at a relatively low angle of 30 °, 25 °, 20 °, 15 °, 10 ° or 5 ° or less, said angle being the glancing angle It is. Combinations of the above may be used to illustrate the relatively low angles at which the second photon emitter can be positioned with respect to the surface of the article. In some embodiments, for example, 0 ° or more and 30 ° or less (ie, between 0 ° and 30 °), such as 0 ° or more and 20 ° or less (ie, 0 ° and 20 °), 0 ° or more 0 ° or more and 25 ° or less including 10 ° or less (ie between 0 ° and 10 °) and 3 ° or more and 7 ° or less (ie between 3 ° and 7 °) ) Can be arranged at a relatively low angle, which is the glancing angle. By positioning the first photon emitter of the pair of photon emitters at a relatively high angle with respect to the surface of the article, and the second photon emitter of the pair of photon emitters at a relatively low angle with respect to the surface of the article, Allows differential scattering of photons from surface features in the article as described to produce the differential maps described herein, such as the differential surface feature maps 160A and 160B of FIGS. 1A and 1B. It is possible to

  The photon emitter may emit photons on the surface of the article, such as the entire surface or some predetermined portion of the surface (e.g., for gradual rotation of the article for piece-by-piece inspection if desired). The photon emitter may further emit photons on any surface of the article or any predetermined portion of the surface, such that the entire surface or a predetermined portion of the surface is uniformly or homogeneously illuminated. Uniformly irradiating the entire surface of the article or any predetermined portion of the surface is the same or substantially the same photon energy per unit time (eg photon power or photons) over the entire surface of the article or any predetermined portion of the surface of the article Including, but not limited to, exposure to the same or approximately the same photon power (eg, photon flux density) per bundle area and / or unit area. In radiation measurement terms, uniformly irradiating refers to the entire surface of the article or some predetermined part of the surface of the article, the same or nearly the same radiant energy per unit time (eg radiant power or radiant flux) and / or unit area It includes, but is not limited to, exposure to the same or nearly the same radiation power (eg, emissivity or radiant flux density).

  With the understanding that photons are elementary particles of electromagnetic radiation or light, photon emitters or light sources can have a relatively broad range of wavelengths (eg, full spectrum, ultraviolet, visible, visible, infrared, etc.), a relatively narrow range of wavelengths (Eg, UV subdivisions such as UVA, UVB and UVC; visible subdivisions such as red, green and blue; subdivisions of infrared such as near infrared and mid infrared) or light containing a specific wavelength (for example, single color) , A relatively wide range of frequencies (eg, full spectrum, UV, visible, visible, infrared, etc.), a relatively narrow range of frequencies (eg, UVA, UVB, UVC, etc.), subdivision of ultraviolet light; red, green, blue, etc. Visible subdivisions such as; Subdivisions of infrared rays such as near infrared rays and mid infrared rays), or light containing a specific frequency (for example, single color), polarization For example, linearly polarized light, circularly polarized light etc.), partially polarized light or unpolarized light, and / or a different degree of temporal coherence and / or ranging from coherent (eg laser) to non-coherent light Or provide light with spatial coherence. As discussed herein, a photon emitter or light source may be used in conjunction with one or more optical components of an optical setup to provide light having any of the above qualities.

  In view of the above, the photon emitter or light source may include a lamp, such as a flash lamp including a high speed flash lamp, which uses a photon detector array to detect photons scattered from features on the surface of the article While, it is configured to minimize vibration. In some embodiments, for example, a 500 W Xe flash lamp to minimize vibration while photon emitters or light sources detect photons scattered from features on the surface of the article using a photon detector array. Such as a high speed Xe flash lamp.

  Further in view of the above, the photon emitter or light source may comprise a collimated light source such as a laser comprising a combination of lasers configured to emit photons on the surface of the article at one or more angles. In some embodiments, for example, a combination of lasers may be provided to the laser beam shaper such that the combination of lasers emits photons on the surface of the article at an angle. In some embodiments, for example, a combination of lasers may be provided to the laser beam shaper such that the combination of lasers emits photons on the surface of the article at multiple angles. In some embodiments, for example, at least two, four, six, eight, ten, twelve, and so on, such that the combination of lasers emits photons on the surface of the article at one or more angles. Fourteen, sixteen, eighteen, twenty, twenty-two, twenty-four, twenty-six, twenty-six, twenty-eight, thirty-eight, or more than thirty lasers (or more) may be provided to the laser beam shaper. In some embodiments, for example, 30, 28, 26, 24, 22, 20, 18 such that the combination of lasers emits photons on the surface of the article at one or more angles. No more than 16, 16, 14, 12, 10, 8, 6, 4, or 2 lasers may be provided to the laser beam shaper. Combinations of the above may also be used to describe the combination of lasers provided to the laser beam shaper. In some embodiments, for example, 2 or more and 30 or less lasers (eg, between 2 and 30 lasers), eg, 10 or more and 30 or less lasers (eg, 10 and 30) Between 20 and 30 lasers (for example between 20 and 30 lasers), and further between 24 and 28 lasers (for example between 24 and 28). (A) laser may be provided to the laser beam shaper such that the combination of lasers emits photons on the surface of the article at one or more angles.

