SG11201406485QA - Method for producing hard disk substrate - Google Patents

Method for producing hard disk substrate

Info

Publication number
SG11201406485QA
SG11201406485QA SG11201406485QA SG11201406485QA SG11201406485QA SG 11201406485Q A SG11201406485Q A SG 11201406485QA SG 11201406485Q A SG11201406485Q A SG 11201406485QA SG 11201406485Q A SG11201406485Q A SG 11201406485QA SG 11201406485Q A SG11201406485Q A SG 11201406485QA
Authority
SG
Singapore
Prior art keywords
nip
lllll
plating
substrate
electroless
Prior art date
Application number
SG11201406485QA
Inventor
Gen Ishida
Nobuaki Mukai
Takahiro Yoshida
Original Assignee
Toyo Kohan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Kohan Co Ltd filed Critical Toyo Kohan Co Ltd
Publication of SG11201406485QA publication Critical patent/SG11201406485QA/en

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/73Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739Magnetic recording media substrates
    • G11B5/73911Inorganic substrates
    • G11B5/73913Composites or coated substrates
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/858Producing a magnetic layer by electro-plating or electroless plating

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

(i2) mwu ft iz s-5 iv x m £ titz s issaj n d9) mm IHMMi _ (43) 2013 ^ 10 ^ 17 0 (17.10.2013) I P O I P C T (10) WO 2013/153993 A1 (51) G1 IB 5/84 (2006.01) (21) (22) (25) (26) 4>§fl(£> s In: G11B 5/73 (2006.01) PCT/JP2013/060096 2013 ^4^ 2 0(02.04.2013) I £ \"7 — 3 2 |Jg Tokyo (30) fiBfefix — £: 4#Jg| 2012-089685 2012 ^ 4 ^ 10 0(10.04.2012) JP (71) tti H A: H ;¥_IPI (TOYO KOHAN CO., LTD.) [JP/JP]; T 1028447 KifvtlW-t H E 0#®! 2 S±fe 1 2 Tokyo (JP). (72) Effl TE(ISHIDAGen); T 7448611 Uj • R 1296 #&© 1 Yamaguchi (JP). ifll (MUKAI Nobuaki); T 7448611 UjPftTt&rfT^H# 12 9 6#±feo) 1 fill fa Yamaguchi (JP). • H |5§ JA (YOSHIDA Takahiro); T 7448611 UjPlftTl&rfTKil# 1 2 9 6#±feo)i Yamaguchi (JP). (74) ft IIA: ¥ ^ 51- (HIRAKI Yusuke et al.); T 1056232 m«fP;SEgg2Tg 5# 1 gg ^U->t^XMOR (JP). (8i) IS ft nj f b): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) *!£H (asrofci^isy > ±T(Dmm(Dfcm% V&tf nlfb): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW), 3- — V T (AM, AZ, BY, KG, KZ, RU, TJ, TM), 3 — • V / ^ (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG). - (&&£ 21 &(3)) (54) Title: METHOD FOR PRODUCING HARD DISK SUBSTRATE (54) : /\— KxV AA HI60IJ2-1 BB J±$Mi]2-1 cc kt$$.M2 — 2 mmftx.mztkzs.m-? -a DD EE m o\ o\ m T-H cn i-H o CJ o & AA Embodiment 2-1 BB Comparative example 2-1 CC Comparative example 2-2 DD Almost no mesh-shaped defects are seen EE Mesh-shaped defects arising at portion thereof FF Mesh-shaped defects arising across wide range (57) Abstract: The problem addressed by the present invention is to obtain hard disk a substrate that can obtain a smooth plating film surface by means of electroless NiP plating, and that does not have worsened acid corrosion resistance. The method for produ­ cing hard a disk substrate includes: a first plating step wherein substrate immersed in a is a first electroless NiP plating bath contain­ ing an additive having leveling effect, forming a at the surface of the substrate an electroless NiP plating film bottom layer having a lower average surface roughness than the surface; and second a plating step wherein the substrate which to the electroless NiP plat­ ing film bottom layer has been formed by means of the first plating step is immersed in second electroless a NiP plating bath, form­ ing an electroless NiP plating film top layer having acid corrosion resistance. From the first plating step until transitioning to the second plating step, contact of the bottom layer to the atmosphere suppressed. is (57) mm-' fn WO 2013/153993 A11 lllll llllllll II llllll III lllll lllll lllll lllll III III III lllll lllll lllll llll lllllll llll llll llll NiP cried; y ¥;# *f§0J<7)/\— KxV l£> 0)tomfifNiPfeo^;§lcSte$;S;SLTl^Stea)a®lc, l CD#)o ^XfMIc J; luIBtom® y Nip ft o £j£M<Z)TJi^BJ$£ *lfcS*J5£, II 2 NiP ft o £;§ lc;S;SLTliB^tt^^-r-S^mfifNiPfeo^SMa)±Ji^BJS-r-Sll2a)feo^XfM<!:^#^ > Hi 0) isb-iZJLmfribBzcDisb-DZJLm^Wiit&^vcDm, TJia)^m^a)gM^WfiJ-r-So
SG11201406485QA 2012-04-10 2013-04-02 Method for producing hard disk substrate SG11201406485QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012089685A JP5890236B2 (en) 2012-04-10 2012-04-10 Manufacturing method of hard disk substrate
PCT/JP2013/060096 WO2013153993A1 (en) 2012-04-10 2013-04-02 Method for producing hard disk substrate

