SG109012A1 - Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device and method for producing the same - Google Patents
Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device and method for producing the sameInfo
- Publication number
- SG109012A1 SG109012A1 SG200404511A SG200404511A SG109012A1 SG 109012 A1 SG109012 A1 SG 109012A1 SG 200404511 A SG200404511 A SG 200404511A SG 200404511 A SG200404511 A SG 200404511A SG 109012 A1 SG109012 A1 SG 109012A1
- Authority
- SG
- Singapore
- Prior art keywords
- producing
- positive
- same
- display device
- semiconductor device
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
- C08G69/42—Polyamides containing atoms other than carbon, hydrogen, oxygen, and nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/452—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
- C08G77/455—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences containing polyamide, polyesteramide or polyimide sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Polyamides (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003288221 | 2003-08-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG109012A1 true SG109012A1 (en) | 2005-02-28 |
Family
ID=34114037
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200404511A SG109012A1 (en) | 2003-08-06 | 2004-08-04 | Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device and method for producing the same |
Country Status (6)
Country | Link |
---|---|
US (1) | US7368205B2 (fr) |
EP (1) | EP1513014A3 (fr) |
KR (1) | KR20050016162A (fr) |
CN (2) | CN101928396A (fr) |
SG (1) | SG109012A1 (fr) |
TW (1) | TW200512543A (fr) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2006235230B8 (en) | 2005-04-07 | 2010-08-26 | Chata Biosystems, Inc. | Flow path conditioner system |
JPWO2009014113A1 (ja) * | 2007-07-26 | 2010-10-07 | 住友ベークライト株式会社 | スプレー塗布用ポジ型感光性樹脂組成物、それを用いた硬化膜の形成方法、硬化膜および半導体装置 |
US20100249166A1 (en) | 2007-09-19 | 2010-09-30 | Xy, Inc. | Differential evaporation potentiated disinfectant system |
US8119688B2 (en) * | 2007-09-19 | 2012-02-21 | Xy, Llc | Differential evaporation potentiated disinfectant system |
TW200927832A (en) * | 2007-10-16 | 2009-07-01 | Fujifilm Electronic Materials | Novel photosensitive resin compositions |
KR101584385B1 (ko) * | 2008-05-07 | 2016-01-11 | 스미또모 베이크라이트 가부시키가이샤 | 포지티브형 감광성 수지 조성물, 경화막, 보호막 및 절연막, 및 이를 이용한 반도체 장치 및 표시체 장치 |
JP5410918B2 (ja) * | 2008-10-20 | 2014-02-05 | チェイル インダストリーズ インコーポレイテッド | ポジティブ型感光性樹脂組成物 |
KR101413078B1 (ko) | 2011-12-30 | 2014-07-02 | 제일모직 주식회사 | 포지티브형 감광성 수지 조성물 |
JP5494897B1 (ja) * | 2012-09-14 | 2014-05-21 | 東レ株式会社 | ポリアミド樹脂組成物、成形品 |
US20140234532A1 (en) * | 2013-02-15 | 2014-08-21 | Sumitomo Bakelite Co., Ltd. | Laminated composite material for producing display element, optical element, or illumination element |
KR102176074B1 (ko) * | 2013-04-15 | 2020-11-09 | 아크론 폴리머 시스템즈, 인코포레이티드 | 디스플레이용 소자, 광학용 소자, 또는 조명용 소자의 제조를 위한 방향족 폴리아미드 용액 |
EP3491047B1 (fr) * | 2016-07-28 | 2021-09-15 | 3M Innovative Properties Company | Blocs copolymères silicone polyamide segmentés et articles contenant ces blocs copolymères |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0291779B1 (fr) * | 1987-05-18 | 1994-07-27 | Siemens Aktiengesellschaft | Réserves positives résistantes à la chaleur et procédé de fabrication de structures formant réserve résistantes à la chaleur |