  Further in view of the above, a two-dimensional light source such as a combination of point light sources, including a linear combination of point light sources configured to emit photons on the surface of an article, a combination of arches, etc. May be included. In some embodiments, for example, the two-dimensional light source is at least 10, 20, 40, 60, 80, 100, 110, 120, 140, 160, 180, or 200 It may include a single point light source or a combination of more than 200 point sources. In some embodiments, for example, two-dimensional light sources can be 200, 180, 160, 140, 120, 100, 80, 60, 40, 20 or 10 point light sources or less Can include combinations of Combinations of the above may also be used to describe two-dimensional light sources, including combinations of point light sources. In some embodiments, for example, the two-dimensional light source may comprise a combination of 10 or more and 200 or less (e.g. between 10 and 200) point light sources, for example 40 or more and 160 or less (e.g. 40 and 160) point light sources may be included, and 60 or more and 140 or less (for example, between 60 and 140) point light sources may be included, and 80 or more and 120 or less (for example 80). Between 120 and 120) point light sources. Such point light sources may be linearly combined to form a two dimensional light source such as a strip light. Such point light sources may be arched to form a two-dimensional light source, such as a ring light. In some embodiments, for example, the photon emitter or light source may comprise a two dimensional light source comprising at least 60 point light sources, eg the two dimensional light source is a ring light comprising at least 60 point light sources, It includes a ring light that includes at least 60 light emitting diodes ("LEDs"), and further includes a ring light that includes at least 100 LEDs. A two dimensional light source comprising LEDs may comprise white LEDs, each LED having a power of at least 10 mW. LED-based ring lights are particularly susceptible to scratches (eg, circumferential scratches) on the surface of the article, particularly when configured to emit photons on the surface of the article at lower angles (eg, glancing angles less than 45 °) And / or may enhance features such as voids.

  The apparatus may further include an optical setup (see, for example, the optical setup 120 of FIGS. 1A and 1B), which is from the surface features of photons and / or articles emitted from one or more photon emitters. It can handle scattered photons. With the understanding that photons are elementary particles of electromagnetic radiation or light, the optical setup may process light emitted from one or more photon emitters and / or light scattered from surface features of the article. The optical setup may include any of a number of optical components disposed in an optical path in front of the article, which uniformly or uniformly illuminates the entire surface or a predetermined portion of the surface of the article. Previously, it may be used to process photons / light emitted from one or more photon emitters. The optical setup may include any of a number of optical components placed in the optical path behind the article, which optical components are used to process photons / light scattered from features on the surface of the article It can be done. The optical components described above may include, but are not limited to, optical components such as lenses, mirrors and filters. For optical components such as filters, such filters may include, for example, wave filters and polarization filters. Wave filters may be used in conjunction with the photon emitters described herein to provide light containing a relatively wide range of wavelengths or frequencies, a relatively narrow range of wavelengths or frequencies, or a particular wavelength or frequency. It may be used. Polarized filters may be used in conjunction with the photon emitters described herein to provide light of the desired polarization, including polarization, partial polarization or non-polarization.

  The optical setup may comprise a single lens or a plurality of lenses, said lenses comprising a photon detector array for collecting and detecting photons scattered from features on the surface of the article (for example the photons of FIGS. 1A and 1B) Including, but not limited to, a combination of lenses coupled to detector array 130). The lens coupled to the photon detector array may be an objective lens such as a telecentric lens, said lens comprising an object space telecentric lens (ie the entrance pupil is at infinity), an image space telecentric lens ( That is, the exit pupil is at infinity) or a double telecentric lens (ie both pupils are at infinity). Coupling a telecentric lens to a photon detector array reduces errors with respect to the location of surface features of the article, reduces distortion of the surface features of the article, and / or quantitative analysis of photons scattered from the surface features of the article It will be possible. The quantitative analysis involves integration of the photon scattering intensity distribution for size determination of the surface features of the article.

  The apparatus further comprises a single photon detector array (eg, see photon detector array 130 of FIGS. 1A and 1B) or each including multiple photon detectors to detect photons scattered from surface features of the article. May include multiple photon detector arrays, including multiple photon detectors. In some embodiments, for example, the plurality of photon detector arrays comprises two, three, four, five, six, seven, eight, nine or ten or more photon detector arrays May be included. In some embodiments, for example, the plurality of photon detector arrays comprises no more than ten, nine, eight, seven, six, five, four, three or two photon detector arrays May be included. Combinations of the above may also be used to describe multiple photon detector arrays. In some embodiments, for example, the plurality of photon detector arrays may include 2 or more and 10 or less photon detector arrays (eg, between 2 and 10 photon detector arrays), for example Two or more and five or less photon detector arrays (e.g., between two and five photon detector arrays) may be included. Further, for multiple photon detector arrays, each photon detector array of the multiple photon detector arrays may be the same, different, or some combination thereof (eg, at least two are the same) A photon detector array, the remaining photon detector arrays being different, or at least three being the same photon detector array, the remaining photon detector arrays being different, etc.

  Regardless of whether the device includes a single photon detector array or multiple photon detector arrays, each photon detector array can optimally receive photons scattered from one or more types of features (eg, minimum To detect photons scattered from surface features of the article at a distance and / or angle for maximum reception of photons in background noise of a given type of features are described in more detail herein. be written. Similarly, the combination of the photon detector array and the lens (e.g. a telecentric lens) provides the maximum reception of scattered light and / or the distance and / or angle for optimal reception of photons scattered from one or more types of features. Can be directed to collect and detect photons scattered from surface features of the article. Such an angle is defined by the ray including the centerline axis of the photon detector array and / or the lens extending to the surface of the article, and the normal at the point the ray is extended (ie a line perpendicular to the surface of the article Can be an angle between The angle, optionally combined with an aperture that can be optionally sized for maximum reception of photons with minimal background noise, can allow for reception of scattered photons with multiple scattering angles, which are: It may scatter from one or more types of features. The scattering angle may be different than the reflection angle, which is equal to the incident angle as described herein. FIG. 2 is a diagram providing a number of light rays including photons that are scattered from features 154 on the surface 152 of the article 150, wherein the light rays exhibit different scattering angles.