Publications (1)

Publication Number Publication Date
SG11201406485QA true SG11201406485QA (en) 2014-12-30

Family

ID=49327561

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201406485QA SG11201406485QA (en) 2012-04-10 2013-04-02 Method for producing hard disk substrate

Country Status (6)

Country Link
US (1) US20150064347A1 (en)
JP (1) JP5890236B2 (en)
CN (1) CN104364847A (en)
SG (1) SG11201406485QA (en)
TW (1) TW201407607A (en)
WO (1) WO2013153993A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150099143A1 (en) * 2013-04-05 2015-04-09 Toyo Kohan Co., Ltd. Method for production of hard disk substrate and hard disk substrate

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62128020A (en) * 1985-11-28 1987-06-10 Toshikatsu Watabe Disk for memory medium having amorphous carbon film
US5141778A (en) * 1989-10-12 1992-08-25 Enthone, Incorporated Method of preparing aluminum memory disks having a smooth metal plated finish
US5578187A (en) * 1995-10-19 1996-11-26 Enthone-Omi, Inc. Plating process for electroless nickel on zinc die castings
US6800121B2 (en) * 2002-06-18 2004-10-05 Atotech Deutschland Gmbh Electroless nickel plating solutions
JP4408210B2 (en) * 2002-10-31 2010-02-03 昭和電工株式会社 Method for manufacturing perpendicular magnetic recording medium
SG112925A1 (en) * 2003-12-18 2005-07-28 Fuji Elec Device Tech Co Ltd Method of pretreating a nonmagnetic substrate and a magnetic recording medium
JP4719631B2 (en) * 2006-06-16 2011-07-06 三友セミコンエンジニアリング株式会社 Automatic metal film forming apparatus and method for forming metal film on wafer
JP5525762B2 (en) * 2008-07-01 2014-06-18 上村工業株式会社 Electroless plating solution, electroless plating method using the same, and method for manufacturing wiring board
JP2011134419A (en) * 2009-12-25 2011-07-07 Fuji Electric Device Technology Co Ltd Disk substrate for magnetic recording medium, and manufacturing method of the same
SG189274A1 (en) * 2010-10-07 2013-05-31 Toyo Kohan Co Ltd Method for production of hard disk substrate and hard disk substrate

Also Published As

Publication number Publication date
JP2013218765A (en) 2013-10-24
US20150064347A1 (en) 2015-03-05
CN104364847A (en) 2015-02-18
TW201407607A (en) 2014-02-16
JP5890236B2 (en) 2016-03-22
WO2013153993A1 (en) 2013-10-17

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