JPS6446862A (en) | 1987-08-18 | 1989-02-21 | Fujitsu Ltd | Bus controller |
EP0373952B1 (fr) * | 1988-12-16 | 1995-02-08 | Hitachi Chemical Co., Ltd. | Composition résineuse photosensible et élément photosensible utilisant cette composition |
KR950011927B1 (ko) * | 1989-12-07 | 1995-10-12 | 가부시끼가이샤 도시바 | 감광성 조성물 및 수지봉지형 반도체장치 |
DE4028515C2 (de) * | 1990-09-07 | 2000-11-30 | Siemens Ag | Resists auf der Basis von oligomeren und/oder polymeren Polybenzoxazol-Vorstufen |
EP0478321B1 (fr) * | 1990-09-28 | 1997-11-12 | Kabushiki Kaisha Toshiba | Composition résineuse photosensible pour la structuration d'un film de polyimide et méthode pour structurer un film de polyimide |
US5472823A (en) * | 1992-01-20 | 1995-12-05 | Hitachi Chemical Co., Ltd. | Photosensitive resin composition |
JP2674415B2 (ja) * | 1992-01-27 | 1997-11-12 | 信越化学工業株式会社 | 感光性樹脂組成物及び電子部品用保護膜 |
JP2787531B2 (ja) * | 1993-02-17 | 1998-08-20 | 信越化学工業株式会社 | 感光性樹脂組成物及び電子部品用保護膜 |
JPH08254831A (ja) * | 1995-03-15 | 1996-10-01 | Shin Etsu Chem Co Ltd | 感光性ポリイミド系樹脂組成物 |
JPH09118825A (ja) * | 1995-10-24 | 1997-05-06 | Shin Etsu Chem Co Ltd | ポリイミド樹脂組成物 |
TW502135B (en) * | 1996-05-13 | 2002-09-11 | Sumitomo Bakelite Co | Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same |
US6207356B1 (en) * | 1996-12-31 | 2001-03-27 | Sumitomo Bakelite Company Limited | Method for the pattern-processing of photosensitive resin composition |
JP4330798B2 (ja) * | 1998-04-15 | 2009-09-16 | 旭化成イーマテリアルズ株式会社 | ポジ型レジスト組成物 |
US6127086A (en) * | 1998-10-01 | 2000-10-03 | Arch Specialty Chemicals, Inc. | Photosensitive resin compositions |
US6143467A (en) * | 1998-10-01 | 2000-11-07 | Arch Specialty Chemicals, Inc. | Photosensitive polybenzoxazole precursor compositions |
US6177225B1 (en) * | 1998-10-01 | 2001-01-23 | Arch Specialty Chemicals, Inc. | Photosensitive resin compositions |
DE60142844D1 (de) * | 2000-10-31 | 2010-09-30 | Intel Corp | Positive lichtempfindliche harzzusammensetzung, prozess zu ihrer herstellung und halbleiterbauelemente |
US6670090B1 (en) * | 2002-09-03 | 2003-12-30 | Industrial Technology Research Institute | Positive working photosensitive composition, article and process for forming a relief pattern |
-
2004
- 2004-07-26 TW TW093122276A patent/TW200512543A/zh unknown
- 2004-08-03 EP EP04018367A patent/EP1513014A3/fr not_active Withdrawn
- 2004-08-04 SG SG200404511A patent/SG109012A1/en unknown
- 2004-08-04 CN CN2010102843193A patent/CN101928396A/zh active Pending
- 2004-08-04 CN CNA2004100559981A patent/CN1609133A/zh active Pending
- 2004-08-05 KR KR1020040061659A patent/KR20050016162A/ko active IP Right Grant
- 2004-08-06 US US10/912,841 patent/US7368205B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7368205B2 (en) | 2008-05-06 |
CN101928396A (zh) | 2010-12-29 |
US20050031994A1 (en) | 2005-02-10 |
CN1609133A (zh) | 2005-04-27 |
TW200512543A (en) | 2005-04-01 |
KR20050016162A (ko) | 2005-02-21 |
EP1513014A3 (fr) | 2005-11-23 |
EP1513014A2 (fr) | 2005-03-09 |
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