  In view of the above, the photon detector array or combination of photon detector array and lens may be oriented at an angle in the range of 0 ° to 90 °, the angle of 0 ° being the photon detector on the side of the article The orientation of the array or combination of photon detector array and lens is shown, and the angle of 90 ° indicates the orientation of the combination of photon detector array or photon detector array and lens that is directly above the article. In some embodiments, for example, the photon detector array or combination of photon detector array and lens is at least 0 °, 5 °, 10 °, 15 °, 20 °, 25 °, 30 °, 35 °, 40 It can be oriented at an angle of 45 °, 50 °, 55 °, 60 °, 65 °, 70 °, 75 °, 80 °, 85 ° or 90 °. In some embodiments, for example, the photon detector array or the combination of photon detector array and lens is 90 °, 85 °, 80 °, 75 °, 70 °, 65 °, 60 °, 55 °, 50 ° , 45 °, 40 °, 35 °, 30 °, 25 °, 20 °, 15 °, 10 ° or 5 ° or 0 ° or less. Combinations of the above may also be used to describe the angle at which the photon detector array or the combination of the photon detector array and the lens may be oriented. In some embodiments, for example, the photon detector array or combination of photon detector array and lens may be oriented at an angle of 0 ° or more and 90 ° or less (ie, between 0 ° and 90 °), The angle includes, for example, 0 ° or more and 45 ° or less (ie, between 0 ° and 45 °) or 45 ° or more and 90 ° or less (ie, between 45 ° and 90 °).

  A photon detector array, optionally in combination with a lens (e.g., a telecentric lens), can detect photons scattered from features on the surface of the article, such as the entire surface of the article or some predetermined portion of the surface of the article. A photon detector array, optionally in combination with a lens (e.g. a telecentric lens), is directed to a distance and / or an angle for optimal reception of photons scattered from one or more types of features. Photons scattered from features on the surface of the article, such as the surface or some predetermined portion of the surface of the article may be detected. As provided herein, the angle for optimal reception of photons scattered from one or more types of features may allow reception of scattered photons with multiple scattering angles, said scattered photons being one It can scatter from more than one type of feature.

  With the understanding that photons are elementary particles of electromagnetic radiation or light, a photon detector array or a photodetector array can have a relatively wide range of wavelengths (eg, ultraviolet, visible, visible, infrared, etc.), a relatively narrow range Wavelengths (eg, UV subdivisions such as UVA, UVB, and UVC; visible subdivisions such as red, green, and blue; subdivisions of infrared such as near infrared and mid infrared) or specific wavelengths (for example, single color) Including light, a relatively wide range of frequencies (for example, UV, visible, infrared, etc.), a relatively narrow range of frequencies (for example, UV subdivisions such as UVA, UVB, UVC, etc .; red, green, blue, etc. Visible subdivisions; subdivisions of infrared rays such as near-infrared, mid-infrared, etc.) or light containing a specific frequency (eg monochromatic) (eg Linearly polarized light, circularly polarized light etc.) light, partially polarized or unpolarized light, and / or light with different degrees of temporal and / or spatial coherence ranging from coherent light (eg laser) to non-coherent light Can be detected. As discussed herein, a photon detector array or photodetector may also be used in connection with one or more optical components of an optical setup to detect light having any of the above qualities. Good.

  The photon detector array may include a plurality of pixel sensors, which may each include photon detectors (e.g. photodiodes) coupled to a circuit comprising transistors configured for amplification. Features of photon detector arrays including such pixel sensors include low temperature operation (eg -40 ° C), low electronic noise (eg 2-10e-RMS; 1e-RMS; <1e-RMS etc), wide dynamic range (Eg, 30,000: 1, 8,500: 1, 3,000: 1, etc.), and / or reduced photon / light collection times, including but not limited to. The photon detector array may include a number of pixel sensors (e.g. .gtoreq.1,000,000 or .gtoreq.1M pixel sensors) arranged in columns and rows of a two dimensional array, each pixel sensor being coupled to an amplifier Includes a photon detector. In some embodiments, for example, the photon detector array is at least 1M, 2M, 3M, 4M, 5M, 6M, 7M, 8M, 9M, 10M, or more arranged in columns and rows of a two-dimensional array May be included. In some embodiments, for example, the 10M, 9M, 8M, 7M, 6M, 5M, 4M, 3M, 2M, or 1M or less pixel sensors are arranged in columns and rows of a two-dimensional array, for example. May be included. Combinations of the above may also be used to describe the number of pixel sensors in the photon detector array. In some embodiments, for example, the photon detector array may include 1M or more and 10M or less (eg, between 1M and 10M) pixel sensors arranged in columns and rows of a two-dimensional array, for example, 1M or more It may include pixel sensors of 8 M or less (for example, between 1 M and 8 M), and include pixel sensors of 1 M to 6 M (for example, between 1 M and 8 M), and further 2 M to 6 M (for example, 1 M and 8 M) ) And further includes 2 to 5 M (for example, between 2 M and 5 M) pixel sensors.

  Surface features appear at a larger size, due to surface reflection and / or small angle scattering (eg, 4π scattering) of surface features in the article, which allows pixel sensors larger than surface features to be used. In some embodiments, for example, the photon detector array has micrometer sizes (ie, measured in μm units with minimum dimensions of 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm or 10 μm or more) Can be included. In some embodiments, for example, the photon detector array may include a micrometer sized pixel sensor having a minimum dimension of 10 μm, 9 μm, 8 μm, 7 μm, 6 μm, 5 μm, 4 μm, 3 μm, 2 μm or 1 μm or less. Combinations of the above may also be used to describe the dimensions of micrometer sized pixel sensors in a photon detector array. In some embodiments, for example, the photon detector array may include a micrometer sized pixel sensor having a minimum dimension of 1 μm to 10 μm (eg, between 1 μm and 10 μm), eg, the minimum dimension is 1 μm. And 7 μm or less (eg, between 1 μm and 7 μm), 4 μm or more and 10 μm or less (eg, 4 μm and 10 μm), and further 4 μm or more and 7 μm or less (eg, 4 μm and 7 μm). Such micrometer sized pixel sensors may be used in an apparatus to detect, map and / or characterize surface features of articles 100 times or more smaller than micrometer sized pixel sensors.

