SG11201401113RA - Method for manufacturing solar cell - Google Patents

Method for manufacturing solar cell

Info

Publication number
SG11201401113RA
SG11201401113RA SG11201401113RA SG11201401113RA SG11201401113RA SG 11201401113R A SG11201401113R A SG 11201401113RA SG 11201401113R A SG11201401113R A SG 11201401113RA SG 11201401113R A SG11201401113R A SG 11201401113RA SG 11201401113R A SG11201401113R A SG 11201401113RA
Authority
SG
Singapore
Prior art keywords
solar cell
manufacturing solar
manufacturing
cell
solar
Prior art date
Application number
SG11201401113RA
Other languages
English (en)
Inventor
Akira Kumagai
Original Assignee
J E T Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by J E T Co Ltd filed Critical J E T Co Ltd
Publication of SG11201401113RA publication Critical patent/SG11201401113RA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
  • Photovoltaic Devices (AREA)
  • ing And Chemical Polishing (AREA)
SG11201401113RA 2011-10-07 2012-07-31 Method for manufacturing solar cell SG11201401113RA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011223205 2011-10-07
JP2012048340A JP5467697B2 (ja) 2011-10-07 2012-03-05 太陽電池の製造方法
PCT/JP2012/069445 WO2013051329A1 (ja) 2011-10-07 2012-07-31 太陽電池の製造方法

Publications (1)

Publication Number Publication Date
SG11201401113RA true SG11201401113RA (en) 2014-08-28

Family

ID=48043500

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201401113RA SG11201401113RA (en) 2011-10-07 2012-07-31 Method for manufacturing solar cell

Country Status (6)

Country Link
JP (1) JP5467697B2 (ko)
KR (1) KR101442461B1 (ko)
CN (1) CN103918090B (ko)
SG (1) SG11201401113RA (ko)
TW (1) TWI489646B (ko)
WO (1) WO2013051329A1 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5866477B2 (ja) * 2012-03-19 2016-02-17 アライアンス フォー サステイナブル エナジー リミテッド ライアビリティ カンパニー シリコン表面の銅支援反射防止エッチング
GB201205178D0 (en) * 2012-03-23 2012-05-09 Nexeon Ltd Etched silicon structures, method of forming etched silicon structures and uses thereof
CN103219428B (zh) * 2013-04-12 2015-08-19 苏州大学 一种晶体硅太阳能电池的绒面结构及其制备方法
JP2015053398A (ja) * 2013-09-06 2015-03-19 株式会社ジェイ・イー・ティ 太陽電池の製造方法
CN107978511A (zh) * 2017-11-20 2018-05-01 武汉新芯集成电路制造有限公司 氧化层及半导体器件的形成方法
KR102046255B1 (ko) 2018-06-21 2019-11-18 한국생산기술연구원 나노 텍스쳐링 구조를 갖는 태양전지의 제조방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10392752T5 (de) * 2002-06-06 2005-06-02 Kansai Technology Licensing Organization Co., Ltd. Verfahren zur Herstellung eines multikristallinen Siliziumsubstrats für Solarzellen
JP2007194485A (ja) 2006-01-20 2007-08-02 Osaka Univ 太陽電池用シリコン基板の製造方法
JP2009152302A (ja) * 2007-12-19 2009-07-09 Canon Inc 光起電力素子の形成方法
US20090236317A1 (en) * 2008-03-21 2009-09-24 Midwest Research Institute Anti-reflection etching of silicon surfaces catalyzed with ionic metal solutions

Also Published As

Publication number Publication date
WO2013051329A1 (ja) 2013-04-11
KR101442461B1 (ko) 2014-09-22
TW201324833A (zh) 2013-06-16
KR20140105437A (ko) 2014-09-01
JP2013093537A (ja) 2013-05-16
CN103918090A (zh) 2014-07-09
TWI489646B (zh) 2015-06-21
CN103918090B (zh) 2016-03-23
JP5467697B2 (ja) 2014-04-09

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