SG11201401017UA - Linewidth measurement system - Google Patents

Linewidth measurement system

Info

Publication number
SG11201401017UA
SG11201401017UA SG11201401017UA SG11201401017UA SG11201401017UA SG 11201401017U A SG11201401017U A SG 11201401017UA SG 11201401017U A SG11201401017U A SG 11201401017UA SG 11201401017U A SG11201401017U A SG 11201401017UA SG 11201401017U A SG11201401017U A SG 11201401017UA
Authority
SG
Singapore
Prior art keywords
measurement system
linewidth measurement
linewidth
measurement
Prior art date
Application number
SG11201401017UA
Other languages
English (en)
Inventor
Yi Qiao
Michael W Dolezal
David L Hofeldt
Jack W Lai
Catherine P Tarnowski
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of SG11201401017UA publication Critical patent/SG11201401017UA/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/04—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/04—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving
    • G01B11/046—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving for measuring width
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901—Optical details; Scanning details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
SG11201401017UA 2011-09-30 2012-09-13 Linewidth measurement system SG11201401017UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161542061P 2011-09-30 2011-09-30
PCT/US2012/055003 WO2013048744A1 (en) 2011-09-30 2012-09-13 Linewidth measurement system

Publications (1)

Publication Number Publication Date
SG11201401017UA true SG11201401017UA (en) 2014-04-28

Family

ID=47996302

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201401017UA SG11201401017UA (en) 2011-09-30 2012-09-13 Linewidth measurement system

Country Status (8)

Country Link
US (1) US20140240720A1 (de)
EP (1) EP2761281A4 (de)
JP (1) JP2014529086A (de)
KR (1) KR20140074970A (de)
CN (1) CN104040323A (de)
BR (1) BR112014007576A2 (de)
SG (1) SG11201401017UA (de)
WO (1) WO2013048744A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114466809A (zh) * 2019-10-16 2022-05-10 倍耐力轮胎股份公司 用于计量连续长形元件的方法和装置
CN114935315B (zh) * 2022-05-13 2024-01-16 浙江工业大学 一种通过频域计算细丝衍射条纹的直径测量方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3877776A (en) * 1971-03-01 1975-04-15 Matsushita Electric Ind Co Ltd Speckle reduction in holography
JPS5343300B2 (de) * 1972-11-02 1978-11-18
JPS5334865B2 (de) * 1972-11-17 1978-09-22
DE2421851C3 (de) * 1974-05-06 1978-12-07 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Verfahren zur Messung des Mittelwerts der Steigung von gedrehten Fäden
CA1082811A (en) * 1976-04-05 1980-07-29 Greenwood Mills, Inc. Diffraction pattern amplitude analysis for use in fabric inspection
US4588260A (en) * 1984-04-03 1986-05-13 The United States Of America As Represented By The Secretary Of The Air Force Phase-only optical filter for use in an optical correlation system
JPS62222380A (ja) * 1986-03-25 1987-09-30 Citizen Watch Co Ltd パタ−ン欠陥検出方法
US5317651A (en) * 1988-06-24 1994-05-31 Thomson-Csf Non-linear and adaptive signal-processing device
JPH0462455A (ja) * 1990-06-29 1992-02-27 Shimadzu Corp 粒度分布測定装置
JP2906281B2 (ja) * 1990-09-05 1999-06-14 セイコーインスツルメンツ株式会社 光学的パターン認識装置
US5113286A (en) * 1990-09-27 1992-05-12 At&T Bell Laboratories Diffraction grating apparatus and method of forming a surface relief pattern in diffraction grating apparatus
JPH04299204A (ja) * 1991-03-27 1992-10-22 Toyoda Mach Works Ltd バイト端縁検出装置
JP3378032B2 (ja) * 1992-08-28 2003-02-17 浜松ホトニクス株式会社 人物照合装置
JP2796022B2 (ja) * 1992-10-29 1998-09-10 住友大阪セメント株式会社 物体識別装置
US5629802A (en) * 1995-01-05 1997-05-13 The United States Of America As Represented By The Secretary Of The Air Force Spatially multiplexed optical signal processor
US5919549A (en) * 1996-11-27 1999-07-06 Minnesota Mining And Manufacturing Company Abrasive articles and method for the manufacture of same
US6362879B1 (en) * 2000-02-25 2002-03-26 Corning Incorporated High resolution non-scanning spectrometer
US6567155B1 (en) * 2000-03-16 2003-05-20 Intel Corporation Method for improved resolution of patterning using binary masks with pupil filters
US7221760B2 (en) * 2001-03-30 2007-05-22 The University Of Connecticut Information security using digital holography
US7342659B2 (en) * 2005-01-21 2008-03-11 Carl Zeiss Meditec, Inc. Cross-dispersed spectrometer in a spectral domain optical coherence tomography system
JP2008216575A (ja) * 2007-03-02 2008-09-18 Sony Corp 画像表示方法
JP2008304292A (ja) * 2007-06-07 2008-12-18 Kyushu Institute Of Technology パルス化レーザ光を用いた回転体測定方法及びシステム
US8175739B2 (en) * 2007-07-26 2012-05-08 3M Innovative Properties Company Multi-unit process spatial synchronization
CN102870034B (zh) * 2010-04-30 2015-01-28 浜松光子学株式会社 观察装置

Also Published As

Publication number Publication date
JP2014529086A (ja) 2014-10-30
CN104040323A (zh) 2014-09-10
EP2761281A4 (de) 2015-06-03
EP2761281A1 (de) 2014-08-06
BR112014007576A2 (pt) 2017-04-11
KR20140074970A (ko) 2014-06-18
WO2013048744A1 (en) 2013-04-04
US20140240720A1 (en) 2014-08-28

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