  In view of the above, a complementary metal-oxide semiconductor (each of which may optionally be part of a CMOS or sCMOS camera, respectively) may be a single photon detector array or a plurality of photon detector arrays. Or CMOS)) or scientific complementary metal-oxide semiconductor (sCMOS)).

  FIG. 3 provides a schematic for the detection of surface features in an article, and shows a close-up cross-sectional view of an apparatus including an optical setup and photon detector array. As shown, article 150 includes a surface 152 and at least surface features 154. Photons emitted from a single photon emitter or multiple photon emitters may be scattered by surface feature 154 and collected and detected by a combination including optical setup 120 coupled to photon detector array 130. The combination may be arranged at distances and / or angles for optimal reception of photons scattered from one or more types of features (eg, maximum reception of photons with minimal background noise). Optical setup 120, which may include a telecentric lens, may collect and focus photons scattered from surface features 154 onto one or more pixel sensors 132 of photon detector array 130. The one or more pixel sensors each include a photon detector coupled to an amplifier. One or more pixel sensors 132, each corresponding to a specific fixed area on the surface of the article and a pixel in the map of the surface feature of the article, map the position of the surface feature 154, as shown, for example, in FIG. 6A. One or more signals may be provided to a computer or equivalent device for making or otherwise determining. 6A is a proximity image of the map of surface features provided in FIG. 5, and FIG. 5 is a proximity image of the surface feature maps provided in FIG. The computer or equivalent device may then use pixel interpolation to further map surface features 154, as shown in FIG. 6B.

  The apparatus further comprises one or more computers or equivalent devices (eg, a device including primary and / or secondary memory and one or more processing elements operable to perform arithmetic and logic operations) on which the instructions have been loaded. The instructions may include transporting each item to the device for inspection and optionally positioning each item for inspection, including incremental rotation of the item for inspection by piece And holding or otherwise maintaining the position of each article for inspection, inserting an optical component into the optical setup, removing the optical component from the optical setup, and for inspection Positioning and / or adjusting the optical components, and the photon emitter-article distance and / or angle optimized for one or more types of features Moving each photon emitter to a position for inspection which may include, for example, glancing angle) and switching each photon emitter on and off or otherwise emitting a mode and photon that emits photons Switching for each photon emitter between modes and position for inspection which may include photon detector array-article distance and / or angle (eg scattering angle) optimized for one or more types of features To each photon detector between moving the respective photon detector array and switching the respective photon detector array on and off or otherwise detecting photons Switching the array and optionally for better accuracy (eg 10 × better than pixel size) with respect to the position of the surface features Processing the photon detector array signal, including interpolation, mapping or otherwise locating the surface features of the article (eg photon scattering intensity distribution) from the photon detector array signal or the processed photon detector array signal Determining the surface characteristics of the article in terms of type (e.g. particles, stains, scratches, voids, etc.) and / or size (e.g. volume from integration of photon scattering intensity distribution); To enable the apparatus to operate to categorize surface features of the object and to determine trends with respect to the surface features of the article, but is not limited thereto.

  The device detects, maps and / or detects surface features of the article whose minimum dimensions (eg length, width, height or depth depending on surface features) are below nanometer size (ie employing nm units at measurement) Or may be operable to characterize. The feature may be smaller than the wavelength of photons / light emitted from the photon emitter of the device. However, the device is not limited to the detection, mapping and / or characterization of surface features of sub-nanometer sized articles. Because the device may be operable to detect, map and / or characterize surface features of articles of micrometer size (i.e. employing [mu] m units at measurement). In some embodiments, for example, the device has a minimum dimension of 500 nm, 250 nm, 200 nm, 150 nm, 125 nm, 110 nm, 100 nm, 90 nm, 80 nm, 70 nm, 60 nm, 50 nm, 40 nm, 30 nm, 20 nm, 10 nm or 1 nm (10 Å ) May be operable to detect, map and / or characterize the surface features of the article less than or smaller, eg, the surface features of the article may have minimum dimensions of 9 Å, 8 Å, 7 Å, 6 Å, 5 Å, 4 Å , 3 Å, 2 Å, or 1 Å. In view of the above, in some embodiments, for example, the device may be operable to detect, map and / or characterize surface features of the article between 0.1 nm and 1000 nm, for example The surface features of the article are between 0.1 nm and 500 nm, including between 0.1 nm and 250 nm, and further including between 0.1 nm and 100 nm, and further between 0.1 nm and 80 nm. Including.

  The apparatus detects certain features including surface and / or subsurface defects that include particle contamination where the smallest dimension (eg, length, width or height) of the particles is less than or equal to the nanometer size (ie, in nm units when measured) , May be operable to map and / or characterize. In some embodiments, for example, the device may be operable to detect, map and / or characterize particles below and / or below 125 nm, eg, such particles have a minimum dimension of less than 100 nm And includes less than 80 nm and further includes less than 10 nm. It is important for hard disks in hard disk drives to detect, map and / or characterize particles on the surface and / or subsurface to a level of 10 nm in height. This is because particles (e.g. from the surface) having a height of more than 10 nm can deteriorate the distance between the hard disk and the read / write head of the hard disk drive. In some embodiments, for example, the device may be operable to detect, map and / or characterize particles at or below 4 nm in height and / or subsurface.

  The apparatus may be operable to detect, map and / or characterize certain features including surface and / or subsurface defects including scratches (e.g. circumferential scratches), said defects having a minimum size (e.g. The length, width or depth) is less than a micrometer size (ie employing μm in measurement), for example, less than a nanometer size (ie adopting nm in measurement), eg angstrom size (ie measurement) (In units of .ANG.)) Or less. For micrometer sized scratches, the device may, for example, detect, map and / or characterize scratches from 1 μm to 1000 μm whose length may be significantly longer than the wavelength of photons / light emitted from the photon emitter of the device It may be operable. In some embodiments, for example, the device may be operable to detect, map and / or characterize surface features such as defects including scratches less than 1000 μm, eg, the scratch has a scratch length Is less than 500 μm, includes less than 250 μm, further includes less than 100 μm, and further includes less than 50 μm. For nanometer sized scratches, the device may be operable to detect, map and / or characterize scratches with a scratch width of, for example, 1 nm to 500 nm. In some embodiments, for example, the device may be operable to detect, map and / or characterize surface features such as defects including scratches with a scratch width of less than 500 nm, eg, the scratches The scratch width is less than 250 nm, includes less than 100 nm, further includes less than 50 nm, and further includes less than 15 nm. Surprisingly, the high level of spatial coherence allows the device to be operable to detect, map and / or characterize angstrom sized scratches in terms of scratch depth. In some embodiments, for example, the device may be operable to detect, map and / or characterize surface features such as defects including scratches having a scratch depth of less than 50 Å, eg, the scratch is The scratch depth is less than 25 Å, includes less than 10 Å, further includes less than 5 Å, and further includes less than 1 Å (eg, 0.5 Å). For example, the device may be operable to detect, map and / or characterize surface features such as defects including scratches that are less than 500 μm in length, less than 100 nm in width, and less than 50 Å in depth.

  The apparatus may be operable to map or otherwise determine the position of features on the surface of the article accurately and / or accurately (eg, FIG. 6A (top) and FIG. 6B (top)). In terms of accuracy, the apparatus maps or otherwise determines the location of features on the surface of the article within a radius of micrometer size (i.e. employing [mu] m units when measuring) or better. May be operable. In some embodiments, for example, the device is 100 μm, 90 μm, 80 μm, 70 μm, 50 μm, 50 μm, 30 μm, 20 μm, 20 μm, 10 μm, 9 μm, 8 μm, 7 μm, 6 μm, 5 μm, 4 μm, 3 μm, 2 μm or 1 μm. It may be operable to precisely map or otherwise determine the position of the feature on the surface of the article within the radius or better. Combinations of the above may also be used to describe the accuracy with which the device may map or otherwise determine the location of features on the surface of the article. In some embodiments, for example, the device may be operable to accurately map or otherwise determine the position of features on the surface of the article within a radius in the range of 1 μm to 100 μm, For example, the radius is 1 μm to 50 μm, includes 1 μm to 30 μm, and further includes 5 μm to 10 μm.

  In addition to mapping and / or otherwise determining the location of features on the surface of the article accurately and / or accurately, the apparatus accurately and / or precisely photon scattering intensity of the features on the surface of the article It may be operable to determine the distribution (eg, FIG. 6A (bottom) and FIG. 6B (bottom)). Such photon scattering intensity distribution can be used to quantitatively and qualitatively characterize the surface features of the article. For quantitative characterization of surface features of the article, integration of the photon scattering intensity distribution provides the size (e.g., volume) of the surface features of the article. The quantitative characterization of the surface features of the article may further include the determination of surface feature locations on the article as described above. The quantitative characterization may still further include the total number of surface features per article and the number of surface features of each type on the article. Such characterization information may be sorted across multiple articles, and if such features include surface and / or subsurface defects that may reduce the performance of the article, to correct manufacturing trends. It can be used.

With respect to the qualitative characterization of the surface features of the article, the qualitative characterization involves the determination of the type of surface features (eg particles, stains, scratches, voids, etc.) on the article, said determination comprising an analysis of the photon scattering intensity distribution But not limited thereto. As described herein, the device may include a pair of photon emitters (eg, a pair of photon emitters configured to emit broad spectrum, unpolarized light, polarized monochromatic light, etc.); The first photon emitter may be positioned at a relatively high angle with respect to the surface of the article, and the second photon emitter may be positioned at a relatively low angle with respect to the surface of the article. Depending on the type of surface feature, the photon scattering intensity distribution for the surface feature generated under the first photon emitter and the photon scattering intensity distribution for the surface feature generated under the second photon emitter are It may be substantially the same or different. For example, for particle type features 154A on the surface 152 of the article 150 of FIG. 7, the photon scattering intensity distribution for the particles produced under the first photon emitter (relatively high angle) and the second photon emitter ( The photon scattering intensity distribution for particles produced under relatively low angles) may be approximately the same or the photon scattering intensity distribution for particles produced under the first photon emitter and the second The ratio of the photon scattering intensity distribution for the particles produced under the photon emitter of. For example, for the void type feature 154B of FIG. 7, the photon scattering intensity distribution for the void produced under the first photon emitter (relatively high angle) and the second photon emitter (relatively low angle) under The photon scattering intensity distribution for the void generated in the first is the photon scattering intensity distribution for the void generated under the second photon emitter (see, eg, a close image of the void type feature 154B in FIG. 8B). Scattering intensity distribution for the void created under the photon emitter (see, eg, the close-up image of the same void type feature 154B in FIG. 8B), even if it is small or negligible Good. Therefore, the ratio of the photon scattering intensity distribution for the voids generated under the first photon emitter (relatively high angle) and the photon scattering intensity distribution for the voids generated under the second photon emitter is very Or mathematically indefinite. In another example, feature 154C of FIG. 7 can be considered as a void having a rim or a void in close proximity to a particle, and a photon for feature 154C generated under the first photon emitter (relatively high angle) The ratio of the scattering intensity distribution and the photon scattering intensity distribution for feature 154C generated under the second photon emitter (relatively low angle) is the photon scattering intensity generated for feature 154C under the first photon emitter The distribution may be similar to the photon scattering intensity distribution generated for the particle, and the photon scattering intensity distribution generated for feature 154C under the second photon emitter is larger than the photon scattering intensity distribution of the void, although the particle It may differ somewhat in that it may be less than the photon scattering intensity distribution of Thus, the ratio of the photon scattering intensity distribution for feature 154C generated under the first photon emitter (relatively high angle) and the photon scattering intensity distribution for feature 154C generated under the second photon emitter are , Greater than 1 or otherwise between the particle and void ratios described above. The above photon scattering intensity distributions generated under relatively high angle photon emitters and relatively low angle photon emitters are described herein, such as the differential surface feature maps 160A and 160B of FIGS. 1A and 1B. Information, portions of information may be provided or otherwise incorporated in order to generate the discriminatory map described. As such, in some embodiments, qualitative characterization of one or more surface features of the article may be performed to generate a first map generated under a first photon emitter (relatively high angle) Contrasting the information used with the information used to generate the second map generated under the second photon emitter (relatively low angle), or generated under the first photon emitter The first map may be contrasted with a second map generated below the second photon emitter. Along with quantitative characterization, such qualitative characterization information may be sorted across multiple articles, where such features include surface and / or subsurface defects that may reduce the performance of the article. Can be used to correct manufacturing trends.

  Depending on factors that may include the type of article and the type of surface features, etc., the number of photons emitted from a single photon emitter or multiple photon emitters (eg, photon energy) is increased to It may sometimes be desirable to provide an increased scattered signal for characterization (eg, qualitative and / or quantitative). Such an increase in photon energy may be to unit time for increased photon power or photon flux, or to unit area for increased photon flux density. Alternatively or additionally, to increase the detection time of a single photon detector array or multiple photon detector arrays in order to map and otherwise determine the position of surface features accurately and / or accurately It may be desirable to detect more photons. Stray light from one or more photon emitters, background light and either alternatively to increase photon energy or detection time or additionally to increase photon energy and detection time It may sometimes be desirable to minimize background noise, including background fluorescent radiation.

  The apparatus described herein may be configured to process or inspect the article at a speed greater than or equal to the speed at which the article or its workpiece is manufactured. In some embodiments, for example, the devices may be one, two, three, four, five, six, seven, eight, nine, ten, twelve, fourteen, sixteen per second. It may be configured to process or inspect the article at speeds of 18, 18 or 20 or more, which may correspond to the speed at which the article or its workpiece is manufactured. In some embodiments, for example, the devices may be 20, 18, 16, 14, 12, 10, 9, 8, 7, 6, 5, 4, 3 each second. It may be configured to process or inspect the article at speeds of one, two, or less than one, which may correspond to the speed at which the article or its workpiece is manufactured. Combinations of the above may also be used to describe the rate at which the article or its workpiece is processed or inspected by the device. In some embodiments, for example, the device may be configured to process or inspect one or more and twenty or less articles per second (eg, between one and twenty articles per second), eg, every second One or more and ten or less articles (e.g., between 1 and 10 articles per second) are processed or inspected, such as 1 or more and 5 or less articles per second (e.g., 1 and 5 articles per second) Goods between). Treating or inspecting an article at a rate greater than or equal to the rate at which the article or its workpiece is manufactured is a function of many features of the apparatus described herein and is during processing or examination ( For example but not limited to photon emitters and / or articles that need not be moved) for scanning. For example, items such as hard disks in hard disk drives do not need to be rotated during processing or inspection. As such, the device may be configured to hold the article stationary while emitting photons on the surface of the article.

  The apparatus may be configured to process or inspect the article at a speed greater than or equal to that at which the article or its workpiece is manufactured, but may operate at a slower speed if necessary. In some embodiments, for example, the device may be configured to process or inspect an item at a rate of less than one per second. In such embodiments, for example, the device is configured to process or inspect the article at a rate of less than one per 5 seconds, 10 seconds, 25 seconds, 50 seconds, 75 seconds, 100 seconds or more. obtain.

  The apparatus described herein, including a pair of photon emitters, an optical setup, a photon detector array and a computer or equivalent device, can be fully automated and can function in different modes. Such modes include, but are not limited to, ultra-fast mode, ultra-sensitive mode and ultra-sensitive plus mode. With respect to the ultrafast mode, the device operates at least 200 times faster than other optical surface analyzers (e.g. KLA-Tencor Candela CS10 or CS20) and detects surface features such as defects containing embedded particles up to at least 100 nm Surface features such as defects including scratches (eg, nanometer sized scratches) may be partially detected to provide a measure of roughness. With respect to the ultra-sensitive mode, the device operates at least 50 times faster than other optical surface analyzers, and can detect surface features such as defects containing embedded particles up to at least 30 nm and provide a measure of roughness . With respect to ultra-sensitive plus mode, the device operates at least 20 times faster than other optical surface analyzers, detects surface features such as defects containing embedded particles up to at least 30 nm, and scratches (eg nanoscratch) Surface features such as defects included may be fully detected to provide a measure of roughness.

  Thus, the devices provided herein comprise two photon emitters configured to emit photons on the surface of an article, and a plurality configured to receive photons scattered from features on the surface of the article. And a mapping means for mapping features on the surface of the article, the mapping means corresponding to two photon emitters, two features of the features on the surface of the article Provide a map. In some embodiments, two photon emitters are positioned on the same side of the device. In some embodiments, two photon emitters are positioned to emit photons on the surface of the article at different angles. In some embodiments, the first of the two photon emitters is positioned to emit photons on the surface of the article at a glancing angle of 30 ° or more, and the two photon emitters are The second photon emitter is positioned to emit photons on the surface of the article at a glancing angle of less than 30 °. In some embodiments, the mapping means comprises one or more computers or equivalent devices loaded with instructions operable to map features on the surface of the article from the signals received from the photon detector array. In some embodiments, the apparatus is configured to characterize features on the surface of the article by contrasting the first of the two maps with the second of the two maps. In some embodiments, the first of the two photon emitters is configured to emit a first set of photons, and the second of the two photon emitters is a second photon emitter. The apparatus is configured to emit a set of photons, and the apparatus transmits a signal from the photon detector array corresponding to the first set of photons scattered from the feature on the surface of the article from the feature on the surface of the article. Are characterized to characterize features on the surface of the article by contrasting with the signal from the photon detector array corresponding to the set of photons. In some embodiments, the apparatus further comprises a telecentric lens coupled to the photon detector array, and one or more additional photon emitters, and the mapping means is one or more additional photon emitters. Each provides one or more additional maps of features on the surface of the corresponding article.

  Also, the apparatus provided herein is coupled to a plurality of photon emitters configured to emit photons on the surface of an article, an objective lens, and an objective lens and scattered from features on the surface of the article A photon detector array comprising a plurality of photon detectors configured to receive photons, and a mapping means for mapping features on the surface of the article, the mapping means corresponding respectively to the plurality of photon emitters, Providing a plurality of maps of features on the surface of the article. In some embodiments, multiple photon emitters are positioned on the same side of the device. In some embodiments, the first photon emitter of the plurality of photon emitters is positioned to emit photons on the surface of the article at a glancing angle of 30 ° or more, and the second of the plurality of photon emitters The photon emitter is positioned to emit photons on the surface of the article at a glancing angle less than 30 °. In some embodiments, the mapping means comprises one or more computers or equivalent devices loaded with instructions operable to map features on the surface of the article from the signals received from the photon detector array. In some embodiments, the apparatus is configured to characterize features on the surface of the article by comparing a first map of the plurality of maps to a second map of the plurality of maps.

  Also, the apparatus provided herein comprises a photon detector array configured to receive photons scattered from features on the surface of the article, and characterization means for characterizing the features on the surface of the article. Inclusion, the characterization means contrasts the signals from the photon detector array corresponding to the two sets of photons scattered from the features on the surface of the article, the two sets of photons respectively originating from photon emitters at different locations. In some embodiments, the apparatus further comprises a telecentric lens, wherein the telecentric lens is coupled to the photon detector array. In some embodiments, the first photon emitter of the photon emitters is configured to emit the first set of photons of the two sets of photons, and the second photon emitter of the photon emitters is two It is configured to emit a second set of photons of the set of photons. In some embodiments, the first photon emitter is positioned to emit photons on the surface of the article at a glancing angle of 30 ° or more. In some embodiments, the second photon emitter is positioned to emit photons on the surface of the article at a glancing angle of less than 30 degrees. In some embodiments, the characterization means comprises one or more computers or equivalent devices loaded with instructions operable to characterize surface features of the article in terms of type and / or size. In some embodiments, the apparatus further comprises mapping means for mapping the features on the surface of the article, the mapping means providing a map of the features on the surface of the article, each corresponding to a photon emitter.

  Also, the devices provided herein are configured to receive at least two photon emitters configured to emit photons on the surface of the article, and photons scattered from features on the surface of the article. An array of photon detectors comprising a plurality of photon detectors and mapping means for mapping features on the surface of the article, the mapping means corresponding to the at least two photon emitters of features on the surface of the article Provide at least two maps. In some embodiments, the apparatus further comprises a telecentric lens, wherein the telecentric lens is coupled to the photon detector array. In some embodiments, each of the at least two photon emitters is positioned to emit photons on the surface of the article at different angles. In some embodiments, the first of the at least two photon emitters is positioned to emit photons on the surface of the article at a glancing angle of 30 ° or more. In some embodiments, the second of the at least two photon emitters is positioned to emit photons on the surface of the article at a glancing angle of less than 30 degrees. In some embodiments, at least two photon emitters are positioned on the same side of the device. In some embodiments, the mapping means comprises one or more computers or equivalent devices loaded with instructions operable to map features on the surface of the article from the signals received from the photon detector array. In some embodiments, the apparatus is configured to characterize features on the surface of the article by contrasting a first one of the at least two maps with a second one of the at least two maps. Ru. In some embodiments, a first photon emitter of the at least two photon emitters is configured to emit a first set of photons, and a second photon emitter of the at least two photon emitters is , Configured to emit a second set of photons, the apparatus comprising: signals from the photon detector array corresponding to the first set of photons scattered from features on the surface of the article, from the features on the surface of the article A feature on the surface of the article is configured to be characterized by contrasting with the signal from the photon detector array corresponding to the scattered second set of photons.

  Also, the apparatus provided herein is coupled to at least two photon emitters configured to emit photons on the surface of the article at different angles, an objective lens, and an objective lens, the surface of the article A photon detector array comprising a plurality of photon detectors configured to receive photons scattered from the features in the at least one mapping means for mapping the features on the surface of the article, the mapping means comprising at least two At least two maps of features on the surface of the article, each corresponding to a photon emitter, are provided. In some embodiments, the first of the at least two photon emitters is positioned to emit photons on the surface of the article at a glancing angle of 30 ° or more. In some embodiments, the second of the at least two photon emitters is positioned to emit photons on the surface of the article at a glancing angle of less than 30 degrees. In some embodiments, at least two photon emitters are positioned on the same side of the device. In some embodiments, the mapping means comprises one or more computers or equivalent devices loaded with instructions operable to map features on the surface of the article from the signals received from the photon detector array. In some embodiments, the apparatus is configured to characterize features on the surface of the article by contrasting a first one of the at least two maps with a second one of the at least two maps. Ru.

  Also, the devices provided herein are configured to receive at least two photon emitters configured to emit photons on the surface of the article, and photons scattered from features on the surface of the article. A photon detector array comprising a plurality of photon detectors, and characterization means for characterizing features on the surface of the article, wherein the characterization means comprises at least two sets of photons scattered from the features on the surface of the article Contrast the signals from the corresponding photon detector array. In some embodiments, the apparatus further comprises a telecentric lens, wherein the telecentric lens is coupled to the photon detector array. In some embodiments, the first photon emitter of the at least two photon emitters is configured to emit a first of the at least two sets of photons. In some embodiments, the second one of the at least two photon emitters is configured to emit a second of the at least two sets of photons. In some embodiments, the first photon emitter is positioned to emit photons on the surface of the article at a glancing angle of 30 ° or more. In some embodiments, the second photon emitter is positioned to emit photons on the surface of the article at a glancing angle of less than 30 degrees. In some embodiments, the characterization means comprises one or more computers or equivalent devices loaded with instructions operable to characterize surface features of the article in terms of type and / or size. In some embodiments, the apparatus further comprises mapping means for mapping features on the surface of the article, the mapping means corresponding to at least two photon emitters, at least two of the features on the surface of the article Provide a map. In some embodiments, the mapping means comprises one or more computers or equivalent devices loaded with instructions operable to map features on the surface of the article from the signals received from the photon detector array.

  Although the present invention has been described and / or described by specific embodiments and / or examples, and these embodiments and / or examples have been described in considerable detail, the scope of the present invention is limited or optional to such details. It is not the intention of the applicant to limit in the aspect of Additional adjustments and / or modifications of the invention will be readily apparent to those skilled in the art to which the invention pertains, and in its broader aspects the invention may encompass these adjustments and / or modifications. . Accordingly, departures from the above-described embodiments and / or examples may be made without departing from the scope of the present invention, the scope of the present invention being limited only by the scope of the claims when properly interpreted.

Claims (8)

A device,
Two photon emitters configured to emit photons on the surface of an article that is a semiconductor wafer, a magnetic recording medium, a workpiece of a semiconductor wafer or a workpiece of a magnetic recording medium ;
A photon detector array comprising a plurality of photon detectors configured to receive photons scattered from features on the surface of the article;
And mapping means for mapping the features on the surface of the article based on the photon scattering intensity distribution of the features detected by the photon detector array ,
The photon detector array is configured to receive photons scattered at an angle different from a reflection angle equal to the incident angle of photons emitted by the two photon emitters,
Said mapping means provide two maps of said features on said surface of said article, corresponding respectively to said two photon emitters;
The apparatus is further characterized in that the photon scattering intensity distribution of the feature in a first one of the two maps and the ratio of the photon scattering intensity distribution of the feature in a second one of the two maps. Further comprising characterization means for characterizing the type of said features of said surface of the article,
Of the two photon emitters, the first photon emitter is positioned to emit photons on the surface of the article at a glancing angle of 30 ° or more, and the second of the two photon emitters is positioned A device wherein photon emitters are positioned to emit photons on the surface of the article at a glancing angle of less than 30 °.   The device of claim 1, wherein the two photon emitters are positioned on the same side of the device.   An apparatus according to claim 1 or 2, wherein the mapping means comprises one or more computers or equivalent devices for mapping features on the surface of the article from signals received from the photon detector array.   The article further includes a telecentric lens coupled to the photon detector array and one or more additional photon emitters, the mapping means corresponding to the one or more articles corresponding to the one or more additional photon emitters. An apparatus according to claim 1 or 2 providing one or more additional maps of the features on a surface. A device,
A photon detector array configured to receive photons scattered from features on the surface of an article that is a semiconductor wafer, a magnetic recording medium, a workpiece of a semiconductor wafer, or a workpiece of a magnetic recording medium ;
And characterization means for characterizing the features on the surface of the article based on the photon scattering intensity distribution of the features detected by the photon detector array ;
The photon detector array receives two sets of photons scattered from features on the surface of the article;
The two sets of photons originate respectively from two photon emitters at different locations,
The photon detector array is configured to receive photons scattered at an angle different from a reflection angle equal to the incident angle of photons emitted by the two photon emitters,
First photon emitter of the two-photon emitters configured to emit a first set of photons of the two pairs of photons, the second photon emitter of the two-photon emitters , Configured to emit a second set of photons of said two sets of photons,
The first photon emitter is positioned to emit photons on the surface of the article at a glancing angle of 30 ° or more,
The second photon emitter is positioned to emit photons on the surface of the article at a glancing angle of less than 30 ° ;
The characterization means determines the type of the features of the surface of the article based on the ratio of the photon scattering intensity distribution of the first set of photons and the photon scattering intensity distribution of the second set of photons. An apparatus to characterize . 6. The apparatus of claim 5 , further comprising a telecentric lens, wherein the telecentric lens is coupled to the photon detector array. The apparatus according to claim 5 or 6 , wherein the characterization means comprises one or more computers or equivalent devices for characterizing surface features of an article in terms of type and size. The apparatus further comprises mapping means for mapping the features on the surface of the article, the mapping means corresponding to the two photon emitters based on the photon scattering intensity distribution of the features , respectively. provides a map of the features in the surface of the article, according to claim 5 or 6.

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